Patents by Inventor Cheng-Tsung WU

Cheng-Tsung WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220368151
    Abstract: An under-floor charging station can be mounted under a floor such that a top plate of the under-floor charging station is substantially flush with a top surface of the floor without touching the ground. Openings in the top plate allow charging elements to extend when in use to charge a mobile robot, and to retract under the floor when not in use. The retractable charging elements prevent tripping hazards and allow the mobile robot to move freely throughout a clean room. Moreover, because the charging elements can be retracted in an unobtrusive position when the under-floor charging station is not in use, the under-floor charging station is permitted to be positioned in locations in the clean room that allow the mobile robot to continue working while charging and/or allow non-stop running of the mobile robot.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 17, 2022
    Inventors: Cheng-Lung WU, Sing-Tsung LI, Ren-Hau WU, Yang-Ann CHU, Jiun-Rong PAI, Feng-Kuang WU
  • Patent number: 11494926
    Abstract: A method for performing hybrid depth detection with aid of an adaptive projector and associated apparatus are provided. The method includes: utilizing an image processing circuit to obtain distance information; utilizing the image processing circuit to determine a distance range according to the distance information; utilizing the image processing circuit to perform projection type selection to determine at least one selected projection type corresponding to the distance range among multiple predetermined projection types; utilizing the adaptive projector to perform projection of the at least one selected projection type to capture at least one corresponding image with a camera, and utilizing the image processing circuit to perform depth detection according to corresponding image to generate depth map; and utilizing the image processing circuit to selectively output the depth map as resultant depth map or perform depth data combination to generate combined depth map as resultant depth map.
    Type: Grant
    Filed: July 1, 2021
    Date of Patent: November 8, 2022
    Assignees: HIMAX TECHNOLOGIES LIMITED, LIQXTAL TECHNOLOGY INC.
    Inventors: Biing-Seng Wu, Pen-Hsin Chen, Ching-Wen Wang, Cheng-Che Tsai, Hung-Shan Chen, Yi Hung, Ming-Syuan Chen, Hsueh-Tsung Lu, Wu-Feng Chen
  • Publication number: 20220320289
    Abstract: High-voltage semiconductor device and method of forming the same, the high-voltage semiconductor device includes a substrate, a gate structure, a drain, a first insulating structure and a drain doped region. The gate structure is disposed on the substrate. The drain is disposed in the substrate, at one side of the gate structure. The first insulating structure is disposed on the substrate, under the gate structure to partially overlap with the gate structure. The drain doped region is disposed in the substrate, under the drain and the first insulating structure, and the drain doped region includes a discontinuous bottom surface.
    Type: Application
    Filed: June 22, 2022
    Publication date: October 6, 2022
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Wen-Hsin Lin, Shin-Chen Lin, Yu-Hao Ho, Cheng-Tsung Wu, Chiu-Hao Chen
  • Patent number: 11446727
    Abstract: A low-gloss metal plate includes a metal body and a plurality of metal pattern units. The metal body has a first surface and a second surface opposite to each other. The plurality of metal pattern units protrude from the first surface and are arranged to form a regular pattern. One of the plurality of metal pattern units has a top, a base and a sidewall. The base at least partially overlaps with the first surface. The sidewall connects the top with the base and forms an angle less than 60° with the base.
    Type: Grant
    Filed: July 9, 2021
    Date of Patent: September 20, 2022
    Assignee: Qisda Corporation
    Inventors: Ying-Tsung Tsai, Cheng-Sheng Wu, Han-Kuang Ho
  • Patent number: 11437843
    Abstract: An under-floor charging station can be mounted under a floor such that a top plate of the under-floor charging station is substantially flush with a top surface of the floor without touching the ground. Openings in the top plate allow charging elements to extend when in use to charge a mobile robot, and to retract under the floor when not in use. The retractable charging elements prevent tripping hazards and allow the mobile robot to move freely throughout a clean room. Moreover, because the charging elements can be retracted in an unobtrusive position when the under-floor charging station is not in use, the under-floor charging station is permitted to be positioned in locations in the clean room that allow the mobile robot to continue working while charging and/or allow non-stop running of the mobile robot.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: September 6, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Lung Wu, Sing-Tsung Li, Ren-Hau Wu, Yang-Ann Chu, Jiun-Rong Pai, Feng-Kuang Wu
  • Publication number: 20220250135
    Abstract: A low-gloss metal plate includes a metal body and a plurality of metal pattern units. The metal body has a first surface and a second surface opposite to each other. The plurality of metal pattern units protrude from the first surface and are arranged to form a regular pattern. One of the plurality of metal pattern units has a top, a base and a sidewall. The base at least partially overlaps with the first surface. The sidewall connects the top with the base and forms an angle less than 60° with the base.
    Type: Application
    Filed: July 9, 2021
    Publication date: August 11, 2022
    Applicant: Qisda Corporation
    Inventors: Ying-Tsung TSAI, Cheng-Sheng WU, Han-Kuang HO
  • Patent number: 11398552
    Abstract: High-voltage semiconductor device and method of forming the same, the high-voltage semiconductor device includes a substrate, a gate structure, a drain, a first insulating structure and a drain doped region. The gate structure is disposed on the substrate. The drain is disposed in the substrate, at one side of the gate structure. The first insulating structure is disposed on the substrate, under the gate structure to partially overlap with the gate structure. The drain doped region is disposed in the substrate, under the drain and the first insulating structure, and the drain doped region includes a discontinuous bottom surface.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: July 26, 2022
    Assignee: Vanguard International Semiconductor Corporation
    Inventors: Wen-Hsin Lin, Shin-Chen Lin, Yu-Hao Ho, Cheng-Tsung Wu, Chiu-Hao Chen
  • Publication number: 20220069081
    Abstract: High-voltage semiconductor device and method of forming the same, the high-voltage semiconductor device includes a substrate, a gate structure, a drain, a first insulating structure and a drain doped region. The gate structure is disposed on the substrate. The drain is disposed in the substrate, at one side of the gate structure. The first insulating structure is disposed on the substrate, under the gate structure to partially overlap with the gate structure. The drain doped region is disposed in the substrate, under the drain and the first insulating structure, and the drain doped region includes a discontinuous bottom surface.
    Type: Application
    Filed: August 26, 2020
    Publication date: March 3, 2022
    Inventors: Wen-Hsin Lin, Shin-Chen Lin, Yu-Hao Ho, Cheng-Tsung Wu, Chiu-Hao Chen
  • Publication number: 20210397339
    Abstract: An example non-transitory computer-readable storage medium comprises instructions that, when executed by a processing resource of a computing device, cause the processing resource to present an interface of an application on a first display of the computing device. The instructions further cause the processing resource to, in response to receiving a selection of a boundary that defines a portion of the interface, present the portion on a second display of the computing device.
    Type: Application
    Filed: March 13, 2019
    Publication date: December 23, 2021
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Ron Yiran Zhang, Lu-Yen Lai, Wei-Yu Lin, Dhruv Jain, Cheng-Tsung Wu, Yannick Quentin Pivot
  • Publication number: 20210397399
    Abstract: An example non-transitory computer-readable storage medium comprises instructions that, when executed by a processing resource of a computing device, cause the processing resource to determine a portion of an interface moved from a first display to a second display. The instructions further cause the processing resource to compare the portion of the interface moved from the first display to the second display to a threshold. The instructions further cause the processing resource to move the interface automatically from the first display to the second display responsive to a determination that the portion of the interface moved to the second display exceeds the threshold.
    Type: Application
    Filed: March 12, 2019
    Publication date: December 23, 2021
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Ron Yirang Zhang, Lu-Yen Lai, Wei-Yu Lin, Dhruv Jain, Cheng-Tsung Wu
  • Patent number: 11132068
    Abstract: An information display method for a computer having a keyboard. The method includes selecting a first system information among a plurality of system information, wherein the system information is configured to respectively indicate statuses of a plurality of devices of the computer; selecting a first display pattern among a plurality of display patterns according to the first system information; selecting a first keyboard region for applying the first display pattern; and showing the first system information in real-time by a plurality of first buttons corresponding to the first keyboard region of the keyboard according to the selected first display pattern, the first keyboard region and the first system information.
    Type: Grant
    Filed: February 15, 2020
    Date of Patent: September 28, 2021
    Assignee: Acer Incorporated
    Inventors: Yu-Chuan Cheng, Ling-Fan Tsao, Cheng-Tsung Wu
  • Patent number: 10867787
    Abstract: A plasma processing system and a method for controlling a plasma in semiconductor fabrication are provided. The system includes a remote plasma module configured to generate a plasma. The system further includes a compound mixing member configured to receive the plasma. The system also includes a processing chamber configured to receive the plasma from the compound mixing member for processing. In addition, the system includes a detection module configured to monitor the plasma in the compound mixing member.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: December 15, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Cheng-Tsung Wu, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Hsiang-Sheng Kung
  • Patent number: 10790365
    Abstract: An LDMOS includes a body region disposed in the substrate and having a first conductivity type; a drift region disposed in the substrate and having a second conductivity type; a source region disposed in the body region and having the second conductivity type; a drain region disposed in the drift region and having the second conductivity type; an isolation region disposed in the drift region between the source region and the drain region; a gate disposed on the body region and the drift region; a source field plate electrically connected to the source region; a drain field plate electrically connected to the drain region; and a first gate plate electrically connected to the gate. The first gate plate is correspondingly disposed above the gate. The shapes of the first gate plate and the gate are substantially the same when viewed from a top view.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: September 29, 2020
    Assignee: Vanguard International Semiconductor Corporation
    Inventors: Wen-Hsin Lin, Yu-Hao Ho, Shin-Cheng Lin, Cheng-Tsung Wu
  • Patent number: 10724140
    Abstract: A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: July 28, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Chan Lo, Yi-Fang Lai, Po-Hsiung Leu, Ding-I Liu, Si-Wen Liao, Kai-Shiung Hsu, Jheng-Uei Hsieh, Shian-Huei Lin, Jui-Fu Hsu, Cheng-Tsung Wu
  • Publication number: 20200227342
    Abstract: A semiconductor structure including a substrate, a first well, a field oxide layer, a first conductive line and a second conductive line is provided. The substrate has a first conductivity type. The first well is formed on the substrate and has a second conductivity type. The field oxide layer is disposed on the first well. The first conductive line is formed on the field oxide layer and is in direct contact with the field oxide layer. The second conductive line is formed on the field oxide layer and is in direct contact with the field oxide layer. The first conductive line is spaced apart from the second conductive line.
    Type: Application
    Filed: January 15, 2019
    Publication date: July 16, 2020
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Cheng-Tsung WU, Shin-Cheng LIN, Hsiao-Ling CHIANG, Wen-Hsin LIN
  • Patent number: 10714410
    Abstract: A semiconductor structure including a substrate, a first well, a field oxide layer, a first conductive line and a second conductive line is provided. The substrate has a first conductivity type. The first well is formed on the substrate and has a second conductivity type. The field oxide layer is disposed on the first well. The first conductive line is formed on the field oxide layer and is in direct contact with the field oxide layer. The second conductive line is formed on the field oxide layer and is in direct contact with the field oxide layer. The first conductive line is spaced apart from the second conductive line.
    Type: Grant
    Filed: January 15, 2019
    Date of Patent: July 14, 2020
    Assignee: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
    Inventors: Cheng-Tsung Wu, Shin-Cheng Lin, Hsiao-Ling Chiang, Wen-Hsin Lin
  • Patent number: 10692786
    Abstract: A semiconductor structure includes a substrate, a first insulating layer, a second insulating layer, a first seal ring structure, a second seal ring structure, and a passivation layer. The substrate has a chip region and a seal ring region. The first insulating layer is on the substrate. The second insulating layer is on the first insulating layer. The first seal ring structure is in the seal ring region and embedded in the first insulating layer and the second insulating layer, wherein the first seal ring structure includes a stack of metal layers. The second seal ring structure is in the seal ring region and embedded in the first insulating layer, wherein the second seal ring structure includes a polysilicon ring structure. The passivation layer is on the second insulating layer and the first seal ring structure.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: June 23, 2020
    Assignee: Vanguard International Semiconductor Corporation
    Inventors: Ting-You Lin, Chi-Li Tu, Shin-Cheng Lin, Yu-Hao Ho, Cheng-Tsung Wu
  • Publication number: 20200183501
    Abstract: An information display method for a computer having a keyboard. The method includes selecting a first system information among a plurality of system information, wherein the system information is configured to respectively indicate statuses of a plurality of devices of the computer; selecting a first display pattern among a plurality of display patterns according to the first system information; selecting a first keyboard region for applying the first display pattern; and showing the first system information in real-time by a plurality of first buttons corresponding to the first keyboard region of the keyboard according to the selected first display pattern, the first keyboard region and the first system information.
    Type: Application
    Filed: February 15, 2020
    Publication date: June 11, 2020
    Applicant: Acer Incorporated
    Inventors: Yu-Chuan Cheng, Ling-Fan Tsao, Cheng-Tsung Wu
  • Patent number: 10606369
    Abstract: An information display method for a computer having a keyboard. The method includes selecting a first system information among a plurality of system information, wherein the system information is configured to respectively indicate statuses of a plurality of devices of the computer; selecting a first display pattern among a plurality of display patterns according to the first system information; selecting a first keyboard region for applying the first display pattern; and showing the first system information in real-time by a plurality of first buttons corresponding to the first keyboard region of the keyboard according to the selected first display pattern, the first keyboard region and the first system information.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: March 31, 2020
    Assignee: Acer Incorporated
    Inventors: Yu-Chuan Cheng, Ling-Fan Tsao, Cheng-Tsung Wu
  • Publication number: 20190378714
    Abstract: A plasma processing system and a method for controlling a plasma in semiconductor fabrication are provided. The system includes a remote plasma module configured to generate a plasma. The system further includes a compound mixing member configured to receive the plasma. The system also includes a processing chamber configured to receive the plasma from the compound mixing member for processing. In addition, the system includes a detection module configured to monitor the plasma in the compound mixing member.
    Type: Application
    Filed: August 22, 2019
    Publication date: December 12, 2019
    Inventors: Cheng-Tsung WU, Po-Hsiung LEU, Ding-I LIU, Si-Wen LIAO, Hsiang-Sheng KUNG