Abstract: Provided are an imaging method and system for residual stress of a basin insulator and a method for preparing a test block. The imaging method includes cutting and preparing a standard industrial sample of a basin insulator and testing the acoustoelastic coefficient of the standard industrial sample; then obtaining the residual stress data of the basin insulator and obtaining the spatial point sound velocity distribution of the basin insulator; finally, obtaining a stress distribution cloud map of the basin insulator by calculation of the attribute value and the coordinate data of a to-be-measured location, and performing reliability verification based on the residual stress data.

Abstract: A data processing method in a storage system and the storage system, and relates to the field of data storage technologies. A client first sends a data block in a stripe and metadata of the data block to a data storage node. The client then sends the metadata of the data block and a parity block to a parity storage node, to back up the metadata of the data block on the parity storage node. When the metadata of the data block is successfully backed up, the data block is written into a corresponding storage device based on a storage location indicated by the metadata. This reduces write operation time.

Abstract: Provided are an imaging method and system for residual stress of a basin insulator and a method for preparing a test block. The imaging method includes cutting and preparing a standard industrial sample of a basin insulator and testing the acoustoelastic coefficient of the standard industrial sample; then obtaining the residual stress data of the basin insulator and obtaining the spatial point sound velocity distribution of the basin insulator; finally, obtaining a stress distribution cloud map of the basin insulator by calculation of the attribute value and the coordinate data of a to-be-measured location, and performing reliability verification based on the residual stress data.

Abstract: An optical element driving system is provided. The optical element driving system includes an optical element driving mechanism and a control assembly. The optical element driving mechanism includes a movable portion, a fixed portion, and a driving assembly. The movable portion is used for connecting to an optical element. The movable portion is movable relative to the fixed portion. The movable portion is in an accommodating space in the fixed portion. The driving assembly is used for driving the movable portion to move relative to the fixed portion. The control assembly provides a driving signal to the driving assembly to control the driving assembly. The driving assembly includes a first driving element, and the material of the first driving element includes shape memory alloy.

Abstract: A device (e.g., SAR ADC device) include a DAC circuit and generates a digital output based on logic circuitry that includes SAR logic. Additional logic circuitry includes delta modulation circuitry and dynamic element matching circuitry. The delta modulation circuitry provides several digital outputs of the SAR DAC, while the dynamic element matching circuitry selects a different set of capacitors from the DAC circuit. Each cycle is added together and averaged, and then added to the digital output from the SAR logic.

Abstract: A distributed storage system comprises a data storage node Nx that receives a write success response returned by a hard disk that provides the storage address. The data storage node Nx returns a write success response to a client. The client receives the write success response returned by the data storage node Nx, and the client returns a write completion response to a host.

Abstract: A data storage method implemented by a storage node in a distributed storage system includes receiving first data of a first strip in a first stripe, wherein the first stripe comprises a first plurality of strips, receiving second data of a second strip in a second stripe, wherein the second strip comprises a second plurality of strips, wherein a first logical address of the first data is the same as a second logical address of the second data, and generating a record indicating that the first data reaches the storage node before the second data.

Abstract: This application discloses a data processing method in a storage system and the storage system, and relates to the field of data storage technologies. In this application, a client sends a data block in a stripe and metadata of the data block to a data storage node, and sends the metadata of the data block and a parity block to a parity storage node, to back up the metadata of the data block on the parity storage node. This reduces write operation time.

Abstract: The solution discloses a data storage method in a distributed storage system: A client generates data of a stripe and concurrently sends data of strips in the stripe to storage nodes corresponding to the strips, so that data interaction between the storage nodes is reduced, and write concurrency is improved; and the storage node receives the data of the strips sent by the client and records a sequence of data of strips corresponding to a same logical address, so that write performance of a distributed block storage system is improved and data consistency is ensured.

Abstract: A distributed storage system comprises a data storage node Nx that receives a write success response returned by a hard disk that provides the storage address. The data storage node Nx returns a write success response to a client. The client receives the write success response returned by the data storage node Nx, and the client returns a write completion response to a host.

Abstract: The present invention relates to methods and compositions for diagnosing prostate cancer and/or determining whether a prostate cancer patient is at increased risk of suffering a relapse, or a rapid relapse, of his cancer. It is based, at least in part, on the results of a comprehensive genome analysis on 241 prostate cancer samples (104 prostate cancer, 85 matched bloods, 49 matched benign prostate tissues adjacent to cancer, and 3 cell lines) which indicate that (i) genome copy number variation (CNV) occurred in both cancer and non-cancer tissues, and (ii) CNV predicts prostate cancer progression.

Abstract: Provided is a structure for transdermal delivery to deliver a material to a body. The structure for transdermal delivery includes a pillar which is a first dermal infiltration part, a microstructure which is connected to an end of one side of the pillar and serves as a second dermal infiltration part. The microstructure includes a body part formed of a biodegradable viscous composition, and a connection part which includes a first contact surface having viscosity generated by a viscous composition to allow the body part to be connected to the pillar and disposed opposite the end of the one side of the pillar.

Abstract: A method for preparing a flame retardant modified acrylonitrile-based copolymer, includes: prepolymerizing a first composition to obtain a first prepolymer solution including a first prepolymer; prepolymerizing a second composition to obtain a second prepolymer solution including a second prepolymer; and mixing the first and second prepolymer solutions and subjecting a mixture of the first and second prepolymers to polymerization to obtain a flame retardant modified acrylonitrile-based copolymer solution containing a flame retardant modified acrylonitrile-based copolymer.

Abstract: A method for preparing a flame retardant modified acrylonitrile-based copolymer, includes: prepolymerizing a first composition to obtain a first prepolymer solution including a first prepolymer; prepolymerizing a second composition to obtain a second prepolymer solution including a second prepolymer; and mixing the first and second prepolymer solutions and subjecting a mixture of the first and second prepolymers to polymerization to obtain a flame retardant modified acrylonitrile-based copolymer solution containing a flame retardant modified acrylonitrile-based copolymer.

Abstract: The present invention relates to methods and compositions for diagnosing prostate cancer and/or determining whether a prostate cancer patient is at increased risk of suffering a relapse, or a rapid relapse, of his cancer. It is based, at least in part, on the results of a comprehensive genome analysis on 241 prostate cancer samples (104 prostate cancer, 85 matched bloods, 49 matched benign prostate tissues adjacent to cancer, and 3 cell lines) which indicate that (i) genome copy number variation (CNV) occurred in both cancer and non-cancer tissues, and (ii) CNV predicts prostate cancer progression.

Abstract: The present invention relates to methods and compositions for diagnosing prostate cancer and/or determining whether a prostate cancer patient is at increased risk of suffering a relapse, or a rapid relapse, of his cancer. It is based, at least in part, on the results of a comprehensive genome analysis on 241 prostate cancer samples (104 prostate cancer, 85 matched bloods, 49 matched benign prostate tissues adjacent to cancer, and 3 cell lines) which indicate that (i) genome copy number variation (CNV) occurred in both cancer and non-cancer tissues, and (ii) CNV predicts prostate cancer progression.

Abstract: An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first figure-of-merit; and then using a second computational model to calculate a second figure-of-merit of the photolithographic data set; and changing a second part of the photolithographic data set to increase the second figure-of-merit. The second computational model enables figure-of-merit calculations to be executed at a significantly faster execution rate than the first computational model.

Abstract: A method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips. More particularly, a method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips based on the parameters of test patterns measured at the “wafer sweet spots” so as to arrive at an accurate model.

Abstract: A hierarchical representation encapsulates the detailed internal composition of a sub-circuit using the notion of a cell definition (a CellDef). The CellDef serves as a natural unit for operational reuse. If the computation required for the analysis or manipulation (e.g. parasitic extraction, RET, design rule confirmation (DRC), or OPC) based on a CellDef or one cell instance can be applied, with no or minimal additional effort, to all or a significant subset of other instances of the cell, very substantial reduction in computational effort may be realized. Furthermore, a hierarchical representation also allows for the partitioning of the overall analysis/manipulation task into a collection of subtasks, e.g. one per CellDef. Multiple jobs may then be distributed across a large number of computational nodes on a network for concurrent execution. While this may not reduce the aggregate computational time, a major reduction in the overall turnaround time (TAT) is in itself extremely beneficial.

Abstract: The present invention provides a system and method of modifying the mask layout shapes of an integrated circuit layout design to compensate for reticle field location-specific systematic CD variations resulting from mask writing process variations, lens imperfections in lithographic patterning, and photoresist process variations. Called PLC (Process-optimized Layout Compensation), each set of compensation rules according to the present invention is specifically tailored for a particular mask-writer-patterning-tools-and-resist-process combination, and are performed on a reticle-wide basis. Furthermore, for each geometric shape in the mask layout, the amount of modification is determined based on a categorization of the type of the shape, the specific location in the reticle field the particular shape falls in, its context (i.e., surrounding patterns, orientation, etc.), as well as certain photoresist parameters to be used in the patterning process.