Abstract: The present disclosure provides an ethylene cracking furnace, comprising at least one radiant section provided with a bottom burner and/or a side burner, and at least one set of radiant coil arranged along a longitudinal direction of the radiant section. The radiant coil is an at least two-pass coil having an N?1 structure, wherein N is preferably a natural number from 2 to 8. A manifold is arranged at an inlet end of a downstream tube of said at least two-pass coil, and an outlet end of each upstream tube of said at least two-pass coil is connected to the manifold through a curved connector. The arrangement according to the present disclosure can effectively reduce the expansion differences between the upstream tubes and the downstream tubes, and therefore reduce the stress caused thereby. Consequently, bending of the radiant coil can be avoided, thereby extending the service life of the radiant coil.

Abstract: In some embodiments, a mask patterning system includes an electronic memory configured to store an integrated circuit mask layout. A computation tool determines a number of radiation shots to be used to write the integrated circuit mask layout to a physical mask. The computation tool also determines a scaling factor which accounts for expected thermal expansion of the physical mask due to the number of radiation shots used in writing the integrated circuit mask layout to the physical mask. An ebeam or laser writing tool writes the integrated circuit mask layout to the physical mask based on the scaling factor and by using the number of radiation shots.

Abstract: Some embodiments of the present disclosure relate to a method of patterning a workpiece with a mask, wherein a scale factor between a geometry of the mask and a corresponding target shape of the mask is determined. The scale factor results from thermal expansion of the mask and geometry due to heating of the mask during exposure to radiation by an electron beam (e-beam) in the mask manufacturing process. A number of radiation pulses necessary to dispose the geometry on the mask is determined. A scale factor for the mask is then determined from the number of pulses. The target shape is then generated on the mask by re-scaling the geometry according to the scale factor prior to mask manufacturing. This method compensates for thermal deformation due to e-beam heating to improve OVL variability in advanced technology nodes.

Abstract: Some embodiments relate a method of forming a photomask for a deep ultraviolet photolithography process (e.g., having an exposing radiation with a wavelength of 193 nm). The method provides a mask blank for a deep ultraviolet photolithography process. The mask blank has a transparent substrate, an amorphous isolation layer located over the transparent substrate, and a photoresist layer located over the amorphous isolation layer. The photoresist layer is patterned by selectively removing portions of the photoresist layer using a beam of electrons. The amorphous isolation layer is subsequently etched according to the patterned photoresist layer to form one or more mask openings. The amorphous isolation layer isolates electrons backscattered from the beam of electrons from the photoresist layer during patterning, thereby mitigating CD and overlay errors caused by backscattered electrons.

Abstract: Some embodiments of the present disclosure relate to a method of patterning a workpiece with a mask, wherein a scale factor between a geometry of the mask and a corresponding target shape of the mask is determined. The scale factor results from thermal expansion of the mask and geometry due to heating of the mask during exposure to radiation by an electron beam (e-beam) in the mask manufacturing process. A number of radiation pulses necessary to dispose the geometry on the mask is determined. A scale factor for the mask is then determined from the number of pulses. The target shape is then generated on the mask by re-scaling the geometry according to the scale factor prior to mask manufacturing. This method compensates for thermal deformation due to e-beam heating to improve OVL variability in advanced technology nodes.

Abstract: An ethylene cracking furnace comprising a high pressure steam drum (1), a convection section (2), a radiant section (3), multiple groups of radiant coils (4) arranged vertically in the firebox of radiant section, burners (5) and transfer line exchangers (6), each radiant coil comprising a first-pass tube (7), a second-pass tube (8) and a connection member (9); feedstocks being introduced into an inlet end of the first-pass tube and outflow from an outlet end of the second-pass tube, said first-pass tube (7) and said second-pass tube (8) are non-split coils, and the centerlines of the respective radiant tubes (7, 8) are within a common plane; said connection member (9) is a tridimensional structural member comprising an inlet bending tube (10), a return bending tube (11) and an outlet bending tube (12); said inlet bending tubes (10) and said outlet bending tubes (12) are arranged at two sides of the plane containing the centerlines of said first-pass tubes (7) and said second-pass tubes (8), respectively; the

Abstract: Some embodiments relate a method of forming a photomask for a deep ultraviolet photolithography process (e.g., having an exposing radiation with a wavelength of 193 nm). The method provides a mask blank for a deep ultraviolet photolithography process. The mask blank has a transparent substrate, an amorphous isolation layer located over the transparent substrate, and a photoresist layer located over the amorphous isolation layer. The photoresist layer is patterned by selectively removing portions of the photoresist layer using a beam of electrons. The amorphous isolation layer is subsequently etched according to the patterned photoresist layer to form one or more mask openings. The amorphous isolation layer isolates electrons backscattered from the beam of electrons from the photoresist layer during patterning, thereby mitigating CD and overlay errors caused by backscattered electrons.

Abstract: The present disclosure provides an ethylene cracking furnace, comprising at least one radiant section provided with a bottom burner and/or a side burner, and at least one set of radiant coil arranged along a longitudinal direction of the radiant section. The radiant coil is an at least two-pass coil having an N?1 structure, wherein N is preferably a natural number from 2 to 8. A manifold is arranged at an inlet end of a downstream tube of said at least two-pass coil, and an outlet end of each upstream tube of said at least two-pass coil is connected to the manifold through a curved connector. The arrangement according to the present disclosure can effectively reduce the expansion differences between the upstream tubes and the downstream tubes, and therefore reduce the stress caused thereby. Consequently, bending of the radiant coil can be avoided, thereby extending the service life of the radiant coil.

Abstract: An ethylene cracking furnace is provided. The ethylene cracking furnace includes at least one radiant section. The at least one radiant section includes bottom burners and/or sidewall burners, and at least one radiant coil arranged in the radiant section. The radiant coil includes at least an upstream pass tube and a downstream pass tube, the upstream pass tube being configured as an inner tube, and the downstream pass tube being configured as an outer tube surrounding the inner tube and having a closed end. The inner tube defines an inner space forming an upstream flow path. A gap defined between the inner tube and the outer tube forms an downstream flow path.

Abstract: A method and system for target detecting, editing and rebuilding by 3D image is provided, which comprises an inputting and picking unit, a training and detecting unit, a displaying and editing unit and a rebuilding unit. The inputting and picking unit receives a digital image and a LiDAR data and picks up a first parameter to form a 3D image. The training and detecting unit selects a target, picks up a second parameter therefrom, calculates the second parameter to generate a threshold and detects the target areas in the 3D image according to the threshold. The displaying and editing unit sets a quick selecting tool according to the threshold and edits the detecting result. The rebuilding unit sets a buffer area surrounding the target, picks up a third parameter therefrom and calculates the original shape of the target by the Surface Fitting method according to the third parameter.

Abstract: An ethylene cracking furnace comprising a high pressure steam drum (1), a convection section (2), a radiant section (3), multiple groups of radiant coils (4) arranged vertically in the firebox of radiant section, burners (5) and transfer line exchangers (6), each radiant coil comprising a first-pass tube (7), a second-pass tube (8) and a connection member (9); feedstocks being introduced into an inlet end of the first-pass tube and outflow from an outlet end of the second-pass tube, said first-pass tube (7) and said second-pass tube (8) are non-split coils, and the centerlines of the respective radiant tubes (7, 8) are within a common plane; said connection member (9) is a tridimensional structural member comprising an inlet bending tube (10), a return bending tube (11) and an outlet bending tube (12); said inlet bending tubes (10) and said outlet bending tubes (12) are arranged at two sides of the plane containing the centerlines of said first-pass tubes (7) and said second-pass tubes (8), respectively; the

Abstract: A back light module including a frame, a light-guide plate and a light source is provided. The frame has a opening and a first surface and a second surface opposite to the first surface. The opening is extended from the first surface to the second surface of the frame, so that an inner surface of the opening is connected to the first surface and the second surface. At least a portion of the inner surface is slanted toward the inner of the opening. The light-guide plate is integrated with the frame and at least a portion of the opening is filled with the light-guide plate. The light-guide plate is tightly attached to the inner surface of the frame. The light source is adjacent to the light-guide plate.

Abstract: A method and system for target detecting, editing and rebuilding by 3D image is provided, which comprises an inputting and picking unit, a training and detecting unit, a displaying and editing unit and a rebuilding unit. The inputting and picking unit receives a digital image and a LiDAR data and picks up a first parameter to form a 3D image. The training and detecting unit selects a target, picks up a second parameter therefrom, calculates the second parameter to generate a threshold and detects the target areas in the 3D image according to the threshold. The displaying and editing unit sets a quick selecting tool according to the threshold and edits the detecting result. The rebuilding unit sets a buffer area surrounding the target, picks up a third parameter therefrom and calculates the original shape of the target by the Surface Fitting method according to the third parameter.

Abstract: A palatability enhancing composition for extruded pet food containing at least one potassium pyrophosphate salt in an amount effective to enhance palatability and at least one ingredient selected from animal products, animal by-products, fish products, fish by-products, dairy products, dairy by-products, sources of microbial proteins, vegetable proteins, carbohydrates and amino acids. Methods for enhancing pet food palatability with the disclosed palatability enhancing compositions and extruded pet food compositions coated therewith are also disclosed.

Abstract: A flat heat pipe has a vacuum chamber, an evaporator connected to a heating element, and a condenser connected to a cooling device. The vacuum chamber is provided in an interior with a wick structure and a working fluid by which an evaporation-condensation cyclic process is effected. The vacuum chamber is further provided in the interior with a plurality of heat conduction pillars, which are confined to the area of the evaporator and are connected with an upper wall and a lower wall of the interior of the chamber. The heat conduction pillars serve to enhance the heat conduction to the condenser from the evaporator.