Abstract: A method for forming a dielectric-isolated bulk fin field-effect transistor (finFET) device includes forming a second isolation layer over a first structure including multiple partially exposed fins and horizontal areas including a first isolation layer. The second isolation layer is removed from horizontal areas of a first portion of the first structure. An oxide layer is formed under the fins of the first portion of the first structure. The second isolation layer is removed in order to expose the partially exposed fins and horizontal areas of the first structure to form a second structure, on which gate regions are formed.

Abstract: An anti-fuse device for fin field-effect transistor (finFET) technology includes a dummy gate, an electrically conductive contact, and a diffusion contact. The dummy gate is formed over an end-corner of a fin. The electrically conductive contact is disposed on a portion of the dummy gate and can be used as a first electrode of the device. The diffusion contact is disposed over the fin and can be used as a second electrode of the device.

Abstract: A method for forming a dielectric-isolated bulk fin field-effect transistor (finFET) device includes forming a second isolation layer over a first structure including multiple partially exposed fins and horizontal areas including a first isolation layer. The second isolation layer is removed from horizontal areas of a first portion of the first structure. An oxide layer is formed under the fins of the first portion of the first structure. The second isolation layer is removed in order to expose the partially exposed fins and horizontal areas of the first structure to form a second structure, on which gate regions are formed.

Abstract: An anti-fuse device for fin field-effect transistor (finFET) technology includes a dummy gate, an electrically conductive contact, and a diffusion contact. The dummy gate is formed over an end-corner of a fin. The electrically conductive contact is disposed on a portion of the dummy gate and can be used as a first electrode of the device. The diffusion contact is disposed over the fin and can be used as a second electrode of the device.

Abstract: A field-effect transistor (FET) based one-time programmable (OTP) device is discussed. The OTP device includes a fin structure, a gate structure, a first contact region, and a second contact region. The first contact region includes an insulating region and a conductive region and is configured to be electrically isolated from the gate structure. While, the second contact region includes the conductive region and is configured to be electrically coupled to at least a portion of the gate structure. The OTP device is configured to be programmed by disintegration of the insulating region in response to a first voltage being applied to the first contact and a second voltage being applied to the second contact region simultaneously, where the second voltage is higher than the first voltage by a threshold value.

Abstract: A capacitor structure in a semiconductor device includes a semiconductor substrate having a top surface and a bottom surface opposite the top surface, an isolation region having a top surface and a bottom surface, opposite the top surface, the bottom surface of the isolation region being disposed on the top surface of the semiconductor substrate. The capacitor structure also includes a gate terminal structure disposed on the top surface of the isolation region and a diffusion contact structure disposed on the top surface of the isolation region and arranged parallel to the gate terminal structure. In some aspects, the gate terminal structure is connected to a first contact node and the diffusion contact structure is connected to a second contact node, in which the first and second contact nodes form opposing nodes of the capacitor structure.

Abstract: A fin-shaped field-effect transistor device is provided. The fin-shaped field effect transistor device may include a semiconductor substrate having a top and a bottom surface. The fin-shaped field effect transistor device may also include a fin structure disposed on the top surface of the semiconductor substrate, where the fin structure includes a first sidewall and a second sidewall opposite of the first sidewall. The first sidewall is adjacent to a first region of the top surface of the semiconductor substrate and the second sidewall is adjacent to a second region of the top surface of the semiconductor substrate. The fin-shaped field effect transistor device may also include an insulation layer disposed above the fin structure and the first and second regions of the top surface. The fin-shaped field effect transistor device may also include a conductor structure disposed above and adjacent to the insulation layer.

Abstract: An integrated circuit device includes dummy through-silicon vias (TSVs) that can be connected to one or more voltage references, thereby increasing a capacitance associated with the integrated circuit device, such as a decoupling capacitance. In addition, the dummy TSVs can be distributed based on the distribution of active TSVs in the device, thus increasing the stability and performance of the TSV manufacturing process.

Abstract: In a stack of chips which each include active circuit regions, a plurality of through-silicon via (TSV) structures are formed for thermally conducting heat from the multi-chip stack by patterning, etching and filling with thermally conductive material a plurality of TSV openings in the multi-chip stack, including a first larger TSV opening that extends through substantially the entirety of the multi-chip stack without penetrating any active circuit region, and a second smaller TSV opening that extends down to but not through an active circuit region.

Abstract: A circuit and a method of operation to reduce dynamic and static power dissipation in the circuit are disclosed. The circuit is multi-threshold, voltage-biased and includes a p-channel field effect transistor (FET) and an n-channel FET. A source terminal of the p-channel FET interconnects to a higher-voltage rail of a power supply and a source terminal of the n-channel FET interconnects to a lower-voltage rail of the power supply. At least one of the FETs includes a back contact. The circuit may be operated by applying a fixed bias voltage to the back contact. The fixed bias voltage is independent of the power supply voltage which may be varied. In a normal state, the supply voltage is adjusted to decrease dynamic power consumption. In a low power state, the supply voltage is further adjusted to limit leakage current. The circuit may optionally include a second fixed biasing voltage source so that both FETs are biased.