Patents by Inventor Cheng T. Horng

Cheng T. Horng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030133232
    Abstract: A method for forming an NiCr seed layer based bottom spin valve sensor element having a synthetic antiferromagnet pinned (SyAP) layer and a capping layer comprising either a single specularly reflecting nano-oxide layer (NOL) or a bi-layer comprising a non-metallic layer and a specularly reflecting nano-oxide layer and the sensor element so formed. The method of producing these sensor elements provides elements having higher GMR ratios and lower resistances than elements of the prior art.
    Type: Application
    Filed: January 16, 2002
    Publication date: July 17, 2003
    Applicant: Headway Technologies, Inc.
    Inventors: Min Li, Simon H. Liao, Masashi Sano, Kiyoshi Noguchi, Kochan Ju, Cheng T. Horng
  • Patent number: 6590751
    Abstract: A method for forming an anisotropic magnetoresistive (MR) sensor element, and the anisotropic magnetoresistive (MR) sensor element formed in accord with the method. In accord with the method, there is first provided a substrate. There is then formed over the substrate a seed layer formed of a magnetoresistive (MR) resistivity sensitivity enhancing material selected from the group consisting or nickel-chromium alloys and nickel-iron-chromium alloys. There is then formed over the seed layer a nickel oxide material layer. Finally, there is then formed over the nickel oxide material layer a magnetoresistive (MR) layer. The method contemplates the anisotropic magnetoresistive (MR) sensor element formed in accord with the method. The nickel oxide material layer provides the anisotropic magnetoresistive (MR) sensor element with an enhanced magnetoresistive (MR) resistivity sensitivity.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: July 8, 2003
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Rongfu Xiao, Ru-Ying Tong, Jei-Wei Chang, Kochan Ju, Simon H. Liao
  • Patent number: 6581272
    Abstract: A method for forming a bottom spin valve sensor having a synthetic antiferromagnetic pinned (SyAP) layer, antiferromagnetically coupled to a pinning layer, in which one of the layers of the SyAP is formed as a three layer lamination that contains a specularly reflecting oxide layer of FeTaO. The sensor formed according to this method has an extremely high GMR ratio and exhibits good pinning strength.
    Type: Grant
    Filed: January 4, 2002
    Date of Patent: June 24, 2003
    Assignee: Headway Technologies, Inc.
    Inventors: Min Li, Simon H. Liao, Masashi Sano, Kiyoshi Noguchi, Kochan Ju, Cheng T. Horng
  • Publication number: 20030099771
    Abstract: A high performance specular free layer bottom spin valve is disclosed. This structure made up the following layers: NiCr/MnPt/CoFe/Ru/CoFe/Cu/free layer/Cu/Ta or TaO/Al2O3. A key feature is that the free layer is made of a very thin CoFe/NiFe composite layer. Experimental data confirming the effectiveness of this structure is provided, together with a method for manufacturing it and, additionally, its longitudinal bias leads.
    Type: Application
    Filed: November 12, 2002
    Publication date: May 29, 2003
    Applicant: HEADWAY TECHNOLOGIES, INC.
    Inventors: Cheng T. Horng, Mao-Min Chen, Min Li, Ru-Ying Tong
  • Publication number: 20030096057
    Abstract: A high performance specular free layer bottom spin valve is disclosed. This structure made up the following layers: NiCr/MnPt/CoFe/Ru/CoFe/Cu/free layer/Cu/Ta or TaO/Al2O3. A key feature is that the free layer is made of a very thin CoFe/NiFe composite layer. Experimental data confirming the effectiveness of this structure is provided, together with a method for manufacturing it and, additionally, its longitudinal bias leads.
    Type: Application
    Filed: November 12, 2002
    Publication date: May 22, 2003
    Applicant: HEADWAY TECHNOLOGIES, INC.
    Inventors: Cheng T. Horng, Mao-Min Chen, Min Li, Ru-Ying Tong
  • Publication number: 20030095363
    Abstract: A high performance specular free layer bottom spin valve is disclosed. This structure made up the following layers: NiCr/MnPt/CoFe/Ru/CoFe/Cu/free layer/Cu/Ta or TaO/Al2O3. A key feature is that the free layer is made of a very thin CoFe/NiFe composite layer. Experimental data confirming the effectiveness of this structure is provided, together with a method for manufacturing it and, additionally, its longitudinal bias leads.
    Type: Application
    Filed: November 12, 2002
    Publication date: May 22, 2003
    Applicant: HEADWAY TECHNOLOGIES, INC.
    Inventors: Cheng T. Horng, Mao-Min Chen, Min Li, Ru-Ying Tong
  • Publication number: 20030053267
    Abstract: A method for forming top and bottom spin valve sensors and the sensors so formed, the sensors having a strongly coupled SyAP pinned layer and an ultra-thin antiferromagnetic pinning layer. The two strongly coupled ferromagnetic layers comprising the SyAP pinned layer in the top valve configuration are separated by a Ru spacer layer approximately 3 angstroms thick, while the two layers in the bottom spin valve configuration are separated by a Rh spacer layer approximately 5 angstroms thick. This allows the use of an ultra thin MnPt antiferromagnetic pinning layer of thickness between approximately 80 and approximately 150 angstroms. The sensor structure produced thereby is suitable for high density applications.
    Type: Application
    Filed: September 17, 2001
    Publication date: March 20, 2003
    Applicant: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Kochan Ju, Mao-Min Chen, Min Li, Ru-Ying Tong, Simon Liao
  • Publication number: 20030039079
    Abstract: As the dimensions of spin valve heads continue to be reduced, a number of difficulties are being encountered. One such is with the longitudinal bias when an external magnetic field can cause reversal of the hard magnet, thereby causing a hysteric response by the head. This coercivity reduction becomes more severe as the hard magnet becomes thinner. This problem has been overcome by inserting a decoupling layer between the antiferromagnetic layer that is used to stabilize the pinned layer of the spin valve itself and the soft ferromagnetic layer that is used for longitudinal biasing. This soft ferromagnetic layer is pinned by a second antiferromagnetic layer deposited on it on its far side away from the first antiferromagnetic layer. The presence of the decoupling layer ensures that the magnetization of the soft layer is determined only by the second antiferromagnetic layer. The inclusion of said decoupling layer allows more latitude in etch depth control during manufacturing.
    Type: Application
    Filed: August 22, 2001
    Publication date: February 27, 2003
    Applicant: Headway Technologies, Inc.
    Inventors: You Feng Zheng, Kochan Ju, Cheng T. Horng, Simon Liao, Ru Ying Tong
  • Patent number: 6522507
    Abstract: A method for fabricating a single top spin valve head that is capable of reading ultra-high density recordings. Said top spin valve has a CoFe free layer for high GMR ratio, which is grown on a NiCr/Ru layer to provide better magnetic properties and has a ferromagnetically coupled CoFe/NiCr/CoFe laminated pinned layer for thermal stability and robustness.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: February 18, 2003
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Min Li, Ru-Ying Tong
  • Patent number: 6517896
    Abstract: A high performance specular free layer bottom spin valve is disclosed. This structure made up the following layers: NiCr/MnPt/CoFe/Ru/CoFe/Cu/free layer/Cu/Ta or TaO/Al2O3. A key feature is that the free layer is made of a very thin CoFe/NiFe composite layer. Experimental data confirming the effectiveness of this structure is provided, together with a method for manufacturing it and, additionally, its longitudinal bias leads.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: February 11, 2003
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Mao-Min Chen, Min Li, Ru-Ying Tong
  • Publication number: 20020174533
    Abstract: This invention describes a spin valve based magnetic read head that is suitable for use with ultra-high recording densities along with a process for manufacturing it. This process produces a product that is free of conductor lead bridging and conductor lead fencing. A key sub-process of the present invention is the deposition of a first capping layer through DC sputtering followed by, without breaking vacuum, a lead overlay layer This is followed by deposition, also by DC sputtering, of a second capping layer which is patterned so that it becomes a hard mask. Then, using this hard mask, the lead overlay layer is removed from the center of the structure by means of ion beam etching. Hard bias and conductor lead layers are then formed inside parallel trenches without the use of liftoff processes.
    Type: Application
    Filed: December 26, 2000
    Publication date: November 28, 2002
    Applicant: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Ru-Ying Tong, Kochan Ju
  • Publication number: 20020154458
    Abstract: A method for forming a top spin-valve SyAP GMR read sensor having a novel conductive lead overlay configuration and the sensor so formed. The lead overlay electrically contacts the sensor at a position within the SyAP pinned layer, thus simultaneously assuring improved electrical contact and destroying the GMR properties of the sensor at the junction to improve the definition of the sensor track width.
    Type: Application
    Filed: September 17, 2001
    Publication date: October 24, 2002
    Applicant: Headway Technologies, Inc.
    Inventors: Charles C. Lin, Cheng T. Horng, Min Li, Kochan Ju
  • Patent number: 6466418
    Abstract: A method for forming a specularly reflecting bottom spin valve magnetoresistive (SVMR) sensor element with continuous spacer exchange hard bias and a specularly reflecting bottom spin valve magnetoresistive (SVMR) sensor element fabricated according to that method. To practice the method, there is provided a substrate upon which is formed a seed layer, upon which is formed an antiferromagnetic pinning layer, upon which is formed a ferromagnetic pinned layer, upon which is formed a non-magnetic spacer layer, upon which is formed a ferromagnetic free layer, upon which is formed a specularly reflecting and capping layer. The width of the sensor element is defined by a pair of conducting leads aligned upon a pair of continuous spacer exchange hard bias layers.
    Type: Grant
    Filed: February 11, 2000
    Date of Patent: October 15, 2002
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Min Li, Simon H. Liao, Ru-Ying Tong, Chyu Jiuh Torng, Rongfu Xiao
  • Patent number: 6430015
    Abstract: A longitudinally magnetically biased dual stripe magnetoresistive (DSMR) sensor element comprises a first patterned magnetoresistive (MR) layer. There are contacts at the opposite ends of the patterned magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer, each of the stacks including a first Anti-Ferro-Magnetic (AFM) layer and a first lead layer. With the first MR layer in place the device was annealed in the presence of a longitudinal external magnetic field. A second patterned magnetoresistive (MR) layer was formed above the previous structure. There are contacts at the opposite ends of the second patterned magnetoresistive (MR) layer with a second pair of stacks defining a second track width of the second patterned magnetoresistive (MR) layer.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: August 6, 2002
    Assignee: Headway Technologies, Inc.
    Inventors: Kochan Ju, Mao-Min Chen, Cheng T. Horng, Jei-Wei Chang
  • Patent number: 6396671
    Abstract: A spin valve structure, and method for manufacturing it, are described. The valve is subject to only small bias point shifts by sense current fields while at the same time has good GMR characteristics. This is achieved by introducing a layer of about 15 Angstroms of ruthenium between the seed layer and the free layer. This acts as an effective bias control layer with the added benefit of providing interfaces (to both the seed and the free layer) that are highly favorable to specular reflection of the conduction electrons. The HCP crystal structure of this ruthenium layer also improves the crystalline quality of the free layer thereby improving its performance with respect to the GMR ratio.
    Type: Grant
    Filed: March 15, 2000
    Date of Patent: May 28, 2002
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Mao-Min Chen, Kochan Ju, Min Li, Simon H. Liao, Ku-Ying Tong
  • Patent number: 6392853
    Abstract: The giant magnetoresistance (GMR) effect includes a contribution that is due to anisotropic magnetoresistance (AMR). Unfortunately the AMR effect tends to degrade the peak-to-peak signal asymmetry. Additionally, a high AMR/GMR ratio causes a larger signal asymmetry variation. It is therefor desirable to reduce both the AMR contribution as well as the AMR/GMR ratio. This has been achieved by modifying the free layer through the insertion of an extra layer of a highly resistive or insulating material at approximately mid thickness level. This layer is from 3 to 15 Angstroms thick and serves to reduce the Anisotropic Magneto-resistance contribution to the total magneto-resistance of the device. This reduces the GMR contribution only slightly but cuts the AMR/GMR ratio in half, thereby improving cross-track asymmetry and signal linearity.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: May 21, 2002
    Assignee: Headway Technologies, Inc.
    Inventors: Min Li, Simon H. Liao, Cheng T. Horng, Youfeng Zheng, Ru-Ying Tong, Kochan Ju
  • Patent number: 6388847
    Abstract: A specular spin valve structure that is more robust than currently available specular spin valves is described. The improved stability is achieved by a using a modified pinned layer that is a laminate of three layers—a layer nickel-chromium, between about 3 and 4 Angstroms thick, sandwiched between two layers of cobalt-iron. A key requirement is that the cobalt-iron layer closest to the copper separation layer must be about twice as thick as the other cobalt-iron layer. A process for manufacturing this structure is also disclosed.
    Type: Grant
    Filed: February 1, 2000
    Date of Patent: May 14, 2002
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Min Li, Ru-Ying Tong, Rong-Fu Xiao
  • Publication number: 20010040782
    Abstract: A method for forming a longitudinally magnetically biased dual stripe magnetoresistive (DSMR) sensor element comprises forming a first patterned magnetoresistive (MR) layer. Contact the opposite ends of the patterned magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer, each of the stacks including a first Anti-Ferro-Magnetic (AFM) layer and a first lead layer. Then anneal the device in the presence of a longitudinal external magnetic field. Next, form a second patterned magnetoresistive (MR) layer above the previous structure. Contact the opposite ends of the second patterned magnetoresistive (MR) layer with a second pair of stacks defining a second track width of the second patterned magnetoresistive (MR) layer. Each of the second pair of stacks includes spacer layer composed of a metal, a Ferro-Magnetic (FM) layer, a second Anti-Ferro-Magnetic (AFM) layer and a second lead layer.
    Type: Application
    Filed: February 2, 2001
    Publication date: November 15, 2001
    Applicant: HEADWAY TECHNOLOGIES, INC.
    Inventors: Kochan Ju, Mao-Min Chen, Cheng T. Horng, Jei-Wei Chang
  • Patent number: 6307721
    Abstract: A magnetoresistive (MR) sensor element and a method for fabricating the magnetoresistive (MR) sensor element. There is first provided a substrate. There is then formed over the substrate a first shield layer. There is then formed upon the first shield layer a first dielectric spacer layer. There is then formed upon the first dielectric spacer layer a patterned magnetoresistive (MR) layer. There is then formed adjacent to and electrically communicating with a pair of opposite ends of the patterned magnetoresistive (MR) layer a pair of patterned conductor lead layers to define a trackwidth of the patterned magnetoresistive (MR) layer. There is then formed upon the pair of patterned conductor lead layers and upon the patterned magnetoresistive (MR) layer at the trackwidth of the patterned magnetoresistive (MR) layer a blanket second dielectric spacer layer.
    Type: Grant
    Filed: September 4, 1998
    Date of Patent: October 23, 2001
    Assignee: Headway Technologies, Inc.
    Inventors: Mao-Min Chen, Cherng-Chyi Han, Cheng T. Horng
  • Patent number: 6292336
    Abstract: A method for forming a giant magnetoresistive (GMR) sensor element, and a giant magnetoresistive (GMR) sensor element formed in accord with the method. In accord with the method, there is first provided a substrate. There is then formed over the substrate a seed layer formed of a magnetoresistive (MR) resistivity sensitivity enhancing material selected from the group consisting or nickel-chromium alloys and nickel-iron-chromium alloys. There is then formed over the seed layer a nickel oxide material layer. Finally, there is then formed over the nickel oxide material layer a free ferromagnetic layer separated from a pinned ferromagnetic layer in turn formed thereover by a non-magnetic conductor spacer layer, where the pinned ferromagnetic layer in turn has a pinning material layer formed thereover. The method contemplates a giant magnetoresistive (GMR) sensor element formed in accord with the method.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: September 18, 2001
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Ru-Ying Tong, Kochan Ju, Mao-Min Chen, Jei-Wei Chang, Simon H. Liao