Abstract: A diffuser includes a lower element and an upper element. The upper element is fixed on the lower element, and the upper element and the lower element are formed separately. The lower element includes a lower inner wall and a lower outer wall, and the upper element includes an upper inner wall and an upper outer wall. The upper inner wall is connected to the lower inner wall to form an internal air-guiding surface, the upper outer wall is connected to the lower outer wall to form an external air-guiding surface, and the internal air-guiding surface is disposed opposite to the external air-guiding surface to define an air-guiding channel for air flow diffusion. The upper element further includes an upper air-guiding wing for connecting the upper inner wall and the upper outer wall, and the lower element further includes a lower air-guiding wing for connecting the lower inner wall and the lower outer wall.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: The present invention discloses a clustering algorithm-based multi-parameter cumulative calculation method for lower limb vascular calcification indexes, including the following steps: firstly carrying out super-pixel segmentation of a CT image, and enabling calcified spots in the CT image to be segmented in each super-pixel region; after the super-pixel segmentation is accomplished, extracting a brightness characteristic value of a super-pixel region where the calcified spots are located by using a Lab color space, and performing edge detection and contour extraction on the calcified spots in the image; and after edge detection and contour extraction, fitting the calcified spots in the image by using a segmented ellipse, and extracting the area of the calcified spots after optimizing an ellipse contour.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: The present invention discloses a clustering algorithm-based multi-parameter cumulative calculation method for lower limb vascular calcification indexes, including the following steps: firstly carrying out super-pixel segmentation of a CT image, and enabling calcified spots in the CT image to be segmented in each super-pixel region; after the super-pixel segmentation is accomplished, extracting a brightness characteristic value of a super-pixel region where the calcified spots are located by using a Lab color space, and performing edge detection and contour extraction on the calcified spots in the image; and after edge detection and contour extraction, fitting the calcified spots in the image by using a segmented ellipse, and extracting the area of the calcified spots after optimizing an ellipse contour.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: A diffuser includes a lower element and an upper element. The upper element is fixed on the lower element, and the upper element and the lower element are formed separately. The lower element includes a lower inner wall and a lower outer wall, and the upper element includes an upper inner wall and an upper outer wall. The upper inner wall is connected to the lower inner wall to form an internal air-guiding surface, the upper outer wall is connected to the lower outer wall to form an external air-guiding surface, and the internal air-guiding surface is disposed opposite to the external air-guiding surface to define an air-guiding channel for air flow diffusion. The upper element further includes an upper air-guiding wing for connecting the upper inner wall and the upper outer wall, and the lower element further includes a lower air-guiding wing for connecting the lower inner wall and the lower outer wall.

Abstract: Disclosed are a fan head part, a stand fan and a wall-mounted fan, a household appliance and an air blowing method. The fan head part comprises a base and a fan head, wherein the fan head comprises a blade and a grill, the blade being able to rotate with a first axis, the fan head being able to integrally rotate about a second axis and along a circumferential direction relative to the base, and the second axis extends through the grill in the front-rear direction and being obliquely arranged relative to the first axis. Since the second axis is obliquely arranged relative to the first axis, only one driving structure is required to simultaneously drive the fan head to rotate within a space defined in the horizontal and vertical directions, so that the structure is simple, and the costs are relatively low.

Abstract: A diffuser includes a lower element and an upper element. The upper element is fixed on the lower element, and the upper element and the lower element are formed separately. The lower element includes a lower inner wall and a lower outer wall, and the upper element includes an upper inner wall and an upper outer wall. The upper inner wall is connected to the lower inner wall to form an internal air-guiding surface, the upper outer wall is connected to the lower outer wall to form an external air-guiding surface, and the internal air-guiding surface and the external air-guiding surface define an air-guiding channel for air flow diffusion. The upper element includes an upper air-guiding wing for connecting the upper inner wall and the upper outer wall, and the lower element includes a lower air-guiding wing for connecting the lower inner wall and the lower outer wall.

Abstract: In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

Abstract: Disclosed are a fan head part, a stand fan and a wall-mounted fan, a household appliance and an air blowing method. The fan head part comprises a base and a fan head, wherein the fan head comprises a blade and a grill, the blade being able to rotate with a first axis, the fan head being able to integrally rotate about a second axis and along a circumferential direction relative to the base, and the second axis extends through the grill in the front-rear direction and being obliquely arranged relative to the first axis. Since the second axis is obliquely arranged relative to the first axis, only one driving structure is required to simultaneously drive the fan head to rotate within a space defined in the horizontal and vertical directions, so that the structure is simple, and the costs are relatively low.

Abstract: A diffuser includes a lower element and an upper element. The upper element is fixed on the lower element, and the upper element and the lower element are formed separately. The lower element includes a lower inner wall and a lower outer wall, and the upper element includes an upper inner wall and an upper outer wall. The upper inner wall is connected to the lower inner wall to form an internal air-guiding surface, the upper outer wall is connected to the lower outer wall to form an external air-guiding surface, and the internal air-guiding surface is disposed opposite to the external air-guiding surface to define an air-guiding channel for air flow diffusion. The upper element further includes an upper air-guiding wing for connecting the upper inner wall and the upper outer wall, and the lower element further includes a lower air-guiding wing for connecting the lower inner wall and the lower outer wall.

Abstract: An ethylene cracking furnace is provided. The ethylene cracking furnace includes at least one radiant section. The at least one radiant section includes bottom burners and/or sidewall burners, and at least one radiant coil arranged in the radiant section. The radiant coil includes at least an upstream pass tube and a downstream pass tube, the upstream pass tube being configured as an inner tube, and the downstream pass tube being configured as an outer tube surrounding the inner tube and having a closed end. The inner tube defines an inner space forming an upstream flow path. A gap defined between the inner tube and the outer tube forms an downstream flow path.

Abstract: The present disclosure provides an ethylene cracking furnace, comprising at least one radiant section provided with a bottom burner and/or a side burner, and at least one set of radiant coil arranged along a longitudinal direction of the radiant section. The radiant coil is an at least two-pass coil having an N?1 structure, wherein N is preferably a natural number from 2 to 8. A manifold is arranged at an inlet end of a downstream tube of said at least two-pass coil, and an outlet end of each upstream tube of said at least two-pass coil is connected to the manifold through a curved connector. The arrangement according to the present disclosure can effectively reduce the expansion differences between the upstream tubes and the downstream tubes, and therefore reduce the stress caused thereby. Consequently, bending of the radiant coil can be avoided, thereby extending the service life of the radiant coil.

Abstract: In some embodiments, a mask patterning system includes an electronic memory configured to store an integrated circuit mask layout. A computation tool determines a number of radiation shots to be used to write the integrated circuit mask layout to a physical mask. The computation tool also determines a scaling factor which accounts for expected thermal expansion of the physical mask due to the number of radiation shots used in writing the integrated circuit mask layout to the physical mask. An ebeam or laser writing tool writes the integrated circuit mask layout to the physical mask based on the scaling factor and by using the number of radiation shots.

Abstract: The present disclosure provides an ethylene cracking furnace, comprising at least one radiant section provided with a bottom burner and/or a side burner, and at least one set of radiant coil arranged along a longitudinal direction of the radiant section. The radiant coil is an at least two-pass coil having an N?1 structure, wherein N is preferably a natural number from 2 to 8. A manifold is arranged at an inlet end of a downstream tube of said at least two-pass coil, and an outlet end of each upstream tube of said at least two-pass coil is connected to the manifold through a curved connector. The arrangement according to the present disclosure can effectively reduce the expansion differences between the upstream tubes and the downstream tubes, and therefore reduce the stress caused thereby. Consequently, bending of the radiant coil can be avoided, thereby extending the service life of the radiant coil.

Abstract: The present disclosure provides an ethylene cracking furnace, comprising at least one radiant section provided with a bottom burner and/or a side burner, and at least one set of radiant coil arranged along a longitudinal direction of the radiant section. The radiant coil is an at least two-pass coil having an N?1 structure, wherein N is preferably a natural number from 2 to 8. A manifold is arranged at an inlet end of a downstream tube of said at least two-pass coil, and an outlet end of each upstream tube of said at least two-pass coil is connected to the manifold through a curved connector. The arrangement according to the present disclosure can effectively reduce the expansion differences between the upstream tubes and the downstream tubes, and therefore reduce the stress caused thereby. Consequently, bending of the radiant coil can be avoided, thereby extending the service life of the radiant coil.