Abstract: A semiconductor structure includes a SOI substrate having a device layer and a buried oxide layer contiguous with the device layer; a transistor disposed on the device layer; a dielectric layer surrounding the transistor; an interconnect structure disposed on the dielectric layer and electrically connected to a gate of the transistor; a charge trapping layer contiguous with the buried oxide layer; a capping layer contiguous with the charge trapping layer; and a conductive via penetrating through the capping layer, the charge trapping layer, the buried oxide layer, the device layer, and the dielectric layer. The conductive via is electrically connected to the interconnect structure.

Abstract: A semiconductor package includes a RDL interposer having a first surface and a second surface; fanout pads and peripheral pads on the second surface; a first semiconductor die on the first surface and electrically connected to the fanout pads; a molding compound surrounding the first semiconductor die and the first surface of the RDL interposer; through mold vias in the molding compound around the first semiconductor die; peripheral solder bumps within the through mold vias and directly disposed on the peripheral pads; through silicon via pads on the rear surface of the first semiconductor die; a second semiconductor die bonded to the through silicon via pads of the first semiconductor die and the peripheral solder bumps within the through mold vias.

Abstract: A resonant converter having a switch on-time control mechanism is provided. The resonant converter includes a primary-side switch circuit, a primary-side resonant circuit, a secondary-side switch circuit, a secondary-side resonant circuit, a transformer and a control circuit. In the resonant converter, the control circuit controls on-times and switching frequencies of the primary-side switch circuit and the secondary-side switch circuit to extend time within which power is transmitted from an input power source, the primary-side switch circuit, the primary-side resonant circuit and the transformer to the secondary-side resonant circuit, and stored in the secondary-side resonant circuit. As a result, the secondary-side resonant circuit is able to supply more power to a load.

Abstract: A wafer structure includes a substrate having a pre-bonding structure thereon. The pre-bonding structure includes an outer dielectric layer covering a central region of the substrate and a ring-shaped absorbent layer within a ring-shaped peripheral region of the substrate. The ring-shaped absorbent layer is contiguous with the outer dielectric layer.

Abstract: In an embodiment, a device includes: an interposer including: a back-side redistribution structure; an interconnection die over the back-side redistribution structure, the interconnection die including a substrate, a through-substrate via protruding from the substrate, and an isolation layer around the through-substrate via; a first encapsulant around the interconnection die, a surface of the first encapsulant being substantially coplanar with a surface of the isolation layer and a surface of the through-substrate via; and a front-side redistribution structure over the first encapsulant, the front-side redistribution structure including a first conductive via that physically contacts the through-substrate via, the isolation layer separating the first conductive via from the substrate.

Abstract: The present invention relates to the technical field of wastewater treatment, and discloses a bioaugmentation treatment process for lithium battery producing wastewater. The method comprises the following steps: 1) introducing wastewater into a hydrolytic acidification tank, and adding Enterobacter sp. NJUST50 and activated sludge to the hydrolytic acidification tank for hydrolytic acidification treatment; 2) introducing the effluent into an anoxic tank, and adding Enterobacter sp. NJUST50 and anaerobic activated sludge for anoxic treatment; 3) introducing the effluent into an aerobic tank, and adding Enterobacter sp. NJUST50 and aerobic activated sludge for aerobic treatment; 4) introducing the effluent into an anoxic filter tank, and adding Enterobacter sp. NJUST50 and anaerobic activated sludge to the filter tank for treatment; and 5) introducing the effluent into a biological aerated filter tank, and adding a sludge mixture of Enterobacter sp.

Abstract: A semiconductor device and a method of fabricating the same, includes at least one dielectric layer, a conductive structure, and a first insulator. The at least one dielectric layer includes a stacked structure having a low-k dielectric layer, an etching stop layer, and a conductive layer between the low-k dielectric layer and the etching stop layer. The conductive structure is disposed in the first dielectric layer. The first insulator is disposed between the conductive layer and the conductive structure.

Abstract: The disclosure provides a projection apparatus, which includes a casing, a projection module, at least one airflow generating unit, and at least one speaker. The casing has at least one air outlet. The projection module is disposed in the casing and configured to project an image beam outside the casing. The airflow generating unit is disposed in the casing and configured to generate airflow. The speaker is disposed in the casing, and the airflow generating unit is located between the projection module and the speaker. The speaker has at least one flow guiding surface, and the flow guiding surface is inclined toward the air outlet to guide the airflow toward the air outlet. The projection apparatus has a favorable heat dissipation capability and may reduce the noise generated by the airflow generating unit.

Abstract: The present disclosure is related to a semiconductor device and a fabricating method thereof, and the semiconductor device includes a first dielectric layer and a first conductive structure. The first dielectric layer includes a stacked structure including a low-k dielectric layer, an etching stop layer, and a carbon-rich dielectric layer between the low-k dielectric layer and the etching stop layer, wherein a carbon concentration within the carbon-rich dielectric layer is above 15%. The first conductive structure is disposed in the first dielectric layer.

Abstract: A method for fabricating a semiconductor device includes the steps of: providing a substrate, wherein the substrate comprises a MRAM region and a logic region; forming a magnetic tunneling junction (MTJ) on the MRAM region; forming a top electrode on the MTJ; and then performing a flowable chemical vapor deposition (FCVD) process to form a first inter-metal dielectric (IMD) layer around the top electrode and the MTJ.

Abstract: A semiconductor device includes a first magnetic tunneling junction (MTJ) and a second MTJ on a substrate, a first ultra low-k (ULK) dielectric layer on the first MTJ and the second MTJ, a passivation layer on the first ULK dielectric layer, and a second ULK dielectric layer on the passivation layer.

Abstract: A semiconductor device includes a magnetic tunneling junction (MTJ) on a substrate, a top electrode on the MTJ, a trapping layer in the top electrode for trapping hydrogen, a first inter-metal dielectric (IMD) layer on the MTJ, and a first metal interconnection in the first IMD layer and on the top electrode. Preferably, a top surface of the trapping layer is lower than a bottom surface of the first IMD layer.

Abstract: An embodiment interposer may include a plurality of first redistribution layers including first electrical interconnect structures having a first line width and a first line spacing embedded in a first dielectric material, and a plurality of second redistribution layers including second electrical interconnect structures having a second line width and a second line spacing embedded in a second dielectric material such that the second line width is greater than the first line width and such that the second line spacing is greater than the first line spacing. The first dielectric material may be one of polyimide, benzocyclobuten, or polybenzo-bisoxazole and second dielectric material may include an inorganic particulate material dispersed in an epoxy resin. The interposer may further include a protective layer, including the second dielectric material, formed over the first redistribution layers, and a surface layer, including the first dielectric material, formed as part of the second redistribution layers.

Abstract: An embodiment semiconductor package includes a bare semiconductor chip, a packaged semiconductor chip adjacent the bare semiconductor chip, and a redistribution structure bonded to the bare semiconductor chip and the packaged semiconductor chip. The redistribution structure includes a first redistribution layer having a first thickness; a second redistribution layer having a second thickness; and a third redistribution layer between the first redistribution layer and the second redistribution layer. The third redistribution layer has a third thickness greater than the first thickness and the second thickness. The package further includes an underfill disposed between the bare semiconductor chip and the redistribution structure and a molding compound encapsulating the bare semiconductor chip, the packaged semiconductor chip, and the underfill.

Abstract: An embodiment semiconductor package includes a bare semiconductor chip, a packaged semiconductor chip adjacent the bare semiconductor chip, and a redistribution structure bonded to the bare semiconductor chip and the packaged semiconductor chip. The redistribution structure includes a first redistribution layer having a first thickness; a second redistribution layer having a second thickness; and a third redistribution layer between the first redistribution layer and the second redistribution layer. The third redistribution layer has a third thickness greater than the first thickness and the second thickness. The package further includes an underfill disposed between the bare semiconductor chip and the redistribution structure and a molding compound encapsulating the bare semiconductor chip, the packaged semiconductor chip, and the underfill.

Abstract: A semiconductor device includes a first magnetic tunneling junction (MTJ) and a second MTJ on a substrate, a first ultra low-k (ULK) dielectric layer on the first MTJ and the second MTJ, a passivation layer on the first ULK dielectric layer, and a second ULK dielectric layer on the passivation layer.

Abstract: A method for fabricating a semiconductor device includes the steps of: providing a substrate, wherein the substrate comprises a MRAM region and a logic region; forming a magnetic tunneling junction (MTJ) on the MRAM region; forming a top electrode on the MTJ; and then performing a flowable chemical vapor deposition (FCVD) process to form a first inter-metal dielectric (IMD) layer around the top electrode and the MTJ.

Abstract: A semiconductor device includes a magnetic tunneling junction (MTJ) on a substrate, a top electrode on the MTJ, a trapping layer in the top electrode for trapping hydrogen, a first inter-metal dielectric (IMD) layer on the MTJ, and a first metal interconnection in the first IMD layer and on the top electrode. Preferably, a top surface of the trapping layer is lower than a bottom surface of the first IMD layer.

Abstract: A package structure includes an interposer including a front side and a back side opposite the front side, an upper molded structure on the front side of the interposer and including an upper molding layer and a semiconductor die in the upper molding layer, and a lower molded structure on the back side of the interposer and including a lower molding layer and a substrate portion in the lower molding layer, wherein the substrate portion includes conductive layers electrically coupled to the semiconductor die through the interposer.

Abstract: A method includes forming a photoresist on a base structure, and performing a first light-exposure process on the photoresist using a first lithography mask. In the first light-exposure process, an inner portion of the photoresist is blocked from being exposed, and a peripheral portion of the photoresist is exposed. The peripheral portion encircles the inner portion. A second light-exposure process is performed on the photoresist using a second lithography mask. In the second light-exposure process, the inner portion of the photoresist is exposed, and the peripheral portion of the photoresist is blocked from being exposed. The photoresist is then developed.