Patents by Inventor Chi-Hai Kuo

Chi-Hai Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210296291
    Abstract: A manufacturing method of chip package structure includes following steps. A carrier is provided. A first patterned circuit layer and a first dielectric layer covering the first patterned circuit layer have been formed on the carrier. A flat structure layer is formed on the first dielectric layer. A second dielectric layer is formed on the first dielectric layer and covers the flat structure layer and a portion of the first dielectric layer. A second patterned circuit layer is formed on the second dielectric layer. The second patterned circuit layer includes a plurality of pads. An orthographic projection of the flat structure layer on the carrier overlaps orthographic projections of the pads on the carrier. A plurality of chips are disposed on the pads. A molding compound is formed to cover the second dielectric layer and encapsulate the chips and the pads.
    Type: Application
    Filed: April 13, 2020
    Publication date: September 23, 2021
    Applicant: Unimicron Technology Corp.
    Inventors: Pu-Ju Lin, Chi-Hai Kuo, Kai-Ming Yang, Cheng-Ta Ko
  • Publication number: 20210247147
    Abstract: A vapor chamber structure including a thermally conductive shell, a capillary structure layer, and a working fluid is provided. The thermally conductive shell includes a first thermally conductive portion and a second thermally conductive portion. The first thermally conductive portion has at least one first cavity. The second thermally conductive portion and the first cavity define at least one sealed chamber, and a pressure in the sealed chamber is lower than a standard atmospheric pressure. The capillary structure layer covers an inner wall of the sealed chamber. The working fluid is filled in the sealed chamber.
    Type: Application
    Filed: February 5, 2021
    Publication date: August 12, 2021
    Applicant: Unimicron Technology Corp.
    Inventors: Ra-Min Tain, John Hon-Shing Lau, Pu-Ju Lin, Wei-Ci Ye, Chi-Hai Kuo, Cheng-Ta Ko, Tzyy-Jang Tseng
  • Publication number: 20210251107
    Abstract: A vapor chamber structure includes a thermally conductive housing, a capillary structure layer, a grid structure layer, and a working fluid. The thermally conductive housing has a sealed chamber, where a pressure in the sealed chamber is lower than a standard atmospheric pressure. The capillary structure layer is disposed in the sealed chamber. The grid structure layer is disposed in the sealed chamber and arranged along a first direction. A size of the grid structure layer is less than or equal to a size of the capillary structure layer. The working fluid fills the sealed chamber.
    Type: Application
    Filed: September 11, 2020
    Publication date: August 12, 2021
    Applicant: Unimicron Technology Corp.
    Inventors: Ra-Min Tain, Pu-Ju Lin, Cheng-Chung Lo, Chi-Hai Kuo, Cheng-Ta Ko, Tzyy-Jang Tseng, John Hon-Shing Lau