Abstract: A transparent conductive film structure includes, a substrate and a multi-layer film formed on the substrate. The multi-layer film includes a reflection-matching layer and a transparent conductive layer. The reflection matching layer is applied to reduce the reflection index difference of the etched portion and the non-etched portion. Therefore, the etched traces cannot be observed by the users so that the image quality of the transparent conductive film structure is improved.

Abstract: An optical film structure includes a substrate and a multi-film structure formed on the substrate. The multi-film structure includes a first refraction-matching layer, a second refraction-matching layer and a third layer. The refraction matching effect of the first and the second refraction-matching layers is produced to lead a phase reversal so as to interfere the incident light and the reflecting light.

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure in order to increase transmittance of blue light, includes a substrate and a coating module. The coating module is formed on a front surface of the substrate and composed of a plurality of silicon carbide compound coating layers, a plurality of Al-based oxide coating layers and a plurality of metal coating layers that are alternately stacked onto each other.

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure in order to increase transmittance of blue light. The coating structure includes a substrate and a coating module. The coating module is formed on a front surface of the substrate and composed of a plurality of mixture coating layers, a plurality of Al-based oxide coating layers and a plurality of metal coating layers that are alternately stacked onto each other. Each mixture coating layer is composed of silicon carbide compound and Ti-based oxide.

Abstract: A coating structure with an anti-reflection function and an anti-electromagnetic wave function, including an anti-reflection coating structure, an anti-electromagnetic wave coating structure, a third transparent substrate, and two adhesive layers respectively disposed between the anti-reflection coating structure and the third transparent substrate and between the third transparent substrate and the anti-electromagnetic wave coating structure. The anti-reflection coating structure has a first transparent substrate and an anti-reflection coating module formed on the first transparent substrate. The anti-electromagnetic wave coating structure has a second transparent substrate and an anti-electromagnetic wave coating module formed on the second transparent substrate. The third transparent substrate is disposed between the anti-reflection coating structure and the anti-electromagnetic wave coating structure.

Abstract: A multilayer film structure for increasing transmittance includes a transparent substrate and a multifunctional film module. The multifunctional film module is formed on a front surface of the transparent substrate and composed of a plurality of dielectric layers and a plurality of metal layers. The dielectric layers and the metal layers are alternately stacked onto each other, and each metal layer is formed by mixing at least two metals. Each dielectric layer is a silicon carbide compound layer that is SiC, and each metal layer is formed by mixing Ag and Cu.

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure with a surface protective layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of silicon carbide compound coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.

Abstract: An extreme low resistivity light attenuation anti-reflection coating with a transparent surface conductive layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of mixture coating layers and a plurality of metal coating layers that are alternately stacked with each other. Each mixture coating layer is composed of silicon carbide compound and Ti-based oxide. The composed protection coating layer is formed on the coating module.

Abstract: An anti-reflection coating anti-reflection coating with low resistivity function and transparent conductive coating as outermost layer is disclosed. The anti-reflection coating contains a transparent conductive oxide as a surface layer and has a photo reflectance below 0.5%. The resistivity of the anti-reflection coating is between 0.5? and 0.7? per square, and its transparency is between 55% and 70%.

Abstract: A extreme low resistivity light attenuation anti-reflection coating structure includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of Ti-based oxide coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure in order to increase transmittance of blue light. The coating structure includes a substrate and a coating module. The coating module is formed on a front surface of the substrate and composed of a plurality of mixture coating layers, a plurality of Al-based oxide coating layers and a plurality of metal coating layers that are alternately stacked onto each other. Each mixture coating layer is composed of silicon carbide compound and Ti-based oxide.

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure in order to increase transmittance of blue light, includes a substrate and a coating module. The coating module is formed on a front surface of the substrate and composed of a plurality of silicon carbide compound coating layers, a plurality of Al-based oxide coating layers and a plurality of metal coating layers that are alternately stacked onto each other.

Abstract: Disclosed is a method of preparing MDI-based polyurethane polymer having a density in a range of between 25 and 80 kg/m3. The method includes the steps of a) mixing a first main raw material including methylene diphenyl diisocyanate polymer and carbonized methylene diphenyl diisocyanate, a second main raw material including 5 to 20 parts by weight of polyether polyol having a molecular weight of 3000 and 95 to 80 parts by weight of polyether polyol having a molecular weight of 5000, and an auxiliary material including a catalyst, a foam control agent, a crosslinking agent, a chain extender and water, and b) foaming the mixture of step a). In step a), the ratio by weight of the first main raw material to the second main raw material is in a range of 1:1.2 to 1:2.

Abstract: A coating structure with an anti-reflection function and an anti-electromagnetic wave function, including an anti-reflection coating structure, an anti-electromagnetic wave coating structure, a third transparent substrate, and two adhesive layers respectively disposed between the anti-reflection coating structure and the third transparent substrate and between the third transparent substrate and the anti-electromagnetic wave coating structure. The anti-reflection coating structure has a first transparent substrate and an anti-reflection coating module formed on the first transparent substrate. The anti-electromagnetic wave coating structure has a second transparent substrate and an anti-electromagnetic wave coating module formed on the second transparent substrate. The third transparent substrate is disposed between the anti-reflection coating structure and the anti-electromagnetic wave coating structure.

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure with a surface protective layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of silicon carbide compound coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.

Abstract: An extreme low resistivity light attenuation anti-reflection coating with a transparent surface conductive layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of mixture coating layers and a plurality of metal coating layers that are alternately stacked with each other. Each mixture coating layer is composed of silicon carbide compound and Ti-based oxide. The composed protection coating layer is formed on the coating module.

Abstract: An extreme low resistivity light attenuation anti-reflection coating with a transparent surface conductive layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of mixture coating layers and a plurality of metal coating layers that are alternately stacked with each other. Each mixture coating layer is composed of Ti-based oxide and carbon. The composed protection coating layer is formed on the coating module.

Abstract: A extreme low resistivity light attenuation anti-reflection coating structure includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of Ti-based oxide coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.

Abstract: An anti-reflection coating anti-reflection coating with low resistivity function and transparent conductive coating as outermost layer is disclosed. The anti-reflection coating contains a transparent conductive oxide as a surface layer and has a photo reflectance below 0.5%. The resistivity of the anti-reflection coating is between 0.5? and 0.7? per square, and its transparency is between 55% and 70%.

Abstract: A low resistivity light attenuation anti-reflection coating with a transparent surface conductive layer is disclosed. The multi-layered structure of the low resistivity light attenuation anti-reflection coating is HL (HL)6HL (H: a material scoring high on the refractive index, L: a material scoring low on the refractive index). There are 8 oxide layers, and the material of the surface layer is a transparent conductive coating and scores between 1.9 and 2.0 on the refractive index.