Patents by Inventor Cheng Shih

Cheng Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8851696
    Abstract: A fragrance lamp structure including a carrying element, a lighting element and a driving element is provided. The carrying element has a carrying surface, a first contact surface and a second contact surface. The carrying surface and the first contact surface are opposite to each other, and so are the carrying surface and the second contact surface opposite to each other. The lighting element has a first heat output surface facing the first contact surface of the carrying element. The lighting element generates a first heat going through the first heat output surface and the first contact surface to heat up the carrying element. The driving element has a second heat output surface facing the second contact surface of the carrying element. The driving element generates a second heat going through the second heat output surface and the second contact surface to heat up the carrying element.
    Type: Grant
    Filed: January 5, 2012
    Date of Patent: October 7, 2014
    Assignees: Dongguan Masstop Liquid Crystal Display Co., Ltd., Wintek Corporation
    Inventors: Ming-Chuan Lin, Kuo-Jui Huang, Ying-Cheng Shih
  • Patent number: 8853831
    Abstract: A interconnect structure includes a conductive layer formed in a dielectric layer. An adhesion layer is formed between the dielectric layer and a substrate. The adhesion layer has a carbon content ratio greater than a carbon content ratio of the dielectric layer.
    Type: Grant
    Filed: April 30, 2012
    Date of Patent: October 7, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Cheng Shih, Yu-Yun Peng, Chia Cheng Chou, Joung-Wei Liou
  • Patent number: 8791894
    Abstract: Systems and methods may provide for determining an operating mode of a display device that may include a flat panel display and a controller coupled to the flat panel display. The controller may be configured to determine an operating mode for the flat panel display among a plurality of operating modes including at least a first operating mode and a second operating mode. In the first operating mode, the controller may set the flat panel display to utilize a first frame rate and a first inversion mode to save power. In the second operating mode, the controller may set the flat panel display to utilize a second frame rate, a second inversion mode, and black frame insertion to improve image quality. The second frame rate may be faster than the first frame rate. The second inversion mode and black frame insertion may be mutually configured to maintain a DC balanced operation of the flat panel display.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: July 29, 2014
    Assignee: Intel Corporation
    Inventors: Akihiro Takagi, Cheng-Shih Chin, Yanli Zhang, Maximino Vasquez
  • Publication number: 20140194158
    Abstract: A method for intelligent antenna configuration selection of a communication apparatus including an antenna module including a plurality of antennas and a plurality of radio modules sharing the antenna module includes individually determining a preferred antenna configuration of the antenna module by each radio module; determining an optimum antenna configuration according to the preferred antenna configurations; and controlling a configuration of the antennas based on the optimum antenna configuration. The optimum antenna configuration is determined for a radio module having a highest priority among the radio modules to have an optimum radio communication performance.
    Type: Application
    Filed: January 6, 2014
    Publication date: July 10, 2014
    Applicant: HTC Corporation
    Inventors: Win-Chyi GONG, Haw-Wei SHU, Hsing-Yu LUNG, Yuan-Hao LAN, Kuo-Hsing HUNG, Chien-Jen HUANG, Wei-Cheng SHIH
  • Publication number: 20140141611
    Abstract: A Ultra-Violet (UV) treatment is performed on an exposed surface of a low-k dielectric layer and an exposed surface of a metal line. After the UV treatment, an organo-metallic soak process is performed on the exposed surface of the low-k dielectric layer and the exposed surface of the metal line. The organo-metallic soak process is performed using a process gas including a metal bonded to an organic group.
    Type: Application
    Filed: November 16, 2012
    Publication date: May 22, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Cheng Chou, Mei-Ling Chen, Hui-Chun Yang, Po-Cheng Shih, Joung-Wei Liou, Shwang-Ming Jeng
  • Publication number: 20140124667
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Application
    Filed: January 17, 2014
    Publication date: May 8, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • Patent number: 8699213
    Abstract: An electronic device with supporting stands includes an input/output module, two stands and a limiter. The two stands are obliquely disposed on the back side of the input/output module. The stands are limited by the limiter to move synchronously. At the same time, the limiter has two slots penetrated by the stands to limit moving range for the stands. Then the stands are controlled to swing with an angle and finally the visual angle of the input/output module is varied in suitable range.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: April 15, 2014
    Assignee: ASUSTeK Computer Inc.
    Inventors: Wean-Fong Loi, Hung-Hsiang Chen, Chia-cheng Shih, Alec Wong, Hsien-Chih Wu, Chiu-Lang Huang
  • Publication number: 20140078695
    Abstract: A USB socket is disposed on a casing for connecting to a USB plug. The USB socket includes a piercing structure, a substrate and a plurality of terminals. The piercing structure is formed on a surface of the casing, and a main board is disposed inside the casing. An internal wall of the piercing structure can buckle the USB plug when the USB plug inserts into the piercing structure. The substrate is disposed on the main board and located inside the piercing structure. An integrated circuit is disposed on the substrate. The plurality of terminals is disposed on the substrate and coupled to the integrated circuit. The USB plug is electrically connected to the substrate and the terminals when the USB plug inserts into the piercing structure.
    Type: Application
    Filed: December 24, 2012
    Publication date: March 20, 2014
    Applicant: WISTRON CORPORATION
    Inventors: Chia-Cheng Shih, Kuo-Pao Sun
  • Patent number: 8647282
    Abstract: The invention discloses an apparatus and method for measuring a blood pressure. In particular, the method and apparatus according to the invention are capable of eliminating motion artifacts induced by, for example, talking, irregular breathing, frequent swallowing, coughing, shaking, and so on motions of a subject. The method and apparatus according to the invention utilizes a set of fuzzy logic rules and a curve-fitting way to eliminate the motion artifacts.
    Type: Grant
    Filed: July 7, 2010
    Date of Patent: February 11, 2014
    Assignee: Quanta Computer Inc.
    Inventors: Yi-Cheng Shih, Shih-Chieh Yen
  • Patent number: 8633439
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: January 21, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • Publication number: 20130275599
    Abstract: An approach is provided for reassigning and sharing loads to peers with a same identity, which is based on a threshold. The peers are configured to store indexes of a key and to share the same loading (i.e., indexes) of the key to the peers with same secondary identities in different zones. The secondary identity is derived and has a modulo relationship with a first identity of the peer. The threshold indicates maximum number of indexes stored in each peer. Therefore, the loading are distributed evenly to peers in different zones, which achieves load balance to a decentralized structured peer-to-peer network.
    Type: Application
    Filed: May 10, 2013
    Publication date: October 17, 2013
    Inventors: Chung-Yuan HSU, Kuochen WANG, Hung-Cheng SHIH
  • Patent number: 8556822
    Abstract: A blood pressure measuring device disclosed in the present invention comprises a base, a reel-type cuff and at least one stopper. The reel-type cuff is elastically and recoverably reeled in the base with one end, and is freely extended out from the base with the other end. The stopper, after being operated, can limit at least one determined length that the reel-type cuff is extended out from the base.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: October 15, 2013
    Assignee: Quanta Computer Inc.
    Inventors: Yi-Cheng Shih, Feng-Chi Liu, Yi-Chin Tsai
  • Publication number: 20130263900
    Abstract: A semiconductor apparatus includes a first tank configured to accommodate a first fluid. A second tank is configured to receive overflow of the first fluid into an upper portion of the second tank and to accommodate a second fluid. A cycling system including a first conduit is configured between the first tank and the second tank. The first conduit has an end substantially below a surface of the second fluid. A fluid providing system including a second conduit is fluidly coupled to the second tank and configured to provide the second fluid into the second tank. The second conduit has an end substantially below the surface of the second fluid. An overflow system is coupled to the second tank and configured to remove an upper portion of the second fluid when the surface of the second fluid is substantially equal to or higher than a pre-determined level.
    Type: Application
    Filed: June 6, 2013
    Publication date: October 10, 2013
    Inventors: Kuang-Nian Tang, Yang- Kai Fan, Yu-Sheng Su, Ming-Tsao Chiang, Yu-Cheng Shih
  • Publication number: 20130256888
    Abstract: A interconnect structure includes a first etch stop layer over a substrate, a dielectric layer over the first etch stop layer, a conductor in the dielectric layer, and a second etch stop layer over the dielectric layer. The dielectric layer contains carbon and has a top portion and a bottom potion. A difference of C content in the top portion and the bottom potion is less than 2 at %. An oxygen content in a surface of the conductor is less than about 1 at %.
    Type: Application
    Filed: May 18, 2012
    Publication date: October 3, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Cheng SHIH, Hui-Chun YANG, Chih-Hung SUN, Joung-Wei LIOU
  • Publication number: 20130256903
    Abstract: A interconnect structure includes a conductive layer formed in a dielectric layer. An adhesion layer is formed between the dielectric layer and a substrate. The adhesion layer has a carbon content ratio greater than a carbon content ratio of the dielectric layer.
    Type: Application
    Filed: April 30, 2012
    Publication date: October 3, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Cheng SHIH, Yu-Yun PENG, Chia Cheng CHOU, Joung-Wei LIOU
  • Patent number: 8470708
    Abstract: A method of lithography patterning includes forming a mask layer on a material layer and forming a capping layer on the mask layer. The capping layer is a boron-containing layer with a higher resistance to an etching reaction of patterning process of the material layer. By adapting the boron-containing layer as the capping layer, the thickness of the mask layer can be thus reduced. Hence, a better gap filling for forming an interconnect metallization in the material layer could be achieved as well.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: June 25, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Cheng Shih, Kuan-Chen Wang, Chung-Chi Ko, Keng-Chu Lin, Tai-Yen Peng, Wen-Kuo Hsieh, Chih-Hao Chen
  • Patent number: 8460478
    Abstract: A semiconductor apparatus includes a first tank configured to accommodate a first fluid. A second tank is configured to receive overflow of the first fluid into an upper portion of the second tank and to accommodate a second fluid. A cycling system including a first conduit is configured between the first tank and the second tank. The first conduit has an end substantially below a surface of the second fluid. A fluid providing system including a second conduit is fluidly coupled to the second tank and configured to provide the second fluid into the second tank. The second conduit has an end substantially below the surface of the second fluid. An overflow system is coupled to the second tank and configured to remove an upper portion of the second fluid when the surface of the second fluid is substantially equal to or higher than a pre-determined level.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: June 11, 2013
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kuang-Nian Tang, Yang-Kai Fan, Yu-Sheng Su, Ming-Tsao Chiang, Yu-Cheng Shih
  • Patent number: 8443086
    Abstract: An approach is provided for reassigning and sharing loads to peers with a same identity, which is based on a threshold. The peers are configured to store indexes of a key and to share the same loading (i.e., indexes) of the key to the peers with same secondary identities in different zones. The secondary identity is derived and has a modulo relationship with a first identity of the peer. The threshold indicates maximum number of indexes stored in each peer. Therefore, the loading are distributed evenly to peers in different zones, which achieves load balance to a decentralized structured peer-to-peer network.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: May 14, 2013
    Assignee: National Chiao Tung University
    Inventors: Chung-Yuan Hsu, Kuochen Wang, Hung-Cheng Shih
  • Publication number: 20130113694
    Abstract: In some embodiments, a display device may include a flat panel display a controller coupled to the flat panel display. The controller may be configured to determine an operating mode for the flat panel display among a plurality of operating modes including at least a first operating mode and a second operating mode. In the first operating mode, the controller may set the flat panel display to utilize a first frame rate and a first inversion mode to save power. In the second operating mode, the controller may set the flat panel display to utilize a second frame rate, a second inversion mode, and black frame insertion to improve image quality. The second frame rate may be faster than the first frame rate. The second inversion mode and black frame insertion may be mutually configured to maintain a DC balanced operation of the flat panel display. Other embodiments are disclosed and claimed.
    Type: Application
    Filed: December 28, 2012
    Publication date: May 9, 2013
    Inventors: Akihiro Takagi, Cheng-Shih Chin, Yanli Zhang, Maximino Vasquez
  • Publication number: 20130052818
    Abstract: A method includes forming a hard mask over a low-k dielectric layer, and patterning the hard mask to form an opening. A stress tuning layer is formed over the low-k dielectric layer and in physical contact with the hard mask. The stress tuning layer has an inherent stress, wherein the inherent stress is a near-zero stress or a tensile stress. The low-k dielectric layer is etched to form a trench aligned to the opening, wherein the step of etching is performed using the hard mask as an etching mask.
    Type: Application
    Filed: August 29, 2011
    Publication date: February 28, 2013
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Cheng Shih, Chung-Chi Ko, Keng-Chu Lin