Abstract: A semiconductor device includes a semiconductor fin protruding from a substrate, a gate electrode over the semiconductor fin, a gate insulating layer between the semiconductor fin and the gate electrode, source and drain regions disposed on opposite sides of the semiconductor fin, a first stressor formed in a region between the source and drain regions. The first stressor is a grading strained stressor including multiple graded portions formed at graded depths. The first stressor is configured to create one of a graded compressive stress or a graded tensile stress.

Abstract: A package structure and a method of forming the same are provided. The package structure includes a die, an encapsulant, a dielectric layer, a first redistribution layer (RDL) and a second RDL. The encapsulant laterally encapsulates the die. The dielectric layer is located on the encapsulant and the die. The first RDL penetrates through the dielectric layer to connect to the die. The second RDL is located on the first RDL and the dielectric layer. The second RDL and the first RDL share a common seed layer.

Abstract: The present disclosure discloses a ceramic material having a positive slow release effect and a method for manufacturing the same. The ceramic material comprises a hierarchically meso-macroporous structure which composition at least includes silicon and oxygen, wherein the hierarchically meso-macroporous structure includes a plurality of macropores and a wall having a plurality of arranged mesopores, and the plurality of macropores are separated by the wall; and nano-scale metal particles confined in at least one of the plurality of arranged mesopores. The nano-scale metal particles have a positive slow release effect from the at least one of the plurality of arranged mesopores. The ceramic material has a property of inhibiting growth of microorganisms or killing the microorganisms in an environment or a system containing a hydrophilic medium.

Abstract: Embodiments of the disclosure provide a semiconductor device including a substrate, an insulating layer formed over the substrate, a plurality of fins formed vertically from a surface of the substrate, the fins extending through the insulating layer and above a top surface of the insulating layer, a gate structure formed over a portion of fins and over the top surface of the insulating layer, a source/drain structure disposed adjacent to opposing sides of the gate structure, the source/drain structure contacting the fin, a dielectric layer formed over the insulating layer, a first contact trench extending a first depth through the dielectric layer to expose the source/drain structure, the first contact trench containing an electrical conductive material, and a second contact trench extending a second depth into the dielectric layer, the second contact trench containing the electrical conductive material, and the second depth is greater than the first depth.

Abstract: The embodiment of the present application provides a method, apparatus and application system for extracting a target feature. The method includes: acquiring target area video data captured by a panoramic camera; determining, by a target detection algorithm, a tracking target having a preset feature in the target area video data; allocating the tracking target to a detail camera, such that the detail camera tracks the tracking target and acquires close-up video data of the tracking target; extracting, from the close-up video data, attribute information of the tracking target. With the embodiment of the present application, attribute information of each target can be accurately extracted, improving the accuracy of extracting the attribute information of the target.

Abstract: The disclosure provides a self-powered sheet which is configured to absorb and to be applied on a human skin. The self-powered sheet includes a base layer and a plurality of electrically conductive inks. The base layer is configured to absorb the liquid and adapted to be applied on the human skin. The base layer has a contact surface. The electrically conductive inks are disposed on the contact surface of the base layer. Each of the electrically conductive inks has a plurality of first electrodes and a plurality of second electrodes. When each of the first electrodes and each of the second electrodes are soaked in the liquid, an electrical potential difference between one of the plurality of first electrodes and one of the plurality of second electrodes generate a current in the human skin.

Abstract: A device includes a semiconductive fin, a first gate stack, a second gate stack, an insulating structure, and a spacer. The semiconductive fin extends along a first direction. The first gate stack extends along a second direction and across the semiconductive fin. The first gate stack includes a high-? dielectric layer and a gate electrode. The high-? dielectric layer is over the semiconductive fin. The gate electrode is over the high-? dielectric layer. The second gate stack extends along the second direction and is substantially aligned with the first gate stack along the second direction. The insulating structure is between the first gate stack and the second gate stack. The high-? dielectric layer is spaced apart from the insulating structure. The spacer extends along a sidewall of the first gate stack and beyond a first sidewall of the insulating structure that faces the first gate stack.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A first patterned photoresist layer is formed on a substrate. A second patterned photoresist layer is formed on the substrate after the first patterned photoresist layer is formed, wherein the first patterned photoresist layer and the second patterned photoresist layer are arranged alternatively. A liner is formed to cover sidewalls of the first patterned photoresist layer and the second patterned photoresist layer. The present invention also provides a semiconductor device, including a plurality of pillars being disposed on a layer, wherein the layer includes first recesses and second recesses, wherein the depths of the first recesses are less than the depths of the second recesses.

Abstract: A method for forming a fin field effect transistor (FinFET) device structure is provided. The FinFET device structure includes a substrate and a first fin structure and a second fin structure extending above the substrate. The FinFET device structure also includes a first transistor formed on the first fin structure and a second transistor formed on the second fin structure. The FinFET device structure further includes an inter-layer dielectric (ILD) structure formed in an end-to-end gap between the first transistor and the second transistor, and the end-to-end gap has a width in a range from about 20 nm to about 40 nm.

Abstract: A semiconductor device includes a semiconductor fin protruding from a substrate, a gate electrode over the semiconductor fin, a gate insulating layer between the semiconductor fin and the gate electrode, source and drain regions disposed on opposite sides of the semiconductor fin, a first stressor formed in a region between the source and drain regions. The first stressor is a grading strained stressor including multiple graded portions formed at graded depths. The first stressor is configured to create one of a graded compressive stress or a graded tensile stress.

Abstract: A method of manufacturing a DRAM includes isolation structures and word line sets are formed in the substrate. A conductive material is formed on the substrate. Conductive material is removed to form first openings in the conductive material. The first openings expose surfaces of the substrate in the first areas and divide the conductive material into conductive layers, thereby the conductive layers are located on surfaces of the substrate in the second areas. A first dielectric material is filled in the first openings so as to form first dielectric layers on the substrate in the first areas. Top surfaces of the conductive layers are lower than top surfaces of the first dielectric layers. Second dielectric layers are formed respectively in the conductive layers. Capacitors are formed respectively on the conductive posts.

Abstract: A cable comprises a power conductor, a data conductor and a first PTC device. The power conductor is configured to transmit electrical power between a source and a sink. The data conductor is configured to transmit data between the source and the sink. The first PTC device is coupled to the data conductor and its resistance increases drastically to decrease current flowing through the data conductor if a temperature of the first PTC device exceeds a first trip temperature. The first trip temperature is 55-80° C. The resistance of the PTC device is larger than 20k? at 85° C. and larger than 80k? at 100° C. A current flowing through the data conductor does not exceed 20 mA.

Abstract: A fin-type field effect transistor comprising a substrate, a plurality of insulators, at least one gate stack and strained material portions is described. The substrate has a plurality of fins thereon and the fin comprises a stop layer embedded therein. The plurality of insulators is disposed on the substrate and between the plurality of fins. The at least one gate stack is disposed over the plurality of fins and on the plurality of insulators. The strained material portions are disposed on two opposite sides of the at least one gate stack.

Abstract: A semiconductor device includes at least one semiconductor fin, a gate electrode, at least one gate spacer, and a gate dielectric. The semiconductor fin includes at least one recessed portion and at least one channel portion. The gate electrode is present on at least the channel portion of the semiconductor fin. The gate spacer is present on at least one sidewall of the gate electrode. The gate dielectric is present at least between the channel portion of the semiconductor fin and the gate electrode. The gate dielectric extends farther than at least one end surface of the channel portion of the semiconductor fin.

Abstract: A first instruction to store an entity identification (ID) in a memory of a device may be received. The entity ID may be stored in the memory in response to receiving the first instruction. Furthermore, a second instruction to store a value based on a key in the memory of the device may be received. A determination may be made as to whether the value based on the key that is to be stored in the memory corresponds to the entity ID that is stored in the memory. The value based on the key may be stored in the memory of the device when the value based on the key corresponds to the entity ID.

Abstract: A method for performing read acceleration, an associated data storage device and controller thereof are provided, where the method is applicable to the data storage device and the controller. The method includes: receiving a write command from a host device, and performing programming on a non-volatile (NV) memory element within a plurality of NV memory elements according to the write command; recording operation command-related information corresponding to the write command; when a read command having high priority exists in a queue corresponding to the NV memory element, suspending performing programming on the NV memory element; executing the read command; and after executing the read command, continuing performing programming on the NV memory element at least according to the operation command-related information.

Abstract: An embodiment of a semiconductor switch structure includes source contacts, drain contacts, gates and fins. The contacts and gates are elongated in a first direction and are spaced apart from each other in a second direction perpendicular to the first direction. The gates are interspersed between the contacts. The fins underlie both the contacts and the gates. The fins are elongated in the second direction and are spaced apart from each other in the first direction. A contact via extends through one of the contacts without contacting a gate or a fin. A gate via extends through one of the gates without contacting a contact or a fin. A contact-gate via is in contact with both a contact and a gate but not a fin.

Abstract: A method of removing a hard mask is provided. Gate stacks are patterned on a substrate, where the gate stacks include a polysilicon layer and the hard mask deposited over the polysilicon layer. A dielectric layer is deposited on the substrate and on the patterned gate stacks. A first portion of the dielectric layer is planarized by chemical mechanical polishing (CMP) to remove a topography of the dielectric layer. The hard mask and a second portion of the dielectric layer are removed by the CMP.

Abstract: A semiconductor device includes a semiconductor substrate and at least one gate stack. The gate stack is present on the semiconductor substrate, and the gate stack includes at least one work function conductor and a filling conductor. The work function conductor has a recess therein. The filling conductor includes a plug portion and a cap portion. The plug portion is present in the recess of the work function conductor. The cap portion caps the work function conductor.

Abstract: A method includes providing a substrate, wherein the substrate includes a conductive feature in a top portion of the substrate; forming a buffer layer over the substrate; forming a dielectric layer over the buffer layer; performing a first etching process to form an opening in the dielectric layer, thereby exposing a top surface of the buffer layer; and performing a second etching process to extend the opening downwardly into the buffer layer, thereby exposing a top surface of the conductive feature, wherein the performing of the second etching process includes laterally enlarging a footing profile of the opening.