Patents by Inventor Chia-Hua Lin

Chia-Hua Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11682692
    Abstract: In some embodiments, the present disclosure relates to a display device that includes a reflector electrode coupled to an interconnect structure. An isolation structure is disposed over the reflector electrode, and a transparent electrode is disposed over the isolation structure. Further, an optical emitter structure is disposed over the transparent electrode. A via structure extends from a top surface of the isolation structure to the reflector electrode and comprises an outer portion that directly overlies the top surface of the isolation structure. A hard mask layer is arranged directly between the top surface of the isolation structure and the outer portion of the via structure.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: June 20, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Hua Lin, Hsun-Chung Kuang, Yu-Hsing Chang, Yao-Wen Chang
  • Publication number: 20220359609
    Abstract: In some embodiments, the present disclosure relates to a display device that includes a reflector electrode coupled to an interconnect structure. An isolation structure is disposed over the reflector electrode, and a transparent electrode is disposed over the isolation structure. Further, an optical emitter structure is disposed over the transparent electrode. A via structure extends from a top surface of the isolation structure to the reflector electrode and comprises an outer portion that directly overlies the top surface of the isolation structure. A hard mask layer is arranged directly between the top surface of the isolation structure and the outer portion of the via structure.
    Type: Application
    Filed: July 26, 2022
    Publication date: November 10, 2022
    Inventors: Chia-Hua Lin, Hsun-Chung Kuang, Yu-Hsing Chang, Yao-Wen Chang
  • Patent number: 11456555
    Abstract: A safety socket is disclosed, comprising a socket body, an outer mold sleeve, a torsion rotating spring and a protective block body, and when any foreign object may be potentially inserted into the socket body, the foreign object will be effectively blocked by the protective block body such that it cannot smoothly enter therein, thus achieving the feature of safety protection.
    Type: Grant
    Filed: June 15, 2021
    Date of Patent: September 27, 2022
    Inventor: Chia-Hua Lin
  • Publication number: 20220252466
    Abstract: An ear-pod type thermometer includes a base and an ear part. The ear part is inserted into a user's ear. The ear part includes a temperature sensor which detects the user's temperature. The base includes at least one light emitting member which displays different colors of light responsive to the detected temperature, so that the wearer's temperature can be displayed and easily monitored.
    Type: Application
    Filed: February 8, 2021
    Publication date: August 11, 2022
    Inventors: Chun-Liang Yeh, Chia-Hua Lin, Mei-Jou Huang, Shu-Ni Lee
  • Publication number: 20220173290
    Abstract: A method for manufacturing reflective structure is provided. The method includes the operations as follows. A metallization structure is received. A plurality of conductive pads are formed over the metallization structure. A plurality of dielectric stacks are formed over the conductive pads, respectively, wherein the thicknesses of the dielectric stacks are different. The dielectric stacks are isolated by forming a plurality of trenches over a plurality of intervals between each two adjacent dielectric stacks.
    Type: Application
    Filed: February 18, 2022
    Publication date: June 2, 2022
    Inventors: CHIA-HUA LIN, YAO-WEN CHANG, CHII-MING WU, CHENG-YUAN TSAI, EUGENE I-CHUN CHEN, TZU-CHUNG TSAI
  • Patent number: 11257997
    Abstract: A semiconductor structure is provided. The semiconductor structure includes metallization structure, a plurality of conductive pads, and a dielectric layer. The plurality of conductive pads is over the metallization structure. The dielectric layer is on the metallization structure and covers the conductive pad. The dielectric layer includes a first dielectric film, a second dielectric film, and a third dielectric film. The first dielectric film is on the conductive pad. The second dielectric film is on the first dielectric film. The third dielectric film is on the second dielectric film. The a refractive index of the first dielectric film is smaller than a refractive index of the second dielectric film, and the refractive index of the second dielectric film is smaller than a refractive index of the third dielectric film.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: February 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chia-Hua Lin, Yao-Wen Chang, Chii-Ming Wu, Cheng-Yuan Tsai, Eugene I-Chun Chen, Tzu-Chung Tsai
  • Publication number: 20210384413
    Abstract: Various embodiments of the present disclosure are directed towards a method for forming an integrated chip. The method includes forming a memory cell stack over a substrate. The memory cell stack includes a top electrode. A sidewall spacer structure is formed around the memory cell stack. The sidewall spacer structure includes a first sidewall spacer layer, a second sidewall spacer layer, and a protective sidewall spacer layer sandwiched between the first and second sidewall spacer layers. A dielectric structure is formed over the sidewall spacer structure. A first etch process is performed on the dielectric structure and the second sidewall spacer layer to define an opening above the top electrode. The second sidewall spacer layer and the dielectric structure are etched at a higher rate than the protective sidewall spacer layer during the first etch process. A top electrode via is formed within the opening.
    Type: Application
    Filed: August 19, 2021
    Publication date: December 9, 2021
    Inventors: Yao-Wen Chang, Chung-Chiang Min, Harry-Hak-Lay Chuang, Hung Cho Wang, Tsung-Hsueh Yang, Yuan-Tai Tseng, Sheng-Huang Huang, Chia-Hua Lin
  • Patent number: 11148765
    Abstract: An inflatable platform that is utilized on the ocean or other bodies of water for relaxation, entertainment, or other recreational purposes includes two floating bodies. The larger floating body has a recess with a mesh panel so the user may access water filtered by the mesh panel while relaxing on the larger floating body. The user may place the smaller floating body next to the larger floating body to create more space for another user or may put the smaller floating body into the recess and use the present invention as a swim platform, tanning deck, or other recreational purpose.
    Type: Grant
    Filed: February 4, 2020
    Date of Patent: October 19, 2021
    Inventors: Frank Pieschel, Francois Gagnon, Eric Gagnon, Chia Hua Lin, Nicholas Pieschel
  • Patent number: 11121308
    Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a magnetoresistive random access memory (MRAM) cell over a substrate. A dielectric structure overlies the substrate. The MRAM cell is disposed within the dielectric structure. The MRAM cell includes a magnetic tunnel junction (MTJ) sandwiched between a bottom electrode and a top electrode. A conductive wire overlies the top electrode. A sidewall spacer structure continuously extends along a sidewall of the MTJ and the top electrode. The sidewall spacer structure includes a first sidewall spacer layer, a second sidewall spacer layer, and a protective sidewall spacer layer sandwiched between the first and second sidewall spacer layers. The first and second sidewall spacer layers comprise a first material and the protective sidewall spacer layer comprises a second material different than the first material.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: September 14, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yao-Wen Chang, Chung-Chiang Min, Harry-Hak-Lay Chuang, Hung Cho Wang, Tsung-Hsueh Yang, Yuan-Tai Tseng, Sheng-Huang Huang, Chia-Hua Lin
  • Publication number: 20210265417
    Abstract: In some embodiments, the present disclosure relates to a display device that includes a reflector electrode coupled to an interconnect structure. An isolation structure is disposed over the reflector electrode, and a transparent electrode is disposed over the isolation structure. Further, an optical emitter structure is disposed over the transparent electrode. A via structure extends from a top surface of the isolation structure to the reflector electrode and comprises an outer portion that directly overlies the top surface of the isolation structure. A hard mask layer is arranged directly between the top surface of the isolation structure and the outer portion of the via structure.
    Type: Application
    Filed: May 11, 2020
    Publication date: August 26, 2021
    Inventors: Chia-Hua Lin, Hsun-Chung Kuang, Yu-Hsing Chang, Yao-Wen Chang
  • Patent number: 11088487
    Abstract: An outdoor socket structure is disclosed, comprising an armature part and an outer cladding part enveloping on the surface of the armature part, wherein the armature part includes a fixation base and a top lid, and the inside of the fixation base is correspondingly configured with three fixing channels thereby allowing to position and connect electrode boards having different polarities, and one ends on the different power terminals of the plug part can be respectively connected onto the electrode boards having different polarities, while the other ends thereof extend out between the top lid and the fixation base, such that the electrode boards having different polarities can be connected to different power terminals without having to use power wires thus reducing labor and material costs.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: August 10, 2021
    Inventor: Chia-Hua Lin
  • Publication number: 20210202809
    Abstract: A semiconductor structure is provided. The semiconductor structure includes metallization structure, a plurality of conductive pads, and a dielectric layer. The plurality of conductive pads is over the metallization structure. The dielectric layer is on the metallization structure and covers the conductive pad. The dielectric layer includes a first dielectric film, a second dielectric film, and a third dielectric film. The first dielectric film is on the conductive pad. The second dielectric film is on the first dielectric film. The third dielectric film is on the second dielectric film. The a refractive index of the first dielectric film is smaller than a refractive index of the second dielectric film, and the refractive index of the second dielectric film is smaller than a refractive index of the third dielectric film.
    Type: Application
    Filed: December 31, 2019
    Publication date: July 1, 2021
    Inventors: CHIA-HUA LIN, YAO-WEN CHANG, CHII-MING WU, CHENG-YUAN TSAI, EUGENE I-CHUN CHEN, TZU-CHUNG TSAI
  • Patent number: 11024774
    Abstract: Various embodiments of the present disclosure are directed towards a display device. The display device includes an isolation structure disposed over a semiconductor substrate. An electrode is disposed at least partially over the isolation structure. A light-emitting structure is disposed over the electrode. A conductive reflector is disposed below the isolation structure and electrically coupled to the electrode. The conductive reflector is disposed at least partially between sidewalls of the light-emitting structure. The conductive reflector comprises a non-metal-doped aluminum material.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: June 1, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yao-Wen Chang, Tzu-Chung Tsai, Yen-Chang Chu, Chia-Hua Lin
  • Patent number: D929942
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: September 7, 2021
    Inventor: Chia-Hua Lin
  • Patent number: D929943
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: September 7, 2021
    Inventor: Chia-Hua Lin
  • Patent number: D946530
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: March 22, 2022
    Inventor: Chia-Hua Lin
  • Patent number: D946531
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: March 22, 2022
    Inventor: Chia-Hua Lin
  • Patent number: D964940
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: September 27, 2022
    Inventor: Chia-Hua Lin
  • Patent number: D978802
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: February 21, 2023
    Inventor: Chia-Hua Lin
  • Patent number: D988268
    Type: Grant
    Filed: October 27, 2021
    Date of Patent: June 6, 2023
    Inventor: Chia-Hua Lin