Abstract: A tricalcium silicate kit includes a first reagent containing tricalcium silicate, and a second reagent containing a salt material and water. The salt material is selected from the group consisting of sodium carbonate, calcium chloride, and a combination thereof. A method for preparing a Portland cement-based dental material using the tricalcium silicate kit is also provided.

Abstract: An ultrasound analysis method and a system performing the same are provided. A plurality of ultrasound emission-receiving elements of the system alternately emits a focused ultrasound and a planar ultrasound to a target object. The energy and the focus position of the focused ultrasound are controlled during the emission of the focused ultrasound. The energy level and the direction of travel of the planar ultrasound are controlled during the emission of the planar ultrasound. The system receives scattered echo signals of the planar ultrasound to generate echo mapping signals, thereby reconstructing the echo mapping signals into an ultrasound image to map neurological functional change.

Abstract: An ultrasonic device is provided for use on a biological tissue, and includes a base assembly on which a vibrator is mounted, and an ultrasonic probe. The base assembly includes an annular base having at least two pairs of abutment protrusions for abutting against the biological tissue, and an installation base coaxially disposed on and rotatable relative to the annular base between two test positions. The installation base has a through hold in which the ultrasonic probe is inserted.

Abstract: A method includes: providing a first design layout including a plurality of cells; updating a first cell of the plurality of cells using optical proximity correction to provide a first updated cell and a data set; and updating a second cell from remaining cells in the first design layout based on the data set and a model without involvement of optical proximity correction to provide a second updated cell, wherein the model includes hidden layers including nodes and is trained to obtaining converged values of the nodes of the hidden layers through providing a mapping of edge segments before lithography enhancement and edge segments after lithography enhancement using optical proximity correction, and wherein at least one of the providing, and updating is executed by one or more processors.

Abstract: A method includes providing a first design layout including cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; training a model based on a layout-dependent parameter of a second design layout; and updating a second cell based on the data set and the model to provide a second updated cell. The model includes an input layer, a hidden layer and an output layer. Training the model includes obtaining converged values of nodes of the hidden layer. Obtaining converged values of nodes of the hidden layer includes providing information on edge segments before and after lithography enhancement to the input layer and the output layer, respectively, until values of nodes of the hidden layer attains convergence in terms of a cost function.

Abstract: An ultrasonic device is provided for use on a biological tissue, and includes a base assembly on which a vibrator is mounted, and an ultrasonic probe. The base assembly includes an annular base having at least two pairs of abutment protrusions for abutting against the biological tissue, and an installation base coaxially disposed on and rotatable relative to the annular base between two test positions. The installation base has a through hold in which the ultrasonic probe is inserted.

Abstract: The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.

Abstract: A measuring system for measuring elasticity of biological tissue includes a mobile device and a measuring apparatus including a conducting seat and a measuring device. The conducting seat is for detachable mounting of the mobile device therein, and is adapted to abut against the biological tissue for conducting vibrations produced by the mobile device to the biological tissue to cause the biological tissue to vibrate. The measuring device includes an ultrasonic transducer to emit an ultrasound signal to the biological tissue and an elasticity analyzer to analyze an ultrasound echo signal that results from reflection of the ultrasound signal by the biological tissue which is vibrating to obtain an elasticity data of the biological tissue.

Abstract: A method includes providing a first design layout including cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; training a model based on a layout-dependent parameter of a second design layout; and updating a second cell based on the data set and the model to provide a second updated cell. The model includes an input layer, a hidden layer and an output layer. Training the model includes obtaining converged values of nodes of the hidden layer. Obtaining converged values of nodes of the hidden layer includes providing information on edge segments before and after lithography enhancement to the input layer and the output layer, respectively, until values of nodes of the hidden layer attains convergence in terms of a cost function.

Abstract: A method and a system of performing layout enhancement include: providing a first design layout comprising a plurality of cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; updating a second cell from remaining cells in the first design layout based on the data set to provide a second updated cell; and manufacturing a mask based on the first updated cell and the second updated cell in the first design layout.

Abstract: A measuring system for measuring elasticity of biological tissue includes a mobile device and a measuring apparatus including a conducting seat and a measuring device. The conducting seat is for detachable mounting of the mobile device therein, and is adapted to abut against the biological tissue for conducting vibrations produced by the mobile device to the biological tissue to cause the biological tissue to vibrate. The measuring device includes an ultrasonic transducer to emit an ultrasound signal to the biological tissue and an elasticity analyzer to analyze an ultrasound echo signal that results from reflection of the ultrasound signal by the biological tissue which is vibrating to obtain an elasticity data of the biological tissue.

Abstract: A backlight module having a bearing plate and a light module is provided. The bearing plate has a bearing surface, which includes a trough, a first groove, a first inner stage, and a first outer stage. The first groove is disposed close to the trough. The first inner stage is between the trough and the first groove while the first outer stage is on the side of the first groove opposite to the first inner stage. The light module is disposed on the bearing surface and corresponds to the trough. Comparing to the first inner stage, the first outer stage is more protruding toward the light module.

Abstract: A backlight module having a bearing plate and a light module is provided. The bearing plate has a bearing surface, which includes a trough, a first groove, a first inner stage, and a first outer stage. The first groove is disposed close to the trough. The first inner stage is between the trough and the first groove while the first outer stage is on the side of the first groove opposite to the first inner stage. The light module is disposed on the bearing surface and corresponds to the trough. Comparing to the first inner stage, the first outer stage is more protruding toward the light module.

Abstract: The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.

Abstract: A method and a system of performing layout enhancement include: providing a first design layout comprising a plurality of cells; updating a first cell in the plurality of cells using optical proximity correction to provide a first updated cell and a data set; updating a second cell from remaining cells in the first design layout based on the data set to provide a second updated cell; and manufacturing a mask based on the first updated cell and the second updated cell in the first design layout.

Abstract: An ultrasound transducer system includes an alignment-guidance transducer device and a control device. The alignment-guidance transducer device includes a transducer module for emitting ultrasound waves and receiving ultrasound signals reflected from a target hollow organ, and an indicator module for indicating a state of alignment between the alignment-guidance transducer device and the target hollow organ. The control device is in communication with the alignment-guidance transducer device for processing the ultrasound signals received from the transducer module and transmitting instructions to the indicator module according to the processed ultrasound signals, so as to guide a user to align the ultrasound transducer device to an extension direction of the target hollow organ.

Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 ?m2 to 60000 ?m2. The second pattern has an area of 0.16 ?m2 to 60000 ?m2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.

Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 ?m2 to 60000 ?m2. The second pattern has an area of 0.16 ?m2 to 60000 ?m2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.

Abstract: A method of preparing mask data, the method begins with performing a logic operation to a design layout, and an optical proximity correction (OPC) is performed to the design layout to form an OPC feature. The OPC feature has a first jog and a second jog on a line, and the first jog is larger than the second jog in width. The OPC feature is resized to form a resized first jog and a resized second jog on the line if a width ratio of the first jog to the second jog being smaller than a predetermined value.

Abstract: A method of preparing mask data, the method begins with performing a logic operation to a design layout, and an optical proximity correction (OPC) is performed to the design layout to form an OPC feature. The OPC feature has a first jog and a second jog on a line, and the first jog is larger than the second jog in width. The OPC feature is resized to form a resized first jog and a resized second jog on the line if a width ratio of the first jog to the second jog being smaller than a predetermined value.