Patents by Inventor Chang-Won Choi
Chang-Won Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11539800Abstract: Disclosed is an electronic device. The electronic device of the present invention comprises: a communication unit; a storage unit for storing a uniform resource locator (URL) designated by an external electronic device and information on specific content provided in the designated URL; and a processor which, when a request for a connection to a designated URL is received from an external electronic device through the communication unit, identifies whether specific content can be provided in the designated URL, and in a case where the specific content cannot be provided, obtains information on another URL that provides content related to the specific content by using stored information, and transmits the obtained information on the another URL to the external electronic device through the communication unit.Type: GrantFiled: August 29, 2018Date of Patent: December 27, 2022Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Tae-hoon Lee, Young-hyun Kim, Young-in Park, Han-jin Park, Sung-min Lim, Chang-won Choi
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Publication number: 20220137922Abstract: Provided is a bit-width optimization method for performing floating point to fixed point conversion (FFC) by at least one processor. The bit-width optimization method includes receiving a first floating-point value which represents a minimum value among floating-point values to be converted, receiving a second floating-point value which represents a maximum value among the floating-point values to be converted, receiving a maximum permissible error rate for performing FFC, calculating a minimum bit width of fixed-point notation which satisfies the maximum permissible error rate on the basis of the first floating-point value, the second floating-point value, and the maximum permissible error rate, and calculating a scale factor for FFC on the basis of the second floating-point value and the calculated minimum bit width.Type: ApplicationFiled: September 16, 2021Publication date: May 5, 2022Inventors: Joon Hwan YI, Gi Sik LEE, Chang Won CHOI
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Patent number: 11187568Abstract: The present invention provides a curb for measuring the flood depth in an urban area, more particularly, to a curb for measuring the flood depth in an urban area, which is configured to demarcate the boundary between a vehicular roadway and a pedestrian sidewalk to measure the flood depth so that the flood depth in the urban area can be measured without the necessity for additional installation of a separate structure. In particular, the present invention has an effect in that an air contact type water level gauge is installed in a first space of a main body to measure the flood depth, i.e., the level of flooding water based on the internal air pressure of a cylindrical tube so that a pressure sensor is not brought into close contact with the flooding water to prevent corrosion of the pressure sensor, thereby reducing the maintenance and repair costs.Type: GrantFiled: November 7, 2018Date of Patent: November 30, 2021Assignee: THE REPUBLIC OF KOREA (NATIONAL DISASTER MANAGEMENT RESEARCH INSTITUTE)Inventors: Han Seung Lee, Jae Seung Joo, Jae Woong Cho, Chang Won Choi, Ho Seon Kang, Chang Yeon Bae, Jeong Geun Hwang
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Publication number: 20210255022Abstract: The present invention provides a curb for measuring the flood depth in an urban area, more particularly, to a curb for measuring the flood depth in an urban area, which is configured to demarcate the boundary between a vehicular roadway and a pedestrian sidewalk to measure the flood depth so that the flood depth in the urban area can be measured without the necessity for additional installation of a separate structure. In particular, the present invention has an effect in that an air contact type water level gauge is installed in a first space of a main body to measure the flood depth, i.e., the level of flooding water based on the internal air pressure of a cylindrical tube so that a pressure sensor is not brought into close contact with the flooding water to prevent corrosion of the pressure sensor, thereby reducing the maintenance and repair costs.Type: ApplicationFiled: November 7, 2018Publication date: August 19, 2021Inventors: Han Seung LEE, Jae Seung JOO, Jae Woong CHO, Chang Won CHOI, Ho Seon KANG, Chang Yeon BAE, Jeong Geun HWANG
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Patent number: 11066638Abstract: The present invention relates to bacterial ghosts, and more particularly, to a method of preparing bacterial ghosts from gram-positive bacteria by hydrochloric acid treatment. Specifically, according to the present invention, when gram-positive bacteria were cultured after being treated with a minimum inhibitory concentration (MIC) of hydrochloric acid capable of inhibiting colony formation of gram-positive bacteria, bacterial ghosts were effectively formed. Since the formed bacterial ghosts have no intracellular proteins or DNA while preserving cell wall integrity, the risk of side effects such as secondary infection caused by bacterial growth when the bacterial ghosts are administered to humans is low. Therefore, the bacterial ghosts prepared from gram-positive bacteria according to the method of the present invention may be effectively used as a vaccine or a foreign antigen carrier for preventing or treating gram-positive bacterial infection.Type: GrantFiled: July 13, 2016Date of Patent: July 20, 2021Assignee: PAICHAI UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATIONInventors: Chang Won Choi, Seong Mi Ji, Hyun Jung Park, Sung Oh, Nagarajan Vinod, Han Byul No
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Publication number: 20200344308Abstract: Disclosed is an electronic device. The electronic device of the present invention comprises: a communication unit; a storage unit for storing a uniform resource locator (URL) designated by an external electronic device and information on specific content provided in the designated URL; and a processor which, when a request for a connection to a designated URL is received from an external electronic device through the communication unit, identifies whether specific content can be provided in the designated URL, and in a case where the specific content cannot be provided, obtains information on another URL that provides content related to the specific content by using stored information, and transmits the obtained information on the another URL to the external electronic device through the communication unit.Type: ApplicationFiled: August 29, 2018Publication date: October 29, 2020Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Tae-hoon Lee, Young-hyun Kim, Young-in Park, Han-jin Park, Sung-min Lim, Chang-won Choi
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Patent number: 10090135Abstract: A method of forming a coating layer, including preparing hollow inorganic particles, each hollow inorganic particle including a shell surrounding a hollow core; preparing inorganic coating particles of a solid structure; forming a mixture of the hollow inorganic particles and the inorganic coating particles; and spraying the mixture on a surface of a base by a plasma spray coating process.Type: GrantFiled: February 4, 2016Date of Patent: October 2, 2018Assignee: Samsung Electronics Co., Ltd.Inventors: Chul-Kyun Seok, Tae-Kyun Kang, Chang-Won Choi
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Publication number: 20180066225Abstract: The present invention relates to bacterial ghosts, and more particularly, to a method of preparing bacterial ghosts from gram-positive bacteria by hydrochloric acid treatment. Specifically, according to the present invention, when gram-positive bacteria were cultured after being treated with a minimum inhibitory concentration (MIC) of hydrochloric acid capable of inhibiting colony formation of gram-positive bacteria, bacterial ghosts were effectively formed. Since the formed bacterial ghosts have no intracellular proteins or DNA while preserving cell wall integrity, the risk of side effects such as secondary infection caused by bacterial growth when the bacterial ghosts are administered to humans is low. Therefore, the bacterial ghosts prepared from gram-positive bacteria according to the method of the present invention may be effectively used as a vaccine or a foreign antigen carrier for preventing or treating gram-positive bacterial infection.Type: ApplicationFiled: July 13, 2016Publication date: March 8, 2018Applicant: PAICHAI UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATIONInventors: Chang Won CHOI, Seong Mi JI, Hyun Jung PARK, Sung OH, Nagarajan VINOD, Han Byul NO
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Publication number: 20160351376Abstract: A method of forming a coating layer, including preparing hollow inorganic particles, each hollow inorganic particle including a shell surrounding a hollow core; preparing inorganic coating particles of a solid structure; forming a mixture of the hollow inorganic particles and the inorganic coating particles; and spraying the mixture on a surface of a base by a plasma spray coating process.Type: ApplicationFiled: February 4, 2016Publication date: December 1, 2016Inventors: Chul-Kyun SEOK, Tae-Kyun KANG, Chang-Won CHOI
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Patent number: 9034725Abstract: A method of forming a transistor is provided. An upper portion of a substrate is partially removed forming a trench. An isolation layer partially fills the trench, forming active patterns of the substrate. The isolation layer has a void therein. A photoresist pattern is formed on the active patterns and the isolation layer. The active patterns and the isolation layer are partially removed using the photoresist pattern as an etching mask, thus forming a recess. A plasma treatment process is performed, removing the photoresist pattern and filling the void. A gate insulation layer and a gate electrode fill the recess.Type: GrantFiled: September 18, 2013Date of Patent: May 19, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Doo-Whan Choi, Jung-Bong Yun, Chang-Won Choi
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Publication number: 20140087533Abstract: A method of forming a transistor is provided. An upper portion of a substrate is partially removed forming a trench. An isolation layer partially fills the trench, forming active patterns of the substrate. The isolation layer has a void therein. A photoresist pattern is formed on the active patterns and the isolation layer. The active patterns and the isolation layer are partially removed using the photoresist pattern as an etching mask, thus forming a recess. A plasma treatment process is performed, removing the photoresist pattern and filling the void. A gate insulation layer and a gate electrode fill the recess.Type: ApplicationFiled: September 18, 2013Publication date: March 27, 2014Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: DOO-WHAN CHOI, Jung-Bong Yun, Chang-Won Choi
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Patent number: 8514800Abstract: A method for transmitting Ethernet data in a Digital Unit (DU) that processes a baseband and interfaces with at least two Radio Frequency (RF) Units (RUs) is provided. The method includes setting location information of two or more Ethernet channels in a first subchannel of a radio frame, allocating the two or more Ethernet channels in second subchannels of the radio frame, using the location information, and transmitting the radio frame to the at least two RUs.Type: GrantFiled: January 19, 2011Date of Patent: August 20, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Keun-Bok Kim, Chang-Won Kim, Han-Ul Moon, Chang-Won Choi
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Publication number: 20110182255Abstract: A method for transmitting Ethernet data in a Digital Unit (DU) that processes a baseband and interfaces with at least two Radio Frequency (RF) Units (RUs) is provided. The method includes setting location information of two or more Ethernet channels in a first subchannel of a radio frame, allocating the two or more Ethernet channels in second subchannels of the radio frame, using the location information, and transmitting the radio frame to the at least two RUs.Type: ApplicationFiled: January 19, 2011Publication date: July 28, 2011Applicant: SAMSUNG ELECTRONICS CO. LTD.Inventors: Keun-Bok KIM, Chang-Won KIM, Han-Ul MOON, Chang-Won CHOI
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Patent number: 7241441Abstract: The present invention relates to a novel Pediococcus genus microorganism and more particularly, Pediococcus pentosaceus EROM101 (KCCM-10517) originated from human intestines having immune enhancement, anticancer and antiviral activities and a use thereof. Due to its excellent immune enhancement, anticancer and antimicrobial activities by activating macrophages/spleen cells and inducing gut immunity, the Pediococcus pentosaceus EROM101 of the present invention can be effectively used for the production of various products such as immune enhancement agent, anticancer agent, antimicrobial agent, food additive, intestinal function-controlling agent, live bacterial agent, feed additive and other fermented products.Type: GrantFiled: June 12, 2006Date of Patent: July 10, 2007Assignee: Eromlife Co., Ltd.Inventors: Chang Won Choi, Mi Hyoun Park, Sang Ho Hwang, Suk Gyu Woo, Mi Kyung Song, Jong Jun Im, Sung Gil Hong, Joong Hark Kim, Jung Soon Jang, Hwa Young Kim
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Publication number: 20060228379Abstract: The present invention relates to a novel Pediococcus genus microorganism and more particularly, Pediococcus pentosaceus EROM101 (KCCM-10517) originated from human intestines having immune enhancement, anticancer and antiviral activities and a use thereof. Due to its excellent immune enhancement, anticancer and antimicrobial activities by activating macrophages/spleen cells and inducing gut immunity, the Pediococcus pentosaceus EROM101 of the present invention can be effectively used for the production of various products such as immune enhancement agent, anticancer agent, antimicrobial agent, food additive, intestinal function-controlling agent, live bacterial agent, feed additive and other fermented products.Type: ApplicationFiled: June 12, 2006Publication date: October 12, 2006Applicant: EROMLIFE CO., LTD.Inventors: Chang Won Choi, Mi Hyoun Park, Sang Ho Hwang, Suk Gyu Woo, Mi Kyung Song, Jong Jun Im, Sung Gil Hong, Joong Hark Kim, Jung Soon Jang, Hwa Young Kim
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Patent number: 6869621Abstract: The present invention relates to a diet composition comprising brown rice, job's tear, red beans, buckwheat, Italian millet, Indian millet, white beans, black beans, black rice, barley, brown rice sprouts, kale, matured pumpkin (Curcurbia moschata), carrot, Angelica, cabbage, wild Lanceolate root, Lotus root, radish, green radish, mugwort, pine needles, laver, sea mustard, sea tagle, Shiitake mushroom, Reishi mushroom, soy peptide, isolated soy protein, L-carnitine, Hibiscus extract, green tea extract and solomon's seal extract. The composition is useful in reducing body weight and body fat; controlling body shape; and lowering serum cholesterol and neutral fat.Type: GrantFiled: April 15, 2003Date of Patent: March 22, 2005Assignee: Eromlife Co., Ltd.Inventors: Sang Ho Hwang, Hey Eun Chang, Chang Won Choi, Sung Bum Yang, Mi Hyoun Park
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Patent number: 6858235Abstract: The present invention relates to an antioxidant composition and a method of preparation thereof. In detail, the present invention relates to an antioxidant composition containing procyanidin B3 obtained from Rosa multiflora, and a preparation method for the antioxidant composition, comprising extraction of the underground part of Rosa multiflora with an organic solvent, followed by fractionation and purification of the extract by chromatography. The antioxidant composition of the present invention can be effectively used in treatment or prevention of various diseases due to oxidation by reactive oxygen species, maintenance of quality of food, and prevention of skin damages due to oxidation.Type: GrantFiled: November 7, 2002Date of Patent: February 22, 2005Assignee: Eromlife Co. Ltd.Inventors: Mi-Hyoun Park, Nam-In Baek, Jae-Taek Han, Chang-Won Choi
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Patent number: 6838719Abstract: Methods of forming integrated circuit capacitors include the steps of forming a first electrically insulating layer having a conductive plug therein, on a semiconductor substrate, and then forming second and third electrically insulating layers of different materials on the first electrically insulating layer. A contact hole is then formed to extend through the second and third electrically insulating layers and expose the conductive plug. Next, a conductive layer is formed in the contact hole and on the third electrically insulating layer. A step is then performed to planarize the conductive layer to define a U-shaped electrode in the contact hole. The third electrically insulating layer is then etched-back to expose upper portions of outer sidewalls of the U-shaped electrode, using the second electrically insulating layer as an etch stop layer. However, the second electrically insulating layer is not removed but is left to act as a supporting layer for the U-shaped electrode.Type: GrantFiled: August 20, 2002Date of Patent: January 4, 2005Assignee: Samsung Electronics Co. Ltd.Inventors: Ki-Hyun Hwang, Chang-Won Choi, Seok-Woo Nam, Bon-Young Koo, Young-Sub Yu, Han-Jin Lim
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Patent number: 6835276Abstract: An end point detection window prevents process failures in a plasma etching device. The end point detection window has a body of aluminum or an aluminum alloy through which a hole extends to provide a path along which light generated during the etching process can pass from the process chamber, and a capping section coupled to a light outlet of the body. The capping section is of quartz for allowing the light passing through the hole in the body to be transmitted out of the process chamber.Type: GrantFiled: September 19, 2002Date of Patent: December 28, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Jung-Hyun Hwang, No-Hyun Huh, Chang-Won Choi, Byeung-Wook Choi, Doo-Won Lee
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Publication number: 20040238488Abstract: A wafer edge etching apparatus and method for etching an edge of a semiconductor wafer including a bottom electrode, arranged below the semiconductor wafer and acting as a stage to support the semiconductor wafer. A method of etching a semiconductor wafer including inserting a semiconductor wafer into a chamber, increasing a pressure in the chamber, supplying at least one etchant gas to the chamber while further increasing the pressure, supplying power to the chamber and etching the semiconductor wafer at the edge bead or the backside of the semiconductor wafer, discontinuing the power and the etchant gas, venting the chamber with a venting gas, and purging the venting gas from the chamber.Type: ApplicationFiled: January 23, 2004Publication date: December 2, 2004Inventors: Chang Won Choi, Jong Baum Kim, Tae Ryong Kim, Jung-Woo Seo, Chang Ju Byun