Substrate support for a substrate processing chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of a substrate support for a substrate processing chamber, showing our new design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation view thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a left elevation view thereof.

FIG. 7 is a right elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.

The dashed lines in FIGS. 1-8 illustrate portions of the article that form no part of the claimed design.

Claims

The ornamental design for a substrate support for a substrate processing chamber, as shown and described.

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Patent History
Patent number: D1071886
Type: Grant
Filed: Jan 20, 2022
Date of Patent: Apr 22, 2025
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Zhixiu Liang (Fremont, CA), Michael Sterling Jackson (Sunnyvale, CA), Jiang Lu (Milpitas, CA), Cheng-Hsiung Matthew Tsai (Cupertino, CA), Tomoharu Matsushita (Chiba), Zubin Huang (Santa Clara, CA)
Primary Examiner: Brett Miller
Assistant Examiner: Russell Carnell Smith, Jr.
Application Number: 29/823,917