Patents by Inventor Chi-Feng Cheng

Chi-Feng Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9705308
    Abstract: A power strip includes a power plug and an outlet connected to the power plug through a power cord. The power plug has a plugging face and at least one power pin disposed on the plugging face. The power plug includes a first thermal cut-off device, which has a first thermal sensing pin exposed on the plugging face. The outlet has at least one set of apertures. The first thermal cut-off device is in electrically connection with a power output wire of the power plug. The first thermal cut-off device cuts off the power transmission between the power plug and the outlet when the temperature of the plugging face exceeds a first determined temperature.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: July 11, 2017
    Assignee: POWERTECH INDUSTRIAL CO., LTD.
    Inventors: Yu-Lung Lee, Chi Feng Cheng
  • Publication number: 20150311698
    Abstract: A power strip includes a power plug and an outlet connected to the power plug through a power cord. The power plug has a plugging face and at least one power pin disposed on the plugging face. The power plug includes a first thermal cut-off device, which has a first thermal sensing pin exposed on the plugging face. The outlet has at least one set of apertures. The first thermal cut-off device is in electrically connection with a power output wire of the power plug. The first thermal cut-off device cuts off the power transmission between the power plug and the outlet when the temperature of the plugging face exceeds a first determined temperature.
    Type: Application
    Filed: July 14, 2014
    Publication date: October 29, 2015
    Inventors: YU-LUNG LEE, CHI FENG CHENG
  • Publication number: 20150303821
    Abstract: A wall socket includes a main body and a socket panel. The main body includes a socket portion. The socket portion includes an AC output area and a DC output area. The DC output area is disposed with at least two DC output sockets. The AC output area is disposed with a two-hole socket and a three-hole socket. The socket panel is disposed on the body and has an opening to expose the socket portion. The AC output area and the DC output area are arranged horizontally side by side. The two-hole socket is disposed between the DC output sockets and the three-hole socket.
    Type: Application
    Filed: July 21, 2014
    Publication date: October 22, 2015
    Inventors: YU-LUNG LEE, CHI FENG CHENG
  • Patent number: 8569846
    Abstract: A method includes forming a gate stack over a semiconductor substrate, and forming a first silicon germanium (SiGe) region in the semiconductor substrate and adjacent the gate stack. The first SiGe region has a first atomic percentage of germanium to germanium and silicon. A second SiGe region is formed over the first SiGe region. The second SiGe region has a second atomic percentage of germanium to germanium and silicon. The second atomic percentage is lower than the first atomic percentage, wherein the first and the second SiGe regions form a source/drain stressor of a metal-oxide-semiconductor (MOS) device.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: October 29, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Chieh Lin, Wei-Hua Hsu, Yu-En Percy Chang, Chung Li Chang, Chi-Feng Cheng, Win Hung, Kishimoto Ko
  • Publication number: 20110256681
    Abstract: A method includes forming a gate stack over a semiconductor substrate, and forming a first silicon germanium (SiGe) region in the semiconductor substrate and adjacent the gate stack. The first SiGe region has a first atomic percentage of germanium to germanium and silicon. A second SiGe region is formed over the first SiGe region. The second SiGe region has a second atomic percentage of germanium to germanium and silicon. The second atomic percentage is lower than the first atomic percentage, wherein the first and the second SiGe regions form a source/drain stressor of a metal-oxide-semiconductor (MOS) device.
    Type: Application
    Filed: June 22, 2011
    Publication date: October 20, 2011
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Chieh Lin, Wei-Hua Hsu, Yu-En Percy Chang, Chung Li Chang, Chi-Feng Cheng, Win Hung, Kishimoto Ko
  • Patent number: 7989901
    Abstract: A semiconductor structure and methods for forming the same are provided. The semiconductor structure includes a semiconductor substrate; a gate stack on the semiconductor substrate; a SiGe region in the semiconductor substrate and adjacent the gate stack, wherein the SiGe region has a first atomic percentage of germanium to germanium and silicon; and a silicide region over the SiGe region. The silicide region has a second atomic percentage of germanium to germanium and silicon. The second atomic percentage is substantially lower than the first atomic percentage.
    Type: Grant
    Filed: April 27, 2007
    Date of Patent: August 2, 2011
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Chieh Lin, Wei-Hua Hsu, Yu-En Percy Chang, Chung Li Chang, Chi-Feng Cheng, Win Hung, Kishimoto Ko
  • Patent number: 7950829
    Abstract: The high efficiency light emitting diode apparatus mainly comprises a connector, a heat dissipating body, a light generator, a central venting portion, and a transparent casing. This connector has a flow guider, a flow chamber and a vent. The light generator contains several LEDs. The heat dissipating body includes an inner passage and an outer passage. The central venting portion has a central channel. An inner flow path and an outer flow path are formed. So, the heat dissipating effect of the flow paths is excellent. The structure forming two flow paths can enhance the heat dissipating effect. The auxiliary element can strengthen the overall illuminating effect. Plus, the auxiliary element can make the light more uniformly.
    Type: Grant
    Filed: April 9, 2009
    Date of Patent: May 31, 2011
    Assignee: Taiwan Green Point Enterprises Co., Ltd.
    Inventors: Shao-Chen Chiu, Yih-Hua Renn, Ray-Long Tsai, Shih-Tsung Chang, Chi-Feng Cheng
  • Publication number: 20100214781
    Abstract: The high efficiency light emitting diode apparatus mainly comprises a connector, a heat dissipating body, a light generator, a central venting portion, and a transparent casing. This connector has a flow guider, a flow chamber and a vent. The light generator contains several LEDs. The heat dissipating body includes an inner passage and an outer passage. The central venting portion has a central channel. An inner flow path and an outer flow path are formed. So, the heat dissipating effect of the flow paths is excellent. The structure forming two flow paths can enhance the heat dissipating effect. The auxiliary element can strengthen the overall illuminating effect. Plus, the auxiliary element can make the light more uniformly.
    Type: Application
    Filed: April 9, 2009
    Publication date: August 26, 2010
    Applicant: TAIWAN GREEN POINT ENTERPRISES CO., LTD.
    Inventors: SHAO-CHEN CHIU, YIH-HUA RENN, RAY-LONG TSAI, SHIH-TSUNG CHANG, CHI-FENG CHENG
  • Publication number: 20080265256
    Abstract: A semiconductor structure and methods for forming the same are provided. The semiconductor structure includes a semiconductor substrate; a gate stack on the semiconductor substrate; a SiGe region in the semiconductor substrate and adjacent the gate stack, wherein the SiGe region has a first atomic percentage of germanium to germanium and silicon; and a silicide region over the SiGe region. The silicide region has a second atomic percentage of germanium to germanium and silicon. The second atomic percentage is substantially lower than the first atomic percentage.
    Type: Application
    Filed: April 27, 2007
    Publication date: October 30, 2008
    Inventors: Chun-Chieh Lin, Wei-Hua Hsu, Yu-En Percy Chang, Chung Li Chang, Chi-Feng Cheng, Win Hung, Kishimoto Ko
  • Patent number: 7234855
    Abstract: A lamp having a planar light-emitting source includes a light-guiding structure, a light-emitting portion, and a shading supporting seat. The point-shaped lighting units of the light-emitting portion emit the point-shaped light beams toward the side plane of the light-guiding structure. Then, these beams enter the light-guiding structure. After turning approximately 90 degrees, a uniformly distributed planar light generated from the light-emitting plane of the light-guiding structure. So, a planar light source is obtained. In this invention, it has a planar light-emitting function with better lighting efficiency. The planar lighting is evenly distributed without shadow. Its energy consumption and heat generation are low. The product's life is prolonged. Its volume is small and it is portable.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: June 26, 2007
    Assignee: Taiwan Green Point Enterprises Co., Ltd.
    Inventors: Shao Chen Chiu, Chi Feng Cheng, Ray Long Tsai, Hui Hua Hu, Ming Yuan Lai
  • Publication number: 20050079811
    Abstract: A device for cleaning a pad conditioner that comprises a cleaning agent supply for providing a cleaning agent for cleaning a pad conditioner including a conditioning surface, a pad including an abrasive surface, and a pump rotating the pad with respect to the pad conditioner for rubbing the abrasive surface of the pad against the conditioning surface of the pad conditioner.
    Type: Application
    Filed: October 9, 2003
    Publication date: April 14, 2005
    Inventor: Chi-Feng Cheng
  • Patent number: 6856394
    Abstract: A system for monitoring oxidant concentration in a chemical mechanical polishing process, including a spectrometer and a central controller. The spectrometer is coupled to a conduit for supplying slurry between a slurry supply tub and a polishing table. The spectrometer is used to detect the oxidant concentration of the slurry. The central controller is coupled to the spectrometer, the slurry supply tub and the polishing table. The central controller is used to adjust the composition of the slurry in the slurry supply tub and the polishing condition of the polishing table according to the oxidant concentration of the slurry obtained from a signal transmitted by the spectrometer.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: February 15, 2005
    Assignee: Macronix International Co., Ltd.
    Inventor: Chi-Feng Cheng
  • Patent number: 6814457
    Abstract: The present invention relates to an improvement for a light guide structure for light guide plate so as to resolve the problems of illumination and degree of uniformity of the conventional light guide plate. The light guide plate of the present invention has line-shaped passages which are located in parallel with the direction of light from the light emitting diodes. The depth of the passages becomes deeper gradually from one end to the other, wherein the source of light is located close to the shallow end, thereby the light from the light emitting diodes is transmitted to the remote areas that are located far from the source of light. The present invention increases the total illumination and the degree of uniformity, and the efficiency of the light emitting diode is also increased.
    Type: Grant
    Filed: August 5, 2002
    Date of Patent: November 9, 2004
    Assignee: Taiwan Green Point Enterprise Co., Ltd.
    Inventors: Shih-Tsung Chang, Chi-Feng Cheng
  • Publication number: 20040038632
    Abstract: A conditioner for conditioning the polishing pad of a chemical-mechanical polishing station. The conditioner includes a conditioning disk having an input surface and an output surface, a tube with one end attached to the input surface of the conditioning disk, a high-pressure fluid supplier connected to the other end of the tube and a plurality of nozzles positioned on the output surface of the conditioning disk.
    Type: Application
    Filed: September 12, 2002
    Publication date: February 26, 2004
    Inventor: Chi-Feng Cheng
  • Publication number: 20040022049
    Abstract: The present invention relates to an improvement for a leads the light chart shape of a leads the light board so as to resolve the problems of illumination and degree of uniformity of the conventional leads the light boards. The leads the light board of the present invention has line-shaped passages which are located in parallel with the direction of light from the light emitting diodes. The depth of the passages becomes deeper gradually from one end to the other, wherein the source of light is located close to the shallow end, thereby the light from the light emitting diodes is transmitted to the remote areas that are located far from the source of light. The present invention increases the total illumination and the degree of uniformity, and the efficiency of the light emitting diode is also increased.
    Type: Application
    Filed: August 5, 2002
    Publication date: February 5, 2004
    Inventors: Shih-Tsung Chang, Chi-Feng Cheng
  • Patent number: 6682409
    Abstract: A wafer carrier structure for a chemical-mechanical polishing device. The wafer carrier structure includes a holder and a slurry supply pipeline. The slurry supply pipeline is attached to the side of the holder such that a portion of the supply pipeline near the outlet end is either parallel or perpendicular to the sidewall of the holder.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: January 27, 2004
    Assignee: Macronix International Co., Ltd.
    Inventor: Chi-Feng Cheng
  • Patent number: 6644537
    Abstract: Manufacturing method for bonded electroforming metallic mold, including steps of: 1. preparation of metallic material 2. preparation of electroforming metallic plate and plastic mold core and electroforming substrate; 3. preparation of power supply; 4. forming of electroforming deposited film; and 5. final-shaping. In order to significantly shorten the electroforming time and firmly connect with the steel material of the mold, the steel material of the mold and the electroforming article are simultaneously electrically connected to the cathodes of power supplies. So, the electroforming metal is simultaneously deposited on both sides to quickly achieve the desired thickness of the electroforming metallic plate. By the metal-to-metal bonding force, the electroforming metallic plate and the steel material of the mold are firmly connected with each other. Also, the electroforming metallic plate keeps having the original cast pattern and is tightly combined with the steel material of the mold.
    Type: Grant
    Filed: May 1, 2002
    Date of Patent: November 11, 2003
    Assignee: Taiwan Green Point Enterprise Co., Ltd.
    Inventors: Shao Chen Chiu, Hsiharng Yang, Chi Feng Cheng
  • Publication number: 20030205611
    Abstract: Manufacturing method for bonded electroforming metallic mold, including steps of: 1. preparation of metallic material 2. preparation of electroforming metallic plate and plastic mold core and electroforming substrate; 3. preparation of power supply; 4. forming of electroforming deposited film; and 5. final-shaping. In order to significantly shorten the electroforming time and firmly connect with the steel material of the mold, the steel material of the mold and the electroforming article are simultaneously electrically connected to the cathodes of power supplies. So, the electroforming metal is simultaneously deposited on both sides to quickly achieve the desired thickness of the electroforming metallic plate. By the metal-to-metal bonding force, the electroforming metallic plate and the steel material of the mold are firmly connected with each other. Also, the electroforming metallic plate keeps having the original cast pattern and is tightly combined with the steel material of the mold.
    Type: Application
    Filed: May 1, 2002
    Publication date: November 6, 2003
    Inventors: Shao Chen Chiu, Hsiharng Yang, Chi Feng Cheng
  • Patent number: D721653
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: January 27, 2015
    Assignee: Powertech Industrial Co., Ltd.
    Inventors: Yu-Lung Lee, Chi Feng Cheng
  • Patent number: D730836
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: June 2, 2015
    Assignee: POWERTECH INDUSTRIAL CO., LTD.
    Inventors: Yu-Lung Lee, Chi Feng Cheng