Patents by Inventor Chi Kang Liu

Chi Kang Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11532500
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: December 20, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Publication number: 20210233764
    Abstract: A semiconductor device and a method of forming a semiconductor device include forming a dielectric material, performing a wet oxidation treatment on the dielectric material, and performing a dry anneal on the dielectric material. The dielectric material may be a flowable material. The wet oxidation treatment may include an acid and oxidizer mixture.
    Type: Application
    Filed: July 15, 2020
    Publication date: July 29, 2021
    Inventors: Han-Pin Chung, Chi-Kang Liu
  • Publication number: 20210050247
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Application
    Filed: October 30, 2020
    Publication date: February 18, 2021
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Patent number: 10840126
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: November 17, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Patent number: 10606420
    Abstract: A touch display panel includes a substrate, a plurality of data lines, a plurality of touch sensing lines, and a plurality of gate lines. The data lines are disposed above the substrate, and extend along a first direction. The touch sensing lines are disposed above the substrate, extend along a second direction different from the first direction, and intersect with the data lines. The gate lines are disposed above the substrate, extend along the second direction, and intersect with the data lines. The touch sensing lines or the gate lines and the data lines form touch sensing elements.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: March 31, 2020
    Assignee: ILI TECHNOLOGY CORP.
    Inventors: Chi Kang Liu, Guo-Kiang Hung
  • Publication number: 20200083091
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Application
    Filed: November 19, 2019
    Publication date: March 12, 2020
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Patent number: 10515818
    Abstract: To pattern a gate electrode, a mandrel of material is initially deposited and then patterned. In an embodiment the patterning is performed by performing a first etching process and to obtain a rough target and then to perform a second etching process with different etch parameters to obtain a precise target. The mandrel is then used to form spacers which can then be used to form masks to pattern the gate electrode.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: December 24, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Kang Liu, Jr-Jung Lin, Huan-Just Lin, Ming-Hsi Yeh, Sung-Hsun Wu
  • Patent number: 10504770
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Grant
    Filed: June 18, 2018
    Date of Patent: December 10, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Patent number: 10457103
    Abstract: Determining installation positions of tires can include: measuring, by a magnetic sensor provided in each tire in the same manner, a first magnetic field strength in a first direction and a second magnetic field strength in a second direction, where the first direction is a circumferential or axial direction of the tire and the second direction is a radial direction of the tire; acquiring a first magnetic field strength sampling value of the tire by sampling the first magnetic field strength; acquiring a second magnetic field strength sampling value of the tire by sampling the second magnetic field strength; calculating a difference between the first and second magnetic field strength sampling values; and determining whether the installation position of the tire is on the left or right side of a vehicle according to a change trend of the calculated difference of the tire.
    Type: Grant
    Filed: April 5, 2018
    Date of Patent: October 29, 2019
    Assignee: Silergy Semiconductor Technology (Hangzhou) LTD
    Inventor: Chi-Kang Liu
  • Publication number: 20190279600
    Abstract: A driving method of a touch display device is provided. In a first display period of a first frame time, m gate signals are sequentially provided to first to mth gate lines, respectively, wherein m is a positive integer. In a first touch control period of the first frame time immediately following the first display period, a touch driving signal is provided to a touch sensor. In another first display period of a second frame time immediately following the first frame time, p gate signals are sequentially provided to the first to gate lines, pth respectively, where p is a positive integer and is different from m. In another first touch period of the second frame time immediately following the another first display period, the touch driving signal is provided to the touch sensor.
    Type: Application
    Filed: August 7, 2018
    Publication date: September 12, 2019
    Applicant: ILI TECHNOLOGY CORP.
    Inventors: Ping-Yu CHAN, Chi Kang LIU, Kai-Ting HO
  • Patent number: 10354998
    Abstract: Devices are described herein that include a first fin structure formed on a substrate. A second fin structure formed on the substrate. One or more gate structures are formed on the first fin structure and the second fin structure. A first in-fin source/drain region is associated with a first volume and is disposed between the first fin structure and the second fin structure. A fin-end source/drain region is associated with a second volume larger than the first volume, the first fin structure being disposed between the first in-fin source/drain region and the fin-end source/drain region. The gate structures, the first in-fin source/drain region, and the fin-end source/drain region are configured to form one or more transistors.
    Type: Grant
    Filed: August 10, 2017
    Date of Patent: July 16, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Yung-Ta Li, Chun-Hsiang Fan, Tung-Ying Lee, Clement Hsing-Jen Wann
  • Patent number: 10345978
    Abstract: An in-cell touch display panel includes a substrate, a semiconductor stack, a transparent layer, an insulation layer, and a metal layer. The semiconductor stack is disposed on the substrate, and includes a plurality of pixel control elements. The transparent layer is disposed on the semiconductor layer stack, and includes a plurality of first touch electrode portions and a plurality of first connecting lines extending along a first direction. The insulation layer is disposed on the transparent layer. The metal layer is disposed on the insulation layer, and includes a plurality of second touch electrode portions and a plurality of second connecting lines extending along a second direction. The second connecting lines and the first touch electrode portions form a plurality of first touch electrode strips, and the first connecting lines and the second touch electrode portions form a plurality of second touch electrode strips.
    Type: Grant
    Filed: November 14, 2017
    Date of Patent: July 9, 2019
    Assignee: ILI TECHNOLOGY CORP.
    Inventors: Chi Kang Liu, Guo-Kiang Hung
  • Patent number: 10216321
    Abstract: A control method for a touch display device including a display panel is provided. The display panel includes multiple first gate lines and multiple second gate lines respectively corresponding to a first field and a second field of a frame, and multiple sensing electrodes for touch sensing. Within one single frame period, the control method includes: scanning the first gate lines to update the first field; controlling the sensing electrodes to perform touch sensing and providing a first touch report; scanning the second gates lines to update the second field; and controlling the sensing electrodes to perform touch sensing and providing a second touch report. At least one of the first gates lines is located between two of the second gate lines, and at least one of the second gate lines is located between two of the first gate lines.
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: February 26, 2019
    Assignee: ILI TECHNOLOGY CORP.
    Inventors: Chi-Kang Liu, Guo-Kiang Hung, Song-Yi Lin, Ping-Yu Chan
  • Publication number: 20180312021
    Abstract: Determining installation positions of tires can include: measuring, by a magnetic sensor provided in each tire in the same manner, a first magnetic field strength in a first direction and a second magnetic field strength in a second direction, where the first direction is a circumferential or axial direction of the tire and the second direction is a radial direction of the tire; acquiring a first magnetic field strength sampling value of the tire by sampling the first magnetic field strength; acquiring a second magnetic field strength sampling value of the tire by sampling the second magnetic field strength; calculating a difference between the first and second magnetic field strength sampling values; and determining whether the installation position of the tire is on the left or right side of a vehicle according to a change trend of the calculated difference of the tire.
    Type: Application
    Filed: April 5, 2018
    Publication date: November 1, 2018
    Inventor: Chi-Kang Liu
  • Publication number: 20180301339
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Application
    Filed: June 18, 2018
    Publication date: October 18, 2018
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Patent number: 10042462
    Abstract: A touch sensing method of an electronic apparatus is provided. The electronic device includes a touch sensor and a motion sensor. The touch sensing method includes: performing touch detection with the touch sensor to generate a touch signal having a first amplitude; performing motion detection with the motion sensor to generate a motion signal having a second amplitude; determining whether the first amplitude is smaller than a first predetermined value, and determining whether the second amplitude is greater than a second predetermined value; and when the first amplitude is smaller than the first predetermined value and the second amplitude is greater than the second predetermined value, increasing a signal gain corresponding to the touch signal.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: August 7, 2018
    Assignee: MStar Semiconductor, Inc.
    Inventors: Chi Kang Liu, Chien Chuan Chen
  • Patent number: 10043479
    Abstract: An in-cell touch display panel includes a substrate, a semiconductor stack, a transparent layer, an insulating layer and a metal layer. The semiconductor stack is disposed on the substrate. The transparent layer is disposed on the semiconductor stack, and includes a plurality of connecting electrode strips extending along a first direction. The insulating layer is disposed on the transparent layer. The metal layer is disposed on the insulating layer, and includes a plurality of first touch electrode strips and a plurality of first touch electrode portions. The first touch electrode strips extend along a second direction. The first touch electrode portions and the connecting electrode strips form a plurality of second touch electrode strips extending along the first direction. The first touch electrode strips intersect and are insulated from the second touch electrode strips.
    Type: Grant
    Filed: September 1, 2015
    Date of Patent: August 7, 2018
    Assignee: MSTAR SEMICONDUCTOR, INC.
    Inventors: Guo-Kiang Hung, Chi Kang Liu, Ping-Yu Chan
  • Patent number: 10002765
    Abstract: A method for forming FinFETs comprises forming a plurality of first fins and a plurality of second fins over a substrate and embedded in isolation regions, depositing a first photoresist layer over the substrate, removing the first photoresist layer over an n-type region, applying a first ion implantation process to the first isolation regions, wherein dopants with a first polarity type are implanted in the first isolation regions, depositing a second photoresist layer over the substrate, removing the second photoresist layer over a p-type region, applying a second ion implantation process to the second isolation regions, wherein dopants with a second polarity type are implanted in the second isolation regions, applying an annealing process to the isolation regions and recessing the first isolation regions and the second isolation regions through an etching process.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: June 19, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Lien Huang, Chi-Kang Liu, Chi-Wen Liu
  • Publication number: 20180151382
    Abstract: To pattern a gate electrode, a mandrel of material is initially deposited and then patterned. In an embodiment the patterning is performed by performing a first etching process and to obtain a rough target and then to perform a second etching process with different etch parameters to obtain a precise target. The mandrel is then used to form spacers which can then be used to form masks to pattern the gate electrode.
    Type: Application
    Filed: January 27, 2017
    Publication date: May 31, 2018
    Inventors: Chi-Kang Liu, Jr-Jung Lin, Huan-Just Lin, Ming-Hsi Yeh, Sung-Hsun Wu
  • Publication number: 20180074617
    Abstract: An in-cell touch display panel includes a substrate, a semiconductor stack, a transparent layer, an insulation layer, and a metal layer. The semiconductor stack is disposed on the substrate, and includes a plurality of pixel control elements. The transparent layer is disposed on the semiconductor layer stack, and includes a plurality of first touch electrode portions and a plurality of first connecting lines extending along a first direction. The insulation layer is disposed on the transparent layer. The metal layer is disposed on the insulation layer, and includes a plurality of second touch electrode portions and a plurality of second connecting lines extending along a second direction. The second connecting lines and the first touch electrode portions form a plurality of first touch electrode strips, and the first connecting lines and the second touch electrode portions form a plurality of second touch electrode strips.
    Type: Application
    Filed: November 14, 2017
    Publication date: March 15, 2018
    Inventors: Chi Kang Liu, Guo-Kiang Hung