Patents by Inventor Cheng-Wei Tsai

Cheng-Wei Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11574436
    Abstract: The disclosure provides a mixed rendering system and a mixed rendering method. The mixed rendering system includes a client device configured to perform: determining at least one user-interactable object of a virtual environment; rendering the at least one user-interactable object; receiving a background scene frame of the virtual environment; blending the at least one rendered user-interactable object with the background scene frame as a visual content of the virtual environment; and providing the visual content of the virtual environment.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: February 7, 2023
    Assignee: HTC Corporation
    Inventors: Jung-Sen Yang, Jing-Lung Wu, Cheng-Wei Tsai, Jiun-Lin Chen
  • Patent number: 11498830
    Abstract: The invention provides a MEMS microphone. The MEMS microphone includes a substrate, having a first opening. A dielectric layer is disposed on the substrate, wherein the dielectric layer has a second opening aligned to the first opening. A diaphragm is disposed within the second opening of the dielectric layer, wherein a peripheral region of the diaphragm is embedded into the dielectric layer at sidewall of the second opening. A backplate layer is disposed on the dielectric layer and covering over the second opening. The backplate layer includes a plurality of acoustic holes arranged into a regular array pattern. The regular array pattern comprises a pattern unit, the pattern unit comprises one of the acoustic holes as a center hole, and peripheral holes of the acoustic holes surrounding the center hole with a same pitch to the center hole.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: November 15, 2022
    Assignee: Solid State System Co., Ltd.
    Inventors: Cheng-Wei Tsai, Tsung-Min Hsieh, Chien-Hsing Lee
  • Publication number: 20220187626
    Abstract: The present invention provides an intelligent virtual display device including a contact lens. The contact lens has a central area thereon, a micro display disposed outside the central area, a wearable reflector disposed corresponding to the micro display and configured to receive and to reflect images of the micro display, and a controller. The controller is connected with the micro display and configured to send the control signals to the micro display so as to generate the images. The contact lens is designed for being worn on a user's eyeball. When the eyeball rotates, the micro display changes its projection direction simultaneously to match the user's visual angle.
    Type: Application
    Filed: March 1, 2021
    Publication date: June 16, 2022
    Applicant: National Yang Ming Chiao Tung University
    Inventors: Mang OU-YANG, Sheng Chun HUNG, Yen Jui CHEN, Yung-Jhe YAN, Jin-Chern CHIOU, Cheng-Wei TSAI
  • Publication number: 20220127134
    Abstract: A structure of micro-electro-mechanical-system (MEMS) microphone includes a substrate, having a first opening. A dielectric layer is disposed on the substrate, wherein the dielectric layer has a second opening aligned to the first opening. A membrane is disposed within the second opening of the dielectric layer. A peripheral region of the membrane is embedded into the dielectric layer at sidewall of the second opening. A backplate layer is disposed on the dielectric layer. The backplate layer includes a protection layer, having a peripheral region disposed on the dielectric layer and a central region with venting holes over the second opening. The central region of the protection layer further has anti-sticky structures at a side of the protection layer toward the membrane. An electrode layer is disposed on the side of the protection layer, surrounding the anti-sticky structures.
    Type: Application
    Filed: October 27, 2020
    Publication date: April 28, 2022
    Applicant: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai
  • Patent number: 11312616
    Abstract: A structure of micro-electro-mechanical-system (MEMS) microphone includes a substrate, having a first opening. A dielectric layer is disposed on the substrate, wherein the dielectric layer has a second opening aligned to the first opening. A membrane is disposed within the second opening of the dielectric layer. A peripheral region of the membrane is embedded into the dielectric layer at sidewall of the second opening. A backplate layer is disposed on the dielectric layer. The backplate layer includes a protection layer, having a peripheral region disposed on the dielectric layer and a central region with venting holes over the second opening. The central region of the protection layer further has anti-sticky structures at a side of the protection layer toward the membrane. An electrode layer is disposed on the side of the protection layer, surrounding the anti-sticky structures.
    Type: Grant
    Filed: October 27, 2020
    Date of Patent: April 26, 2022
    Assignee: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai
  • Patent number: 11317220
    Abstract: In an embodiment, the invention provides a structure of MEMS microphone includes a substrate of semiconductor, having a first opening in the substrate. A dielectric layer is disposed on the substrate, having a dielectric opening. A diaphragm is within the dielectric opening and held by the dielectric layer at a peripheral region, wherein the diaphragm has a diaphragm opening. A back-plate is disposed on the dielectric layer, over the diaphragm. A protruding structure is disposed on the back-plate, protruding toward the diaphragm. At least one air valve plate is affixed on an end of the protruding structure within the diaphragm opening of the diaphragm. The air valve plate is activated when suffering an air flow with a pressure.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: April 26, 2022
    Assignee: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Cheng-Wei Tsai, Chien-Hsing Lee
  • Publication number: 20210390769
    Abstract: The disclosure provides a mixed rendering system and a mixed rendering method. The mixed rendering system includes a client device configured to perform: determining at least one user-interactable object of a virtual environment; rendering the at least one user-interactable object; receiving a background scene frame of the virtual environment; blending the at least one rendered user-interactable object with the background scene frame as a visual content of the virtual environment; and providing the visual content of the virtual environment.
    Type: Application
    Filed: June 9, 2021
    Publication date: December 16, 2021
    Applicant: HTC Corporation
    Inventors: Jung-Sen Yang, Jing-Lung Wu, Cheng-Wei Tsai, Jiun-Lin Chen
  • Patent number: 11172287
    Abstract: A structure of micro-electro-mechanical-system microphone includes a substrate of semiconductor, having a first opening in the substrate. A dielectric layer is disposed on the substrate, the dielectric layer has a second opening, corresponding to the first opening. A diaphragm is located within the second opening, having an embedded part held by the dielectric layer and an exposed part exposed by the second opening. The exposed part has a junction peripheral region, a buffer peripheral region and a central region. The junction region has an elastic structure with slits, the buffer peripheral region includes a plurality of holes and is disposed between the junction peripheral region and the central region. A backplate is disposed on the dielectric layer above the second opening, wherein the backplate includes venting holes distributed at a region corresponding to the central part of the diaphragm.
    Type: Grant
    Filed: November 5, 2019
    Date of Patent: November 9, 2021
    Assignee: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Cheng-Wei Tsai, Chien-Hsing Lee
  • Publication number: 20210276857
    Abstract: The invention provides a MEMS microphone. The MEMS microphone includes a substrate, having a first opening. A dielectric layer is disposed on the substrate, wherein the dielectric layer has a second opening aligned to the first opening. A diaphragm is disposed within the second opening of the dielectric layer, wherein a peripheral region of the diaphragm is embedded into the dielectric layer at sidewall of the second opening. A backplate layer is disposed on the dielectric layer and covering over the second opening. The backplate layer includes a plurality of acoustic holes arranged into a regular array pattern. The regular array pattern comprises a pattern unit, the pattern unit comprises one of the acoustic holes as a center hole, and peripheral holes of the acoustic holes surrounding the center hole with a same pitch to the center hole.
    Type: Application
    Filed: March 9, 2020
    Publication date: September 9, 2021
    Applicant: Solid State System Co., Ltd.
    Inventors: Cheng-Wei Tsai, Tsung-Min Hsieh, Chien-Hsing Lee
  • Publication number: 20210195340
    Abstract: In an embodiment, the invention provides a structure of MEMS microphone includes a substrate of semiconductor, having a first opening in the substrate. A dielectric layer is disposed on the substrate, having a dielectric opening. A diaphragm is within the dielectric opening and held by the dielectric layer at a peripheral region, wherein the diaphragm has a diaphragm opening. A back-plate is disposed on the dielectric layer, over the diaphragm. A protruding structure is disposed on the back-plate, protruding toward the diaphragm. At least one air valve plate is affixed on an end of the protruding structure within the diaphragm opening of the diaphragm. The air valve plate is activated when suffering an air flow with a pressure.
    Type: Application
    Filed: December 18, 2019
    Publication date: June 24, 2021
    Applicant: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Cheng-Wei Tsai, Chien-Hsing Lee
  • Publication number: 20210136483
    Abstract: A structure of micro-electro-mechanical-system microphone includes a substrate of semiconductor, having a first opening in the substrate. A dielectric layer is disposed on the substrate, the dielectric layer has a second opening, corresponding to the first opening. A diaphragm is located within the second opening, having an embedded part held by the dielectric layer and an exposed part exposed by the second opening. The exposed part has a junction peripheral region, a buffer peripheral region and a central region. The junction region has an elastic structure with slits, the buffer peripheral region includes a plurality of holes and is disposed between the junction peripheral region and the central region. A backplate is disposed on the dielectric layer above the second opening, wherein the backplate includes venting holes distributed at a region corresponding to the central part of the diaphragm.
    Type: Application
    Filed: November 5, 2019
    Publication date: May 6, 2021
    Applicant: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Cheng-Wei Tsai, Chien-Hsing Lee
  • Patent number: 10841710
    Abstract: A package structure of MEMS microphone is provided. The MEMS microphone includes a MEMS microphone chip disposed on a circuit board. The MEMS microphone chip comprises a first bonding pad, including a metal pad on a top of the MEMS microphone chip; and a protection layer fully enclosing a sidewall of the metal pad and also partially disposed on a top of the metal pad. A circuit chip is disposed on the circuit board, wherein the circuit chip comprises a second bonding pad. A bonding wire is connected between the first bonding pad and the second bonding pad.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: November 17, 2020
    Assignee: Solid State System Co., Ltd.
    Inventors: Chien-Hsing Lee, Tsung-Min Hsieh, Cheng-Wei Tsai
  • Patent number: 10798493
    Abstract: A Micro-Electro-Mechanical Systems (MEMS) device includes a substrate, a dielectric supporting layer, a diaphragm, a backplate. The substrate has a substrate opening corresponding to a diaphragm region. The dielectric supporting layer is disposed on the substrate, having a dielectric opening corresponding to the substrate opening to form the diaphragm region. The diaphragm within the dielectric opening is held by the dielectric supporting layer at a periphery. The backplate is disposed on the dielectric supporting layer, having a plurality of venting holes, connecting to the dielectric opening. The backplate includes a conductive layer and a passivation layer covering over the conductive layer at a first side opposite to the diaphragm, wherein a second side of the conductive layer is facing to the diaphragm and not covered by the passivation layer.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: October 6, 2020
    Assignee: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai
  • Patent number: 10390145
    Abstract: A micro electro mechanical system (MEMS) microphone includes a substrate, having a substrate opening. A supporting dielectric layer is disposed on the substrate surrounding the substrate opening. A diaphragm is supported by the supporting dielectric layer above the substrate opening, wherein the diaphragm has a bowl-like structure being convex toward the substrate opening when the diaphragm is at an operation off state. A backplate is disposed on the supporting dielectric layer over the diaphragm, wherein the backplate includes a plurality of venting holes at a region corresponding to the substrate opening.
    Type: Grant
    Filed: April 2, 2018
    Date of Patent: August 20, 2019
    Assignee: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Cheng-Wei Tsai, Chien-Hsing Lee
  • Publication number: 20190124452
    Abstract: A Micro-Electro-Mechanical Systems (MEMS) device includes a substrate, a dielectric supporting layer, a diaphragm, a backplate. The substrate has a substrate opening corresponding to a diaphragm region. The dielectric supporting layer is disposed on the substrate, having a dielectric opening corresponding to the substrate opening to form the diaphragm region. The diaphragm within the dielectric opening is held by the dielectric supporting layer at a periphery. The backplate is disposed on the dielectric supporting layer, having a plurality of venting holes, connecting to the dielectric opening. The backplate includes a conductive layer and a passivation layer covering over the conductive layer at a first side opposite to the diaphragm, wherein a second side of the conductive layer is facing to the diaphragm and not covered by the passivation layer.
    Type: Application
    Filed: December 18, 2018
    Publication date: April 25, 2019
    Applicant: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai
  • Patent number: 10250998
    Abstract: A Micro-Electro-Mechanical Systems (MEMS) device includes a substrate, a dielectric supporting layer, a diaphragm, a backplate. The substrate has a substrate opening corresponding to a diaphragm region. The dielectric supporting layer is disposed on the substrate, having a dielectric opening corresponding to the substrate opening to form the diaphragm region. The diaphragm within the dielectric opening is held by the dielectric supporting layer at a periphery. The backplate is disposed on the dielectric supporting layer, having a plurality of venting holes, connecting to the dielectric opening. The backplate includes a conductive layer and a passivation layer covering over the conductive layer at a first side opposite to the diaphragm, wherein a second side of the conductive layer is facing to the diaphragm and not covered by the passivation layer.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: April 2, 2019
    Assignee: Solid State Systems Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai
  • Publication number: 20180115836
    Abstract: A Micro-Electro-Mechanical Systems (MEMS) device includes a substrate, a dielectric supporting layer, a diaphragm, a backplate. The substrate has a substrate opening corresponding to a diaphragm region. The dielectric supporting layer is disposed on the substrate, having a dielectric opening corresponding to the substrate opening to form the diaphragm region. The diaphragm within the dielectric opening is held by the dielectric supporting layer at a periphery. The backplate is disposed on the dielectric supporting layer, having a plurality of venting holes, connecting to the dielectric opening. The backplate includes a conductive layer and a passivation layer covering over the conductive layer at a first side opposite to the diaphragm, wherein a second side of the conductive layer is facing to the diaphragm and not covered by the passivation layer.
    Type: Application
    Filed: October 26, 2016
    Publication date: April 26, 2018
    Applicant: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai
  • Patent number: 9955268
    Abstract: A micro-electrical-mechanical system (MEMS) microphone includes a MEMS structure, having a substrate, a diaphragm, and a backplate, wherein the substrate has a cavity and the backplate is between the cavity and the diaphragm. The backplate has multiple venting holes, which are connected to the cavity and allows the cavity to extend to the diaphragm. Further, an adhesive layer is disposed on the substrate, surrounding the cavity. A cover plate is adhered on the adhesive layer, wherein the cover plate has an acoustic hole, dislocated from the cavity without direct connection.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: April 24, 2018
    Assignee: Solid State System Co., Ltd.
    Inventors: Tsung-Min Hsieh, Chien-Hsing Lee, Cheng-Wei Tsai, Jhyy-Cheng Liou
  • Patent number: 9399242
    Abstract: A method of preparing polyurethane prepolymer does not require using a toxic isocyanate monomer (manufactured by harmful phosgene) as a raw material. Epoxy resin and carbon dioxide are used as major raw materials to form cyclic carbonates to be reacted with a functional group oligomer, and then amino groups in a hydrophilic (ether group) or hydrophobic (siloxane group) diamine polymer are used for performing a ring-opening polymerization, and the microwave irradiation is used in the ring-opening polymerization to efficiently synthesize the amino-terminated PU prepolymer, and then an acrylic group at an end is added to manufacture an UV cross-linking PU (UV-PU) oligomer which can be coated onto a fabric surface, and the fabric is dried by UV radiation for a surface treatment to form a washing-resisted long lasting hydrophilic or hydrophobic PU fabric.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: July 26, 2016
    Assignee: TAMKANG UNIVERSITY (A UNIVERSITY OF TAIWAN)
    Inventors: Jing-Zhong Hwuang, Guei-Jia Chang, Jhong-Jheng Lin, Cheng-Wei Tsai, Shih-Chieh Wang, Po-Cheng Chen, Kan-Nan Chen, Jen-Taut Yeh
  • Patent number: 9264832
    Abstract: A method to protect an acoustic port of a microelectromechanical system (MEMS) microphone is provided. The method includes: providing the MEMS microphone; and forming a protection film, on the acoustic port of the MEMS microphone. The protection film has a porous region over the acoustic port to receive an acoustic signal but resist at least an intruding material. The protection film can at least endure a processing temperature of solder flow.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: February 16, 2016
    Assignee: Solid State System Co., Ltd.
    Inventors: Cheng-Wei Tsai, Chien-Hsing Lee, Jhyy-Cheng Liou