Abstract: The present invention relates to novel oxodihydropyridinecarbohydrazide derivatives with excellent antifungal activities, an antifungal composition containing the same, and its use for the prevention and treatment of fungal infectious diseases. The oxodihydropyridinecarbohydrazide derivatives of the present invention have excellent antifungal and fungicidal activities, and thus will be useful for the prevention and treatment of various fungal infections by Candida spp., Aspergillus spp., Cryptococcus neoformans and Trichophyton spp., etc. Additionally, the oxodihydropyridinecarbohydrazide derivatives of the present invention, unlike other fungicidal preparations, can be orally administered.

Abstract: A display device includes a bottom chassis including first and second bottom portions, a mold frame including first and second frame portions disposed in respective first and second bottom portions, a hinge portion configured to couple the first and second frame portions to each other, a flexible display panel disposed on the mold frame and the hinge portion, a first curvature adjusting portion disposed between one side of the hinge portion and the display panel and coupled to the first frame portion, a second curvature adjusting portion disposed between the opposite side of the hinge portion and the display panel and coupled to the second frame portion, a first support portion coupled to the hinge portion and configured to support the first curvature adjusting portion, and a second support portion coupled to the hinge portion and configured to support the second curvature adjusting portion.

Abstract: A pellicle for a reflective mask including a pellicle body, a light shielding pattern, a grating pattern, and a pellicle frame. The pellicle body includes a central region and a peripheral region, wherein the peripheral region surrounds the central region. The light shielding pattern is formed on the peripheral region of the pellicle body; the grating pattern is formed on the light shielding pattern, and the pellicle frame is located under the peripheral region of the pellicle body, and the pellicle frame is configured to support the pellicle body.

Abstract: An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.

Abstract: The present invention relates to novel oxodihydropyridinecarbohydrazide derivatives with excellent antifungal activities, an antifungal composition containing the same, and its use for the prevention and treatment of fungal infectious diseases. The oxodihydropyridinecarbohydrazide derivatives of the present invention have excellent antifungal and fungicidal activities, and thus will be useful for the prevention and treatment of various fungal infections by Candida spp., Aspergillus spp., Cryptococcus neoformans and Trichophyton spp., etc. Additionally, the oxodihydropyridinecarbohydrazide derivatives of the present invention, unlike other fungicidal preparations, can be orally administered.

Abstract: There is provided a variable display device including: a variable display displaying an image and variably changed by external force; and at least one click button module provided separately from the variable display and attached onto the bottom of the variable display to correspond to a predetermined touch button region of the variable display.

Abstract: A foldable display is disclosed. In one aspect, the display includes a flexible display panel including a folding region at which the flexible display panel is configured to be folded and a rigid plane region. The display further includes a heat dissipation sheet attached to one side of the plane region and configured to dissipate heat generated by the flexible display panel. The heat dissipation sheet is not attached to the folding region.

Abstract: Provided are: a hollow fiber membrane module comprising a hollow fiber membrane part positioned within a housing part and an air injection pipe part in which a plurality of pores for providing bubbles to the hollow fiber membrane part are formed along a pipe body, wherein the pipe body is wound so as to form a spiral shape; and an aerator including the air injection pipe part.

Abstract: A reflective extreme ultraviolet (EUV) mask includes a mask substrate, a reflecting layer on an upper surface of the mask substrate, and an absorbing layer pattern on an upper surface of the reflecting layer, the absorbing layer pattern having an exposing region and a peripheral region, and the absorbing layer pattern including a grating pattern in the peripheral region to reduce reflectivity of light incident on the peripheral region.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: A display device includes a bottom chassis including first and second bottom portions, a mold frame including first and second frame portions disposed in respective first and second bottom portions, a hinge portion configured to couple the first and second frame portions to each other, a flexible display panel disposed on the mold frame and the hinge portion, a first curvature adjusting portion disposed between one side of the hinge portion and the display panel and coupled to the first frame portion, a second curvature adjusting portion disposed between the opposite side of the hinge portion and the display panel and coupled to the second frame portion, a first support portion coupled to the hinge portion and configured to support the first curvature adjusting portion, and a second support portion coupled to the hinge portion and configured to support the second curvature adjusting portion.

Abstract: An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.

Abstract: The organic light emitting diode display may comprise a cover window including a display region and a non-display region that surrounds the display region; a flexible substrate arranged on a lower portion of the cover window, and including a first region that is spaced apart from the cover window and a second region that extends from the first region toward the cover window; and an adhesive layer arranged between the cover window and the flexible substrate to make the cover window and the flexible substrate adhere to each other.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: An apparatus for creating an EUV light may include a droplet-supplying unit, a laser-irradiating unit, a light-concentrating unit and a guiding unit. The droplet-supplying unit may supply a droplet from which the EUV light may be created. The laser-irradiating unit may irradiate a laser to the droplet supplied from the droplet-supplying unit to create the EUV light. The light-concentrating unit may concentrate the EUV light created by the laser-irradiating unit. The guiding unit may guide the droplet to a position at which the laser may be irradiated. The guiding unit may have at least one gas-spraying hole for spraying a gas to a space between the droplet-supplying unit and the laser irradiation position to form a gas curtain configured to surround the droplet.

Abstract: The inventive concept provides methods of manufacturing semiconductor devices having a fine pattern. In some embodiments, the methods comprise forming an etch-target film on a substrate, forming a first mask pattern on the etch-target film, forming a second mask pattern by performing an ion implantation process in the first mask pattern, and etching the etch-target film using the second mask pattern.

Abstract: According to some embodiments of the invention, a substrate doped with a P type impurity is provided. An N type impurity is doped into the substrate to divide the substrate into a P type impurity region and an N type impurity region. Active patterns having a first pitch are formed in the P type and N type impurity regions. Gate patterns having a second pitch are formed on the active patterns in a direction substantially perpendicular to the active patterns. Other embodiments are described and claimed.

Abstract: An exposing method includes irradiating a first light having a first energy to a first exposed region of a photoresist film through a first shot region of a mask, and irradiating a second light having a second energy to the first exposed region of the photoresist film through a second shot region of the mask.

Abstract: A separation membrane cleaning system and a separation membrane cleaning method. A separation membrane cleaning system includes: a membrane filtration bath; a treated water storage bath configured to store treated water produced by the membrane filtration bath and discharge the treated water during reverse cleaning or chemical cleaning; a chemical storage bath configured to supply a chemical; a first pipe fluidically communicated between the membrane filtration bath and the treated water storage bath to transport the treated water produced by the membrane filtration bath to the treated water storage bath, and a fourth pipe fluidically communicated with the first pipe to transport the chemical to the membrane filtration bath; a second pipe to transport the treated water from the treated water storage bath; and a third pipe fluidically communicated with the fourth pipe to transport the chemical from the chemical storage bath.

Abstract: Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas.