Patents by Inventor Chi-Sheng Chen
Chi-Sheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100271785Abstract: A heat-dissipating and fixing mechanism of an electronic component includes a heat-dissipating element, a circuit board and a thermally-conductive adhesive interface. The circuit board has multiple insertion holes. The pins of the electronic component are inserted into corresponding insertion holes of the circuit board. The thermally-conductive adhesive interface has a first surface bonded with the heat-dissipating element and a second surface bonded with the electronic component. As a consequence, the electronic component is fixed on the heat-dissipating element through the thermally-conductive adhesive interface, and the heat generated by the electronic component is transmitted to the heat-dissipating element through the thermally-conductive adhesive interface.Type: ApplicationFiled: June 22, 2009Publication date: October 28, 2010Inventors: Hung-Chang Hsieh, Chi-Sheng Chen, Ren-Shen Huang
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Publication number: 20090086353Abstract: A bank structure for a display panel is provided. The display panel comprises a substrate, and the bank structure is formed on the surface of the substrate. The bank structure comprises a periphery and a partition, wherein the periphery forms a receiving space with the substrate and the partition is disposed in the receiving space for separating the receiving space into two sub-spaces with fluid-communication. Therefore, the ink can be injected and uniformly distributed in the sub-spaces to overcome the disadvantages of poor injection precision and increasing the spray control of the ink.Type: ApplicationFiled: February 29, 2008Publication date: April 2, 2009Applicant: AU OPTRONICS CORP.Inventors: Lun Tsai, Chi-Sheng Chen, Po-Hua Lung, Wen-Bin Wu
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Publication number: 20080220343Abstract: An ink composition for producing a color filter is provided. The ink composition comprises a colorant, a binder and plural solvents. A color filter production method using the above-mentioned ink composition is also provided. The ink composition is adhered to the designated light transmitting regions on the surface of a transparent substrate. Then, the ink composition adhered to the designated light transmitting regions is solidified.Type: ApplicationFiled: February 14, 2008Publication date: September 11, 2008Applicant: AU Optronics CorporationInventors: Chi-Sheng Chen, Lun Tsai, Wen-Bin Wu, Shen-Jye Shieh, Shu-Chin Lee, Feng-Yuan Gan
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Patent number: 7150960Abstract: The present invention relates to a developer composition comprising (a) alkali metal carbonate salt; (b) alkali metal bicarbonate salt; (c) nonionic surfactant of the following formula (I): wherein, R1, R2, n, and m are define the same as the specification; and (d) nonionic surfactant of the following formula (II): wherein, R3, p, and q are define the same as the specification. The present invention also relates to a developer.Type: GrantFiled: August 11, 2005Date of Patent: December 19, 2006Assignee: Everlight USA, Inc.Inventor: Chi-Sheng Chen
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Publication number: 20060194154Abstract: The present invention relates to a developer composition comprising: (a) alkali metal carbonate salt; (b) alkali metal bicarbonate salt; (c) nonionic surfactant of formula (I) below wherein, k, n and m are defined as in the description; and (d) nonionic surfactant of formula (II) below wherein, p and q are defined as in the description; wherein with respect to 100 parts by weight of water, the aforementioned component (a) is 0.1˜10 parts by weight, the aforementioned component (b) is 0.1˜10 parts by weight, the aforementioned component (c) is 0.1˜20 parts by weight, and the aforementioned component (d) is 0.1˜20 parts by weight. The present invention also relates to a developer.Type: ApplicationFiled: August 4, 2005Publication date: August 31, 2006Applicant: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Hung-Jen Liu, Meng-Hsun Cheng
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Publication number: 20060166147Abstract: The present invention relates to a developer composition comprising (a) alkali metal carbonate salt; (b) alkali metal bicarbonate salt; (c) nonionic surfactant of the following formula (I): wherein, R1, R2, n, and m are define the same as the specification; and (d) nonionic surfactant of the following formula (II): wherein, R3, p, and q are define the same as the specification. The present invention also relates to a developer.Type: ApplicationFiled: August 11, 2005Publication date: July 27, 2006Applicant: Everlight USA, Inc.Inventor: Chi-Sheng Chen
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Patent number: 6933823Abstract: The present invention is directed to a method of installing transformer winding coils, including the steps of: providing a transforming including a magnetic core assembly, a primary winding coil, a secondary winding coil, a winding frame, and an enclosure, wherein the primary winding coil and the secondary winding coil are respectively wounded around the winding frame; wrapping the portions of the winding coils wounded around the winding frame with a tape and leading out a plurality of winding outlets from the winding frame; positioning the magnetic core assembly and the winding frame fixedly within the enclosure; and directly securing the winding outlets to a printed circuit board such that the transformer can be electrically connected to the printed circuit board.Type: GrantFiled: October 24, 2003Date of Patent: August 23, 2005Assignee: Delta Electronics, Inc.Inventor: Chi-Sheng Chen
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Patent number: 6878504Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: wherein R1 is H, C1-C4 alkyl, or CF3; Q is C4-C12 cycloalkyl; R2 is H, C1-C4 alkyl, or CF3; R3 is C4-C12 branched or cyclic alkyl; and x+y+z equals to 1. The chemically-amplified resist compositions of the present invention not only can be applied maturely to general lithographic processes, especially to 193 nm lithographic process, but also have excellent photo-sensitivity, and can form a well-resolved pattern and profile.Type: GrantFiled: May 28, 2003Date of Patent: April 12, 2005Assignee: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
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Publication number: 20040252000Abstract: The present invention is directed to a method of installing transformer winding coils, including the steps of: providing a transforming including a magnetic core assembly, a primary winding coil, a secondary winding coil, a winding frame, and an enclosure, wherein the primary winding coil and the secondary winding coil are respectively wounded around the winding frame; wrapping the portions of the winding coils wounded around the winding frame with a tape and leading out a plurality of winding outlets from the winding frame; positioning the magnetic core assembly and the winding frame fixedly within the enclosure; and directly securing the winding outlets to a printed circuit board such that the transformer can be electrically connected to the printed circuit board.Type: ApplicationFiled: October 24, 2003Publication date: December 16, 2004Applicant: Delta Electronics, Inc.Inventor: Chi-Sheng Chen
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Publication number: 20040241569Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: 1Type: ApplicationFiled: May 28, 2003Publication date: December 2, 2004Applicant: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
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Publication number: 20040118049Abstract: An emergency escape door device includes a primary door panel having an entrance formed in an inner peripheral surface inclined between a greater peripheral side contour a smaller peripheral side contour, and an auxiliary door panel pivotally secured to the primary door panel to selectively enclose the entrance of the primary door panel and having an inclined outer peripheral surface to mate with the inclined inner peripheral surface of the primary door panel. The auxiliary door panel may be disengaged from the primary door panel in such as an earthquake.Type: ApplicationFiled: December 24, 2002Publication date: June 24, 2004Inventor: Chi Sheng Chen
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Patent number: 6745515Abstract: An emergency escape door device includes a primary door panel having an entrance formed in an inner peripheral surface inclined between a greater peripheral side contour a smaller peripheral side contour, and an auxiliary door panel pivotally secured to the primary door panel to selectively enclose the entrance of the primary door panel and having an inclined outer peripheral surface to mate with the inclined inner peripheral surface of the primary door panel. The auxiliary door panel may be disengaged from the primary door panel in such as an earthquake.Type: GrantFiled: December 24, 2002Date of Patent: June 8, 2004Inventor: Chi Sheng Chen
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Patent number: 6720430Abstract: The present invention discloses a compound having the following formula (I), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. This compound is a monomer and suitable for synthesis to form polymers with good hydrophilicity, adhesion and dry-etch resistance. Particularly, this compound can form photosensitive polymers or copolymers by reacting with suitable photosensitive monomers.Type: GrantFiled: May 28, 2002Date of Patent: April 13, 2004Assignee: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
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Patent number: 6703178Abstract: The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The chemical amplified photoresist composition of the present invention can be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light sources, and exhibit excellent resolution, figures and photosensitivity.Type: GrantFiled: May 28, 2002Date of Patent: March 9, 2004Assignee: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
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Publication number: 20030232270Abstract: The present invention discloses a chemical amplified photoresist composition including a polymer having a repeated unit of the formula (II), 1Type: ApplicationFiled: May 28, 2002Publication date: December 18, 2003Applicant: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
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Publication number: 20030229234Abstract: The present invention discloses a compound having the following formula (I), 1Type: ApplicationFiled: May 28, 2002Publication date: December 11, 2003Applicant: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng
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Patent number: 6639035Abstract: The present invention discloses a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The polymer of the present invention can be used to form the chemical amplified photoresist composition, which can then be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light source, and exhibit excellent resolution, figures and photosensitivity.Type: GrantFiled: May 28, 2002Date of Patent: October 28, 2003Assignee: Everlight USA, Inc.Inventors: Chi-Sheng Chen, Yen-Cheng Li, Meng-Hsum Cheng