Abstract: The invention discloses a reticle pod having a lid and multiple pin assemblies. The pin assembly includes a movable member movable relatively to a ceiling of the lid and an elastic member configured to arrange the movable member in between the elastic member and the ceiling of the lid. In the case where the reticle pod is provided without receiving a reticle, the ceiling of the reticle pod determines the movable member stays at a first level. In the case where the reticle pod is provided with a reticle, the elastic member collaborates with the movable member such that the movable member holds the reticle at a second level that is higher than the first level.

Abstract: A reticle pod includes a body, cover, sliding-rail member, sliding-fastening member and shut-corresponding element. The sliding-rail member has a dent portion and a slot portion and defines a locked direction. The dent portion extends from the slot portion in the locked direction. The sliding-fastening member is slidably disposed at the sliding-rail member. The sliding-fastening member has a fastening portion and resilient arms. The resilient arms are inserted into a slot of the slot portion. The fastening portion has a fastening groove corresponding in height to the slot portion. An oblique-guide surface is disposed above the fastening groove. When the cover switches from an open state to a closed state, the shut-corresponding element pushes the sliding-fastening member across the oblique-guide surface and thus compresses the sliding-fastening member, allowing the shut-corresponding element to enter the fastening groove.

Abstract: A method for containing a reticle in a pod is provided. The method includes opening the pod such that a pressing element retained movably on the pod by a limiting cap moves to a first position, wherein a shoulder part of the pressing element between a pressure receiving part and a pressing part of the pressing element is spaced from the limiting cap. The method further includes placing the reticle in the pod such that the reticle is pressed by the pressing element.

Abstract: A substrate container including a container body, a filter member, a back cover is provided. The container body having a top face, a bottom face opposing the top face, a back plate of a first height connecting the top face and the bottom face, a front opening located between the top face and the bottom face, and a back opening opposing the front opening. The front opening enables passage of a substrate and the back opening is located on the back plate and has a smaller second height. The filter member covers the back opening. The back cover establishes sealing engagement with the container body. A gas guiding channel extending in a direction of the first height is formed between the back cover and the container body. The back cover and the filter member define a buffering compartment, and the gas guiding channel has an outlet connecting the buffering compartment.

Abstract: The instant disclosure discloses a container system, comprising an inner base, configured to receive a workpiece, the inner base including a first treatment area that corresponds to a workpiece accommodating region, a second treatment area arranged around the first treatment area of the inner base, and a workpiece supporting post arranged at a border region between the first treatment area and the second treatment area.

Abstract: A reticle pod includes a body, cover, sliding-rail member, sliding-fastening member and shut-corresponding element. The sliding-rail member has a dent portion and a slot portion and defines a locked direction. The dent portion extends from the slot portion in the locked direction. The sliding-fastening member is slidably disposed at the sliding-rail member. The sliding-fastening member has a fastening portion and resilient arms. The resilient arms are inserted into a slot of the slot portion. The fastening portion has a fastening groove corresponding in height to the slot portion. An oblique-guide surface is disposed above the fastening groove. When the cover switches from an open state to a closed state, the shut-corresponding element pushes the sliding-fastening member across the oblique-guide surface and thus compresses the sliding-fastening member, allowing the shut-corresponding element to enter the fastening groove.

Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

Abstract: A reticle storage device includes a top lid having a ceiling and a cover surrounding the ceiling, and a bottom lid having a carrier and a peripheral structure surrounding the carrier. When the top lid engages with the bottom lid, a passage is defined therebetween and therefore the reticle storage device is not sealed.

Abstract: A reticle pressing unit and an EUV reticle pod using the same are provided. An inner assembly includes an upper cover and a lower cover. The lower cover includes a supporting element for supporting the reticle. A pressing unit for pressing the reticle is disposed on the upper cover and includes a pressing element and a limiting cap. The pressing element has oppositely arranged pressing part and pressure receiving part. The pressing part extends through the upper cover to press against the reticle. The pressing element is covered by the limiting cap and is protruded outwardly from a top surface of the limiting cap. An outer cover has a pushing surface for forming a surface-to-surface contact with the pressure receiving part and for simultaneously pressing against the pressure receiving part and the top surface to solve the problems relating to the reticle which is applied with uneven forces.

Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

Abstract: A method and a system of measuring air-tightness and a container measured thereby are provided. In the method, a first cover having a first contact surface and a first base having a second contact surface are provided. The two contact surfaces are used for engaging with each other to form an air-tight state. Further, a first contour curve relating to the first contact surface and a second contour curve relating to the second contact surface are acquired. Then, the two contour curves are brought into contact with each other, and the area of a first gap between the two curves is determined. When the area of the first gap is equal to or smaller than a threshold, the first cover and the first base are paired as a first combination of acceptable air-tightness so as to form the container.

Abstract: A reticle retaining system comprising an inner pod and an outer pod. The inner pod comprises an inner base and an inner cover configured to couple to the inner base thereby forming an interior for housing a received workpiece, and a hold down pin movably arranged through the inner cover and configured to press the received workpiece. The outer pod comprises an outer base configured to receive the inner base, an outer cover, and a pushing element. Wherein the hold down pin, the outer cover and the pushing element have charge dissipation property. When the pushing element pushes the hold down pin to press the workpiece, a charge dissipation path from the received workpiece, through the hold down pin and the pushing element, to the outer cover is established.

Abstract: A quick release purge valve and a substrate container using same are provided. The container includes a base which has a cover plate and a bottom plate. The quick release purge valve includes a snap plate, a gasket fitting, and a valve element. The snap plate detachably engages with the bottom plate and is at most evenly aligned with the bottom plate. The gasket fitting is disposed between the cover plate and the bottom plate and has an airflow conduit communicating the two plates. The valve element is disposed in the conduit for limiting a flow direction of the gas. The gasket fitting is fixed in the base when the snap plate and the bottom plate are in an engaged state and is removable from the base when the snap plate and the bottom plate are in a disengaged state.

Abstract: The invention discloses a reticle storage device including a top lid, a bottom lid and a soft contact member. The top lid has a ceiling and a cover surrounding the ceiling. The bottom lid has a carrier and a peripheral structure surrounding the carrier. The soft contact member is configured to laterally extend in between the cover and the peripheral structure when the top lid and the bottom lid engage with each other, and to extend from an inside to an outside of the device in order to buffer the contact among the two lids.

Abstract: A reticle storage device includes a top lid having a ceiling and a cover surrounding the ceiling, and a bottom lid having a carrier and a peripheral structure surrounding the carrier. When the top lid engages with the bottom lid, a passage is defined therebetween and therefore the reticle storage device is not sealed.

Abstract: The present invention provides a quick-release valve module which includes a flexible grommet defining a channel, and a piston having a disc portion at an end thereof, wherein the disc portion of the piston is exposed to the flexible grommet.

Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

Abstract: A quick release purge valve and a substrate container using the same are provided. The substrate container has a base including a bottom plate, a cover plate, and a quick release purge valve. The quick release purge valve includes a snap plate, a gasket fitting, and a valve element. The snap plate detachably engages with the bottom plate and is at most evenly aligned with the bottom plate. The gasket fitting is disposed between the cover plate and the bottom plate and has an airflow conduit communicating the two plates. The valve element is disposed in the conduit for limiting a flow direction of the gas. The gasket fitting is fixed in the base when the snap plate and the bottom plate are in an engaged state and is removable from the base when the snap plate and the bottom plate are in a disengaged state.

Abstract: A reticle pod with a spoiler structure includes a body and a cover. A reticle allocation area is centrally disposed at the body. The cover covers the body. A peripheral area of the cover and a peripheral area of the body are fitted together by a protruding portion and a dented portion. The dented portion and the protruding portion jointly form a spoiler structure surrounding the reticle allocation area. The spoiler structure includes a spoiler passage between the dented portion and the protruding portion. The body has at least one retreated sidewall corresponding in position to the spoiler passage to form a particle-collecting space. Particles carried by external air current which enters the spoiler passage end up in the particle-collecting space and thus are denied entry into the reticle allocation area.

Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.