Patents by Inventor Chien-Hung Lai
Chien-Hung Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240305016Abstract: An example apparatus may include a first antenna having a first radiator and a first ground plane and a second antenna having a second radiator and a second ground plane. In some examples, a hybrid antenna may be formed through coupling of the hybrid antenna to components of the first antenna and the second antenna. The hybrid antenna may include a third radiator. In some examples, an electrical interface may be disposed between the first antenna and the second antenna. In this regard, the electrical interface may couple the first ground plane to the second ground plane to form the third radiator.Type: ApplicationFiled: September 11, 2020Publication date: September 12, 2024Applicant: Hewlett-Packard Development Company, L.P.Inventors: CHIN-HUNG MA, CHIEN-PAI LAI, PAI-CHENG HUANG, TSAI-YUN CHUANG
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Patent number: 12087705Abstract: A package structure is provided. The package structure includes a substrate and a chip-containing structure bonded to the substrate. The package structure also includes a warpage-control element attached to the substrate. The warpage-control element has a protruding portion extending into the substrate.Type: GrantFiled: April 21, 2023Date of Patent: September 10, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu-Sheng Lin, Chien-Hung Chen, Po-Chen Lai, Po-Yao Lin, Shin-Puu Jeng
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Patent number: 11480869Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.Type: GrantFiled: April 15, 2020Date of Patent: October 25, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Chien-Hung Lai, Hao-Ming Chang, Chia-Shih Lin, Hsuan-Wen Wang, Yu-Hsin Hsu, Chih-Tsung Shih, Yu-Hsun Wu
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Publication number: 20220283496Abstract: The present disclosure provides a photomask, including a plurality of pattern areas, each of the pattern areas is defined by a respective boundary, a first pattern area including a first mask feature, and a training area adjacent to a boundary of the pattern area, the training area comprising a first training feature, wherein the first training feature is comparable to the first mask feature.Type: ApplicationFiled: March 3, 2021Publication date: September 8, 2022Inventors: CHIEN-HUNG LAI, HAO-MING CHANG, HSUAN-WEN WANG, CHING-TING YANG, CHENG-KUANG CHEN, CHIEN-CHAO HUANG
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Publication number: 20210063869Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.Type: ApplicationFiled: April 15, 2020Publication date: March 4, 2021Inventors: CHIEN-HUNG LAI, HAO-MING CHANG, CHIA-SHIH LIN, HSUAN-WEN WANG, YU-HSIN HSU, CHIH-TSUNG SHIH, YU-HSUN WU
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Patent number: 10816891Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.Type: GrantFiled: April 6, 2017Date of Patent: October 27, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hao-Ming Chang, Chien-Hung Lai, Cheng-Ming Lin, Hsuan-Wen Wang, Min-An Yang, S. C. Hsu, Shao-Chi Wei, Yuan-Chih Chu
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Patent number: 10543367Abstract: The invention provides transcranial electrostimulation by combining transcranial direct current stimulation (tDCS) and theta burst stimulation (TBS) to achieve an unexpected therapeutic effect in various brain or neural diseases. Accordingly, the invention provides a mode of direct current with biphasic square wave pulses in the treatment of brain or neural diseases. Also provided are methods of employing the transcranial electrostimulation of the invention and applications of the transcranial electrostimulation of the invention.Type: GrantFiled: June 18, 2015Date of Patent: January 28, 2020Assignees: TAIPEI MEDICAL UNIVERSITY, NATIONAL APPLIED RESEARCH LABORATORIESInventors: Chih-Wei Peng, Shih-Ching Chen, Yu Ting Li, Hsiang Ching Lee, Jia-Jin J. Chen, Tsung-Hsun Hsieh, Chien-Hung Lai, Jiunn-Horng Kang
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Publication number: 20190386258Abstract: A battery structure of an electric motorcycle is provided. The battery includes a casing and a top lid and a bottom respectively mounted to a top and a bottom of the casing. The casing is provided therein with a battery core. The top lid and the bottom lid are each provided, in a circumferentially arranged manner, with a coupling flange on one side thereof facing a direction of combination with the casing. The coupling flange is provided with a fitting groove, which receives a sealing ring to embed therein. An outside surface of the sealing ring is in tight engagement with an inside surface of the casing, so as to prevent external water and dust from getting into an interior of the battery to improve performance and lifespan of the battery.Type: ApplicationFiled: May 24, 2019Publication date: December 19, 2019Inventors: CHIEN-HUNG LAI, JEN-CHIEH CHENG
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Patent number: 10302587Abstract: Test strip and method of operating thereof are provided. The test strip, from the top down, comprises a cover, an insulating layer, an electrode set, and a substrate. More particularly, the electrode set at least comprises a first electrode, a second electrode, and a third electrode. The insulating layer comprises a track, and the cover comprises an inlet, an indication line, and at least one vent. With the third electrode and the indication line in accordance with the present invention, a user may confirm the operation status of the test strip and the loading status of biological samples with ease to improve the accuracy of testing.Type: GrantFiled: March 29, 2016Date of Patent: May 28, 2019Assignee: BROADMASTER BIOTECH CORP.Inventors: Chien-Hung Lai, Ya-Sian Lin, Fan-Yu Chen
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Patent number: 10144101Abstract: A headstock assembly for a machine tool includes a mount having a female threaded bore, a headstock mounted slidably relative to the machine base, a drive member mounted on the headstock, a spindle, and a spindle extension. The spindle has an intermediate segment disposed in a chamber of the headstock and coupled to be driven by the drive member so as to permit the spindle to rotate about a spindle axis. The spindle extension is coupled to be rotatable with the spindle, and has a male threaded segment configured to be in threaded engagement with the female threaded bore so as to permit the headstock to be linearly moved relative to the mount.Type: GrantFiled: February 16, 2017Date of Patent: December 4, 2018Assignee: HIWIN TECHNOLOGIES CORPORATIONInventors: Chien-Hsiang Tsai, Chih-Wei Wang, Chien-Hung Lai, Chung-Sheng Hsu
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Publication number: 20180229336Abstract: A headstock assembly for a machine tool includes a mount having a female threaded bore, a headstock mounted slidably relative to the machine base, a drive member mounted on the headstock, a spindle, and a spindle extension. The spindle has an intermediate segment disposed in a chamber of the headstock and coupled to be driven by the drive member so as to permit the spindle to rotate about a spindle axis. The spindle extension is coupled to be rotatable with the spindle, and has a male threaded segment configured to be in threaded engagement with the female threaded bore so as to permit the headstock to be linearly moved relative to the mount.Type: ApplicationFiled: February 16, 2017Publication date: August 16, 2018Applicant: HIWIN TECHNOLOGIES CORP.Inventors: Chien-Hsiang TSAI, Chih-Wei WANG, Chien-Hung LAI, Chung-Sheng HSU
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Publication number: 20180164675Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.Type: ApplicationFiled: April 6, 2017Publication date: June 14, 2018Inventors: Hao-Ming CHANG, Chien-Hung LAI, Cheng-Ming LIN, Hsuan-Wen WANG, Min-An YANG, S. C. HSU, Shao-Chi WEI, Yuan-Chih CHU
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Patent number: 9869654Abstract: A method of measuring hematocrit (HCT) and a measurement device using in the method and depends on an electrode test specimen to create a capacitor charging effect and consequential change in discharge current for measurement of hematocrit. The method of measuring hematocrit comprises steps as follows: (a) Instill blood into a pair of test electrodes which is installed in the present invention and apply a voltage to the pair of test electrodes; (b) Remove the voltage applied to the pair of test electrodes and measure a discharge current value; (c) Refer to a predetermined decision rule and the discharge current to obtain a hematocrit value for blood. As such, the present invention which relies on an electrode test specimen in measurement of hematocrit corresponding to a discharge current value during electric discharge contributes to precision and reliability in contrast to conventional hematocrit tests.Type: GrantFiled: November 29, 2013Date of Patent: January 16, 2018Assignee: Broadmaster Biotech Corp.Inventors: Yi-Lung Chen, Chien-Hung Lai, Po-Hao Lin, Ya-Sian Lin, Yi-Chen Chen, Fang-Yi Jiang, Shu-Wei Yang, Yu-Hsuan Tai, Shih-Jen Lu
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Publication number: 20170284955Abstract: Test strip and method of operating thereof are provided. The test strip, from the top down, comprises a cover, an insulating layer, an electrode set, and a substrate. More particularly, the electrode set at least comprises a first electrode, a second electrode, and a third electrode. The insulating layer comprises a track, and the cover comprises an inlet, an indication line, and at least one vent. With the third electrode and the indication line in accordance with the present invention, a user may confirm the operation status of the test strip and the loading status of biological samples with ease to improve the accuracy of testing.Type: ApplicationFiled: March 29, 2016Publication date: October 5, 2017Inventors: CHIEN-HUNG LAI, YA-SIAN LIN, FAN-YU CHEN
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Patent number: 9689805Abstract: A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect candidates. The method further includes applying a second test regimen to the manufactured product to identify product defects. The second test regimen produces a second set of defect candidates, and the second test regimen is different from the first test regimen. The method also includes generating a first filtered defect set by eliminating ones of the first set of defect candidates that are not identified in the second set of defect candidates.Type: GrantFiled: June 23, 2015Date of Patent: June 27, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Biow-Hiem Ong, Chih-Chiang Tu, Chien-Hung Lai, Jong-Yuh Chang, Kuang-Yu Liu
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Patent number: 9529255Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.Type: GrantFiled: December 4, 2013Date of Patent: December 27, 2016Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Meng-Lin Lu, Ching-Ting Yang, Chun-Jen Chen, Chien-Hung Lai, Jong-Yuh Chang
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Publication number: 20160367804Abstract: The invention provides transcranial electrostimulation by combining transcranial direct current stimulation (tDCS) and theta burst stimulation (TBS) to achieve an unexpected therapeutic effect in various brain or neural diseases. Accordingly, the invention provides a mode of direct current with biphasic square wave pulses in the treatment of brain or neural diseases. Also provided are methods of employing the transcranial electrostimulation of the invention and applications of the transcranial electrostimulation of the invention.Type: ApplicationFiled: June 18, 2015Publication date: December 22, 2016Inventors: CHIH-WEI PENG, SHIH-CHING CHEN, YU TING LI, HSIANG CHING LEE, JIA-JIN J. CHEN, TSUNG-HSUN HSIEH, CHIEN-HUNG LAI, JIUNN-HORNG KANG
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Patent number: 9308593Abstract: An angle-adjustable thread processing machine includes a base, a rocker arm, a rocker-arm toothed wheel, an idle wheel, a driven toothed wheel, and a processing unit. The base includes a power source with a drive shaft. The rocker arm is fixed to the drive shaft which rotates about a drive axis. The rocker-arm toothed wheel is pivotally sleeved on the drive shaft. The idle wheel is pivotally disposed on the rocker arm and engaged with the rocker-arm toothed wheel. The driven toothed wheel is pivotally disposed on the rocker arm to engage with the idle wheel and rotates around a driven axis which is located a first distance D1 from the drive axis. The processing unit includes a machining spindle fixed to the driven toothed wheel, and a machining head which rotates around a machining-head axis which is located a second distance D2 from the driven axis, and D1=D2.Type: GrantFiled: April 2, 2014Date of Patent: April 12, 2016Assignee: Hiwin Technologies Corp.Inventors: Chien-Hsiang Tsai, Chih-Wei Wang, Chien-Hung Lai
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Publication number: 20160084793Abstract: An electrode reaction area testing method of biosensor test strip includes: (1) preparing a semi-finished or finished test strip product having at least one sensing window corresponding to an electrode reaction area; a plural electrodes exposed from the electrode reaction area; (2) detecting the electrode reaction current of the electrode reaction area to obtain a first electrode reaction current and a third electrode reaction current; (3) calculating a current ratio of the first electrode reaction current to the third electrode reaction current; (4) determining the current ratio; (5) completing the detection of the electrode reaction area to determine whether the semi-finished or finished test strip product is good or defective, so as to test the accuracy of the separating plate attaching position or the insulating position and the applicability of the electrode reaction area in the manufacture of the test strip.Type: ApplicationFiled: September 18, 2014Publication date: March 24, 2016Inventors: YI LUNG CHEN, CHIEN HUNG LAI, YA SIAN LIN, FANG YI JIANG, CHIH CHUN YU, YI CHUNG CHANG
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Patent number: 9205443Abstract: A metal mask manufacturing method includes: (a) disposing a first anti-etching layer having a first void region on a first face of a substrate; (b) disposing a second anti-etching layer on a second face of the substrate opposite to the first face, wherein a second void region of the second anti-etching layer is corresponding to the first void region; (c) performing a first etching on the first face and the second face to form a first concave part and a second concave part separated by a part of the substrate; (d) disposing a protecting layer filled into the first concave part; (e) performing a second etching from the second face to produce a void between the first concave part and the second concave part; (f) removing the second anti-etching layer; and (g) performing a third etching from the second face.Type: GrantFiled: December 5, 2014Date of Patent: December 8, 2015Assignee: DARWIN PRECISIONS CORPORATIONInventors: Kuan-Tao Tsai, Chien-Hung Lai, Ching-Yuan Hu, Ching-Feng Li, Chia-Hsu Tu, Kun-Chih Pan