Patents by Inventor Cherng Chyi Han

Cherng Chyi Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7400475
    Abstract: Patterned, longitudinally and transversely antiferromagnetically exchange biased GMR sensors are provided which have narrow effective trackwidths and reduced side reading. The exchange biasing significantly reduces signals produced by the portion of the ferromagnetic free layer that is underneath the conducting leads while still providing a strong pinning field to maintain sensor stability. In the case of the transversely biased sensor, the magnetization of the free and biasing layers in the same direction as the pinned layer simplifies the fabrication process and permits the formation of thinner leads by eliminating the necessity for current shunting.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: July 15, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Min Li, Ru-Ying Tong, Yun-Fei Li, You Fong Zheng, Simon Liao, Kochan Ju, Cherng Chyi Han
  • Patent number: 7390529
    Abstract: By using a free layer that includes a NiFe layer containing between 65 and 72 atomic percent iron, an improved CPP GMR device has been created. The resulting structure yields a higher CPP GMR ratio than prior art devices, while maintaining free layer softness and acceptable magnetostriction. A process for manufacturing the device is also described.
    Type: Grant
    Filed: May 26, 2004
    Date of Patent: June 24, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Min Li, Cheng T. Horng, Cherng Chyi Han, Yu-Hsia Chen, Ru-Ying Tong
  • Patent number: 7382577
    Abstract: A trimmed upper pole piece for a magnetic write head, said pole piece having a tapered profile that is widest at its trailing edge. Such a pole piece is capable of writing narrow tracks with sharply and well defined patterns and minimal overwriting of adjacent tracks. The necessary taper is produced by using NiCr, NiFeCr, Rh or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant. As a result, the write gap does not protrude to mask the effects of the ion-beam etch used to form the taper.
    Type: Grant
    Filed: September 16, 2005
    Date of Patent: June 3, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Po Kang Wang, Fenglin Liu
  • Publication number: 20080094750
    Abstract: A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
    Type: Application
    Filed: December 11, 2007
    Publication date: April 24, 2008
    Inventors: Cherng-Chyi Han, Kenichi Takano
  • Publication number: 20080094759
    Abstract: A method of making a perpendicular magnetic recording (PMR) head with single or double coil layers and with a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
    Type: Application
    Filed: December 11, 2007
    Publication date: April 24, 2008
    Inventors: Cherng-Chyi Han, Kenichi Takano
  • Patent number: 7359150
    Abstract: A trimmed upper pole piece for a magnetic write head is presented, said pole piece having a uniform width above and below a write gap layer and said pole piece being formed on a pedestal of uniform width projecting from a planar surface of a magnetic shield layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the typical alumina write-gap filling material. The present pole piece uses NiCr, NiFeCr or Ru as write gap filling materials because they have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and allow a uniform trimming to occur.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: April 15, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Fenglin Liu
  • Publication number: 20080055787
    Abstract: For high track density recording, tighter reader and writer track width control are essential. This has been achieved by using the write gap layer as the plating seed on which the upper pole was electro-formed so that the width of the GMR pedestal serves to define the device's write track width.
    Type: Application
    Filed: October 23, 2007
    Publication date: March 6, 2008
    Inventors: Cherng-Chyi Han, Laurie Lauchlan, Xiaomin Liu
  • Patent number: 7335960
    Abstract: A method for forming MRAM cell structures wherein the topography of the cell is substantially flat and the distance between a bit line and a magnetic free layer, a word line and a magnetic free layer or a word line and a bit line and a magnetic free layer is precise and well controlled. The method includes the formation of an MTJ film stack over which is formed both a capping and sacrificial layer. The stack is patterned by conventional means, then is covered by a layer of insulation which is thinned by CMP to expose a remaining portion of the sacrificial layer. The remaining portion of the sacrificial layer can be precisely removed by an etching process, leaving only the well dimensioned capping layer to separate the bit line from the magnetic free layer and the capping layer. The bit line and an intervening layer of insulation separate the free layer from a word line in an equally precise and controlled manner.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: February 26, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Liubo Hong
  • Patent number: 7331100
    Abstract: An improved seed/AFM structure is formed by first depositing a layer of tantalum on the lower shield. A NiCr layer is then deposited on the Ta followed by a layer of IrMn. The latter functions effectively as an AFM for thicknesses in the 40-80 Angstrom range, enabling a reduced shield-to-shield spacing.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: February 19, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Min Li, Cheng T. Horng, Cherng Chyi Han, Yue Liu, Yu-Hsia Chen, Ru-Ying Tong
  • Patent number: 7320168
    Abstract: Problems such as thermal pole tip protrusion result from thermal mismatch between the alumina and pole material during the writing process. This, and similar problems due to inadequate heat dissipation, have been overcome by dividing the bottom shield into two pieces both of which sit on top of a non-magnetic heat sink. Heat generated by the coil during writing is transferred to the non-magnetic heat sink whence it gets transferred to the substrate. With this approach, the head not only benefits from less field disturbance due to the small shield but also improves heat dissipation from the additional heat sink.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: January 22, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Rod Lee, Mao-Min Chen, Pokang Wang
  • Patent number: 7307815
    Abstract: A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
    Type: Grant
    Filed: May 19, 2004
    Date of Patent: December 11, 2007
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Kenichi Takano
  • Publication number: 20070268628
    Abstract: Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electro-plated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.
    Type: Application
    Filed: July 26, 2007
    Publication date: November 22, 2007
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Laurie Lauchlan, Lei Zhang
  • Publication number: 20070266551
    Abstract: Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electroplated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.
    Type: Application
    Filed: July 26, 2007
    Publication date: November 22, 2007
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Laurie Lauchlan, Lei Zhang
  • Publication number: 20070261967
    Abstract: A process is described for the fabrication, through electrodeposition, of FexCoyNiz (x=60-71, y=25-35, z=0-5) films that have, in their as-deposited form, a saturation magnetization of at least 24 kG and a coercivity of less than 0.3 Oe. A key feature is the addition of aryl sulfinates to the plating bath along with a suitable seed layer.
    Type: Application
    Filed: May 10, 2006
    Publication date: November 15, 2007
    Inventors: Xiaomin Liu, Feiyue Li, Cherng-Chyi Han
  • Patent number: 7293344
    Abstract: A process for achieving tighter reader and writer track width control is disclosed. The write gap layer is used as the plating seed on which the upper pole is electro-formed. This allows the write gap layer to then be deposited through a precisely controllable process such as sputtering. Since less material needs to be removed during pole trimming, a thinner layer of photoresist may be used, resulting in improved dimensional control.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: November 13, 2007
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Laurie Lauchlan, Xiaomin Liu
  • Patent number: 7268975
    Abstract: One of the major requirements for higher frequency extendability is to reduce yoke length and inductance in order to have fast saturation. This has been accomplished by using a design that provides a cavity in the lower pole piece inside which is located at least two coils, one on top of the other. A process for manufacturing the device is also described.
    Type: Grant
    Filed: January 25, 2005
    Date of Patent: September 11, 2007
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng Chyi Han, Mao-Min Chen, Pokang Wang, Yimin Guo
  • Publication number: 20070177301
    Abstract: A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.
    Type: Application
    Filed: February 2, 2006
    Publication date: August 2, 2007
    Inventors: Cherng-Chyi Han, Min Li, Fenglin Liu, Jiun-Ting Lee
  • Patent number: 7251102
    Abstract: Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electro-plated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: July 31, 2007
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Laurie Lauchlan, Lei Zhang
  • Publication number: 20070146928
    Abstract: Improved magnetic devices have been fabricated by replacing the conventional seed layer (typically Ta) with a bilayer of Ru on Ta. Although both Ru and Ta layers are ultra thin (between 5 and 20 Angstroms), good exchange bias between the seed and the AFM layer (IrMn about 70 Angstroms thick) is retained. This arrangement facilitates minimum shield-to-shield spacing and gives excellent performance in CPP, CCP-CPP, or TMR configurations.
    Type: Application
    Filed: December 23, 2005
    Publication date: June 28, 2007
    Inventors: Kunliang Zhang, Hui-Chuan Wang, Tong Zhao, Yu-Hsia Chen, Min Li, Cherng-Chyi Han
  • Patent number: 7221539
    Abstract: A PMR write head has a stitched shield formation which results in a strong perpendicular write field with sharp vertical gradients. The shape of the stitched shield is determined by two design parameters, d=½(WSWSLE?WMPTE), and TSWS, where WSWSLE is the width of the leading edge of the stitched shield in the ABS plane, WMPTE is the width of the trailing edge of the main magnetic pole in the ABS plane and TSWS is the thickness of the stitched shield. By a proper choice of these parameters, the write field of the head is sharply limited in the cross-track direction, so that adjacent track erasures are eliminated.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: May 22, 2007
    Assignee: Headway Technologies, Inc.
    Inventors: Kenichi Takano, Cherng-Chyi Han