Abstract: The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.

Abstract: The present invention provides a reticle pod comprising a lower cover and a support mechanism. The lower cover includes a carrying surface and a plurality of securing seats distributed on the carrying surface. The support mechanism includes a supporting portion extending upward for supporting a reticle or a reticle carrier, and a securing portion opposite the supporting portion, wherein the securing portion is detachably connected with a corresponding securing seat, so that the support mechanism can be selectively installed on the lower cover.

Abstract: The invention discloses a substrate container including a shell and a cover member. The shell defines an accommodation space, and has a bottom and at least one exhaust hole formed on the bottom, wherein the exhaust hole is adjacent to an opening of the shell. The cover member is mounted to the bottom of the shell, and the cover member and the bottom of the shell define a negative pressure cavity above and communicating with the at least one exhaust hole. An elongated exhaust hole is defined above the negative pressure cavity, and communicates with the negative pressure cavity and the accommodation space. A gas in the accommodation space is exhausted sequentially from the elongated exhaust hole, the negative pressure cavity and the at least one exhaust hole.

Abstract: Provided is a reticle pod with a detachable supporting mechanism, which is suitable for a dual pod, including an outer pod and an inner pod received therein, the inner pod including: a base, and at least a supporting mechanism, mounted on the base. The supporting mechanism includes: a supporting assembly, connected to a mounting interface of the base, the supporting assembly includes a seat, at least one limiting post, and a mounting hole, the at least one limiting post connects to the seat, the mounting hole penetrates the base and not a circular hole; and a supporting element, having a matching structure, so that the supporting element detachably received in the mounting hole.

Abstract: A door device includes a door body and a substrate retaining assembly. The substrate retaining assembly is disposed on a side of the door body. The substrate retaining assembly includes a retaining body and a plurality of retaining members. The retaining members are disposed on the retaining body and arranged at intervals. Each of the retaining members includes two elastic arms and a clamping structure. The clamping structure includes a clamping body, a clamping groove, and at least one relief portion. The clamping body is connected between the two elastic arms. The clamping groove is located on the clamping body and is communicated with adjacent ends of the elastic arms. The relief portion and the clamping groove are communicated to each other.

Abstract: A dry cleaning device adapted to clean a container component of a container of a semiconductor manufacturing process and adapted to clean the container component by carbon dioxide snowflakes. The dry cleaning device can first inspect the container component before and after cleaning, clean the container component by carbon dioxide snowflakes according to a predetermined cleaning working set, and forwards the container component to a next workstation once the cleaning of the container component is complete. The dry cleaning device is adapted to clean a container of a semiconductor manufacturing process in a fast and effective manner without involving any liquid solvents.

Abstract: The present disclosure provides a reticle pod comprising a base and at least one reticle support disposed on the base, the reticle support reticle support is arranged for carrying a reticle and has a resilient means. When the downward pressure applied to the reticle support is less than or equal to a critical value, a height of the reticle support is maintained at a predetermined height; when the downward pressure applied to the reticle support is greater than the critical value, the reticle support absorbs the downward pressure by deforming, and then the reticle support restores to the predetermined height only when the downward pressure is shared by another reticle support.

Abstract: The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.

Abstract: The present invention provides a dual pod including an inner pod and an outer pod. The inner pod has at least one engaging portion provided on a relative outside of the inner pod. The outer pod defines an accommodation space for receiving the inner pod. The outer pod has at least one guide mechanism provided on a relative inside of the outer pod, and the guide mechanism is guided by and limited at the engaging portion such that an offset movement of the inner pod within the outer pod is restricted.

Abstract: The invention discloses a substrate storage apparatus having a detecting device detachably connecting to an outer pod. The detecting device includes a sensing member having a sensing terminal, a cavity and a sensor. The sensing terminal detachably connects to the outer pod such that the sensing terminal exposes in an accommodating space inside of the outer pod. The cavity receiving the sensor extends to an outside of the outer pod and the accommodating space. The cavity communicates with the accommodating space through the sensing terminal, allowing the sensor to read information regarding the accommodating space.

Abstract: A valve cover for using in a substrate carrier includes a main body and plural elastic arms. The substrate carrier has a shell and a base disposed on a bottom of the shell. A purge valve is received at the bottom and a gas opening is provided on the base. The main body of the valve cover is disposed on the base, and the elastic arms are disposed on the main body and located at the gas opening. The elastic arms are used for fixing the valve cover between the bottom of the shell and the base. A top face of the valve cover is lower than a surface height of the base and a surface height of the purge valve.

Abstract: Provided is a substrate carrier including: a shell defining therein a wafer storage space; and at least one installation structure integrally formed with an inner wall of the shell and adapted to hold at least one gas diffuser, allowing the at least one gas diffuser to be disposed outside an operating range of a front end of a robotic arm. Not only is the installation structure of the substrate carrier structurally simplified, but the gas diffuser is also prevented from interfering with the robotic arm.

Abstract: A reticle pod with backside static dissipation has an inner pod defining an accommodation space for a reticle. Multiple flexible guiding components are correspondingly disposed on multiple outer mounting portions of the inner pod in order to guide an inner cover and an inner base of the inner pod to position without relative displacement. Multiple conductive retainers are correspondingly arranged in the accommodation space to push against a backside of the reticle and form a full-time electrical conduction with the back side of the reticle, so as to establish a static dissipation path by the conductive retainers and the inner pod. Meanwhile, with the conductive retainers pushing against the reticle as well as the flexible guiding components providing the inner cover and the inner base with automatic position guiding, the reticle is automatically pushed and positioned to a center position of the inner base.

Abstract: A method for containing a reticle in a pod is provided. The method includes opening the pod such that a pressing element retained movably on the pod by a limiting cap moves to a first position, wherein a shoulder part of the pressing element between a pressure receiving part and a pressing part of the pressing element is spaced from the limiting cap. The method further includes placing the reticle in the pod such that the reticle is pressed by the pressing element.

Abstract: A reticle pod with antistatic capability includes a base and plural of support members. The base has a carrying surface having a recess formed thereon and defined by a bottom surface. The support members encircle the carrying surface of the base and are adapted to support a reticle. The recess is defined by a depth extending between the carrying surface and the bottom surface. The depth ranges from 300 ?m to 3400 ?m to thereby weaken the electrostatic force exerted upon particles on the carrying surface.

Abstract: A door having a stabilization mechanism for a lock is provided. The door is suitable for a substrate carrier and includes a bottom plate, a cover and a limiting structure. The bottom plate and the cover define an accommodating space for accommodating a plurality of lock structures, each lock structure configured to move between an unlocked position and a locked position, an limiting structure is disposed between lock structure and the cover, and the limiting structure provides an elastic force corresponding to the displacement of the lock structures between the unlocked position and the locked position, such that the lock structures is maintained to move at a horizontal level under the elastic force. The structural design and configuration of the disclosure can prevent collision of substrate carrier or a problem of door drop resulted from the door falling to open/close smoothly.

Abstract: The present invention provides a reticle pod comprising a lower cover and a support mechanism. The lower cover includes a carrying surface and a plurality of securing seats distributed on the carrying surface. The support mechanism includes a supporting portion extending upward for supporting a reticle or a reticle carrier, and a securing portion opposite the supporting portion, wherein the securing portion is detachably connected with a corresponding securing seat, so that the support mechanism can be selectively installed on the lower cover.

Abstract: A substrate container including a container body, a filter member, a back cover is provided. The container body having a top face, a bottom face opposing the top face, a back plate of a first height connecting the top face and the bottom face, a front opening located between the top face and the bottom face, and a back opening opposing the front opening. The front opening enables passage of a substrate and the back opening is located on the back plate and has a smaller second height. The filter member covers the back opening. The back cover establishes sealing engagement with the container body. A gas guiding channel extending in a direction of the first height is formed between the back cover and the container body. The back cover and the filter member define a buffering compartment, and the gas guiding channel has an outlet connecting the buffering compartment.