Abstract: A vehicle hitch assistance system includes a steering system and a controller. The controller acquires position data for a coupler of a trailer, derives a vehicle path to position a center of a hitch ball of the vehicle at an interference offset past a centerline of the coupler in a driving direction of the vehicle path, and outputs a steering control signal to the steering system to maintain the vehicle along the path.

Abstract: Semiconductor devices and methods of forming the same include forming a stack of layers of alternating materials, including first layers of sacrificial material and second layers of channel material. The first layers are recessed relative to the second layers with an etch that etches the second layers at a slower rate than the first layers to taper ends of the second layers. First spacers are formed in recesses formed by recessing the first layers. Second spacers are formed in recesses formed by recessing the first layers. The first spacers are etched to expose sidewalls of the second spacer. Source/drain extensions are formed in contact with exposed ends of the second layers.

Abstract: A method of making a vertical transistor device includes forming a front gate and a back gate opposite a major surface of a substrate. The front gate and the back gate are symmetric and arranged on opposing sides of a channel between the front gate and the back gate. The channel extends from a drain to a source. The method includes disposing a mask to cover the front gate and removing the back gate. The method further includes replacing the back gate with a layer of insulator and another back gate stack. The another back gate stack only covers a junction between the channel and the source, and remaining portions of the back gate are the layer of insulator.

Abstract: A method of fabricating a vertically stacked nanosheet semiconductor device includes epitaxially growing at least three layers each of alternating silicon and silicon germanium layers on a substrate and patterning a gate structure. The method includes performing at least three reactive ion etch processes forming recesses. The method includes forming source or drain regions in a channel formed by a shallow trench isolation layer formed in the recesses. The method includes growing a first epitaxial layer on the source or drain regions, forming at least three pFET structures. The method includes etching away a portion of each of the pFET structures and depositing a dielectric layer on each. The method includes growing a second epitaxial layer, forming at least three nFET structures. Each layer of the pFET structure and nFET structure are stacked vertically and each layer of the pFET structure and nFET structures have independent source or drain contacts.

Abstract: Techniques for controlling top spacer thickness in VFETs are provided. In one aspect, a method of forming a VFET device includes: depositing a dielectric hardmask layer and a fin hardmask(s) on a wafer; patterning the dielectric hardmask layer and the wafer to form a fin(s) and a dielectric cap on the fin(s); forming a bottom source/drain at a base of the fin(s); forming bottom spacers on the bottom source/drain; forming a gate stack alongside the fin(s); burying the fin(s) in a dielectric fill material; selectively removing the fin hardmask(s); recessing the gate stack to form a cavity in the dielectric fill material; depositing a spacer material into the cavity; recessing the spacer material to form top spacers; removing the dielectric cap; and forming a top source/drain at a top of the fin(s). A VFET device is also provided.

Abstract: A hitch assist system is provided herein. The hitch assist system includes a sensing system configured to detect a hitch assembly and a coupler. A controller is configured to generate commands for maneuvering a vehicle along a first path or a second path. A user input device includes a display, the display configured to illustrate the first and second paths.

Abstract: A method of fabricating adjacent vertical fins with top source/drains having an air spacer and a self-aligned top junction, including, forming two or more vertical fins on a bottom source/drain, forming a top source/drain on each of the two or more vertical fins, wherein the top source/drains are formed to a size that leaves a gap between the adjacent vertical fins, and forming a source/drain liner on the top source/drains, where the source/drain liner occludes the gap between adjacent top source/drains to form a void space between adjacent vertical fins.

Abstract: A method is presented for forming a semiconductor structure. The method includes forming a plurality of fins on a first region of the semiconductor substrate, forming a bi-polymer structure, selectively removing the first polymer of the bi-polymer structure and forming deep trenches in the semiconductor substrate resulting in pillars in a second region of the semiconductor structure. The method further includes selectively removing the second polymer of the bi-polymer structure, doping the pillars, and depositing a high-k metal gate (HKMG) over the first and second regions to form the MIS capacitor in the second region of the semiconductor substrate.

Abstract: A technique relates to a semiconductor device. A first vertical fin is formed with a first gate stack and a second vertical fin with a second gate stack. The second vertical fin has a hardmask on top. The first vertical fin is adjacent to a first bottom source or drain (S/D) region and the second vertical fin is adjacent to a second bottom S/D region. The first gate stack is reduced to a first gate length and the second gate stack to a second gate length, the second gate length being greater than the first gate length because of the hardmask. The hardmask is removed. A first top S/D region is adjacent to the first vertical fin and a second top S/D region is adjacent to the second vertical fin.

Abstract: A method of forming fin field effect devices is provided. The method includes forming a plurality of vertical fins on a substrate. The method further includes forming a dielectric pillar on the substrate between two adjacent vertical fins, wherein at least one of the vertical fins is on a first region of the substrate, and at least one of the vertical fins is on a second region of the substrate. The method further includes growing a bottom source/drain layer on the first region of the substrate and the second region of the substrate. The method further includes depositing a bottom spacer layer on the bottom source/drain layer, and a filler layer on the bottom spacer layer. The method further includes forming a cover block on the first region of the substrate, and removing the portion of the filler layer on the second region of the substrate.

Abstract: A method for manufacturing a semiconductor device includes forming a channel layer on a semiconductor substrate and forming at least two spacers on the channel layer. A first portion of a gate metal layer is formed between the spacers, and a dielectric layer is conformally deposited on the spacers and the first portion of the gate metal layer. In the method, part of the dielectric layer is directionally removed from surfaces which are parallel to an upper surface of the substrate. A second portion of the gate metal layer is formed between remaining portions of the dielectric layer and on the first portion of the gate metal layer, and a cap layer is deposited on the second portion of the gate metal layer. A lateral width the second portion of the gate metal layer is less than a lateral width of the first portion of the gate metal layer.

Abstract: Embodiments are directed to a method of fabricating a semiconductor device. A non-limiting example of the method includes performing fabrication operations to form a nanosheet field effect transistor device on a substrate. The fabrication operations include, forming a channel stack over the substrate, wherein the channel stack include stacked and spaced apart channel nanosheets. A metal gate is formed adjacent to end regions of the channel stack and around and between the stacked and spaced apart channel nanosheets. A permanent dummy gate is formed above the channel stack.

Abstract: A hitch assist system is provided herein. The hitch assist system includes a sensing system configured to detect a hitch assembly and a coupler. A controller is configured to generate commands for maneuvering the vehicle along a positioning path and a subsequent alignment path. The alignment path has one or more sequential corrections such that the hitch assembly is aligned with the coupler upon completion of the alignment path.

Abstract: A technique relates to a semiconductor device. A stack is formed of alternating layers of inserted layers and channel layers on a substrate. Source or drain (S/D) regions are formed on opposite sides of the stack. The inserted layers are converted into oxide layers. Gate materials are formed on the stack.

Abstract: A hitch assist system is provided herein. The hitch assist system includes an imager for capturing one or more images of a hitch assembly and a trailer coupler. The imager is operably coupled with a movable panel. The hitch assembly includes a ball mount and a hitch ball. A controller is configured to generate an image that includes the hitch assembly, identify the hitch assembly within the image, estimate a ball mount length based on a predefined reference length and/or estimate a hitch ball height.

Abstract: A method, computer system, and a computer program product for filtering at least one element. The present invention may include receiving a user gesture. The present invention may also include determining a requested action based on the received user gesture. The present invention may then include filtering at least one element associated with a webpage based on the determined requested action. The present invention may further include rendering a modified webpage based on the filtered at least one element.

Abstract: A method of forming a semiconductor structure includes forming a nanosheet stack disposed over a first portion of a substrate and a fin channel material disposed over a second portion of the substrate, patterning the nanosheet stack disposed over the first portion of the substrate to form two or more nanosheet channels for at least one nanosheet field-effect transistor, patterning the fin channel material disposed over the second portion of the substrate to form one or more fins for at least one fin field-effect transistor, forming a first dielectric layer surrounding the nanosheet channels and the one or more fins, patterning a mask layer over the one or more fins, removing the first dielectric layer surrounding the nanosheet channels, removing the mask layer, forming a second dielectric layer surrounding the nanosheet channels and over the first dielectric layer surrounding the one or more fins, and forming a gate conductive layer over the second dielectric layer.

Abstract: A vehicle system comprises a hitch ball mounted on a vehicle and a controller. The controller is configured to identify a coupler position of a trailer and control movement of the vehicle aligning the hitch ball with the coupler position. The controller is further configured to identify a change in the coupler position and stop the motion of the vehicle in response to the change in position of the trailer.

Abstract: A vehicle system comprises a hitch ball mounted on a vehicle and a controller configured to identify a coupler position of a trailer. The controller is further configured to control motion of the vehicle aligning the hitch ball with the coupler position and monitor a height of the coupler relative to the hitch ball. In response to the coupler height being less than a height of the hitch ball, the controller is configured to stop the motion of the vehicle.

Abstract: A vehicle system is configured to control a trailer alignment routine. The system comprises a hitch ball mounted on a vehicle and a controller configured to identify a coupler position of a trailer. The controller is further configured to control motion of the vehicle to an aligned position, wherein the hitch ball is aligned with the coupler position. In response to the aligned position, the controller activates a service brake holding the vehicle and while maintaining the service brake activation, the controller activates a parking brake.