Abstract: A monolithic compound semiconductor structure is disclosed. The monolithic compound semiconductor structure comprises a substrate, an n-type FET epitaxial structure, an n-type etching-stop layer, a p-type insertion layer, and an npn HBT epitaxial structure, and it can be used to form an FET, an HBT, or a thyristor.

Abstract: An integrated structure of compound semiconductor devices is disclosed. The integrated structure comprises from bottom to top a substrate, a first epitaxial layer, an etching-stop layer, a second epitaxial layer, a sub-collector layer, a collector layer, a base layer, and an emitter layer, in which the first epitaxial layer is a p-type doped layer, the second epitaxial layer is an n-type graded doping layer with a gradually increased or decreased doping concentration, and the sub-collector layer is an n-type doped layer. The integrated structure can be used to form an HBT, a varactor, or an MESFET.

Abstract: An improved pseudomorphic high electron mobility transistor (pHEMT) and heterojunction bipolar transistor (HBT) integrated epitaxial structure and the fabrication method thereof, in which the structure comprises a substrate, a pHEMT structure, an etching-stop spacer layer, and an HBT structure. The pHEMT's structure comprises a buffer layer, a barrier layer, a first channel spacer layer, a channel layer, a second channel spacer layer, a Schottky barrier layer, an etching-stop layer, and at least one cap layer. The fabrication method of an HBT and a pHEMT are also included.

Abstract: A method of fabricating short-gate-length electrodes for integrated III-V compound semiconductor devices, particularly for integrated HBT/HEMT devices on a common substrate is disclosed. The method is based on dual-resist processes, wherein a first thin photo-resist layer is utilized for defining the gate dimension, while a second thicker photo-resist layer is used to obtain a better coverage on the surface for facilitating gate metal lift-off. The dual-resist method not only reduces the final gate length, but also mitigates the gate recess undercuts, as compared with those fabricated by the conventional single-resist processes. Furthermore, the dual-resist method of the present invention is also beneficial for the fabrication of multi-gate device with good gate-length uniformity.

Abstract: An on-chip circuit for protection against electrostatic discharge (ESD) is disclosed. Unlike conventional ESD protection circuit using high turn-on voltage diode string, the circuit uses a plural of enhancement-mode HEMT/MESFET triggered by a shorter diode string to shunt large ESD current for protected susceptive RF circuit. Further, by using dual-gate technology of enhancement-mode HEMT/MESFET, the on-chip ESD protection circuit has the less parasitic capacitance without expanding device size for vulnerable RF circuit.

Abstract: A method of fabricating short-gate-length electrodes for integrated III-V compound semiconductor devices, particularly for integrated HBT/HEMT devices on a common substrate is disclosed. The method is based on dual-resist processes, wherein a first thin photo-resist layer is utilized for defining the gate dimension, while a second thicker photo-resist layer is used to obtain a better coverage on the surface for facilitating gate metal lift-off. The dual-resist method not only reduces the final gate length, but also mitigates the gate recess undercuts, as compared with those fabricated by the conventional single-resist processes. Furthermore, the dual-resist method of the present invention is also beneficial for the fabrication of multi-gate device with good gate-length uniformity.

Abstract: A two-port dual-gate field-effect transistor for amplifier applications, wherein a self-bias circuit includes a number of passive elements, such as resistors, diodes and capacitors, is utilized to coupled the output of the amplifier with a second gate of the dual-gate device as a bias source, which transforms the conventional three-port cascade topology into a two-port dual-gate device so as to facilitate device testing, modeling, and packaging for discrete device application. The technology improves the RF performance in conventional two-port single-gate HEMT devices, with slight noise figure degradation.

Abstract: An on-chip circuit for protection against electrostatic discharge (ESD) is disclosed. Unlike conventional ESD protection circuit using high turn-on voltage diode string, the circuit uses a plural of enhancement-mode HEMT/MESFET triggered by a shorter diode string to shunt large ESD current for protected susceptive RF circuit. Further, by using dual-gate technology of enhancement-mode HEMT/MESFET, the on-chip ESD protection circuit has the less parasitic capacitance without expanding device size for vulnerable RF circuit.

Abstract: A two-port dual-gate field-effect transistor for amplifier applications, wherein a self-bias circuit comprising a number of passive elements, such as resistors, diodes and capacitors, is utilized to coupled the output of the amplifier with a second gate of the dual-gate device as a bias source, which transforms the conventional three-port cascode topology into a two-port dual-gate device so as to facilitate device testing, modeling, and packaging for discrete device application. The technology is for improving the RF performance of conventional two-port single-gate HEMT device, with slightly noise figure degradation. This innovation doesn't require complicated RF testing and modeling as compared with conventional dual-gate devices. The two-port dual-gate device fits packaging molds of conventional two-port discrete device, hence the production line thereof can be easily extended to low noise amplifier and power amplifier applications.