Patents by Inventor Chi-Wen Kuo
Chi-Wen Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240369465Abstract: A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.Type: ApplicationFiled: July 21, 2024Publication date: November 7, 2024Inventors: CHWEN YU, EN TIAN LIN, CHI WEN KUO
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Patent number: 12105003Abstract: A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.Type: GrantFiled: August 30, 2021Date of Patent: October 1, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Chwen Yu, En Tian Lin, Chi Wen Kuo
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Publication number: 20240304480Abstract: The present disclosure provides a measuring system. The measuring system includes an insulative tube, a capacitor and a static charge meter. The insulative tube is configured to allow a fluid to flow therethrough. The capacitor is disposed on a surface of a section of the insulative tube. The capacitor includes a first metallic layer, a second metallic layer opposite to the first metallic layer, and a dielectric layer sandwiched between the first metallic layer and the second metallic layer. The static charge meter is electrically coupled to the capacitor and configured to measure static charge accumulated inside the section of the insulative tube.Type: ApplicationFiled: May 21, 2024Publication date: September 12, 2024Inventors: TZU-SOU CHUANG, CHWEN YU, EN TIAN LIN, CHI WEN KUO
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Patent number: 12020962Abstract: The present disclosure provides a measuring system. The measuring system includes an insulative tube, a capacitor and a static charge meter. The insulative tube is configured to allow a fluid to flow therethrough. The capacitor is disposed on a surface of a section of the insulative tube. The capacitor includes a first metallic layer, a second metallic layer opposite to the first metallic layer, and a dielectric layer sandwiched between the first metallic layer and the second metallic layer. The static charge meter is electrically coupled to the capacitor and configured to measure static charge accumulated inside the section of the insulative tube.Type: GrantFiled: August 30, 2021Date of Patent: June 25, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Tzu-Sou Chuang, Chwen Yu, En Tian Lin, Chi Wen Kuo
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Publication number: 20240189961Abstract: A slurry monitoring device, a CMP system and a method of in-line monitoring a slurry are provided. The slurry monitoring device incudes a slurry metrology cell, a plurality of light sources, at least one optical lens, and at least one optical detector. The slurry metrology cell accommodates a slurry. The light sources emit light beams on the slurry in the slurry metrology cell. The at least one optical lens is disposed between the plurality of light sources and the slurry metrology cell. The at least one optical lens modifies a size of a light spot of the light beams impinged on the slurry. The at least one optical detector detects an intensity of the light beams scattered by abrasive particles in the slurry.Type: ApplicationFiled: February 21, 2024Publication date: June 13, 2024Inventors: CHWEN YU, TING-WEN CHEN, CHI WEN KUO
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Patent number: 11938586Abstract: A slurry monitoring device, a CMP system and a method of in-line monitoring a slurry are provided. The slurry monitoring device incudes a slurry metrology cell, a plurality of light sources and at least one optical detector. The slurry metrology cell is configured to accommodating a slurry. The light sources are configured to emit light beams on the slurry in the slurry metrology cell. The light sources include a first light source configured to emit a first light beam having a first wavelength, and a second light source configured to emit a second light beam having a second wavelength longer than the first wavelength. The at least one optical detector is configured to detect an intensity of the light beams scattered by abrasive particles in the slurry.Type: GrantFiled: August 27, 2021Date of Patent: March 26, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Chwen Yu, Ting-Wen Chen, Chi Wen Kuo
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Publication number: 20230063350Abstract: The present disclosure provides a measuring system. The measuring system includes an insulative tube, a capacitor and a static charge meter. The insulative tube is configured to allow a fluid to flow therethrough. The capacitor is disposed on a surface of a section of the insulative tube. The capacitor includes a first metallic layer, a second metallic layer opposite to the first metallic layer, and a dielectric layer sandwiched between the first metallic layer and the second metallic layer. The static charge meter is electrically coupled to the capacitor and configured to measure static charge accumulated inside the section of the insulative tube.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: TZU-SOU CHUANG, CHWEN YU, EN TIAN LIN, CHI WEN KUO
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Publication number: 20230060960Abstract: A slurry monitoring device, a CMP system and a method of in-line monitoring a slurry are provided. The slurry monitoring device incudes a slurry metrology cell, a plurality of light sources and at least one optical detector. The slurry metrology cell is configured to accommodating a slurry. The light sources are configured to emit light beams on the slurry in the slurry metrology cell. The light sources include a first light source configured to emit a first light beam having a first wavelength, and a second light source configured to emit a second light beam having a second wavelength longer than the first wavelength. The at least one optical detector is configured to detect an intensity of the light beams scattered by abrasive particles in the slurry.Type: ApplicationFiled: August 27, 2021Publication date: March 2, 2023Inventors: CHWEN YU, TING-WEN CHEN, CHI WEN KUO
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Publication number: 20230066472Abstract: A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: CHWEN YU, EN TIAN LIN, CHI WEN KUO
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Publication number: 20200307161Abstract: A conductive textile according to the invention includes a fabric, a wire conductor and a metal sheet. The wire conductor is integrated with the fabric, and has a connection end. The metal sheet has a main body and a bent portion. The bent portion extends from the main body and is bent downward. The leading edge of the bent portion is flat or jagged. The metal sheet is pressed against an upper surface of the fabric and placed on the connection end. The main body is welded together with the connection end of the wire conductor by a welding process. The main body serves as a bonding pad.Type: ApplicationFiled: March 26, 2020Publication date: October 1, 2020Inventor: Chi-Wen KUO
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Method and apparatus for inspecting process solution, and sample preparation apparatus in inspection
Patent number: 10746635Abstract: A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.Type: GrantFiled: September 2, 2014Date of Patent: August 18, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tzu-Sou Chuang, Chi-Wen Kuo -
Patent number: 9714887Abstract: A detection method for a substance and a system thereof are provided. The detection method for a substance contained in a sample includes providing a reagent in reaction with the substance to form a chelate; and pressurizing the substance to accumulate the chelate.Type: GrantFiled: September 4, 2012Date of Patent: July 25, 2017Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chi-Wen Kuo, Yu-Kun Hung, Tzu-Sou Chuang
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Patent number: 9570653Abstract: A method for fabricating a light-emitting device is provided. The method includes: providing a substrate; forming a sacrificial dielectric layer on the substrate, wherein the sacrificial dielectric layer is a structure containing voids; forming a buffer layer on the sacrificial dielectric layer; forming an epitaxial light-emitting structure on the buffer layer; forming a metal bonding layer on the epitaxial light-emitting structure; bonding the metal bonding layer to a thermally conductive substrate; and wet etching the sacrificial dielectric layer for to remove the substrate.Type: GrantFiled: August 21, 2012Date of Patent: February 14, 2017Assignee: LEXTAR ELECTRONICS CORPORATIONInventors: Kuo-Lung Fang, Chi-Wen Kuo, Jun-Rong Chen, Chih-Hao Yang
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Publication number: 20160320359Abstract: A system for monitoring contaminations includes a moisture-containing chilating gas supply adapted to provide a moisture-containing chilating gas mixing with a purge gas evacuated from a chamber, a cooling device adapted to condense a mixed gas comprising the moisture-containing chilating gas and the purge gas into a droplet, an impinger adapted to collecting the droplet on a sampling tube wall and in the mixed gas, and a conductivity meter. The droplet is dissolved in a DI water in the impinger, and the conductivity meter measures a conductivity of a fluid including the droplet and the DI water in the impinger. The fluid with contaminations has higher conductivity than that without contaminations, such that the polluted chamber can be selected.Type: ApplicationFiled: April 29, 2015Publication date: November 3, 2016Inventors: Tzu-Sou CHUANG, Chi-Wen KUO
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Patent number: 9352263Abstract: Embodiments of mechanisms of an air treatment system are provided. The air treatment system includes a heating tank having a heating chamber containing air. The air includes gas, water vapor, a number of contaminants floating thereon. The air treatment system further includes a cooling tank having a first cooling chamber receiving the air from the heating chamber. Some of the water vapor in the first cooling tank condenses to a number of droplets, and some of the contaminants are mixed with into the droplets.Type: GrantFiled: December 27, 2013Date of Patent: May 31, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tzu-Sou Chuang, Chieh-Jan Huang, Chi-Wen Kuo
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METHOD AND APPARATUS FOR INSPECTING PROCESS SOLUTION, AND SAMPLE PREPARATION APPARATUS IN INSPECTION
Publication number: 20160061695Abstract: A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.Type: ApplicationFiled: September 2, 2014Publication date: March 3, 2016Inventors: Tzu-Sou CHUANG, Chi-Wen KUO -
Publication number: 20150182902Abstract: Embodiments of mechanisms of an air treatment system are provided. The air treatment system includes a heating tank having a heating chamber containing air. The air includes gas, water vapor, a number of contaminants floating thereon. The air treatment system further includes a cooling tank having a first cooling chamber receiving the air from the heating chamber. Some of the water vapor in the first cooling tank condenses to a number of droplets, and some of the contaminants are mixed with into the droplets.Type: ApplicationFiled: December 27, 2013Publication date: July 2, 2015Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tzu-Sou CHUANG, Chieh-Jan HUANG, Chi-Wen KUO
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Publication number: 20140065719Abstract: A detection method for a substance and a system thereof are provided. The detection method for a substance contained in a sample includes providing a reagent in reaction with the substance to form a chelate; and pressurizing the substance to accumulate the chelate.Type: ApplicationFiled: September 4, 2012Publication date: March 6, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chi-Wen Kuo, Yu-Kun Hung, Tzu-Sou Chuang
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Publication number: 20130062657Abstract: A light-emitting diode structure is disclosed. A substrate has a first semiconductor layer, a light-emitting layer and a second semiconductor layer formed thereon. The first and second semiconductor layers are of opposite conductivity types. A first contact electrode is disposed between the first semiconductor layer and the substrate, and has a protruding portion extending into the second semiconductor layer. A barrier layer is conformally formed on the first contact electrode and exposes a top surface of the protruding portion. A current blocking member is disposed on the barrier layer and around at least a sidewall of the protruding portion. A second contact electrode is disposed between the first semiconductor layer and the first contact electrode, and in direct contact with the first semiconductor layer, wherein the second contact electrode is electrically insulated from the first contact electrode by the barrier layer.Type: ApplicationFiled: September 13, 2012Publication date: March 14, 2013Applicant: LEXTAR ELECTRONICS CORPORATIONInventors: Kuo-Lung Fang, Jui-Yi Chu, Jun-Rong Chen, Chi-Wen Kuo
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Publication number: 20130048945Abstract: A method for fabricating a light-emitting device is provided. The method includes: providing a substrate; forming a sacrificial dielectric layer on the substrate, wherein the sacrificial dielectric layer is a structure containing voids; forming a buffer layer on the sacrificial dielectric layer; forming an epitaxial light-emitting structure on the buffer layer; forming a metal bonding layer on the epitaxial light-emitting structure; bonding the metal bonding layer to a thermally conductive substrate; and wet etching the sacrificial dielectric layer for to remove the substrate.Type: ApplicationFiled: August 21, 2012Publication date: February 28, 2013Applicant: LEXTAR ELECTRONICS CORPORATIONInventors: Kuo-Lung Fang, Chi-Wen Kuo, Jun-Rong Chen, Chih-Hao Yang