Abstract: The present disclosure is an optical line test system that detects a distribution of loss points of an optical line in a longitudinal direction, using a coherent light measurement device, applies vibration to facility disposed on a path of the optical line, detects a vibration point of the optical line in a longitudinal direction upon applying the vibration, using the coherent light measurement device, and identifies the loss point based on correspondence between the detected loss point and vibration point.

Abstract: A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.

Abstract: A linear vibration actuator includes: a mover having a plurality of magnets linearly arrayed in the vibration direction; a guide portion holding the mover to be allowed to linearly move in the vibration direction; a plurality of planar coils wound in a flat plate shape on a flat surface facing the mover; a pair of first biasing magnets respectively arranged at both ends of the mover in the vibration direction; and a pair of second biasing magnets that are respectively arranged facing the pair of first biasing magnets, and respectively have the same polarities as those of the pair of first biasing magnets to bias the mover in the vibration direction.

Abstract: Disclosed is a polishing pad including a polishing layer having a polishing surface, wherein the polishing surface includes a deep-groove region having a first pattern formed by a deep groove or hole having a depth of 0.3 mm or more, and a land region that is a region other than the deep-groove region, and the land region includes shallow recesses having a second pattern and a depth of 0.01 to 0.1 mm, and a plurality of island-like land portions surrounded by the shallow recesses and having a maximum distance in a horizontal direction of 8 mm or less.

Abstract: Disclosed are a polyurethane for use in a polishing layer, and a polishing layer and a polishing pad using the same, the polyurethane including a terminal group represented by the following formula (I): R—(OX)n— (I) wherein R represents a monovalent hydrocarbon group having 1 to 30 carbon atoms that may be substituted with a heteroatom or may be interrupted by a heteroatom, X represents an alkylene group having 2 to 4 carbon atoms, 90 to 100% of the alkylene group being an ethylene group, and n represents a number from 8 to 120.

Abstract: Disclosed is a polyurethane for use in a polishing layer, including a carboxylic acid ester group, and a polyurethane preferably having a carboxylic acid ester group in at least one of a side chain, a main chain terminal, and a main chain skeleton is preferably used. Also disclosed is a method for modifying a polishing layer, including the steps of: preparing a polishing layer including a polyurethane having a carboxylic acid ester group; and hydrolyzing the carboxylic acid ester group of the polyurethane, to produce a carboxyl group.

Abstract: Provided is a polishing pad including a polishing surface having a zeta potential of +0.1 mV or more at a pH of 10.0. Preferably, a polishing pad including a polyurethane having a tertiary amine is provided. Further preferably, the polyurethane having a tertiary amine is a reaction product of a polyurethane reaction raw material containing at least a chain extender having a tertiary amine. A polishing method using the polishing pads is also provided, wherein the method is performed while supplying an alkaline polishing slurry.

Abstract: There is used a polyurethane for polishing layers that can be used as a material of a polishing layer of a polishing pad, the polyurethane including a thermoplastic polyurethane that is a reaction product of a polyurethane raw material including a polymer diol, an organic diisocyanate, and a chain extender, wherein the chain extender contains 50 mass % or more of a first chain extender including a straight-chain carbon backbone having 7 to 12 carbon atoms.

Abstract: A modification method of a polyurethane, including the steps of: preparing a polyurethane having an ethylenically unsaturated bond; and treating the polyurethane with a liquid containing a compound having a conjugated double bond, or a modification method of a polyurethane, including the steps of: preparing a polyurethane having a conjugated double bond; and treating the polyurethane with a liquid containing a compound having an ethylenically unsaturated bond is used.

Abstract: A friction material according to an embodiment is a friction material including: copper in an amount of 0.5 wt % or less; an inorganic material having a cleavage property in an amount of 10 wt % to 20 wt %; a first abrasive material having a Mohs hardness of 6.5 or more and less than 7 and a second abrasive material having a Mohs hardness of 7 or more and 8 or less in an amount of 0.2 wt % to 3 wt %.

Abstract: Disclosed herein are polyurethanes useful for polishing layers, where the polyurethane is a polyurethane having a Schiff base. Also disclosed herein are polishing layers containing the polyurethanes, polishing methods that use the polishing layers, and a modification method including a step of converting the Schiff base into at least one functional group selected from an aldehyde group, a carboxylic acid group, a hydroxyl group, and an amino group.

Abstract: A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.

Abstract: A linear vibration actuator includes: a mover having a plurality of magnets linearly arrayed in the vibration direction; a guide portion holding the mover to be allowed to linearly move in the vibration direction; a plurality of planar coils wound in a flat plate shape on a flat surface facing the mover; a pair of first biasing magnets respectively arranged at both ends of the mover in the vibration direction; and a pair of second biasing magnets that are respectively arranged facing the pair of first biasing magnets, and respectively have the same polarities as those of the pair of first biasing magnets to bias the mover in the vibration direction.

Abstract: Disclosed herein are polyurethanes useful for polishing layers, where the polyurethane is a polyurethane having a Schiff base. Also disclosed herein are polishing layers containing the polyurethanes, polishing methods that use the polishing layers, and a modification method including a step of converting the Schiff base into at least one functional group selected from an aldehyde group, a carboxylic acid group, a hydroxyl group, and an amino group.

Abstract: Disclosed is a non-porous molded article for a polishing layer, the non-porous molded article including a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum value of a loss tangent (tan ?) in a range of ?70 to ?50° C. of 4.00×10?2 or less. Preferably, the thermoplastic polyurethane is obtained by polymerization of a polymer diol having a number average molecular weight of 650 to 1400, an organic diisocyanate, and a chain extender, and a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate is 5.7 to 6.5 mass %.

Abstract: Provided is a polishing pad including a polishing surface having a zeta potential of +0.1 mV or more at a pH of 10.0. Preferably, a polishing pad including a polyurethane having a tertiary amine is provided. Further preferably, the polyurethane having a tertiary amine is a reaction product of a polyurethane reaction raw material containing at least a chain extender having a tertiary amine. A polishing method using the polishing pads is also provided, wherein the method is performed while supplying an alkaline polishing slurry.

Abstract: Disclosed is a polishing-layer molded body including: a thermoplastic polyurethane that is a polymer of a monomer including: a polymer diol; an organic diisocyanate; a first chain extender including a diol having 4 or less carbon atoms; a second chain extender including a diol having 5 or more carbon atoms, a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate being 6.3 to 7.4 mass %, and the polishing-layer molded body being non-porous.

Abstract: A 3D-scanning optical imaging probe which inhibits rotation unevenness of rotational sections, shaft run-out, friction, and rotation transmission delay by reducing the occurrence of torque loss and rotation transmission delay, and which is capable of obtaining 3D scans and observation images within a fixed frontal range. A substantially tubular catheter has, provided along substantially the same line therein: a fixed-side optical fiber; a first optical path conversion means which is rotationally driven by a first motor, and which rotates and emits a beam of light forwards and tilted at an angle with respect to a rotational axis; and a second optical path conversion means which, at a tip side of a rotation-side optical fiber rotationally driven by a second motor, tilts an optical path by a micro-angle with respect to the rotational axis, and rotates and emits the beam of light to irradiate the first optical path conversion means therewith.

Abstract: Disclosed is a polishing-layer molded body including: a thermoplastic polyurethane that is a polymer of a monomer including: a polymer diol; an organic diisocyanate; a first chain extender including a diol having 4 or less carbon atoms; a second chain extender including a diol having 5 or more carbon atoms, a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate being 6.3 to 7.4 mass %, and the polishing-layer molded body being non-porous.

Abstract: Disclosed is a non-porous molded article for a polishing layer, the non-porous molded article including a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a maximum value of a loss tangent (tan 5) in a range of ?70 to ?50° C. of 4.00×10?2 or less. Preferably, the thermoplastic polyurethane is obtained by polymerization of a polymer diol having a number average molecular weight of 650 to 1400, an organic diisocyanate, and a chain extender, and a content ratio of nitrogen derived from an isocyanate group of the organic diisocyanate is 5.7 to 6.5 mass %.