Patents by Inventor Cheng-Hsiung (Matt) Tsai

Cheng-Hsiung (Matt) Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pre-clean chamber with integrated shutter garage
    Patent number: 11251028
    Abstract: Substrate processing chambers with integrated shutter garage are provided herein. In some embodiments, a pre-clean substrate processing chamber may include a chamber body, wherein the chamber body includes a first side configured to be attached to mainframe substrate processing tool, and a second side disposed opposite the first side, a substrate support configured to support a substrate when disposed thereon, a shutter disk garage disposed on the second side of the process chamber, and a shutter disk assembly mechanism comprising a rotatable shaft, and a robot shutter arm coupled to the shaft, wherein the robot shutter arm includes a shutter disk assembly support section configured to support a shutter disk assembly, and wherein the shutter disk assembly mechanism is configured to move the robot shutter arm between a storage position within the shutter garage and a processing position within the process chamber over the substrate support.
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: February 15, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Cheng-Hsiung Matt Tsai, Ananthkrishna Jupudi, Sarath Babu, Manjunatha P. Koppa, Hiroyuki Takahama
  • PRE-CLEAN CHAMBER WITH INTEGRATED SHUTTER GARAGE
    Publication number: 20190348264
    Abstract: Substrate processing chambers with integrated shutter garage are provided herein. In some embodiments, a pre-clean substrate processing chamber may include a chamber body, wherein the chamber body includes a first side configured to be attached to mainframe substrate processing tool, and a second side disposed opposite the first side, a substrate support configured to support a substrate when disposed thereon, a shutter disk garage disposed on the second side of the process chamber, and a shutter disk assembly mechanism comprising a rotatable shaft, and a robot shutter arm coupled to the shaft, wherein the robot shutter arm includes a shutter disk assembly support section configured to support a shutter disk assembly, and wherein the shutter disk assembly mechanism is configured to move the robot shutter arm between a storage position within the shutter garage and a processing position within the process chamber over the substrate support.
    Type: Application
    Filed: May 7, 2019
    Publication date: November 14, 2019
    Inventors: Cheng-Hsiung Matt Tsai, Ananthkrishna Jupudi, Sarath Babu, Manjunatha P. Koppa, Hiroyuki Takahama
  • High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications
    Patent number: 6875927
    Abstract: A high temperature cable includes wire bundle having a plurality of copper strands, where each copper strand has a barrier coating and an anti-oxidation coating disposed thereon. A mica-based layer is wrapped around a length of the wire bundle and a fiberglass layer is disposed over the mica-based layer.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: April 5, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Karl Brown, Cheng-Hsiung (Matt) Tsai, Donny Young, Vineet Mehta, David Loo
  • High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications
    Publication number: 20030169553
    Abstract: A high temperature cable includes wire bundle having a plurality of copper strands, where each copper strand has a barrier coating and an anti-oxidation coating disposed thereon. A mica-based layer is wrapped around a length of the wire bundle and a fiberglass layer is disposed over the mica-based layer.
    Type: Application
    Filed: March 8, 2002
    Publication date: September 11, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Karl Brown, Cheng-Hsiung Matt Tsai, Donny Young, Vineet Mehta, David Loo
  • Process shield for a substrate processing chamber
    Patent number: D891382
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: July 28, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Manjunatha P. Koppa, Aravind Kamath, Cheng-Hsiung Matt Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni, David Or
  • Deposition ring for a substrate processing chamber
    Patent number: D933725
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: October 19, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Manjunatha P. Koppa, Aravind Kamath, Cheng-Hsiung Matt Tsai, Manjunath H. Venkataswamappa, Steven V. sansoni, David Or
  • Process shield for a substrate processing chamber
    Patent number: D942516
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: February 1, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Manjunatha P. Koppa, Aravind Kamath, Cheng-Hsiung Matt Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni, David Or