Patents by Inventor Cheng-Hung Tsai

Cheng-Hung Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149104
    Abstract: A memory testing method includes the operations of: generating test pattern data, a test address and reference data by a pattern generating circuit; performing a built-in self-test (BIST) according to the test pattern, the test address and the reference data by multiple memory modules to generate multiple test results; generating an indicator signal according to the multiple test results; when a first test result among the multiple test results indicates a fault, retaining the test address by the pattern generating circuit in response to the indicator signal, and testing, according to the test address and multiple sets of predetermined pattern data, a first memory module among the multiple memory modules that corresponds to the first test result to generate a localization test result; and determining a faulty memory cell in the first memory module according to the localization test result.
    Type: Application
    Filed: October 25, 2024
    Publication date: May 8, 2025
    Inventors: Cheng Jie ZHU, Cheng Hung TSAI, Kuei Hung CHENG, Chia Ho PAN, Jian Na SHEN
  • Patent number: 12287572
    Abstract: A method includes: depositing a mask layer over a substrate; directing first radiation reflected from a central collector section of a sectional collector of a lithography system toward the mask layer according to a pattern; directing second radiation reflected from a peripheral collector section of the sectional collector toward the mask layer according to the pattern, wherein the peripheral collector section is vertically separated from the central collector section by a gap; forming openings in the mask layer by removing first regions of the mask layer exposed to the first radiation and second regions of the mask layer exposed to the second radiation; and removing material of a layer underlying the mask layer exposed by the openings.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: April 29, 2025
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Cheng Hung Tsai, Sheng-Kang Yu, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen
  • Patent number: 12228863
    Abstract: A system for monitoring and controlling an EUV light source includes a first temperature sensor, a signal processor, and a process controller. The first temperature sensor includes a portion inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes, and obtains an ambient temperature that decreases with time as a function of tin contamination coating on the inserted portion. The signal processor determines an excess tin debris deposition on the vane based on the obtained chamber ambient temperature. The process controller activates a vane cleaning action upon being informed of the excess tin debris deposition by the signal processor, thereby improving availability of the EUV light source tool and reducing risks of tin pollution on other tools such as a reticle.
    Type: Grant
    Filed: April 12, 2023
    Date of Patent: February 18, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Cheng Hung Tsai, Sheng-Kang Yu, Heng-Hsin Liu, Li-Jui Chen, Shang-Chieh Chien
  • Patent number: 12166947
    Abstract: A video processing device for virtual reality is provided. The video processing device includes a video input mechanism configured to receive a first and a second original video obtained from a first camera device; a video processing mechanism in transmission connecting to the video input mechanism, the video processing mechanism includes a first video processing unit configured to adjust the first and the second original video to a first video and a second video, the first video processing unit is configured to further combine the first video and the second video into a third video having a 16:9 aspect ratio, and dimensions of the third video being a total of those of the first and the second video; and a video output mechanism in transmission connecting to the video processing mechanism through a physical wire. A video generating system for virtual reality is also provided.
    Type: Grant
    Filed: September 8, 2023
    Date of Patent: December 10, 2024
    Assignee: FUNIQUE VR STUDIO
    Inventors: Ya-Ching Ko, Cheng Hung Tsai
  • Publication number: 20240379259
    Abstract: An extreme ultra violet (EUV) light source apparatus includes an excitation laser inlet port configured to receive an excitation laser, and a first mirror configured to reflect the excitation laser that passes through a zone of excitation. A metal droplet is irradiated by the excitation laser.
    Type: Application
    Filed: July 23, 2024
    Publication date: November 14, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng Hung TSAI, Sheng-Kang YU, Shang-Chieh CHIEN, Heng-Hsin LIU, Li-Jui CHEN
  • Publication number: 20240353765
    Abstract: Microwave heating of debris collecting vanes within the source vessel of a lithography apparatus is used to accomplish uniform temperature distribution in order to reduce fall-on contamination and formation of clogs on the inner and outer surfaces of the vanes.
    Type: Application
    Filed: July 1, 2024
    Publication date: October 24, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng Hung TSAI, Sheng-Kang YU, Shang-Chieh CHIEN, Heng-Hsin LIU, Li-Jui CHEN
  • Publication number: 20240345491
    Abstract: A system for monitoring and controlling an EUV light source includes a first temperature sensor, a signal processor, and a process controller. The first temperature sensor includes a portion inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes, and obtains an ambient temperature that decreases with time as a function of tin contamination coating on the inserted portion. The signal processor determines an excess tin debris deposition on the vane based on the obtained chamber ambient temperature. The process controller activates a vane cleaning action upon being informed of the excess tin debris deposition by the signal processor, thereby improving availability of the EUV light source tool and reducing risks of tin pollution on other tools such as a reticle.
    Type: Application
    Filed: April 12, 2023
    Publication date: October 17, 2024
    Inventors: Cheng Hung TSAI, Sheng-Kang Yu, Heng-Hsin Liu, Li-Jui Chen, Shang-Chieh Chien
  • Patent number: 12119129
    Abstract: An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
    Type: Grant
    Filed: March 13, 2023
    Date of Patent: October 15, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Cheng Hung Tsai, Sheng-Kang Yu, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen
  • Patent number: 12112719
    Abstract: An electronic device with short frame time length is provided. The electronic device includes a substrate, a plurality of first signal lines, a plurality of second signal lines, and two first integrated circuits. The plurality of first signal lines are disposed on the substrate. The plurality of first signal lines are divided into a first group of signal lines and a second group of signal lines. The plurality of second signal lines are disposed on the substrate. The plurality of second signal lines are disposed alternately with the plurality of first signal lines. The two first integrated circuits are bonded on the substrate. Each of the two first integrated circuits are electrically connected to the first group of signal lines and the second group of signal lines. The first group of signal lines and the second group of signal lines are disposed alternately in columns.
    Type: Grant
    Filed: February 13, 2023
    Date of Patent: October 8, 2024
    Assignee: Innolux Corporation
    Inventors: Yi-Hung Lin, Cheng-Hung Tsai
  • Patent number: 12061423
    Abstract: Microwave heating of debris collecting vanes within the source vessel of a lithography apparatus is used to accomplish uniform temperature distribution in order to reduce fall-on contamination and formation of clogs on the inner and outer surfaces of the vanes.
    Type: Grant
    Filed: September 28, 2021
    Date of Patent: August 13, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Cheng Hung Tsai, Sheng-Kang Yu, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen
  • Patent number: 11990524
    Abstract: A method includes forming a dummy gate structure across a fin, in which the dummy gate structure has a dummy gate dielectric layer and a dummy gate electrode, forming gate spacers on sidewalls of the dummy gate structure, forming source/drain epitaxial structures on sides of the dummy gate structure, performing a first etch process to the dummy gate electrode such that a recessed dummy gate electrode remains over the fin, performing a second etch process to the gate spacers such that recessed gate spacers remain over the sidewalls of the dummy gate structure, removing the recessed dummy gate electrode and the dummy gate dielectric layer after the second etch process to form a recess between the recessed gate spacers, forming a gate structure overfilling the recess, and performing a third etch process to the gate structure such that a recessed gate structure remains between the recessed gate spacers.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: May 21, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsiao-Chien Lin, Hsi Chung Chen, Cheng-Hung Tsai, Chih-Hsuan Lin
  • Publication number: 20240157217
    Abstract: A golf teaching method and a golf teaching system are provided. The golf teaching method includes: configuring image capturing devices and golf simulator to capture swing images and corresponding simulator data records, when a user performs a golf swing; configuring an expert model that includes expert motion information and corresponding correction suggestion information; configuring a computing device to perform an analysis process on the swing images and the simulator data records to divide the golf swing into user motions according to stages and obtaining records of user motion information corresponding to the plurality of stages, and to compare the user motion information with the corresponding expert motion information in each stage through the expert model, and to provide the corresponding correction suggestion information according to a comparison result; and configuring a user interface to provide the correction suggestion information.
    Type: Application
    Filed: April 20, 2023
    Publication date: May 16, 2024
    Inventors: CHENG-HUNG TSAI, CHIA-YU JIH, CHIH-CHUNG CHIEN, LI-LIN LU, SHAO-JUN TAN, WEN-FU LAI
  • Publication number: 20240004304
    Abstract: Methods and apparatuses for a lithography exposure process are described. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The methods utilized and the apparatuses include two or more collectors for collecting the generated EUV light and reflecting the collected EUV light to a focal point of one of the collectors. In some embodiments, one of the two collectors includes a ring-shaped collector.
    Type: Application
    Filed: June 30, 2022
    Publication date: January 4, 2024
    Inventors: Cheng Hung TSAI, Sheng-Kang YU, Shang-Chieh CHIEN, Heng-Hsin LIU, Li-Jui CHEN
  • Publication number: 20230421740
    Abstract: A video processing device for virtual reality is provided. The video processing device includes a video input mechanism configured to receive a first and a second original video obtained from a first camera device; a video processing mechanism in transmission connecting to the video input mechanism, the video processing mechanism includes a first video processing unit configured to adjust the first and the second original video to a first video and a second video, the first video processing unit is configured to further combine the first video and the second video into a third video having a 16:9 aspect ratio, and dimensions of the third video being a total of those of the first and the second video; and a video output mechanism in transmission connecting to the video processing mechanism through a physical wire. A video generating system for virtual reality is also provided.
    Type: Application
    Filed: September 8, 2023
    Publication date: December 28, 2023
    Inventors: YA-CHING KO, CHENG HUNG TSAI
  • Publication number: 20230400763
    Abstract: A method includes: depositing a mask layer over a substrate; directing first radiation reflected from a central collector section of a sectional collector of a lithography system toward the mask layer according to a pattern; directing second radiation reflected from a peripheral collector section of the sectional collector toward the mask layer according to the pattern, wherein the peripheral collector section is vertically separated from the central collector section by a gap; forming openings in the mask layer by removing first regions of the mask layer exposed to the first radiation and second regions of the mask layer exposed to the second radiation; and removing material of a layer underlying the mask layer exposed by the openings.
    Type: Application
    Filed: August 8, 2023
    Publication date: December 14, 2023
    Inventors: Cheng Hung TSAI, Sheng-Kang YU, Shang-Chieh CHIEN, Heng-Hsin LIU, Li-Jui CHEN
  • Publication number: 20230375944
    Abstract: An extreme ultraviolet (EUV) photolithography system includes a scanner that directs the EUV light onto an EUV reticle. The photolithography system includes one or more contamination reduction structures positioned within the scanner and configured to attract and decompose contaminant particles within the scanner. The contamination reduction structure includes a surface material that is highly electronegative.
    Type: Application
    Filed: May 20, 2022
    Publication date: November 23, 2023
    Inventors: Shang-Chieh CHIEN, Tzu-Jung PAN, Wei-Shin CHENG, Cheng Hung TSAI, Li-Jui CHEN, Heng-Hsin LIU
  • Patent number: 11792380
    Abstract: The disclosure provides a video transmission method for virtual reality. The method includes reorganizing a first video and a second video obtained to generate a third video suitable for transmission through a physical wire, hence avoiding distortion caused by compression of a high-definition video. The disclosure further includes a video processing device and a video generating system employing the video transmission method.
    Type: Grant
    Filed: September 30, 2021
    Date of Patent: October 17, 2023
    Assignee: FUNIQUE VR STUDIO
    Inventors: Ya-Ching Ko, Cheng Hung Tsai
  • Patent number: 11782532
    Abstract: A calibration method and a calibration apparatus for a knob applicable to a touch panel are provided. The knob includes at least one sensing pad. The calibration method includes: obtaining sensed position(s) of each sensing pad by sensing a position of the sensing pad through the touch panel; and calculating a position of a center of the knob by using a formula of a radius of a circumscribed circle according the sensed position(s) of each sensing pad.
    Type: Grant
    Filed: November 21, 2021
    Date of Patent: October 10, 2023
    Assignee: HIMAX TECHNOLOGIES LIMITED
    Inventors: Chun-Jen Su, Cheng-Hung Tsai, Po-Hsuan Huang, Chun-Kai Chuang
  • Publication number: 20230282179
    Abstract: An electronic device with short frame time length is provided. The electronic device includes a substrate, a plurality of first signal lines, a plurality of second signal lines, and two first integrated circuits. The plurality of first signal lines are disposed on the substrate. The plurality of first signal lines are divided into a first group of signal lines and a second group of signal lines. The plurality of second signal lines are disposed on the substrate. The plurality of second signal lines are disposed alternately with the plurality of first signal lines. The two first integrated circuits are bonded on the substrate. Each of the two first integrated circuits are electrically connected to the first group of signal lines and the second group of signal lines. The first group of signal lines and the second group of signal lines are disposed alternately in columns.
    Type: Application
    Filed: February 13, 2023
    Publication date: September 7, 2023
    Applicant: Innolux Corporation
    Inventors: Yi-Hung Lin, Cheng-Hung Tsai
  • Publication number: 20230215594
    Abstract: An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
    Type: Application
    Filed: March 13, 2023
    Publication date: July 6, 2023
    Inventors: Cheng Hung TSAI, Sheng-Kang Yu, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jul Chen