Patents by Inventor Chien-Hung Lai

Chien-Hung Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11480869
    Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: October 25, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chien-Hung Lai, Hao-Ming Chang, Chia-Shih Lin, Hsuan-Wen Wang, Yu-Hsin Hsu, Chih-Tsung Shih, Yu-Hsun Wu
  • Publication number: 20220283496
    Abstract: The present disclosure provides a photomask, including a plurality of pattern areas, each of the pattern areas is defined by a respective boundary, a first pattern area including a first mask feature, and a training area adjacent to a boundary of the pattern area, the training area comprising a first training feature, wherein the first training feature is comparable to the first mask feature.
    Type: Application
    Filed: March 3, 2021
    Publication date: September 8, 2022
    Inventors: CHIEN-HUNG LAI, HAO-MING CHANG, HSUAN-WEN WANG, CHING-TING YANG, CHENG-KUANG CHEN, CHIEN-CHAO HUANG
  • Publication number: 20210063869
    Abstract: A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.
    Type: Application
    Filed: April 15, 2020
    Publication date: March 4, 2021
    Inventors: CHIEN-HUNG LAI, HAO-MING CHANG, CHIA-SHIH LIN, HSUAN-WEN WANG, YU-HSIN HSU, CHIH-TSUNG SHIH, YU-HSUN WU
  • Patent number: 10816891
    Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: October 27, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hao-Ming Chang, Chien-Hung Lai, Cheng-Ming Lin, Hsuan-Wen Wang, Min-An Yang, S. C. Hsu, Shao-Chi Wei, Yuan-Chih Chu
  • Patent number: 10543367
    Abstract: The invention provides transcranial electrostimulation by combining transcranial direct current stimulation (tDCS) and theta burst stimulation (TBS) to achieve an unexpected therapeutic effect in various brain or neural diseases. Accordingly, the invention provides a mode of direct current with biphasic square wave pulses in the treatment of brain or neural diseases. Also provided are methods of employing the transcranial electrostimulation of the invention and applications of the transcranial electrostimulation of the invention.
    Type: Grant
    Filed: June 18, 2015
    Date of Patent: January 28, 2020
    Assignees: TAIPEI MEDICAL UNIVERSITY, NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Chih-Wei Peng, Shih-Ching Chen, Yu Ting Li, Hsiang Ching Lee, Jia-Jin J. Chen, Tsung-Hsun Hsieh, Chien-Hung Lai, Jiunn-Horng Kang
  • Publication number: 20190386258
    Abstract: A battery structure of an electric motorcycle is provided. The battery includes a casing and a top lid and a bottom respectively mounted to a top and a bottom of the casing. The casing is provided therein with a battery core. The top lid and the bottom lid are each provided, in a circumferentially arranged manner, with a coupling flange on one side thereof facing a direction of combination with the casing. The coupling flange is provided with a fitting groove, which receives a sealing ring to embed therein. An outside surface of the sealing ring is in tight engagement with an inside surface of the casing, so as to prevent external water and dust from getting into an interior of the battery to improve performance and lifespan of the battery.
    Type: Application
    Filed: May 24, 2019
    Publication date: December 19, 2019
    Inventors: CHIEN-HUNG LAI, JEN-CHIEH CHENG
  • Patent number: 10302587
    Abstract: Test strip and method of operating thereof are provided. The test strip, from the top down, comprises a cover, an insulating layer, an electrode set, and a substrate. More particularly, the electrode set at least comprises a first electrode, a second electrode, and a third electrode. The insulating layer comprises a track, and the cover comprises an inlet, an indication line, and at least one vent. With the third electrode and the indication line in accordance with the present invention, a user may confirm the operation status of the test strip and the loading status of biological samples with ease to improve the accuracy of testing.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: May 28, 2019
    Assignee: BROADMASTER BIOTECH CORP.
    Inventors: Chien-Hung Lai, Ya-Sian Lin, Fan-Yu Chen
  • Patent number: 10144101
    Abstract: A headstock assembly for a machine tool includes a mount having a female threaded bore, a headstock mounted slidably relative to the machine base, a drive member mounted on the headstock, a spindle, and a spindle extension. The spindle has an intermediate segment disposed in a chamber of the headstock and coupled to be driven by the drive member so as to permit the spindle to rotate about a spindle axis. The spindle extension is coupled to be rotatable with the spindle, and has a male threaded segment configured to be in threaded engagement with the female threaded bore so as to permit the headstock to be linearly moved relative to the mount.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: December 4, 2018
    Assignee: HIWIN TECHNOLOGIES CORPORATION
    Inventors: Chien-Hsiang Tsai, Chih-Wei Wang, Chien-Hung Lai, Chung-Sheng Hsu
  • Publication number: 20180229336
    Abstract: A headstock assembly for a machine tool includes a mount having a female threaded bore, a headstock mounted slidably relative to the machine base, a drive member mounted on the headstock, a spindle, and a spindle extension. The spindle has an intermediate segment disposed in a chamber of the headstock and coupled to be driven by the drive member so as to permit the spindle to rotate about a spindle axis. The spindle extension is coupled to be rotatable with the spindle, and has a male threaded segment configured to be in threaded engagement with the female threaded bore so as to permit the headstock to be linearly moved relative to the mount.
    Type: Application
    Filed: February 16, 2017
    Publication date: August 16, 2018
    Applicant: HIWIN TECHNOLOGIES CORP.
    Inventors: Chien-Hsiang TSAI, Chih-Wei WANG, Chien-Hung LAI, Chung-Sheng HSU
  • Publication number: 20180164675
    Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.
    Type: Application
    Filed: April 6, 2017
    Publication date: June 14, 2018
    Inventors: Hao-Ming CHANG, Chien-Hung LAI, Cheng-Ming LIN, Hsuan-Wen WANG, Min-An YANG, S. C. HSU, Shao-Chi WEI, Yuan-Chih CHU
  • Patent number: 9869654
    Abstract: A method of measuring hematocrit (HCT) and a measurement device using in the method and depends on an electrode test specimen to create a capacitor charging effect and consequential change in discharge current for measurement of hematocrit. The method of measuring hematocrit comprises steps as follows: (a) Instill blood into a pair of test electrodes which is installed in the present invention and apply a voltage to the pair of test electrodes; (b) Remove the voltage applied to the pair of test electrodes and measure a discharge current value; (c) Refer to a predetermined decision rule and the discharge current to obtain a hematocrit value for blood. As such, the present invention which relies on an electrode test specimen in measurement of hematocrit corresponding to a discharge current value during electric discharge contributes to precision and reliability in contrast to conventional hematocrit tests.
    Type: Grant
    Filed: November 29, 2013
    Date of Patent: January 16, 2018
    Assignee: Broadmaster Biotech Corp.
    Inventors: Yi-Lung Chen, Chien-Hung Lai, Po-Hao Lin, Ya-Sian Lin, Yi-Chen Chen, Fang-Yi Jiang, Shu-Wei Yang, Yu-Hsuan Tai, Shih-Jen Lu
  • Publication number: 20170284955
    Abstract: Test strip and method of operating thereof are provided. The test strip, from the top down, comprises a cover, an insulating layer, an electrode set, and a substrate. More particularly, the electrode set at least comprises a first electrode, a second electrode, and a third electrode. The insulating layer comprises a track, and the cover comprises an inlet, an indication line, and at least one vent. With the third electrode and the indication line in accordance with the present invention, a user may confirm the operation status of the test strip and the loading status of biological samples with ease to improve the accuracy of testing.
    Type: Application
    Filed: March 29, 2016
    Publication date: October 5, 2017
    Inventors: CHIEN-HUNG LAI, YA-SIAN LIN, FAN-YU CHEN
  • Patent number: 9689805
    Abstract: A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect candidates. The method further includes applying a second test regimen to the manufactured product to identify product defects. The second test regimen produces a second set of defect candidates, and the second test regimen is different from the first test regimen. The method also includes generating a first filtered defect set by eliminating ones of the first set of defect candidates that are not identified in the second set of defect candidates.
    Type: Grant
    Filed: June 23, 2015
    Date of Patent: June 27, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Biow-Hiem Ong, Chih-Chiang Tu, Chien-Hung Lai, Jong-Yuh Chang, Kuang-Yu Liu
  • Patent number: 9529255
    Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: December 27, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Meng-Lin Lu, Ching-Ting Yang, Chun-Jen Chen, Chien-Hung Lai, Jong-Yuh Chang
  • Publication number: 20160367804
    Abstract: The invention provides transcranial electrostimulation by combining transcranial direct current stimulation (tDCS) and theta burst stimulation (TBS) to achieve an unexpected therapeutic effect in various brain or neural diseases. Accordingly, the invention provides a mode of direct current with biphasic square wave pulses in the treatment of brain or neural diseases. Also provided are methods of employing the transcranial electrostimulation of the invention and applications of the transcranial electrostimulation of the invention.
    Type: Application
    Filed: June 18, 2015
    Publication date: December 22, 2016
    Inventors: CHIH-WEI PENG, SHIH-CHING CHEN, YU TING LI, HSIANG CHING LEE, JIA-JIN J. CHEN, TSUNG-HSUN HSIEH, CHIEN-HUNG LAI, JIUNN-HORNG KANG
  • Patent number: 9308593
    Abstract: An angle-adjustable thread processing machine includes a base, a rocker arm, a rocker-arm toothed wheel, an idle wheel, a driven toothed wheel, and a processing unit. The base includes a power source with a drive shaft. The rocker arm is fixed to the drive shaft which rotates about a drive axis. The rocker-arm toothed wheel is pivotally sleeved on the drive shaft. The idle wheel is pivotally disposed on the rocker arm and engaged with the rocker-arm toothed wheel. The driven toothed wheel is pivotally disposed on the rocker arm to engage with the idle wheel and rotates around a driven axis which is located a first distance D1 from the drive axis. The processing unit includes a machining spindle fixed to the driven toothed wheel, and a machining head which rotates around a machining-head axis which is located a second distance D2 from the driven axis, and D1=D2.
    Type: Grant
    Filed: April 2, 2014
    Date of Patent: April 12, 2016
    Assignee: Hiwin Technologies Corp.
    Inventors: Chien-Hsiang Tsai, Chih-Wei Wang, Chien-Hung Lai
  • Publication number: 20160084793
    Abstract: An electrode reaction area testing method of biosensor test strip includes: (1) preparing a semi-finished or finished test strip product having at least one sensing window corresponding to an electrode reaction area; a plural electrodes exposed from the electrode reaction area; (2) detecting the electrode reaction current of the electrode reaction area to obtain a first electrode reaction current and a third electrode reaction current; (3) calculating a current ratio of the first electrode reaction current to the third electrode reaction current; (4) determining the current ratio; (5) completing the detection of the electrode reaction area to determine whether the semi-finished or finished test strip product is good or defective, so as to test the accuracy of the separating plate attaching position or the insulating position and the applicability of the electrode reaction area in the manufacture of the test strip.
    Type: Application
    Filed: September 18, 2014
    Publication date: March 24, 2016
    Inventors: YI LUNG CHEN, CHIEN HUNG LAI, YA SIAN LIN, FANG YI JIANG, CHIH CHUN YU, YI CHUNG CHANG
  • Patent number: 9205443
    Abstract: A metal mask manufacturing method includes: (a) disposing a first anti-etching layer having a first void region on a first face of a substrate; (b) disposing a second anti-etching layer on a second face of the substrate opposite to the first face, wherein a second void region of the second anti-etching layer is corresponding to the first void region; (c) performing a first etching on the first face and the second face to form a first concave part and a second concave part separated by a part of the substrate; (d) disposing a protecting layer filled into the first concave part; (e) performing a second etching from the second face to produce a void between the first concave part and the second concave part; (f) removing the second anti-etching layer; and (g) performing a third etching from the second face.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: December 8, 2015
    Assignee: DARWIN PRECISIONS CORPORATION
    Inventors: Kuan-Tao Tsai, Chien-Hung Lai, Ching-Yuan Hu, Ching-Feng Li, Chia-Hsu Tu, Kun-Chih Pan
  • Publication number: 20150316489
    Abstract: A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect candidates. The method further includes applying a second test regimen to the manufactured product to identify product defects. The second test regimen produces a second set of defect candidates, and the second test regimen is different from the first test regimen. The method also includes generating a first filtered defect set by eliminating ones of the first set of defect candidates that are not indentified in the second set of defect candidates.
    Type: Application
    Filed: June 23, 2015
    Publication date: November 5, 2015
    Inventors: Biow-Hiem Ong, CHIH-CHIANG TU, Chien-Hung Lai, JONG-YUH CHANG, Kuang-Yu Liu
  • Publication number: 20150283633
    Abstract: An angle-adjustable thread processing machine includes a base, a rocker arm, a rocker-arm toothed wheel, an idle wheel, a driven toothed wheel, and a processing unit. The base includes a power source with a drive shaft. The rocker arm is fixed to the drive shaft which rotates about a drive axis. The rocker-arm toothed wheel is pivotally sleeved on the drive shaft. The idle wheel is pivotally disposed on the rocker arm and engaged with the rocker-arm toothed wheel. The driven toothed wheel is pivotally disposed on the rocker arm to engage with the idle wheel and rotates around a driven axis which is located a first distance D1 from the drive axis. The processing unit includes a machining spindle fixed to the driven toothed wheel, and a machining head which rotates around a machining-head axis which is located a second distance D2 from the driven axis, and D1=D2.
    Type: Application
    Filed: April 2, 2014
    Publication date: October 8, 2015
    Applicant: Hiwin Technologies Corp.
    Inventors: Chien-Hsiang Tsai, Chih-Wei Wang, Chien-Hung Lai