Patents by Inventor Chia-Hao Yu

Chia-Hao Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240120988
    Abstract: A method for SCell BFR performed by a UE is provided. The method includes: receiving a first SCell BFR configuration corresponding to a first SCell, the first SCell BFR configuration including at least one of a resource list for BFD and a resource list for NBI; detecting a beam failure condition in the first SCell by measuring at least one BFD reference signal; determining a first new candidate beam index for the first SCell based on the first SCell BFR configuration; and transmitting a beam failure recovery request that includes a cell index of the first SCell in which beam failure occurs and the determined first new candidate beam index.
    Type: Application
    Filed: July 17, 2023
    Publication date: April 11, 2024
    Inventors: Chia-Hao Yu, Chia-Hung Wei
  • Patent number: 11955515
    Abstract: A semiconductor device with dual side source/drain (S/D) contact structures and a method of fabricating the same are disclosed. The method includes forming a fin structure on a substrate, forming a superlattice structure on the fin structure, forming first and second S/D regions within the superlattice structure, forming a gate structure between the first and second S/D regions, forming first and second contact structures on first surfaces of the first and second S/D regions, and forming a third contact structure, on a second surface of the first S/D region, with a work function metal (WFM) silicide layer and a dual metal liner. The second surface is opposite to the first surface of the first S/D region and the WFM silicide layer has a work function value closer to a conduction band energy than a valence band energy of a material of the first S/D region.
    Type: Grant
    Filed: July 28, 2022
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Chuan Chiu, Chia-Hao Chang, Cheng-Chi Chuang, Chih-Hao Wang, Huan-Chieh Su, Chun-Yuan Chen, Li-Zhen Yu, Yu-Ming Lin
  • Patent number: 11955634
    Abstract: A particle structure of cathode material and a preparation method thereof is provided. Firstly, a precursor for forming a core is provided. The precursor includes at least nickel, cobalt and manganese. Secondly, a metal salt and a lithium ion compound are provided. The metal salt includes at least potassium, aluminum and sulfur. After that, the metal salt, the lithium ion compound and the precursor are mixed, and a mixture is formed. Finally, the mixture is subjected to a heat treatment step, and a cathode material particle structure is formed to include the core, a first coating layer coated on the core and a second coating layer coated on the first coating layer. The core includes potassium, aluminum and a Li-M-O based material. The first coating layer includes potassium and aluminum, and a potassium content of the first coating layer is higher than a potassium content of the core. The second coating layer includes sulfur.
    Type: Grant
    Filed: November 18, 2021
    Date of Patent: April 9, 2024
    Assignee: ADVANCED LITHIUM ELECTROCHEMISTRY CO., LTD.
    Inventors: Ching-Hao Yu, Nae-Lih Wu, Chia-Hsin Lin
  • Patent number: 11943030
    Abstract: A method for wireless communication performed by a user equipment (UE) is provided. The UE includes a plurality of antenna panels. The method includes transmitting, to a Base Station (BS), a UE capability message that includes a number of the plurality of antenna panels; and transmitting, to the BS, a panel report that includes information of the plurality of antenna panels, the information associated with at least one of a Synchronization Signal Block (SSB) and a Channel State Information Reference Signal (CSI-RS).
    Type: Grant
    Filed: May 6, 2020
    Date of Patent: March 26, 2024
    Assignee: FG Innovation Company Limited
    Inventors: Chia-Hao Yu, Hsin-Hsi Tsai, Chie-Ming Chou
  • Publication number: 20240089062
    Abstract: A wireless communication method and apparatus for handling radio resource collision are provided. The wireless communication method includes receiving a Radio Resource Control (RRC) configuration indicating a first Control Resource Set (CORESET) pool index associated with a Physical Uplink Control Channel (PUCCH) designated to carry Uplink Control Information (UCI); determining whether the PUCCH overlaps one or more Physical Uplink Shared Channels (PUSCHs) in time domain; after determining that the PUCCH overlaps at least one of the one or more PUSCHs in the time domain, multiplexing the UCI on a particular PUSCH of the one or more PUSCHs that is associated with the first CORESET pool index; and transmitting the UCI via the particular PUSCH.
    Type: Application
    Filed: March 31, 2022
    Publication date: March 14, 2024
    Inventors: WAN-CHEN LIN, CHIA-HAO YU, CHIA-HUNG LIN, HAI-HAN WANG
  • Publication number: 20240089943
    Abstract: A method performed by a user equipment for a beam operation is provided. The method includes: receiving an RRC configuration for configuring a set of joint TCI states; receiving, from the BS, a MAC CE for activating a subset of joint TCI states in the set of joint TCI states, the MAC CE is used to map the subset of joint TCI states to codepoints of a TCI field in DCI; receiving the DCI indicating a joint TCI state included in the subset of joint TCI states activated by the MAC CE; determining whether the DCI includes a DL assignment; transmitting, in response to reception of the DCI, first HARQ-ACK information in a case that the DCI does not include the DL assignment; and transmitting, in response to the reception of the DCI and reception of a PDSCH, second HARQ-ACK information in a case that the DCI includes the DL assignment.
    Type: Application
    Filed: January 12, 2022
    Publication date: March 14, 2024
    Applicant: FG Innovation Company Limited
    Inventors: CHIA-HAO YU, JIA-HONG LIOU, CHIA-HUNG LIN
  • Publication number: 20240073816
    Abstract: A method performed by a UE for saving power is provided. The method includes: receiving, from a Base Station (BS), control information that includes a Physical Downlink Control Channel (PDCCH) monitoring adaptation field, wherein the PDCCH monitoring adaptation field indicates a PDCCH skipping function; and monitoring, regardless of the PDCCH skipping function indicated by the PDCCH monitoring adaptation field, a PDCCH in a case that a Scheduling Request (SR) is transmitted on a Physical Uplink Control Channel (PUCCH) and is determined to be pending.
    Type: Application
    Filed: January 4, 2022
    Publication date: February 29, 2024
    Applicant: FG Innovation Company Limited
    Inventors: CHIA-HSIN LAI, HSIN-HSI TSAI, CHIA-HAO YU, MEI-JU SHIH
  • Patent number: 11915979
    Abstract: A method includes depositing a high-k gate dielectric layer over and along sidewalls of a semiconductor fin. The method further includes depositing an n-type work function metal layer over the high-k gate dielectric layer and performing a passivation treatment on the high-k gate dielectric layer through the n-type work function metal layer. The passivation treatment comprises a remote plasma process. The method further includes depositing a fill metal over the n-type work function metal layer to form a metal gate stack over the high-k gate dielectric layer. The metal gate stack comprising the n-type work function metal layer and the fill metal.
    Type: Grant
    Filed: July 20, 2022
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Pei Ying Lai, Chia-Wei Hsu, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui
  • Patent number: 11916133
    Abstract: Semiconductor devices and methods of forming the same are provided. In one embodiment, a semiconductor device includes a gate structure sandwiched between and in contact with a first spacer feature and a second spacer feature, a top surface of the first spacer feature and a top surface of the second spacer feature extending above a top surface of the gate structure, a gate self-aligned contact (SAC) dielectric feature over the first spacer feature and the second spacer feature, a contact etch stop layer (CESL) over the gate SAC dielectric feature, a dielectric layer over the CESL, a gate contact feature extending through the dielectric layer, the CESL, the gate SAC dielectric feature, and between the first spacer feature and the second spacer feature to be in contact with the gate structure, and a liner disposed between the first spacer feature and the gate contact feature.
    Type: Grant
    Filed: February 21, 2022
    Date of Patent: February 27, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Li-Zhen Yu, Lin-Yu Huang, Chia-Hao Chang, Cheng-Chi Chuang, Yu-Ming Lin, Chih-Hao Wang
  • Publication number: 20240064605
    Abstract: Methods are provided to support path selection for a remote UE configured with multipath in a UE-to-network relay. A direct path or an indirect path is set as the primary path. Side information of the indirect path is considered for path selection. A remote UE can select a suitable path by utilizing the side information for path selection to check whether an indirect path can fulfill the QoS requirement of arriving UL traffic. In a network-controlled path selection, the base station can request UE to send side information. The base station indicates the selected path or the change of primary path to the UE via explicit signaling. Each path is identified by a path ID. The path indication is in a granularity of per radio bearer, per QoS flow, per logical channel, or per logical channel group.
    Type: Application
    Filed: August 4, 2023
    Publication date: February 22, 2024
    Inventors: Guan-Yu Lin, Chia-Hao Yu, Chung-Yin Ho
  • Publication number: 20240040419
    Abstract: In an aspect of the disclosure, a method, a computer-readable medium, and a wireless communication system including a control device and one or more cells are provided. The control device configures triggering conditions for a user equipment (UE) to initiate transmission of specific uplink (UL) reference signals for UL radio resource management (RRM) measurements. The one or more cells detect the specific UL reference signals transmitted by the UE on specific UL RRM resources based on a reference timing when the triggering conditions are met at the UE. The one or more cells measure the specific UL reference signals to obtain measurement results. The control device decides for a carrier change or a cell change based on the measurement results of the one or more cells. The control device indicates to the UE a set of selected cells or carriers for the UE to connect.
    Type: Application
    Filed: July 11, 2023
    Publication date: February 1, 2024
    Inventors: Chia-Hao Yu, Din-Hwa Huang, Pei-Kai Liao
  • Publication number: 20240030358
    Abstract: A capacitor structure including a silicon material layer, a support frame layer, and a capacitor is provided. The support frame layer is disposed in the silicon material layer. The support frame layer has recesses. There is a cavity between two adjacent recesses. The support frame layer is located between the cavity and the recess. The support frame layer has a through hole directly above the cavity. The capacitor is disposed in the silicon material layer. The capacitor includes a first insulating layer and a first electrode layer. The first insulating layer is disposed on the support frame layer. The first electrode layer is disposed on the first insulating layer and fills the recess and the cavity.
    Type: Application
    Filed: September 16, 2022
    Publication date: January 25, 2024
    Applicant: Powerchip Semiconductor Manufacturing Corporation
    Inventors: Shih-Ping Lee, Yu-Cheng Lu, Chia-Hao Yu, Yeh-Yu Chiang
  • Patent number: 11882076
    Abstract: A method, performed by a User Equipment (UE), includes receiving, from a cell, configuration signaling configuring the UE with one or more PUCCH resources on an active UL BWP, the one or more PUCCH resources not being configured with PUCCH-SpatialRelationInfo, and the configuration signaling indicating that a default spatial relation behavior for PUSCH transmission scheduled by a DCI format 0_0 is enabled; receiving, from the cell, the DCI format 0_0 on an active DL BWP, the DCI format 0_0 providing scheduling information for a PUSCH; and transmitting the PUSCH according to the default spatial relation behavior which determines a spatial relation with reference to a QCL-TypeD RS corresponding to a QCL assumption of a pre-determined CORESET on the active DL BWP of the cell.
    Type: Grant
    Filed: April 18, 2022
    Date of Patent: January 23, 2024
    Assignee: Hannibal IP LLC
    Inventor: Chia-Hao Yu
  • Patent number: 11876592
    Abstract: A method for SCell BFR performed by a UE is provided. The method includes: receiving a first SCell BFR configuration corresponding to a first SCell, the first SCell BFR configuration including at least one of a resource list for BFD and a resource list for NBI; detecting a beam failure condition in the first SCell by measuring at least one BFD reference signal; determining a first new candidate beam index for the first SCell based on the first SCell BFR configuration; and transmitting a beam failure recovery request that includes a cell index of the first SCell in which beam failure occurs and the determined first new candidate beam index.
    Type: Grant
    Filed: September 12, 2022
    Date of Patent: January 16, 2024
    Assignee: Hannibal IP LLC
    Inventors: Chia-Hao Yu, Chia-Hung Wei
  • Publication number: 20240014073
    Abstract: A method of fabricating a semiconductor device is described. A plurality of fins is formed over a substrate. Dummy gates are formed patterned over the fins, each dummy gate having a spacer on sidewalls of the patterned dummy gates. Recesses are formed in the fins using the patterned dummy gates as a mask. A passivation layer is formed over the fins and in the recesses in the fins. The passivation layer is patterned to leave a remaining passivation layer only in some of the recesses in the fins. Source and drain regions are epitaxially formed only in the recesses in the fins without the remaining passivation layer.
    Type: Application
    Filed: August 9, 2023
    Publication date: January 11, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Yao Lin, Chao-Cheng Chen, Chih-Han Lin, Chen-Ping Chen, Ming-Ching Chang, Chia-Hao Yu, Hsiao Wen Lee
  • Patent number: 11863498
    Abstract: A user equipment and a method for handling a switching time period of downlink (DL)-uplink (UL) switching for half duplex-frequency division duplex operation are provided. The method includes: receiving a first configuration for a first active bandwidth part (BWP) with a first sub-carrier spacing (SCS), the first active BWP being one of an active UL BWP and an active DL BWP; receiving a second configuration for configuring a second active BWP with a second SCS, the second active BWP being another one of the active UL BWP and the active DL BWP; receiving a third configuration for the switching time period, the switching time period having a unit of symbol; performing communication with a Base Station (BS) on the first active BWP with the first SCS; and performing, after the switching time period, communication with the BS on the second active BWP with the second SCS.
    Type: Grant
    Filed: August 9, 2021
    Date of Patent: January 2, 2024
    Assignee: FG Innovation Company Limited
    Inventors: Wan-Chen Lin, Hai-Han Wang, Chia-Hao Yu
  • Patent number: 11854899
    Abstract: A method of fabricating a semiconductor device is described. A plurality of fins is formed over a substrate. Dummy gates are formed patterned over the fins, each dummy gate having a spacer on sidewalls of the patterned dummy gates. Recesses are formed in the fins using the patterned dummy gates as a mask. A passivation layer is formed over the fins and in the recesses in the fins. The passivation layer is patterned to leave a remaining passivation layer only in some of the recesses in the fins. Source and drain regions are epitaxially formed only in the recesses in the fins without the remaining passivation layer.
    Type: Grant
    Filed: July 15, 2021
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company Ltd.
    Inventors: Shih-Yao Lin, Chao-Cheng Chen, Chih-Han Lin, Chen-Ping Chen, Ming-Ching Chang, Chia-Hao Yu, Hsiao Wen Lee
  • Publication number: 20230413174
    Abstract: A method for a user equipment (UE) monitoring a physical downlink control channel (PDCCH) for power saving signaling is disclosed. The method comprises receiving a discontinuous reception (DRX) configuration from a base station (BS) to configure the UE to monitor a scheduling signal on the PDCCH within a DRX active time, and receiving a configuration from the BS to configure the UE to monitor the power saving signaling on the PDCCH and instructing the UE to wake up for monitoring the scheduling signal in the DRX active time, wherein the configuration includes a time in milliseconds prior to a start of a DRX on-duration time, and instructs the UE to start monitoring the PDCCH for the power saving signaling.
    Type: Application
    Filed: April 19, 2023
    Publication date: December 21, 2023
    Inventors: Yu-Hsin Cheng, Hsin-Hsi Tsai, Chia-Hao Yu, Chie-Ming Chou
  • Patent number: 11844069
    Abstract: A method for transmitting physical uplink shared channel (PUSCH) and a user equipment (UE) are provided. In the method, a configuration of a first PUSCH with a number of PUSCH repetitions is received. Physical Downlink Control Channel (PDCCH) which includes a Transmit Power Control (TPC) command is received. Whether the PDCCH is received within a number of symbols before a first symbol of a slot bundle is determined. In response to determining the PDCCH is received within the number of symbols before the first symbol of the slot bundle, the TPC command is applied for a first PUSCH transmission occasion within the slot bundle. In response to determining the PDCCH is not received within the number of symbols before the first symbol of the slot bundle, the TPC command is applied for a second PUSCH transmission occasion within a second slot bundle after the slot bundle.
    Type: Grant
    Filed: January 14, 2022
    Date of Patent: December 12, 2023
    Assignee: FG Innovation Company Limited
    Inventors: Hai-Han Wang, Chia-Hao Yu
  • Publication number: 20230397224
    Abstract: A user equipment (UE) and a method for power saving are provided. The method includes receiving a configuration indicating a plurality of search space set groups (SSSGs) that includes a first SSSG and one or more second SSSGs, the first SSSG being associated with a first SSSG identifier (ID); receiving downlink control information (DCI) on a physical downlink control channel (PDCCH) while monitoring the PDCCH on a UE-specific search space, the DCI including an information field indicating a value associated with the first SSSG ID; and starting PDCCH monitoring in the first SSSG and stopping PDCCH monitoring in the one or more second SSSGs from a slot that is at least a time offset after the last symbol of the DCI.
    Type: Application
    Filed: October 22, 2021
    Publication date: December 7, 2023
    Inventors: CHIA-HSIN LAI, HSIN-HSI TSAI, HAI-HAN WANG, MEI-JU SHIH, CHIA-HAO YU