Patents by Inventor Cherng-Shyan Tsay

Cherng-Shyan Tsay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography scattering bar structure and method
    Publication number: 20070111109
    Abstract: A photolithography mask includes a design feature located in an isolated or semi-isolated region of the mask and a plurality of parallel linear assist features disposed substantially perpendicular to the design feature.
    Type: Application
    Filed: November 14, 2005
    Publication date: May 17, 2007
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Sung Yen, Kuei-Shun Chen, Chien-Wen Lai, Cherng-Shyan Tsay
  • Regression system and methods for optical proximity correction modeling
    Publication number: 20070038417
    Abstract: An optimized optical proximity correction modeling method comprises receiving a selection of a regression method, displaying regression parameters, receiving values for the displayed regression parameters, receiving a selection of an optimization method, displaying optimization parameters, receiving values for the displayed optimization parameters, and generating a optimized optical proximity correction output.
    Type: Application
    Filed: July 28, 2005
    Publication date: February 15, 2007
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen Chun Huang, Ru-Gun Liu, Chih-Ming Lai, Chen Tsai, Chien Lai, Cherng-Shyan Tsay, Cheng Cheng Kuo, Yao-Ching Ku