Abstract: A semiconductor memory device of an embodiment includes a memory cell array. The memory cell array comprises: a semiconductor layer extending in a first direction; a plurality of conductive layers that face a side surface of the semiconductor layer and are stacked in the first direction; a variable resistance film provided at an intersection of the semiconductor layer and one of the conductive layers; a plurality of contact parts provided at ends of the plurality of conductive layers in a second direction intersecting the first direction, respectively; and a plurality of conductive parts that extend in the first direction and are connected to the plurality of contact parts, respectively. At least one of the plurality of contact parts includes a projection part projecting in the second direction.

Abstract: According to one embodiment, a semiconductor memory device includes a first memory cell including a first transistor and a first capacitor, a second memory cell including a second transistor and a second capacitor, a first word line electrically coupled to the first transistor, a second word line electrically coupled to the second transistor, and a first circuit which supplies a first voltage to the first word line, and a second voltage different from the first voltage to the second word line, during a sleep mode.

Abstract: According to one embodiment, a memory includes: a bit line; a source line; a pillar extending in a first direction and including an oxide semiconductor layer; first, second and third layers arranged along the first direction and opposed to a side of the pillar; a memory cell at an intersection between the first layer and the pillar, the memory cell including a charge storage layer in the oxide semiconductor layer; a first transistor at an intersection between the second layer and the pillar; and a second transistor at an intersection between the third layer and the pillar. A first end of the oxide semiconductor layer in the first direction is in contact with the source line, and a second end of the oxide semiconductor layer in the first direction is electrically disconnected from the bit line.

Abstract: Provided is an objective and convenient index for judging full recovery from atopic dermatitis and severity thereof. The present invention provides a diagnosis assisting method for determining a treatment policy for an atopic dermatitis subject under the treatment, said method comprising: measuring the expression value of SCCA-1 in skin horny cells of the subject; i) when the SCCA-1 expression value is not statistically significantly higher than the level of those who do not suffer from atopic dermatitis, then determining that the continuation of the treatment for the disease becomes unnecessary thanks to the treatment; and, in the case where the continuation of the treatment is determined as still necessary, ii) ranking the severity of atopic dermatitis of the subject using the SCCA-1 expression value as an index and determining an adequate treatment method for atopic dermatitis to be given to the subject depending on the rank.

Abstract: A semiconductor memory device includes a substrate, a stacked body comprising a plurality of first conductors extending in a first direction away from a surface of the substrate and spaced from one another in second and third directions intersecting the first direction and each other, the stacked body having a first region and a second region, a plurality of second conductors extending in the second direction, a plurality of third conductors extending in the third, each third conductor connected to a first end, in the second direction, of a plurality of second conductors in the first region, a plurality of fourth connectors extending in the first direction, each fourth conductor connected to the plurality of second conductors in the second region, and memory cells located between adjacent surfaces of the first and second conductors in the first region.

Abstract: According to an embodiment, a semiconductor device includes M write word lines, M read word lines, N write bit lines, N read bit lines, N source lines, and M×N cells. The M×N cells are arranged in a matrix including M rows×N columns. A cell in an m-th row×an n-th column includes a first FET, a second FET, and a capacitor. The first FET is connected to an m-th write word line at a gate, to an n-th write bit line at a drain, and to a source of the second FET at a source. The second FET is connected to an m-th read word line at a gate and to an n-th read bit line at a drain. The capacitor is connected to an n-th source line at one end and to the source of the first RET at the other end.

Abstract: According to one embodiment, a memory includes: a member extending in a first direction and including an oxide semiconductor layer including first to third portions arranged in order from the bit line to the source line; first, second and third conductive layers arranged along the first direction and facing the first to third portions, respectively, the first conductive layer including first material, and each of the second and third conductive layer including a second material different from the first material; a memory cell in a first position corresponding to the first portion, the memory cell including a charge storage layer in the oxide semiconductor layer; a first transistor in a second position corresponding to the second portion; and a second transistor in a third position corresponding to the third portion.

Abstract: According to one embodiment, a memory includes: a first gate of a first transistor and a second gate electrode of the second transistor facing the a semiconductor layer; an oxide semiconductor layer between the first and second transistors and including first to fifth portions in order; a third gate of a first cell facing the first portion; a fourth gate of a third transistor facing the second portion; a fifth gate of a second cell facing the third portion; a sixth gate of a fourth transistor facing the fourth portion; an interconnect connected to the fifth portion; a source line connected to the first transistor; and a bit line connected to the second transistor. A material of the third gate is different from a material of the fourth gate.

Abstract: This semiconductor memory device includes: global first wiring lines; global second wiring lines; and memory blocks connected to the global first wiring lines and the global second wiring lines. The memory block includes: local first wiring lines; local second wiring lines; and memory cells connected to the local first wiring lines and the local second wiring lines. The memory cell includes: a variable resistance element; first electrodes disposed on a first surface of the variable resistance element; and second electrodes arranged on a second surface of the variable resistance element. The first electrodes are connected to the local first wiring lines, and the second electrodes are connected to the local second wiring lines.

Abstract: According to one embodiment, a semiconductor memory device includes a memory cell including a transistor formed of an oxide semiconductor, an insulation film, and a control electrode, and a capacitance element configured to store a charge, the memory cell being configured to store a coupling weight of a neuron model by a charge amount accumulated in the capacitance element; and a control circuit configured to output a signal as a sum of a product between input data of the memory cell and the coupling weight.

Abstract: According to one embodiment, a memory includes: a bit line; a source line; a pillar extending in a first direction and including an oxide semiconductor layer; first, second and third layers arranged along the first direction and opposed to a side of the pillar; a memory cell at an intersection between the first layer and the pillar, the memory cell including a charge storage layer in the oxide semiconductor layer; a first transistor at an intersection between the second layer and the pillar; and a second transistor at an intersection between the third layer and the pillar. A first end of the oxide semiconductor layer in the first direction is in contact with the source line, and a second end of the oxide semiconductor layer in the first direction is electrically disconnected from the bit line.

Abstract: This semiconductor memory device includes: global first wiring lines; global second wiring lines; and memory blocks connected to the Global first wiring lines and the global second wiring lines. The memory block includes: local first wiring lines; local second wiring lines; and memory cells connected to the local first wiring lines and the local second wiring lines. The memory cell includes: a variable resistance element; first electrodes disposed on a first surface of the variable resistance element; and second electrodes arranged on a second surface of the variable resistance element. The first electrodes are connected to the local first wiring lines, and the second electrodes are connected to the local second wiring lines.

Abstract: According to one embodiment, a semiconductor memory device includes a first memory cell including a first transistor and a first capacitor, a second memory cell including a second transistor and a second capacitor, a first word line electrically coupled to the first transistor, a second word line electrically coupled to the second transistor, and a first circuit which supplies a first voltage to the first word line, and a second voltage different from the first voltage to the second word line, during a sleep mode.

Abstract: According to one embodiment, a non-volatile semiconductor memory device is disclosed. The device includes a semiconductor substrate, and a memory cell array provided on the semiconductor substrate. The memory cell array includes a plurality of memory transistors which are electrically rewritable and arranged in a three-dimensional manner. The device further includes a latch provided above the semiconductor substrate and configured to hold data that is to be written in the memory cell array. The latch includes a capacitor and a first field-effect transistor which is connected to the capacitor and includes a first oxide semiconductor layer.

Abstract: According to one embodiment, a semiconductor memory device includes a memory cell, the cell includes a first capacitor which includes first and second electrodes, and a first transistor which includes first and second terminals and a first control terminal, the first terminal being connected to the first electrode, a first conductive line connected to the second terminal, a second conductive line connected to the second electrode, a sense amplifier, a switch element connected between the first conductive line and the sense amplifier, and a controller turning off the switch element in a write operation, applies a first potential to the first conductive line, and sets a potential of the second conductive line according to a value of write data to be written to the cell.

Abstract: According to one embodiment, a semiconductor memory includes: a first gate of a first select transistor and a second gate of a second select transistor on a gate insulating film on a semiconductor layer; an oxide semiconductor layer above the semiconductor layer; a first control gate of a first cell and a second control gate of a second cell on an insulating layer on the oxide semiconductor layer; a third gate of a first transistor between the first control gate and the second control gate; a fourth gate of a second transistor between a first end of the oxide semiconductor layer and the second control gate; an interconnect connected to the first end; a source line connected to the first select transistor; and a bit line connected to the second select transistor.

Abstract: A semiconductor integrated circuit according to an embodiment includes: a CMOS inverter including an n-channel transistor and a p-channel transistor, one of the n-channel transistor and the p-channel transistor being disposed above the other of the n-channel transistor and the p-channel transistor.

Abstract: According to one embodiment, a semiconductor memory device includes a memory cell, a sense amplifier, a first transfer transistor, a second transfer transistor, and a controller. The memory cell can store a first value and a second value. The sense amplifier amplifies the first value or the second value read from the memory cell to the sense node. The first transfer transistor has a first control terminal connected to the sense node. The second transfer transistor has a second control terminal connected to the sense node. The controller applies a backgate potential to backgate terminals of the first transfer transistor and the second transfer transistor.

Abstract: Provided is a pharmaceutical composition comprising a Cdc7 inhibitor and an M phase promoter. In particular, the Cdc7 inhibitor contained in the pharmaceutical composition is a furanone derivative represented by formula (I), or a pharmaceutically acceptable salt thereof. (In the formula, A is —COOR1 or a hydrogen atom; R1 is a hydrogen atom, an optionally substituted hydrocarbon group, or an optionally substituted heterocycle; R2 and R3 are the same or different and are each a hydrogen atom, an optionally substituted hydrocarbon group, an optionally substituted phenyl group, an optionally substituted heterocycle, an optionally substituted heterocyclic condensed ring, or an optionally substituted amino group. Alternatively, R2 and R3 may, together with the nitrogen atoms bonding the same, form an optionally substituted heterocycle or optionally substituted heterocyclic condensed ring. R4 is a hydrogen atom or halogen atom.

Abstract: To provide a novel furanone derivative, and a medicine including the same.