Patents by Inventor Chang Wan Ha

Chang Wan Ha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230317144
    Abstract: An embodiment of an apparatus may include NAND memory organized as two or more memory planes and a controller communicatively coupled to the NAND memory, the controller including circuitry to provide synchronous independent plane read operations for the two or more memory planes of the NAND memory. Other embodiments are disclosed and claimed.
    Type: Application
    Filed: March 29, 2022
    Publication date: October 5, 2023
    Applicant: Intel NDTM US LLC
    Inventors: Chang Wan Ha, Binh Ngo, Ali Khakifirooz, Aliasgar S. Madraswala, Bharat Pathak, Pranav Kalavade, Shantanu Rajwade
  • Publication number: 20230305708
    Abstract: An embodiment of an apparatus may include a memory package with one or more memory die on an internal input/output (IO) path of the memory package, and an interface module communicatively coupled to the one or more memory die through the internal IO path, the interface module including circuitry to perform IO external to the memory package at a first IO width and a first IO speed, and perform IO internal to the memory package at a second IO width and a second IO speed, wherein one or more of the second IO width is different from the first IO width and the second IO speed is different from the first IO speed. Other embodiments are disclosed and claimed.
    Type: Application
    Filed: March 25, 2022
    Publication date: September 28, 2023
    Applicant: Intel NDTM US LLC
    Inventors: Chang Wan Ha, Sriram Balasubrahmanyam
  • Publication number: 20230266910
    Abstract: Manufacturing yield loss of NAND Flash dies is reduced by selecting a plane to store a read-only reserved block and another plane to store a backup read-only reserved block based on the Number of Valid Blocks (NVB) blocks in each plane in the NAND Flash array.
    Type: Application
    Filed: February 22, 2022
    Publication date: August 24, 2023
    Inventors: Chang Wan HA, Quincy S. CHIU, Hoon KOH, Kristopher H. GAEWSKY, Aliasgar S. MADRASWALA, Bharat M. PATHAK, Pranav KALAVADE, Akshay JAYARAJ, Simerjeet SINGH, Zengtao LIU
  • Publication number: 20230230639
    Abstract: Power consumption of sensing circuitry in a NAND Flash device is reduced by reducing the voltage supply to a portion of logic circuits in sensing circuitry. A first power domain provides power to a first portion of the logic circuits in the sensing circuity and a second power domain provides power to a second portion of the logic circuits in the sensing circuitry. The first power domain has a higher voltage than the second power domain.
    Type: Application
    Filed: March 28, 2023
    Publication date: July 20, 2023
    Inventors: Mattia CICHOCKI, Violante MOSCHIANO, Tommaso VALI, Guido Luciano RIZZO, Chang Wan HA, Richard FASTOW
  • Publication number: 20230200063
    Abstract: Systems, apparatuses, and methods may provide for technology that arranges stair wells for memory devices. The memory device includes a memory array and a memory block coupled to the memory array. The memory block includes a first through array via area and a first staircase area coupled to a plurality of decks. The first staircase area includes a first stair well and a second stair well located contiguous to the first stair well.
    Type: Application
    Filed: December 22, 2021
    Publication date: June 22, 2023
    Inventors: Deepak Thimmegowda, Chang Wan Ha, Md Rezaul Karim Nishat, Liu Liu, Yuanrong Shui, Kwame Eason, Ahmed Reza, Hoon Koh
  • Patent number: 11653496
    Abstract: The total silicon area used by a plurality of high voltage transistors in an array of NAND cells is reduced by modifying the silicon area layout such that the size of the source and drain of each of the plurality of high voltage transistors is dependent on the maximum voltage to be applied to each of the source and drain for the respective one of the plurality of high voltage transistors.
    Type: Grant
    Filed: September 25, 2020
    Date of Patent: May 16, 2023
    Assignee: Intel Corporation
    Inventors: Chang Wan Ha, Chuan Lin, Deepak Thimmegowda, Zengtao Liu, Binh N. Ngo, Soo-yong Park
  • Publication number: 20230082368
    Abstract: Systems, apparatuses, and methods may provide for technology that groups a plurality of wordline drivers together and supports these grouped wordline drivers via a shared multiplexer, a shared level shifter, and/or one or more shared multi-well level shifters. In one example, such technology includes a shared multiplexer and a first and second grouped global wordline driver coupled to the shared multiplexer. The shared multiplexer is to access data state information from a plurality of memory cells. The first grouped global wordline driver is to output a first plurality of wordlines associated with a first plane. The second grouped global wordline driver is to output a second plurality of wordlines associated with a second plane, where the second plane is different than the first plane.
    Type: Application
    Filed: September 15, 2021
    Publication date: March 16, 2023
    Applicant: Intel Corporation
    Inventors: Chang Wan Ha, Binh Ngo, Ahsanur Rahman, Radhika Chinnammagari, Sagar Upadhyay
  • Publication number: 20220399057
    Abstract: An embodiment of a memory device may include a full block memory array of a lower tile of 3D NAND string memory cells, a full block memory array of an upper tile of 3D NAND string memory cells, a first portion of a string driver circuit coupled to the full block memory array of the lower tile, a second portion of the string driver circuit coupled to the full block memory array of the upper tile, a first split block memory array of the lower tile coupled to the first portion of the string driver circuit, and a second split block memory array of the upper tile coupled to the second portion of the string driver circuit. Other embodiments are disclosed and claimed.
    Type: Application
    Filed: June 9, 2021
    Publication date: December 15, 2022
    Applicant: Intel Corporation
    Inventors: Chang Wan Ha, Deepak Thimmegowda, Hoon Koh, Richard M. Gularte, Liu Liu, David Meyaard, Ahsanur Rahman
  • Patent number: 11500446
    Abstract: A nonvolatile memory supports a standby state where the memory is ready to receive an access command to execute, and a deep power down state where the memory ignores all access commands. The memory can transition from the standby state to the deep power down state in response to a threshold amount of time in the standby state. Thus, the memory can enter the standby state after a command and then transition to the deep power down state after the threshold time.
    Type: Grant
    Filed: September 28, 2019
    Date of Patent: November 15, 2022
    Assignee: Intel Corporation
    Inventors: Richard Fastow, Shankar Natarajan, Chang Wan Ha, Chee Law, Khaled Hasnat, Chuan Lin, Shafqat Ahmed
  • Patent number: 11429469
    Abstract: Examples herein relate to determining a number of defective bit lines in a memory region prior to applying a program or erase voltages. If a threshold number of bit lines that pass during a program or erase verify operation is used to determine if the program or erase operation passes or fails, the determined number of defective bit lines can be used to adjust the determined number of passes or fails. In some cases, examples described herein can avoid use of extra bit lines and look-up table circuitry to use in place of defective bit lines and save silicon space and cost associated with the use of extra bit-lines. In some examples, a starting magnitude of a program voltage signal can be determined by considering a number of defective bit lines.
    Type: Grant
    Filed: March 8, 2021
    Date of Patent: August 30, 2022
    Assignee: Intel Corporation
    Inventors: Ali Khakifirooz, Pranav Kalavade, Ravi H. Motwani, Chang Wan Ha
  • Patent number: 11393716
    Abstract: Apparatuses and methods for stair step formation using at least two masks, such as in a memory device, are provided. One example method can include forming a first mask over a conductive material to define a first exposed area, and forming a second mask over a portion of the first exposed area to define a second exposed area, the second exposed area is less than the first exposed area. Conductive material is removed from the second exposed area. An initial first dimension of the second mask is less than a first dimension of the first exposed area and an initial second dimension of the second mask is at least a second dimension of the first exposed area plus a distance equal to a difference between the initial first dimension of the second mask and a final first dimension of the second mask after a stair step structure is formed.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: July 19, 2022
    Assignee: Micron Technology, Inc.
    Inventors: Chang Wan Ha, Graham R. Wolstenholme, Deepak Thimmegowda
  • Publication number: 20220102365
    Abstract: The total silicon area used by a plurality of high voltage transistors in an array of NAND cells is reduced by modifying the silicon area layout such that the size of the source and drain of each of the plurality of high voltage transistors is dependent on the maximum voltage to be applied to each of the source and drain for the respective one of the plurality of high voltage transistors.
    Type: Application
    Filed: September 25, 2020
    Publication date: March 31, 2022
    Inventors: Chang Wan HA, Chuan LIN, Deepak THIMMEGOWDA, Zengtao LIU, Binh N. NGO, Soo-yong PARK
  • Publication number: 20210193200
    Abstract: Examples herein relate to determining a number of defective bit lines in a memory region prior to applying a program or erase voltages. If a threshold number of bit lines that pass during a program or erase verify operation is used to determine if the program or erase operation passes or fails, the determined number of defective bit lines can be used to adjust the determined number of passes or fails. In some cases, examples described herein can avoid use of extra bit lines and look-up table circuitry to use in place of defective bit lines and save silicon space and cost associated with the use of extra bit-lines. In some examples, a starting magnitude of a program voltage signal can be determined by considering a number of defective bit lines. In some examples, identification of open or shorted bit lines can be used to identify read operations involving those open or shorted bit lines as weak in connection with performing soft bit read correction.
    Type: Application
    Filed: March 8, 2021
    Publication date: June 24, 2021
    Inventors: Ali KHAKIFIROOZ, Pranav KALAVADE, Ravi H. MOTWANI, Chang Wan HA
  • Publication number: 20210096634
    Abstract: A nonvolatile memory supports a standby state where the memory is ready to receive an access command to execute, and a deep power down state where the memory ignores all access commands. The memory can transition from the standby state to the deep power down state in response to a threshold amount of time in the standby state. Thus, the memory can enter the standby state after a command and then transition to the deep power down state after the threshold time.
    Type: Application
    Filed: September 28, 2019
    Publication date: April 1, 2021
    Inventors: Richard FASTOW, Shankar NATARAJAN, Chang Wan HA, Chee LAW, Khaled HASNAT, Chuan LIN, Shafqat AHMED
  • Publication number: 20210074338
    Abstract: Examples herein relate to determining a number of defective bit lines in a memory region prior to applying a program or erase voltages. If a threshold number of bit lines that pass during a program or erase verify operation is used to determine if the program or erase operation passes or fails, the determined number of defective bit lines can be used to adjust the determined number of passes or fails. In some cases, examples described herein can avoid use of extra bit lines and look-up table circuitry to use in place of defective bit lines and save silicon space and cost associated with the use of extra bit-lines. In some examples, a starting magnitude of a program voltage signal can be determined by considering a number of defective bit lines.
    Type: Application
    Filed: September 6, 2019
    Publication date: March 11, 2021
    Inventors: Ali KHAKIFIROOZ, Pranav KALAVADE, Ravi H. MOTWANI, Chang Wan HA
  • Patent number: 10942799
    Abstract: Examples herein relate to determining a number of defective bit lines in a memory region prior to applying a program or erase voltages. If a threshold number of bit lines that pass during a program or erase verify operation is used to determine if the program or erase operation passes or fails, the determined number of defective bit lines can be used to adjust the determined number of passes or fails. In some cases, examples described herein can avoid use of extra bit lines and look-up table circuitry to use in place of defective bit lines and save silicon space and cost associated with the use of extra bit-lines. In some examples, a starting magnitude of a program voltage signal can be determined by considering a number of defective bit lines.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: March 9, 2021
    Assignee: Intel Corporation
    Inventors: Ali Khakifirooz, Pranav Kalavade, Ravi H. Motwani, Chang Wan Ha
  • Publication number: 20200365452
    Abstract: Apparatuses and methods for stair step formation using at least two masks, such as in a memory device, are provided. One example method can include forming a first mask over a conductive material to define a first exposed area, and forming a second mask over a portion of the first exposed area to define a second exposed area, the second exposed area is less than the first exposed area. Conductive material is removed from the second exposed area. An initial first dimension of the second mask is less than a first dimension of the first exposed area and an initial second dimension of the second mask is at least a second dimension of the first exposed area plus a distance equal to a difference between the initial first dimension of the second mask and a final first dimension of the second mask after a stair step structure is formed.
    Type: Application
    Filed: July 31, 2020
    Publication date: November 19, 2020
    Inventors: Chang Wan Ha, Graham R. Wolstenholme, Deepak Thimmegowda
  • Patent number: 10832766
    Abstract: An apparatus and/or system is described including a memory device or a controller to perform programming and verification operations including application of a shared voltage level to verify two program voltage levels of a multi-level cell device. For example, in embodiments, the control circuitry performs a program operation to program a memory cell and performs a verification operation by applying a single or shared verify voltage level to verify that the memory cell is programmed to a corresponding program voltage level. In embodiments, the program voltage level is one of two consecutive program voltage levels of a plurality of program voltage levels to be verified by application of the shared verify voltage. Other embodiments are disclosed and claimed.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: November 10, 2020
    Assignee: Intel Corporation
    Inventors: Ali Khakifirooz, Pranav Kalavade, Uday Chandrasekhar, Trupti Bemalkhedkar, Chang Wan Ha
  • Patent number: 10748811
    Abstract: Apparatuses and methods for stair step formation using at least two masks, such as in a memory device, are provided. One example method can include forming a first mask over a conductive material to define a first exposed area, and forming a second mask over a portion of the first exposed area to define a second exposed area, the second exposed area is less than the first exposed area. Conductive material is removed from the second exposed area. An initial first dimension of the second mask is less than a first dimension of the first exposed area and an initial second dimension of the second mask is at least a second dimension of the first exposed area plus a distance equal to a difference between the initial first dimension of the second mask and a final first dimension of the second mask after a stair step structure is formed.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: August 18, 2020
    Assignee: Micron Technology, Inc.
    Inventors: Chang Wan Ha, Graham R. Wolstenholme, Deepak Thimmegowda
  • Patent number: 10468116
    Abstract: Methods of operating a memory device include comparing an input address to one or more addresses stored in the memory device and indicative of problematic memory cells of the memory device, determining a status value of an indicator corresponding to a matched address if the input address matches a stored address, and storing data corresponding to the input address to a first memory array of the memory device and to a second memory array of the memory device if the indicator has a first status value. Methods may further include storing the data corresponding to the input address to only the first memory array or the second memory array if the indicator has a second status value.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: November 5, 2019
    Assignee: Micron Technology, Inc.
    Inventor: Chang Wan Ha