Patents by Inventor Chia-Wen Cheng

Chia-Wen Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus with a check function for controlling a flow resistance of a photoresist solution
    Patent number: 6338361
    Abstract: The present invention provides a flow-control apparatus with a check function for controlling the flow resistance of a photoresist solution. The apparatus is connected to a photoresist supply device, the photoresist supply device comprising a tank for storing the photoresist solution, a pipe partially submerged in the photoresist solution in the tank to transport the photoresist solution, and a pump for drawing the photoresist solution from the tank. The apparatus comprises a housing and a sphere. The housing comprises a chamber, a top opening positioned at the top of the chamber, and a bottom opening positioned at the bottom of the chamber, wherein the top opening can be mated to an end of the pipe or to a bottom opening of another apparatus. The sphere is moveably set inside the chamber of the housing and increases the flow resistance of the photoresist solution.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: January 15, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Chung-Hsien Kao, Ying-Ming Cheng, Li-Chung Lee, Chia-Wen Cheng
  • Apparatus with a check function for controlling a flow resistance of a photoresist solution
    Publication number: 20010042565
    Abstract: The present invention provides a flow-control apparatus with a check function for controlling the flow resistance of a photoresist solution. The apparatus is connected to a photoresist supply device, the photoresist supply device comprising a tank for storing the photoresist solution, a pipe partially submerged in the photoresist solution in the tank to transport the photoresist solution, and a pump for drawing the photoresist solution from the tank. The apparatus comprises a housing and a sphere. The housing comprises a chamber, a top opening positioned at the top of the chamber, and a bottom opening positioned at the bottom of the chamber, wherein the top opening can be mated to an end of the pipe or to a bottom opening of another apparatus. The sphere is moveably set inside the chamber of the housing and increases the flow resistance of the photoresist solution.
    Type: Application
    Filed: February 4, 2000
    Publication date: November 22, 2001
    Applicant: WINSTON HSU
    Inventors: Chung-Hsien Kao, Ying-Ming Cheng, Li-Chung Lee, Chia-Wen Cheng