Abstract: Disclosed is a reflective encoder which is capable of measuring movement amount and detecting movement direction by using one emergent light beam, and achieving high reliability and miniaturization through a simple structure. In the reflective encoder, a light beam emitted by a laser oscillator is caused to be incident on a reflective diffraction grating disposed on a side of a scale, and diffracted light beams reflected by the reflective diffraction grating are received by light receiving elements. An interference optical system is provided between the light receiving elements and the reflective diffraction grating. An optical system is thus constructed to measure movement amount and detect movement direction by using only one emergent light beam.

Abstract: The present invention provides a slurry for chemical mechanical polishing comprising water-soluble clathrate compound (a), polymer compound (b) having an acidic group optionally in a salt form as a side chain, polishing abrasive grain (c) and water (d), wherein the content of the water-soluble clathrate compound (a) is 0.001 mass %-3 mass % of the total amount of the slurry, the polymer compound (b) has a weight average molecular weight of not less than 1,000 and less than 1,000,000, and the content of the polymer compound (b) is 0.12 mass %-3 mass % of the total amount of the slurry, and a polishing method for substrate using the slurry.

Abstract: To provide a vibration actuator capable of both rotation and linear drive and providing a stable driving force. A vibration actuator whose output shaft is moved by vibration includes an oscillatable element with an approximately polygonal shape, the oscillatable element including a hole through which the output shaft is inserted and a slit portion expanding radially from this hole. This slit portion generates the spring force between the output shaft and the oscillatable element to energize the output shaft and holds the output shaft. At least one surface of outer peripheral surfaces of the oscillatable element and its opposite surface are provided with vibrators with the patterned electrodes. A progressive wave is generated in the oscillatable element by applying sequentially voltage to an electrode pattern of the patterned electrodes, thereby rotating the output shaft and displacing the output shaft axially due to the vibration.

Abstract: The present invention provides a slurry for chemical mechanical polishing, containing abrasive grain (a), compound (b) having an amino group having a pKa of more than 9, and not less than 3 hydroxyl groups, and water.

Abstract: A 3D-scanning optical imaging probe which inhibits rotation unevenness of rotational sections, shaft run-out, friction, and rotation transmission delay by reducing the occurrence of torque loss and rotation transmission delay, and which is capable of obtaining 3D scans and observation images within a fixed frontal range. A substantially tubular catheter has, provided along substantially the same line therein: a fixed-side optical fiber; a first optical path conversion means which is rotationally driven by a first motor, and which rotates and emits a beam of light forwards and tilted at an angle with respect to a rotational axis; and a second optical path conversion means which, at a tip side of a rotation-side optical fiber rotationally driven by a second motor, tilts an optical path by a micro-angle with respect to the rotational axis, and rotates and emits the beam of light to irradiate the first optical path conversion means therewith.

Abstract: The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50° C. after saturation swelling with 50° C. water of 130 to 800 MPa, a loss tangent at 50° C. of not more than 0.2, and a contact angle with water of not more than 80°.

Abstract: The present invention provides a slurry for chemical mechanical polishing, containing abrasive grain (a), compound (b) having an amino group having a pKa of more than 9, and not less than 3 hydroxyl groups, and water.

Abstract: The present invention provides an erosion inhibitor for chemical mechanical polishing, which contains compound (a) having a molecular weight of not more than 100,000 and not less than 4 hydroxyl groups, and compound (b) having not less than 4 amino groups, and which has a mass ratio of the compound (a) and the compound (b) (the compound (a)/the compound (b)) of 0.10-500.

Abstract: The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.

Abstract: The present invention provides a slurry for chemical mechanical polishing comprising water-soluble clathrate compound (a), polymer compound (b) having an acidic group optionally in a salt form as a side chain, polishing abrasive grain (c) and water (d), wherein the content of the water-soluble clathrate compound (a) is 0.001 mass %-3 mass % of the total amount of the slurry, the polymer compound (b) has a weight average molecular weight of not less than 1,000 and less than 1,000,000, and the content of the polymer compound (b) is 0.12 mass %-3 mass % of the total amount of the slurry, and a polishing method for substrate using the slurry.

Abstract: The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.

Abstract: The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50° C. after saturation swelling with 50° C. water of 130 to 800 MPa, a loss tangent at 50° C. of not more than 0.2, and a contact angle with water of not more than 80°.

Abstract: The present invention aims to provide a polyurethane foam, suitably usable as a polishing pad, having a uniform foam structure, which can achieve the improvements in the flatness of the surface of polished materials and in the planarization efficiency, and can extend the polishing pad life longer than that of the conventional polyurethane foams. This aim can be achieved by providing a polyurethane foam having a density of 0.5 to 1.0 g/cm3, a cell size of 5 to 200 ?m and a hardness [JIS-C hardness] of not less than 90, comprising a thermoplastic polyurethane which is obtained by a reaction of a high polymer polyol, an organic diisocyanate and a chain extender, contains not less than 6% by weight of a nitrogen atom derived from the isocyanate group, and has a storage elastic modulus measured at 50° C. [E?50] of not less than 5×109 dyn/cm2.

Abstract: The present invention aims to provide a polyurethane foam, suitably usable as a polishing pad, having a uniform foam structure, which can achieve the improvements in the flatness of the surface of polished materials and in the planarization efficiency, and can extend the polishing pad life longer than that of the conventional polyurethane foams. This aim can be achieved by providing a polyurethane foam having a density of 0.5 to 1.0 g/cm3, a cell size of 5 to 200 &mgr;m and a hardness [JIS-C hardness] of not less than 90, comprising a thermoplastic polyurethane which is obtained by a reaction of a high polymer polyol, an organic diisocyanate and a chain extender, contains not less than 6% by weight of a nitrogen atom derived from the isocyanate group, and has a storage elastic modulus measured at 50° C. [E′50] of not less than 5×109 dyn/cm2.

Abstract: (A) A polyester resin composition comprising a copolymerized polyethylene terephthalate (copolymerized PET) comprising 5 to 40 mole % of naphthalenedicarboxylic acid units, a cobalt compound and/or a manganese compound, an olefin polymer and a compatibility-improving agent, in specific amounts; and (B) a polyester resin composition comprising the above copolymerized PET which contains specific amounts of both a cobalt compound and a manganese compound are excellent in resistance to hydrogen peroxide, flavor-barrier properties, gas-barrier properties, heatsealability and mechanical properties such as elongation and strength and, utilizing these features, are effectively usable for various end-uses in particular as packaging materials for beverages such as fruit juices containing flavor components.