Patents by Inventor Chi-Sheng Chen

Chi-Sheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100271785
    Abstract: A heat-dissipating and fixing mechanism of an electronic component includes a heat-dissipating element, a circuit board and a thermally-conductive adhesive interface. The circuit board has multiple insertion holes. The pins of the electronic component are inserted into corresponding insertion holes of the circuit board. The thermally-conductive adhesive interface has a first surface bonded with the heat-dissipating element and a second surface bonded with the electronic component. As a consequence, the electronic component is fixed on the heat-dissipating element through the thermally-conductive adhesive interface, and the heat generated by the electronic component is transmitted to the heat-dissipating element through the thermally-conductive adhesive interface.
    Type: Application
    Filed: June 22, 2009
    Publication date: October 28, 2010
    Inventors: Hung-Chang Hsieh, Chi-Sheng Chen, Ren-Shen Huang
  • Publication number: 20090086353
    Abstract: A bank structure for a display panel is provided. The display panel comprises a substrate, and the bank structure is formed on the surface of the substrate. The bank structure comprises a periphery and a partition, wherein the periphery forms a receiving space with the substrate and the partition is disposed in the receiving space for separating the receiving space into two sub-spaces with fluid-communication. Therefore, the ink can be injected and uniformly distributed in the sub-spaces to overcome the disadvantages of poor injection precision and increasing the spray control of the ink.
    Type: Application
    Filed: February 29, 2008
    Publication date: April 2, 2009
    Applicant: AU OPTRONICS CORP.
    Inventors: Lun Tsai, Chi-Sheng Chen, Po-Hua Lung, Wen-Bin Wu
  • Publication number: 20080220343
    Abstract: An ink composition for producing a color filter is provided. The ink composition comprises a colorant, a binder and plural solvents. A color filter production method using the above-mentioned ink composition is also provided. The ink composition is adhered to the designated light transmitting regions on the surface of a transparent substrate. Then, the ink composition adhered to the designated light transmitting regions is solidified.
    Type: Application
    Filed: February 14, 2008
    Publication date: September 11, 2008
    Applicant: AU Optronics Corporation
    Inventors: Chi-Sheng Chen, Lun Tsai, Wen-Bin Wu, Shen-Jye Shieh, Shu-Chin Lee, Feng-Yuan Gan
  • Patent number: 7150960
    Abstract: The present invention relates to a developer composition comprising (a) alkali metal carbonate salt; (b) alkali metal bicarbonate salt; (c) nonionic surfactant of the following formula (I): wherein, R1, R2, n, and m are define the same as the specification; and (d) nonionic surfactant of the following formula (II): wherein, R3, p, and q are define the same as the specification. The present invention also relates to a developer.
    Type: Grant
    Filed: August 11, 2005
    Date of Patent: December 19, 2006
    Assignee: Everlight USA, Inc.
    Inventor: Chi-Sheng Chen
  • Publication number: 20060194154
    Abstract: The present invention relates to a developer composition comprising: (a) alkali metal carbonate salt; (b) alkali metal bicarbonate salt; (c) nonionic surfactant of formula (I) below wherein, k, n and m are defined as in the description; and (d) nonionic surfactant of formula (II) below wherein, p and q are defined as in the description; wherein with respect to 100 parts by weight of water, the aforementioned component (a) is 0.1˜10 parts by weight, the aforementioned component (b) is 0.1˜10 parts by weight, the aforementioned component (c) is 0.1˜20 parts by weight, and the aforementioned component (d) is 0.1˜20 parts by weight. The present invention also relates to a developer.
    Type: Application
    Filed: August 4, 2005
    Publication date: August 31, 2006
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Hung-Jen Liu, Meng-Hsun Cheng
  • Publication number: 20060166147
    Abstract: The present invention relates to a developer composition comprising (a) alkali metal carbonate salt; (b) alkali metal bicarbonate salt; (c) nonionic surfactant of the following formula (I): wherein, R1, R2, n, and m are define the same as the specification; and (d) nonionic surfactant of the following formula (II): wherein, R3, p, and q are define the same as the specification. The present invention also relates to a developer.
    Type: Application
    Filed: August 11, 2005
    Publication date: July 27, 2006
    Applicant: Everlight USA, Inc.
    Inventor: Chi-Sheng Chen
  • Patent number: 6933823
    Abstract: The present invention is directed to a method of installing transformer winding coils, including the steps of: providing a transforming including a magnetic core assembly, a primary winding coil, a secondary winding coil, a winding frame, and an enclosure, wherein the primary winding coil and the secondary winding coil are respectively wounded around the winding frame; wrapping the portions of the winding coils wounded around the winding frame with a tape and leading out a plurality of winding outlets from the winding frame; positioning the magnetic core assembly and the winding frame fixedly within the enclosure; and directly securing the winding outlets to a printed circuit board such that the transformer can be electrically connected to the printed circuit board.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: August 23, 2005
    Assignee: Delta Electronics, Inc.
    Inventor: Chi-Sheng Chen
  • Patent number: 6878504
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: wherein R1 is H, C1-C4 alkyl, or CF3; Q is C4-C12 cycloalkyl; R2 is H, C1-C4 alkyl, or CF3; R3 is C4-C12 branched or cyclic alkyl; and x+y+z equals to 1. The chemically-amplified resist compositions of the present invention not only can be applied maturely to general lithographic processes, especially to 193 nm lithographic process, but also have excellent photo-sensitivity, and can form a well-resolved pattern and profile.
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: April 12, 2005
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
  • Publication number: 20040252000
    Abstract: The present invention is directed to a method of installing transformer winding coils, including the steps of: providing a transforming including a magnetic core assembly, a primary winding coil, a secondary winding coil, a winding frame, and an enclosure, wherein the primary winding coil and the secondary winding coil are respectively wounded around the winding frame; wrapping the portions of the winding coils wounded around the winding frame with a tape and leading out a plurality of winding outlets from the winding frame; positioning the magnetic core assembly and the winding frame fixedly within the enclosure; and directly securing the winding outlets to a printed circuit board such that the transformer can be electrically connected to the printed circuit board.
    Type: Application
    Filed: October 24, 2003
    Publication date: December 16, 2004
    Applicant: Delta Electronics, Inc.
    Inventor: Chi-Sheng Chen
  • Publication number: 20040241569
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: 1
    Type: Application
    Filed: May 28, 2003
    Publication date: December 2, 2004
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
  • Publication number: 20040118049
    Abstract: An emergency escape door device includes a primary door panel having an entrance formed in an inner peripheral surface inclined between a greater peripheral side contour a smaller peripheral side contour, and an auxiliary door panel pivotally secured to the primary door panel to selectively enclose the entrance of the primary door panel and having an inclined outer peripheral surface to mate with the inclined inner peripheral surface of the primary door panel. The auxiliary door panel may be disengaged from the primary door panel in such as an earthquake.
    Type: Application
    Filed: December 24, 2002
    Publication date: June 24, 2004
    Inventor: Chi Sheng Chen
  • Patent number: 6745515
    Abstract: An emergency escape door device includes a primary door panel having an entrance formed in an inner peripheral surface inclined between a greater peripheral side contour a smaller peripheral side contour, and an auxiliary door panel pivotally secured to the primary door panel to selectively enclose the entrance of the primary door panel and having an inclined outer peripheral surface to mate with the inclined inner peripheral surface of the primary door panel. The auxiliary door panel may be disengaged from the primary door panel in such as an earthquake.
    Type: Grant
    Filed: December 24, 2002
    Date of Patent: June 8, 2004
    Inventor: Chi Sheng Chen
  • Patent number: 6720430
    Abstract: The present invention discloses a compound having the following formula (I), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. This compound is a monomer and suitable for synthesis to form polymers with good hydrophilicity, adhesion and dry-etch resistance. Particularly, this compound can form photosensitive polymers or copolymers by reacting with suitable photosensitive monomers.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: April 13, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Patent number: 6703178
    Abstract: The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The chemical amplified photoresist composition of the present invention can be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light sources, and exhibit excellent resolution, figures and photosensitivity.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: March 9, 2004
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Publication number: 20030232270
    Abstract: The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), 1
    Type: Application
    Filed: May 28, 2002
    Publication date: December 18, 2003
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Publication number: 20030229234
    Abstract: The present invention discloses a compound having the following formula (I), 1
    Type: Application
    Filed: May 28, 2002
    Publication date: December 11, 2003
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
  • Patent number: 6639035
    Abstract: The present invention discloses a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The polymer of the present invention can be used to form the chemical amplified photoresist composition, which can then be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light source, and exhibit excellent resolution, figures and photosensitivity.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: October 28, 2003
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng