Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a gate electrode, a gate insulating layer, an active layer, a dielectric layer, a source electrode, and a drain electrode. The gate insulating layer is disposed between the gate electrode and the active layer, the dielectric layer is disposed on a side of the active layer, and the source electrode and the drain electrode pass through the dielectric layer to electrically connect with the active layer, wherein a first contact surface is formed between the source electrode and the active layer, a second contact surface is formed between the drain electrode and the active layer, the first contact surface and the second contact surface are subjected to a plasma treatment or a deposition treatment to form a protective interface layer.

Abstract: A metal mask includes a metal body and a plurality of through-holes. The metal body has a first surface and a second surface, and the plurality of through-holes penetrate the metal body and respectively have openings on the first surface and the second surface, where each of the through-holes has a first opening, a second opening, and a third opening. The first opening is formed on the first surface; the second opening is formed on the second surface and is smaller than the first opening; the third opening is located within the through-hole and between the first opening and the second opening, and the third opening is smaller than the second opening. Each of the through-holes further has a first length and a second length, and the first length is greater than the second length.

Abstract: A method for fabricating a semiconductor device includes the steps of first forming a first gate structure on a substrate and then forming a first epitaxial layer adjacent to the first gate structure. Preferably, a top surface of the first epitaxial layer includes a first curve, a second curve, and a third curve connecting the first curve and the second curve, in which the first curve and the second curve include curves concave downward while the third curve includes a curve concave upward.

Abstract: The invention provides a metal mask structure, a photomask for preparing a shielding layer, and a method for preparing a metal mask structure by using a photomask. The metal mask structure includes a plate, and the plate at least includes: a pattern area formed with at least one slot; a non-pattern area arranged on one side of the pattern area; and a cutting groove extending along an extending direction between the pattern area and the non-pattern area. The cutting groove has an opening formed on a first surface of the plate, and an inner groove surface concave with respect to the first surface. The plate further includes at least one rib structure extending along the extending direction formed on the inner groove surface, and the at least one rib structure does not protrude from the opening.

Abstract: A metal mask includes: a mask body having two opposite first side edges along a first direction and two opposite second side edges along a second direction, and each of the first side edges having a first length. The mask body includes an open slot region, two first fixing regions, and two first clamping regions, where the two first fixing regions are positioned on two opposite sides of the open slot region, respectively, and each of the first clamping regions is positioned between each of the first fixing regions and each of the first side edges. A first gap is formed in each of the first side edges, the first gap has a first opening length in the first direction, and a ratio of the first opening length to the first length being between 0.2 and 0.8. The metal mask may improve the problem of wrinkles.

Abstract: A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.

Abstract: A manufacturing method of a metal mask comprises: providing a metal plate having a first surface and a second surface opposite to each other, and the first surface has preset opening regions; forming a first photoresist layer on the first surface which has first apertures corresponding to the preset opening regions respectively, and each preset opening region is partially exposed to each first aperture, and an area of the first aperture is 75%-100% of an area of the preset opening region; forming a second photoresist layer on the second surface which has second apertures, and the second surface is exposed to the second apertures; forming first etching parts on the first surface and corresponding to the first apertures respectively, and each first etching part has a first opening located in each preset opening region; forming second etching parts on the second surface and corresponding to the second apertures respectively.

Abstract: The present disclosure relates to a system, a method and a computer-readable medium for distribution time suggestion. The method includes obtaining a first list of viewers in association with a first distributor; obtaining data of the viewers in the first list; obtaining a second list of distributors in association with the viewers in the first list; obtaining data of the distributors in the second list; and determining a distribution time for the first distributor according to the data of the viewers in the first list and the data of the distributors in the second list.

Abstract: A metal mask includes a metal panel, provided with an evaporation surface and a back surface opposite to each other and a plurality of through holes extending from the evaporation surface to the back surface. A size of each through hole decreases gradually from the evaporation surface towards the back surface. A first opening is formed by each through hole in the evaporation surface. The first opening includes a primary opening part and a plurality of secondary opening parts. The primary opening part is provided with two long edges opposite to each other and two short edges opposite to each other. The two short edges are connected between the two long edges, and the secondary opening parts are connected at two ends of the long edges. Each secondary opening part has a width perpendicular to the length. A method to produce the metal mask is also provided.

Abstract: A pet collar structure includes a collar body and an elastic connecting member. The collar body includes beads, a first magnetic fastener and a second magnetic fastener. The first magnetic fastener and second magnetic fastener are detachably magnetically attracted to each other. The elastic connecting member includes a first sleeve portion and a second sleeve portion. The first sleeve portion sleeves the collar body and is positioned neighboring to the first magnetic fastener. The second sleeve portion sleeves the collar body and is positioned neighboring to the second magnetic fastener. With the coordination of the first magnetic fastener, the second magnetic fastener and the elastic connecting member, the collar body is worn on a neck of a pet. When the pet runs, scratches or shakes, with the elastic extension and elastic retraction of the elastic connecting member, the collar body is kept from falling off, hence achieving wearing stability.

Abstract: A metal mask includes: a mask body having two opposite first side edges along a first direction and two opposite second side edges along a second direction, and each of the first side edges having a first length. The mask body includes an open slot region, two first fixing regions, and two first clamping regions, where the two first fixing regions are positioned on two opposite sides of the open slot region, respectively, and each of the first clamping regions is positioned between each of the first fixing regions and each of the first side edges. A first gap is formed in each of the first side edges, the first gap has a first opening length in the first direction, and a ratio of the first opening length to the first length being between 0.2 and 0.8. The metal mask may improve the problem of wrinkles.

Abstract: A metal mask has a first surface, a second surface opposite to the first surface, first and second openings provided on the first and second surfaces respectively, and first and second through holes communicating with the first and second openings respectively. The juncture of the first and second through holes further has an annular protrusion. The mask satisfies the in equations: 1 ? ?m 2 < 1 2 × W × H < 15 ? ?m 2 ? and ? 30 ? ° < ? < 65 ? ° , wherein W is the horizontal distance between an edge of the first opening and an imaginary connecting line passing through an edge of the second opening and an end edge of the annular protrusion, H is the vertical distance between the end edge of the annular protrusion and the first surface, and ? is the included angle between the imaginary connecting line and an imaginary extending plane of the first surface. The metal mask is effective in reducing shadow effect, thereby improving evaporation quality.

Abstract: The present disclosure relates to a system, a method and a computer-readable medium for anomaly detection. The method includes obtaining latency data of a first endpoint, obtaining latency data of a second endpoint, generating, by a representation learning model, reconstruction error distribution data of the latency data of the first endpoint according to the latency data of the first endpoint and the latency data of the second endpoint, obtaining new latency data of the first endpoint, obtaining new latency data of the second endpoint, generating, by the representation learning model, a reconstruction error of the new latency data of the first endpoint according to the new latency data of the first endpoint and the new latency data of the second endpoint, and generating an anomaly score for the first endpoint according to a dispersion characteristic of the reconstruction error distribution data and the reconstruction error.

Abstract: A projection system, including a projection target, a projection device, an image capturing device, and a processor circuit, is provided. The projection target includes a reflective surface and an anti-reflective film disposed on the reflective surface. The anti-reflective film defines a projection range. The image capturing device captures a first captured image containing the projection target. The first captured image includes an image of the anti-reflective film. The processor circuit determines a position and a shape of the anti-reflective film in the first captured image according to the first captured image. The projection device projects a projection image on the projection target. The projection device adjusts the projection image according to the position and the shape of the anti-reflective film, and correspondingly adjusts the projection image to the projection range. In addition, an image projection method is also provided.

Abstract: The disclosure provides an image blending method. The method includes projecting a plurality of images onto a projection surface, respectively, wherein an image of the first portion of the first image and an image of the first portion of the second image projected onto the projection surface overlap each other in the first overlapping area on the projection surface; the image parameters of all pixels of the first non-overlapping area and the second non-overlapping area are adjusted according to the position of the first non-overlapping area and the position of the second non-overlapping area, such that the black-level brightness of the first non-overlapping image in the first non-overlapping area of the first image and the black-level brightness of the second non-overlapping image in the second non-overlapping area of the second image are close to the black-level brightness of the first overlapping image in the first overlapping area.

Abstract: A cholesteric liquid crystal display device and a control method for reducing inrush current when clearing the screen. The cholesteric liquid crystal display device includes a cholesteric liquid crystal display panel and a liquid crystal drive unit. The cholesteric liquid crystal display panel has a plurality of pixel matrix. After the liquid crystal drive unit receives a data latch enable signal, it applies a reset voltage to the plurality of pixel matrix to clear the screen displayed on the cholesteric liquid crystal display panel. The input time of the data latch enable signal received by the liquid crystal driving unit is different, and the corresponding signal time portion is shifted with each other.

Abstract: A fine metal mask includes a plate including a first and a second surfaces. The first surface has a first inner edge defining a first opening. The second surface has a second inner edge defining a second opening communicated with the first opening. The plate includes a first and a second curved surfaces respectively connecting the first surface inside the first opening and the second surface inside the second opening. The first and the second curved surfaces connect with a third inner edge defining a third opening smaller than the first and the second openings. The third inner edge includes a first straight edge, a second straight edge and a circular edge. The first and the second straight edges form an included angle. The circular edge has a radius smaller than or equal to 15 microns and connects between the first and the second straight edges.

Abstract: A projection system and a self-adaptive adjustment method are provided. The projection system includes a projection device, an image capturing device, and a processing device. The projection device sequentially projects sub-pattern arrays of a pattern array to a projection region of a projection surface. The image capturing device sequentially captures the sub-pattern arrays projected on the projection surface to output pattern images. The processing device analyzes the pattern images to obtain pattern coordinates and a pattern order of projected patterns in each pattern image. The processing device determines at least a part of the projected patterns to be effective patterns according to the pattern coordinates and the pattern order, and adjusts the projection device according to the effective patterns. The projection system and the self-adaptive adjustment method provide good projection quality.

Abstract: A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.

Abstract: A display system for displaying a panoramic image and an operation method thereof are provided. The display system for displaying a panoramic image includes N projectors and a controller. The N projectors project N sub-images according to N image data and form a panoramic image. Each sub-image has a sub-image overlapping area, so that two adjacent sub-images of the N sub-images partially overlap, and that a first sub-image and an Nth sub-image of the N sub-images partially overlap. The controller copies a first edge image corresponding to a first edge of an original image and connects the first edge image to a second edge of the original image that is opposite to the first edge, so as to generate an extended image corresponding to the sub-image overlapping area. The controller slices an adjusted image containing the original image and the extended image to generate the N image data.