Patents by Inventor Charlie Lee

Charlie Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11938185
    Abstract: The present invention is directed to antibodies and antigen binding fragments thereof having binding specificity for PACAP. The antibodies and antigen binding fragments thereof comprise the sequences of the VH, VL, and CDR polypeptides described herein, and the polynucleotides encoding them. Antibodies and antigen binding fragments described herein bind to and/or compete for binding to the same linear or conformational epitope(s) on human PACAP as an anti-PACAP antibody. The invention contemplates conjugates of anti-PACAP antibodies and binding fragments thereof conjugated to one or more functional or detectable moieties. Methods of making said anti-PACAP antibodies and antigen binding fragments thereof are also contemplated.
    Type: Grant
    Filed: December 15, 2020
    Date of Patent: March 26, 2024
    Assignee: H. LUNDBECK A/S
    Inventors: Maria-Cristina Loomis, Leon F. Garcia-Martinez, Benjamin H. Dutzar, Daniel S. Allison, Katherine Lee Hendrix, Ethan W. Ojala, Pei Fan, Jeffrey T. L. Smith, John A. Latham, Charlie Karasek, Jenny Mulligan, Michelle Scalley-Kim, Erica Stewart, Vanessa Lisbeth Rubin, Jens J. Billgren
  • Patent number: 10625119
    Abstract: An apparatus and system for obtaining metrics associated with a user's athleticism. In an embodiment, the user performs a workout using the apparatus, and the workout is scored based on a scoring system. In an embodiment, the scoring system may be objective, thereby facilitating score standardization, and individual users for which scores have been recorded may be ranked by the system. In an embodiment, individual users may associate their system profiles with one or more positions for one or more sports. The rankings may be filtered by position and sport to facilitate identification of one or more users of interest, such as for a college recruiting purposes or professional sports team drafts.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: April 21, 2020
    Inventor: Charlie Lee Amos, III
  • Publication number: 20190282855
    Abstract: Embodiments of an apparatus and system for obtaining metrics associated with a user's athleticism are disclosed. In an embodiment, the user performs a workout using the apparatus, and the workout is scored based on a scoring system. In an embodiment, the scoring system may be objective, thereby facilitating score standardization, and individual users for which scores have been recorded may be ranked by the system. In an embodiment, individual users may associate their system profiles with one or more positions for one or more sports. The rankings may be filtered by position and sport to facilitate identification of one or more users of interest, such as for a college recruiting purposes or professional sports team drafts.
    Type: Application
    Filed: June 7, 2019
    Publication date: September 19, 2019
    Inventor: Charlie Lee Amos III
  • Patent number: 10413011
    Abstract: Apparatus and associated methods relate to a wireless audio speaker module configured to play music at a volume level that will not disturb those nearby, based on adapting a wireless audio speaker to be retained within headgear, adjusting the volume of sound emitted by the speaker to a level that will not disturb those nearby, and amplifying the speaker sound as a function of the headgear interior reflecting the sound emitted by the speaker to the user's ear. In an illustrative example, an airgap may be configured between the speaker and the headgear user's ear. In various embodiments, the sound volume emitted by the speaker may be adjusted to avoid disturbing those nearby. In some examples, the headgear may be a hardhat, advantageously configured with a wireless audio speaker module to permit construction workers to listen to music amplified by reflection within their hardhats without disturbing or distracting each other.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: September 17, 2019
    Inventor: Charlie Lee Jordan
  • Publication number: 20190231020
    Abstract: Apparatus and associated methods relate to a wireless audio speaker module configured to play music at a volume level that will not disturb those nearby, based on adapting a wireless audio speaker to be retained within headgear, adjusting the volume of sound emitted by the speaker to a level that will not disturb those nearby, and amplifying the speaker sound as a function of the headgear interior reflecting the sound emitted by the speaker to the user's ear. In an illustrative example, an airgap may be configured between the speaker and the headgear user's ear. In various embodiments, the sound volume emitted by the speaker may be adjusted to avoid disturbing those nearby. In some examples, the headgear may be a hardhat, advantageously configured with a wireless audio speaker module to permit construction workers to listen to music amplified by reflection within their hardhats without disturbing or distracting each other.
    Type: Application
    Filed: January 24, 2019
    Publication date: August 1, 2019
    Inventor: Charlie Lee Jordan
  • Patent number: 10357687
    Abstract: An apparatus and system for obtaining metrics associated with a user's athleticism are disclosed. The user performs a workout using the apparatus, and the workout is scored based on a scoring system. The scoring system may be objective, thereby facilitating score standardization, and individual users for which scores have been recorded may be ranked by the system. Individual users may associate their system profiles with one or more positions for one or more sports. The rankings may be filtered by position and sport to facilitate identification of one or more users of interest, such as for a college recruiting purposes or professional sports team drafts.
    Type: Grant
    Filed: April 1, 2016
    Date of Patent: July 23, 2019
    Inventor: Charlie Lee Amos, III
  • Publication number: 20170109471
    Abstract: The present invention relates to methods of determining, identifying, detecting and annotating nucleic acid sequences suspected in a sample. Particularly, the methods of the invention permit annotating nucleic acid variants present in a sample. The methods are based on data obtained in high-throughput sequencing of nucleic acids obtained from a sample. The invention relates also to computer programs capable of executing the inventive methods and apparatus suitable of running respective computer software.
    Type: Application
    Filed: February 19, 2015
    Publication date: April 20, 2017
    Applicant: VELA OPERATIONS SINGAPORE PTE. LTD.
    Inventors: Pramila ARIYARATNE, Charlie LEE
  • Patent number: 9444831
    Abstract: One embodiment relates to a computer-implemented process for detecting malicious scripts at a client computer using a malicious script detector. A web page interceptor intercepts an access of web page data at a universal resource locator address. A script preprocessor determines script fragments embedded in the web page data and extracts variable and function names from the script fragments. A context analyzer determines whether the script fragments reference known-good scripts. The context analyzer may check variable and function names in the script fragment against a database of known-good contexts. Those script fragments which were determined to reference known-good scripts may be categorized as non-malicious. An emulator may perform emulation on remaining script fragments which were not determined to reference known-good scripts and not perform emulation on the script fragments which were determined to reference known-good scripts. Other embodiments, aspects and features are also disclosed.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: September 13, 2016
    Assignee: Trend Micro Incorporated
    Inventors: Charlie Lee, Xiaochuan Wan, Xuewen Zhu, Hua Ye
  • Publication number: 20120309643
    Abstract: A method of designing at least one oligonucleotide for nucleic acid detection including: (I) identifying and/of selecting region(s) of at least one target nucleic acid to be amplified, the region(s) having an efficiency of amplification (AE) higher than the average AE; and (II) designing at least one oligonucleotide capable of hybridizing to the selected region(s). Also, a method of detecting at least one target nucleic acid including: (i) providing at least one biological sample; (ii) amplifying nucleic acid(s) in the biological sample; (iii) providing at least one oligonucleotide capable of hybridizing to at least one target nucleic acid, if present in the biological sample; and (iv) contacting the oligonucleotide(s) with the amplified nucleic acids and detecting the oligonucleotide(s) hybridized to the target nucleic acid(s). The method is useful for detecting the presence of at least one pathogen, such as a virus, in a human biological sample.
    Type: Application
    Filed: July 13, 2012
    Publication date: December 6, 2012
    Inventors: Christopher Wing Cheong Wong, Wing-Kin Sung, Charlie Lee, Lance David Miller
  • Publication number: 20120303403
    Abstract: A real-time billing monitoring system and method. A processor receiving time data with respect to a task. The time data measures an amount of work accruing by one or more staff members toward completion of the task as the task is being performed. The processor generates a graphical object representing the time data as the task is being performed. The object is displayed on a display device concurrently with the performance of the task.
    Type: Application
    Filed: May 16, 2012
    Publication date: November 29, 2012
    Inventors: Charlie LEE, Robert Moore
  • Patent number: 8234079
    Abstract: It is provided a method of designing at least one oligonucleotide for nucleic acid detection comprising the following steps in any order: (I) identifying and/or selecting region(s) of at least one target nucleic acid to be amplified, the region(s) having an efficiency of amplification (AE) higher than the average AE; and (II) designing at least one oligonucleotide capable of hybridizing to the selected region(s). It is also provided a method of detecting at least one target nucleic acid comprising the steps of: (i) providing at least one biological sample; (ii) amplifying nucleic acid(s) comprised in the biological sample; (iii) providing at least one oligonucleotide capable of hybridizing to at least one target nucleic acid, if present in the biological sample; and (iv) contacting the oligonucleotide(s) with the amplified nucleic acids and detecting the oligonucleotide(s) hybridized to the target nucleic acid(s).
    Type: Grant
    Filed: August 8, 2006
    Date of Patent: July 31, 2012
    Assignee: Agency for Science, Technology and Research
    Inventors: Christopher Wing Cheong Wong, Wing-Kin Sung, Charlie Lee, Lance David Miller
  • Publication number: 20120191364
    Abstract: A method of sequencing a first polynucleotide strand having a first polynucleotide sequence, the first polynucleotide strand resembling a second polynucleotide strand having a known second polynucleotide sequence, the method employing a data set which, for one or more fragment(s) of the second polynucleotide sequence, contains: for each position along each said fragment: (i) first probe data describing the hybridization intensity of the first polynucleotide strand with a respective first probe designed to bind to a portion of the second polynucleotide strand centered at said position; and (ii) second probe data describing the respective hybridization intensities of the first polynucleotide strand with each of a set of second probes, each said second probe being designed to bind with a respective mutation of the corresponding portion of the second polynucleotide sequence which is formed by mutating the corresponding portion of the second polynucleotide sequence at said position, the data set including said sec
    Type: Application
    Filed: September 29, 2010
    Publication date: July 26, 2012
    Inventors: Wing Cheong Christopher Wong, Wah Heng Charlie Lee, Wing Kin Sung, Martin Lloyd Hibberd
  • Publication number: 20090053708
    Abstract: It is provided a method of designing at least one oligonucleotide for nucleic acid detection comprising the following steps in any order: (I) identifying and/or selecting region(s) of at least one target nucleic acid to be amplified, the region(s) having an efficiency of amplification (AE) higher than the average AE; and (II) designing at least one oligonucleotide capable of hybridizing to the selected region(s). It is also provided a method of detecting at least one target nucleic acid comprising the steps of: (i) providing at least one biological sample; (ii) amplifying nucleic acid(s) comprised in the biological sample; (iii) providing at least one oligonucleotide capable of hybridizing to at least one target nucleic acid, if present in the biological sample; and (iv) contacting the oligonucleotide(s) with the amplified nucleic acids and detecting the oligonucleotide(s) hybridized to the target nucleic acid(s).
    Type: Application
    Filed: August 8, 2006
    Publication date: February 26, 2009
    Inventors: Christopher Wing Cheong Wong, Wing-Kin Sung, Charlie Lee, Lance David Miller
  • Publication number: 20070072095
    Abstract: Provided is a method and apparatus for increasing an etching selectivity of photoresist material. An exemplary method initiates with providing a substrate with a developed photoresist layer. The developed photoresist layer on the substrate includes polymer chains containing silicon. Next, the substrate and developed photoresist layer are exposed to an ultraviolet (UV) light, where the UV light emanates from a UV generating agent. A portion of the developed photoresist layer is then converted to a hardened layer where the hardened layer is created by cross-linking the polymer chains containing silicon and the cross-linking is activated by the UV light. Next an etch may be performed on the substrate using the hardened layer.
    Type: Application
    Filed: November 29, 2006
    Publication date: March 29, 2007
    Inventors: Francis Ko, Richard Chen, Charlie Lee
  • Publication number: 20070042388
    Abstract: It is provided a method of designing oligonucleotide probe(s) for nucleic acid detection comprising the following steps in any order: (i) identifying and selecting region(s) of a target nucleic acid to be amplified, the region(s) having an efficiency of amplification (AE) higher than the average AE; and (ii) designing oligonucleotide probe(s) capable of hybridizing to the selected region(s). It is also provided a method of detecting at least one target nucleic acid comprising the steps of: (i) providing a biological sample; (ii) amplifying the nucleic acid(s) of the biological sample; (iii) providing at least an oligonucleotide probe capable of hybridizing to at least a target nucleic acid, if present in the biological sample; and (iv) contacting the probe(s) with the amplified nucleic acids and detecting the probe(s) hybridized to the target nucleic acid(s). In particular, the method indicates the presence of at least a pathogen, for example a virus, in a human biological sample.
    Type: Application
    Filed: August 12, 2005
    Publication date: February 22, 2007
    Inventors: Christopher Wong, Wing-Kin Sung, Charlie Lee, Lance Miller
  • Patent number: 7160671
    Abstract: A method for increasing etching selectivity of a developed silicon-containing photoresist layer on a non-silicon containing photoresist layer on a substrate. The developed silicon-containing photoresist layer includes polymer chains containing silicon. Next, the developed silicon-containing photoresist layer and uncovered portions of the non-silicon containing photoresist layer are exposed to an ultraviolet (UV) light, where the UV light emanates from a UV generating agent, such as neon, xenon, helium, hydrogen, or krypton gas in an inert gas (e.g., argon, etc.) plasma. A top portion of the developed silicon-containing photoresist layer is then converted to a hardened layer, where the hardened layer is created by cross-linking the polymer chains containing silicon and the cross-linking is activated by the UV light. Next, an etch is performed on the uncovered portions of the non-silicon containing photoresist layer and the substrate using the hardened layer.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: January 9, 2007
    Assignee: Lam Research Corporation
    Inventors: Francis Ko, Richard Chen, Charlie Lee
  • Publication number: 20060172548
    Abstract: A method of cleaning a wafer, adapted for a patterned gate structure. The gate structures comprise a gate dielectric layer, a nitrogen-containing barrier layer and a silicon-containing gate layer sequentially stacked over the substrate. The method includes cleaning the substrate with phosphoric acid solution and hydrofluoric acid solution so that silicon nitride residues formed in a reaction between the nitrogen-containing barrier layer and the silicon-containing gate layer can be removed and the amount of pollutants and particles can be reduced. Ultimately, the yield of the process as well as the quality and reliability of the device are improved.
    Type: Application
    Filed: February 2, 2005
    Publication date: August 3, 2006
    Inventors: Chih-Ning Wu, Charlie Lee, Kuan-Yang Liao
  • Publication number: 20050239286
    Abstract: A two-step stripping method for removing via photoresist during the fabrication of trench-first partial-via dual damascene features is disclosed. In the first cleaning step, inert gas (He, Ar, N2)/fluorocarbon plasma is used to contact the remaining “Via Photo” for a short time period not exceeding 20 seconds. Thereafter, in the second cleaning step, a reducing plasma is used to completely strip the remaining “Via Photo”, thereby preventing the low-k or ultra low-k carbon-containing dielectric layer from potential carbon depletion.
    Type: Application
    Filed: October 27, 2004
    Publication date: October 27, 2005
    Inventors: Chih-Ning Wu, Wen-Liang Lien, Charlie Lee, Meiling Li
  • Patent number: 6799907
    Abstract: Provided is a method for increasing an etching selectivity of photoresist material. The method initiates with providing a substrate with a developed photoresist layer. The developed photoresist layer on the substrate is formulated to contain a hardening agent. Next, the substrate is exposed to a gas, where the gas is formulated to interact with the hardening agent. A portion of the developed photoresist layer is then converted to a hardened layer where the hardened layer is created by an interaction of the hardening agent with the gas. Some notable advantages of the discussed methods of increasing the selectivity of a photoresist include improved etch profile control. Additionally, by combining fabrication steps such as the hardening of the photoresist in an etch chamber, downstream etching processes may be performed without having to transfer the wafer to an additional chamber, thereby improving wafer throughput while minimizing handling.
    Type: Grant
    Filed: January 16, 2003
    Date of Patent: October 5, 2004
    Assignee: Lam Research Corporation
    Inventors: Francis Ko, Sandy Chen, Charlie Lee
  • Publication number: 20030129816
    Abstract: Provided is a method for increasing an etching selectivity of photoresist material. The method initiates with providing a substrate with a developed photoresist layer. The developed photoresist layer on the substrate is formulated to contain a hardening agent. Next, the substrate is exposed to a gas, where the gas is formulated to interact with the hardening agent. A portion of the developed photoresist layer is then converted to a hardened layer where the hardened layer is created by an interaction of the hardening agent with the gas. Some notable advantages of the discussed methods of increasing the selectivity of a photoresist include improved etch profile control. Additionally, by combining fabrication steps such as the hardening of the photoresist in an etch chamber, downstream etching processes may be performed without having to transfer the wafer to an additional chamber, thereby improving wafer throughput while minimizing handling.
    Type: Application
    Filed: January 16, 2003
    Publication date: July 10, 2003
    Inventors: Francis Ko, Sandy Chen, Charlie Lee