Abstract: A method and system for establishing a model for sensing ions in a solution, and a method and system for sensing ions in a solution apply an ion-sensitive field effect transistor in a machine learning model for ion detection in training solutions. The method for establishing a model includes adjusting environmental parameters, where the environmental parameters are selected from any one of multiple target temperatures or from any one of multiple external electric fields; establishing at least one virtual sensor based on the biasing relationship of the multi-gate ion sensitive field effect transistor; obtaining, by the at least one virtual sensor, multiple training features of the training solution based on the environmental parameters and bias parameters; and loading, by a computer, the environmental parameters and the training features into a machine learning model to establish an ion detection model, which is used to sense the types and concentrations of ions.

Abstract: A solar cell module includes a first substrate, a second substrate, at least one cell unit, a first packaging film, a second packaging film, a first protective layer, a second protective layer, and a plurality of support members. The first substrate and the second substrate are disposed opposite to each other. The cell unit is disposed between the first substrate and the second substrate. The first packaging film is disposed between the cell unit and the first substrate. The second packaging film is disposed between the cell unit and the second substrate. The first protective layer is disposed between the cell unit and the first packaging film. The second protective layer is disposed between the cell unit and the second packaging film. The support members are respectively disposed between the first packaging film and the second packaging film and surround at least two opposite sides of the cell unit.

Abstract: Embodiments with present disclosure provides a gate-all-around FET device including extended bottom inner spacers. The extended bottom inner prevents the subsequently formed epitaxial source/drain region from volume loss and induces compressive strain in the channel region to prevent strain loss and channel resistance degradation.

Abstract: A dummy gate structure may be formed for a semiconductor device. The dummy gate structure may be formed from an amorphous polysilicon layer. The amorphous polysilicon layer may be deposited in a blanket deposition operation. An annealing operation is performed for the semiconductor device to remove voids, seams, and/or other defects from the amorphous polysilicon layer. The annealing operation may cause the amorphous polysilicon layer to crystallize, thereby resulting in the amorphous polysilicon layer transitioning into a crystallized polysilicon layer. A dual radio frequency (RF) source etch technique may be performed to increase the directionality of ions and radicals in a plasma that is used to etch the crystallized polysilicon layer to form the dummy gate structure. The increased directionality of the ions increases the effectiveness of the ions in etching through the different crystal grain boundaries which increases the etch rate uniformity across the crystallized polysilicon layer.

Abstract: A door locking mechanism and semiconductor container using the same include door panel, cover, and locking module. The door panel has a first stop structure. The cover and the door panel define an accommodating space for receiving the locking module. The locking module includes rotating member, holding member, and elastic member. The elastic member is disposed on the holding member and has a second stop structure near the first stop structure. The elastic member is disposed between the holding and the rotating member. The elastic member is compressed when a force is applied to the holding member, and the second stop structure detaches from a limitation state with the first stop structure for allowing a rotating operation of the rotating member. The elastic member elastically restores when the force is removed, and the second stop structure returns to the limitation state for limiting the rotating operation.

Abstract: A method of fabricating a contact structure includes the following steps. An opening is formed in a dielectric layer. A conductive material layer is formed within the opening and on the dielectric layer, wherein the conductive material layer includes a bottom section having a first thickness and a top section having a second thickness, the second thickness is greater than the first thickness. A first treatment is performed on the conductive material layer to form a first oxide layer on the bottom section and on the top section of the conductive material layer. A second treatment is performed to remove at least portions of the first oxide layer and at least portions of the conductive material layer, wherein after performing the second treatment, the bottom section and the top section of the conductive material layer have substantially equal thickness.

Abstract: A die bonding tool includes a bond head having a moveable component. The moveable component may be moveable between an extended position in which a lower surface of the moveable component protrudes below a lower surface of the bond head and a retracted position in which the lower surface of the moveable component does not protrude below the lower surface of the bond head. The moveable component may be used to control a shape of a semiconductor die secured to the lower surface of the bond head during a process of bonding the semiconductor die to a substrate. Accordingly, void areas and other bonding defects may be avoided and the bond formed between the semiconductor die and the target substrate may be improved.

Abstract: A semiconductor device includes a first channel region, a second channel region, and a first insulating fin, the first insulating fin being interposed between the first channel region and the second channel region. The first insulating fin includes a lower portion and an upper portion. The lower portion includes a fill material. The upper portion includes a first dielectric layer on the lower portion, the first dielectric layer being a first dielectric material, a first capping layer on the first dielectric layer, the first capping layer being a second dielectric material, the second dielectric material being different than the first dielectric material, and a second dielectric layer on the first capping layer, the second dielectric layer being the first dielectric material.

Abstract: A bond structure is provided. The bond structure includes a seed layer and a conductive structure. The conductive structure includes a via portion over the seed layer and a plurality of wires protruding from the via portion.

Abstract: A semiconductor device includes a single diffusion break (SDB) structure dividing a fin-shaped structure into a first portion and a second portion, an isolation structure on the SDB structure, a first spacer adjacent to the isolation structure, a metal gate adjacent to the isolation structure, a shallow trench isolation (STI around the fin-shaped structure, and a second isolation structure on the STI. Preferably, a top surface of the first spacer is lower than a top surface of the isolation structure and a bottom surface of the first spacer is lower than a bottom surface of the metal gate.

Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.

Abstract: A graphene optical device includes a base, a plurality of graphene transistors, and an electrical connection structure. Each of the graphene transistors includes a graphene layer, a metal nanoparticle layer, an insulation layer, a polymer electrolyte layer, and an electrode unit. The electrode unit includes a source electrode, a drain electrode, a first gate electrode component which includes a plurality of first gate electrodes, and a second gate electrode component which includes a plurality of second gate electrodes. The insulation layer has an opening. The polymer electrolyte layer is disposed between the metal nanoparticle layer exposed from the opening and the first gate electrodes, and between the metal nanoparticle layer exposed from the opening and the second gate electrodes. The electrical connection includes a source electrode connecting unit, a drain electrode connecting unit, a first gate electrode connecting unit, and a second gate electrode connecting unit.

Abstract: Integration methods for prevention of floating gate 3D-NAND cell residual using a hybrid plug process in a super-deck structure and associated apparatus. A first desk layered structure comprising alternating isolation and conductor layers having a top isolation layer is formed over a substrate. A Silicon Nitride (SiN) layer is formed over the top isolation layer. An array of pillar holes vertically passing through the SiN layer and layers in the first deck layered structure are formed. The pillar holes are filled with a sacrificial film and an upper portion of the pillar holes are filled with a hybrid plug comprising first and second oxides. A second layered structure comprising alternating isolation and conductor layers having a bottom isolation layer is formed over the SiN layer, and an array of pillar holes are formed in the second deck layered structure. The hybrid plugs and sacrificial film is then removed using etching.

Abstract: An embodiment of a memory device may comprise a super-pillar formed through a plurality of sub-decks, a string of memory cells formed along the super-pillar, and respective regions of transition material disposed between respective sub-decks of the plurality of sub-decks, wherein the super-pillar comprises at least a first pillar formed through a first sub-deck of the plurality of sub-decks substantially aligned with a second pillar formed through a second sub-deck of the plurality of sub-decks. Other embodiments are disclosed and claimed.

Abstract: A biosensor device includes a substrate, an oxide layer and a sensing wire. The oxide layer is disposed on the substrate. The sensing wire is disposed on the oxide layer. The sensing wire is provided to receive target biomolecules. The sensing wire includes at least one first section extending along a first direction and at least one second section extending along a second direction. The at least one first section is continuous with the at least one second section. The first direction is different from the second direction. The sensing wire has a width and a total length and a ratio of the total length to the width is larger than 500.

Abstract: A biosensor device includes a substrate, a sensing transistor, an isolation layer and a main interface layer. The sensing transistor is formed on the substrate and including a bottom gate structure, a top gate structure and a semiconductor layer disposed between the bottom gate structure and the top gate structure. The bottom gate structure is electrically connected to the top gate structure. The isolation layer is formed on the sensing transistor for covering the sensing transistor, and includes a first opening. The main interface layer is disposed in the first opening for receiving biomolecules to be sensed. The main interface layer is electrically connected to the top gate structure.

Abstract: An apparatus for detecting conductance parameter of high protein body fluid sample is provided. The apparatus includes at least one liquid collection element, and at least two electrodes horizontally aligned in the liquid collection element. Also provided are methods for detecting dehydration in a subject, comprising the steps of measuring the conductance parameter of the saliva of the subject.

Abstract: A biosensor device includes a substrate, an oxide layer and a sensing wire. The oxide layer is disposed on the substrate. The sensing wire is disposed on the oxide layer. The sensing wire is provided to receive target biomolecules. The sensing wire includes at least one first section extending along a first direction and at least one second section extending along a second direction. The at least one first section is continuous with the at least one second section. The first direction is different from the second direction. The sensing wire has a width and a total length and a ratio of the total length to the width is larger than 500.

Abstract: An apparatus for detecting conductance parameter of high protein body fluid sample is provided. The apparatus includes at least one liquid collection element, and at least two electrodes horizontally aligned in the liquid collection element. Also provided are methods for detecting dehydration in a subject, comprising the steps of measuring the conductance parameter of the saliva of the subject.

Abstract: A biosensor device includes a substrate, a sensing transistor, an isolation layer and a main interface layer. The sensing transistor is formed on the substrate and including a bottom gate structure, a top gate structure and a semiconductor layer disposed between the bottom gate structure and the top gate structure. The bottom gate structure is electrically connected to the top gate structure. The isolation layer is formed on the sensing transistor for covering the sensing transistor, and includes a first opening. The main interface layer is disposed in the first opening for receiving biomolecules to be sensed. The main interface layer is electrically connected to the top gate structure.