Patents by Inventor Chih-Chung Huang
Chih-Chung Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12230545Abstract: A semiconductor device includes a plurality of channel layers vertically separated from one another. The semiconductor device also includes an active gate structure comprising a lower portion and an upper portion. The lower portion wraps around each of the plurality of channel layers. The semiconductor device further includes a gate spacer extending along a sidewall of the upper portion of the active gate structure. The gate spacer has a bottom surface. Moreover, a dummy gate dielectric layer is disposed between the gate spacer and a topmost channel layer of plurality of channel layers. The dummy gate dielectric layer is in contact with a top surface of the topmost channel layer, the bottom surface of the gate spacer, and the sidewall of the gate structure.Type: GrantFiled: November 30, 2023Date of Patent: February 18, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Kuei-Yu Kao, Chen-Yui Yang, Hsien-Chung Huang, Chao-Cheng Chen, Shih-Yao Lin, Chih-Chung Chiu, Chih-Han Lin, Chen-Ping Chen, Ke-Chia Tseng, Ming-Ching Chang
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Publication number: 20240238166Abstract: A tricalcium silicate kit includes a first reagent containing tricalcium silicate, and a second reagent containing a salt material and water. The salt material is selected from the group consisting of sodium carbonate, calcium chloride, and a combination thereof. A method for preparing a Portland cement-based dental material using the tricalcium silicate kit is also provided.Type: ApplicationFiled: January 16, 2024Publication date: July 18, 2024Inventors: Yung-Ming YANG, Kuan-Wei LU, Chih-Chung HUANG, Wei-Ling GAO, Yen-Tzu Lin, An-Cheng SUN
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Publication number: 20240188924Abstract: An ultrasound analysis method and a system performing the same are provided. A plurality of ultrasound emission-receiving elements of the system alternately emits a focused ultrasound and a planar ultrasound to a target object. The energy and the focus position of the focused ultrasound are controlled during the emission of the focused ultrasound. The energy level and the direction of travel of the planar ultrasound are controlled during the emission of the planar ultrasound. The system receives scattered echo signals of the planar ultrasound to generate echo mapping signals, thereby reconstructing the echo mapping signals into an ultrasound image to map neurological functional change.Type: ApplicationFiled: December 13, 2022Publication date: June 13, 2024Inventors: Hao-Li LIU, Chih-Chung HUANG
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Patent number: 11872083Abstract: An ultrasonic device is provided for use on a biological tissue, and includes a base assembly on which a vibrator is mounted, and an ultrasonic probe. The base assembly includes an annular base having at least two pairs of abutment protrusions for abutting against the biological tissue, and an installation base coaxially disposed on and rotatable relative to the annular base between two test positions. The installation base has a through hold in which the ultrasonic probe is inserted.Type: GrantFiled: December 8, 2021Date of Patent: January 16, 2024Assignee: NATIONAL CHENG KUNG UNIVERSITYInventors: Chih-Chung Huang, Pei-Yu Chen
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Publication number: 20230341765Abstract: A method includes: providing a first design layout including a plurality of cells; updating a first cell of the plurality of cells using optical proximity correction to provide a first updated cell and a data set; and updating a second cell from remaining cells in the first design layout based on the data set and a model without involvement of optical proximity correction to provide a second updated cell, wherein the model includes hidden layers including nodes and is trained to obtaining converged values of the nodes of the hidden layers through providing a mapping of edge segments before lithography enhancement and edge segments after lithography enhancement using optical proximity correction, and wherein at least one of the providing, and updating is executed by one or more processors.Type: ApplicationFiled: June 29, 2023Publication date: October 26, 2023Inventors: WEI-LIN CHU, HSIN-LUN TSENG, SHENG-WEN HUANG, CHIH-CHUNG HUANG, CHI-MING TSAI
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Patent number: 11726402Abstract: A method includes providing a first design layout including cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; training a model based on a layout-dependent parameter of a second design layout; and updating a second cell based on the data set and the model to provide a second updated cell. The model includes an input layer, a hidden layer and an output layer. Training the model includes obtaining converged values of nodes of the hidden layer. Obtaining converged values of nodes of the hidden layer includes providing information on edge segments before and after lithography enhancement to the input layer and the output layer, respectively, until values of nodes of the hidden layer attains convergence in terms of a cost function.Type: GrantFiled: July 22, 2021Date of Patent: August 15, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Wei-Lin Chu, Hsin-Lun Tseng, Sheng-Wen Huang, Chih-Chung Huang, Chi-Ming Tsai
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Publication number: 20230124311Abstract: An ultrasonic device is provided for use on a biological tissue, and includes a base assembly on which a vibrator is mounted, and an ultrasonic probe. The base assembly includes an annular base having at least two pairs of abutment protrusions for abutting against the biological tissue, and an installation base coaxially disposed on and rotatable relative to the annular base between two test positions. The installation base has a through hold in which the ultrasonic probe is inserted.Type: ApplicationFiled: December 8, 2021Publication date: April 20, 2023Inventors: Chih-Chung HUANG, Pei-Yu CHEN
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Patent number: 11320742Abstract: The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.Type: GrantFiled: June 6, 2019Date of Patent: May 3, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Yen-Tung Hu, Kuan-Chi Chen, Ya-Hsuan Wu, Shiuan-Li Lin, Chih-Chung Huang, Chi-Ming Tsai
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Patent number: 11213277Abstract: A measuring system for measuring elasticity of biological tissue includes a mobile device and a measuring apparatus including a conducting seat and a measuring device. The conducting seat is for detachable mounting of the mobile device therein, and is adapted to abut against the biological tissue for conducting vibrations produced by the mobile device to the biological tissue to cause the biological tissue to vibrate. The measuring device includes an ultrasonic transducer to emit an ultrasound signal to the biological tissue and an elasticity analyzer to analyze an ultrasound echo signal that results from reflection of the ultrasound signal by the biological tissue which is vibrating to obtain an elasticity data of the biological tissue.Type: GrantFiled: December 9, 2019Date of Patent: January 4, 2022Assignee: National Cheng Kung UniversityInventors: Chih-Chung Huang, Pei-Yu Chen, Cho-Chiang Shih
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Publication number: 20210349389Abstract: A method includes providing a first design layout including cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; training a model based on a layout-dependent parameter of a second design layout; and updating a second cell based on the data set and the model to provide a second updated cell. The model includes an input layer, a hidden layer and an output layer. Training the model includes obtaining converged values of nodes of the hidden layer. Obtaining converged values of nodes of the hidden layer includes providing information on edge segments before and after lithography enhancement to the input layer and the output layer, respectively, until values of nodes of the hidden layer attains convergence in terms of a cost function.Type: ApplicationFiled: July 22, 2021Publication date: November 11, 2021Inventors: WEI-LIN CHU, HSIN-LUN TSENG, SHENG-WEN HUANG, CHIH-CHUNG HUANG, CHI-MING TSAI
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Patent number: 11079672Abstract: A method and a system of performing layout enhancement include: providing a first design layout comprising a plurality of cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; updating a second cell from remaining cells in the first design layout based on the data set to provide a second updated cell; and manufacturing a mask based on the first updated cell and the second updated cell in the first design layout.Type: GrantFiled: August 12, 2019Date of Patent: August 3, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Wei-Lin Chu, Hsin-Lun Tseng, Sheng-Wen Huang, Chih-Chung Huang, Chi-Ming Tsai
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Publication number: 20210169452Abstract: A measuring system for measuring elasticity of biological tissue includes a mobile device and a measuring apparatus including a conducting seat and a measuring device. The conducting seat is for detachable mounting of the mobile device therein, and is adapted to abut against the biological tissue for conducting vibrations produced by the mobile device to the biological tissue to cause the biological tissue to vibrate. The measuring device includes an ultrasonic transducer to emit an ultrasound signal to the biological tissue and an elasticity analyzer to analyze an ultrasound echo signal that results from reflection of the ultrasound signal by the biological tissue which is vibrating to obtain an elasticity data of the biological tissue.Type: ApplicationFiled: December 9, 2019Publication date: June 10, 2021Inventors: Chih-Chung Huang, Pei-Yu Chen, Cho-Chiang Shih
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Patent number: 10698261Abstract: A backlight module having a bearing plate and a light module is provided. The bearing plate has a bearing surface, which includes a trough, a first groove, a first inner stage, and a first outer stage. The first groove is disposed close to the trough. The first inner stage is between the trough and the first groove while the first outer stage is on the side of the first groove opposite to the first inner stage. The light module is disposed on the bearing surface and corresponds to the trough. Comparing to the first inner stage, the first outer stage is more protruding toward the light module.Type: GrantFiled: June 28, 2019Date of Patent: June 30, 2020Assignee: AU OPTRONICS CORPORATIONInventors: Chih-Chung Huang, Yu-Chuan Lin
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Publication number: 20200183233Abstract: A backlight module having a bearing plate and a light module is provided. The bearing plate has a bearing surface, which includes a trough, a first groove, a first inner stage, and a first outer stage. The first groove is disposed close to the trough. The first inner stage is between the trough and the first groove while the first outer stage is on the side of the first groove opposite to the first inner stage. The light module is disposed on the bearing surface and corresponds to the trough. Comparing to the first inner stage, the first outer stage is more protruding toward the light module.Type: ApplicationFiled: June 28, 2019Publication date: June 11, 2020Inventors: Chih-Chung Huang, Yu-Chuan Lin
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Publication number: 20200133134Abstract: The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.Type: ApplicationFiled: June 6, 2019Publication date: April 30, 2020Inventors: YEN-TUNG HU, KUAN-CHI CHEN, YA-HSUAN WU, SHIUAN-LI LIN, CHIH-CHUNG HUANG, CHI-MING TSAI
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Publication number: 20200133117Abstract: A method and a system of performing layout enhancement include: providing a first design layout comprising a plurality of cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; updating a second cell from remaining cells in the first design layout based on the data set to provide a second updated cell; and manufacturing a mask based on the first updated cell and the second updated cell in the first design layout.Type: ApplicationFiled: August 12, 2019Publication date: April 30, 2020Inventors: WEI-LIN CHU, HSIN-LUN TSENG, SHENG-WEN HUANG, CHIH-CHUNG HUANG, CHI-MING TSAI
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Publication number: 20200060648Abstract: An ultrasound transducer system includes an alignment-guidance transducer device and a control device. The alignment-guidance transducer device includes a transducer module for emitting ultrasound waves and receiving ultrasound signals reflected from a target hollow organ, and an indicator module for indicating a state of alignment between the alignment-guidance transducer device and the target hollow organ. The control device is in communication with the alignment-guidance transducer device for processing the ultrasound signals received from the transducer module and transmitting instructions to the indicator module according to the processed ultrasound signals, so as to guide a user to align the ultrasound transducer device to an extension direction of the target hollow organ.Type: ApplicationFiled: August 21, 2018Publication date: February 27, 2020Inventors: CHIH-CHUNG HUANG, PO-YANG LEE, YI-HSIANG CHUANG
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Patent number: 10274817Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 ?m2 to 60000 ?m2. The second pattern has an area of 0.16 ?m2 to 60000 ?m2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.Type: GrantFiled: March 31, 2017Date of Patent: April 30, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ching-Hung Lai, Chih-Chung Huang, Chih-Chiang Tu, Chung-Hung Lin, Chi-Ming Tsai, Ming-Ho Tsai
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Publication number: 20180284595Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 ?m2 to 60000 ?m2. The second pattern has an area of 0.16 ?m2 to 60000 ?m2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.Type: ApplicationFiled: March 31, 2017Publication date: October 4, 2018Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ching-Hung Lai, Chih-Chung Huang, Chih-Chiang Tu, Chung-Hung Lin, Chi-Ming Tsai, Ming-Ho Tsai
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Patent number: 9367661Abstract: A method of preparing mask data, the method begins with performing a logic operation to a design layout, and an optical proximity correction (OPC) is performed to the design layout to form an OPC feature. The OPC feature has a first jog and a second jog on a line, and the first jog is larger than the second jog in width. The OPC feature is resized to form a resized first jog and a resized second jog on the line if a width ratio of the first jog to the second jog being smaller than a predetermined value.Type: GrantFiled: September 4, 2014Date of Patent: June 14, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jia-Guei Jou, Yi-Chiuan Luo, Chih-Chung Huang, Chi-Ming Tsai, Chih-Chiang Tu