Abstract: A display panel including a first substrate, a second substrate opposite to the first substrate and a display medium between the first substrate and the second substrate is provided. The first substrate has a scan line, a data line and an active device electrically connected to the scan line and the data line. The second substrate has a common electrode layer, an insulting layer covering the common electrode layer, a pixel electrode on the insulating layer and a contact structure on the insulating layer. More specifically, the contact structure is electrically connected to the pixel structure and electrically connected to the active device on the first substrate.

Abstract: A method for fabricating a metal-oxide semiconductor transistor is disclosed. First, a semiconductor substrate having a gate structure thereon is provided, and a spacer is formed around the gate structure. An ion implantation process is performed to implant a molecular cluster containing carbon, boron, and hydrogen into the semiconductor substrate at two sides of the spacer for forming a doped region. The molecular weight of the molecular cluster is preferably greater than 100. Thereafter, a millisecond annealing process is performed to activate the molecular cluster within the doped region.

Abstract: An overlay mark is used in pattern registration on a semiconductor wafer with an oxide layer. Four sets of two trenches each are formed in the oxide layer. Each trench in a set is parallel to the other trench of the same set. The trenches are configured such that each set forms one side of a box shape.

Abstract: A process control method is provided for controlling a tool which processes a deposition process on a plurality of wafers for a process time. The process control method comprises receiving a quantity of the wafers and calculating a deposition compensation time necessary for the deposition process performed on the wafers by the tool according to the quantity of the wafers and a deposition loading effect coefficient corresponding to the deposition process. The deposition loading effect coefficient is retrieved from a database according to a process program of the deposition process. According to the deposition compensation time, the process time is adjusted to be an adjusted process time. The deposition process is performed on the wafers for the adjusted process time by the tool.

Abstract: A method of forming a mark in an IC fabricating process is described. Two parts of the mark each including a plurality of linear patterns are respectively defined by two exposure steps that either belong to two lithography processes respectively or constitute a double-exposure process including X-dipole and Y-dipole exposure steps.

Abstract: A method for patient risk level evaluation is provided, implemented with a remote medical care center. The remote medical care center connects with a plurality of health care locations at various locations over a network. Patient data of a plurality of patients is received from the plurality of health care locations via the network. An occurred event for each patient is determined, and each of the occurred events is classified into deteriorating or ameliorating category. The patients corresponding to the same events are sorted into a group, and the patients within the group are ranked according to severity of illness of each patient. A risk score for each patient is determined according to the corresponding event. Patient ranking orders corresponding to the events of the deteriorating and the ameliorating category are generated and displayed.

Abstract: An optical disk drive includes a body, a tray, a first fastening structure, and a second fastening structure. The body has an opening. The tray is coupled to the body and movable at the opening. The first fastening structure is disposed at the body, and the second fastening structure is disposed at the tray. When the tray is situated in the body, the first fastening structure and second fastening structure are correspondingly fastened to each other to restrict the displacement of the tray along the vertical direction in the body.

Abstract: A method of patterning a target layer on a substrate is described. A patterned photoresist layer is formed over the target layer, wherein the patterned photoresist layer has unexposed parts as separate islands and each unexposed part has a low proton concentration at least in its sidewalls. Acid-crosslinked polymer layers are formed only on the sidewalls of each unexposed part. A flood exposure step is performed to the substrate. A baking step is performed to the patterned photoresist layer. A development step is performed to remove the previously unexposed parts. The target layer is etched with the acid-crosslinked polymer layers as a mask.

Abstract: A touch display panel including a first substrate and a second substrate is provided. A plurality of sensing units is disposed on the first substrate, and each sensing unit includes a main-sensing pattern and at least one sub-sensing pattern. The at least one sub-sensing pattern is electrically connected to the main-sensing pattern, and the size of the at least one sub-sensing pattern is smaller than the size of the main-sensing pattern. A plurality of sensing electrodes is disposed on the second substrate, and each of the sensing electrodes is disposed corresponding to one of the sensing units on the first substrate.

Abstract: A method of forming a mark in an IC fabricating process is described. Two parts of the mark each including a plurality of linear patterns are respectively defined by two exposure steps that either belong to two lithography processes respectively or constitute a double-exposure process including X-dipole and Y-dipole exposure steps.

Abstract: The disclosure provides fusion proteins comprising a carbohydrate recognition domain of an innate immunity receptor and a heterologous polypeptide. The fusion proteins of the disclosure may be used, for example, to fingerprint polysaccharide compositions and to purify polysaccharide compositions. Polysaccharide compositions include those isolated from Ganoderma lucidum (Reishi). The methods and reagents of the disclosure may also be used to identify innate immunity receptors and cell types that bind to polysaccharide compositions (including polysaccharide compositions associated with pathogens), whereupon modulators of the identified receptors can then be obtained. The fusion proteins also may be used to inhibit the interaction between a polysaccharide composition and an innate immunity receptor on a cell surface.

Abstract: An integrated circuit that includes a line end created through use of a mask that controls line end shortening and corner rounding arising from proximity effects is provided. The mask includes a main feature having opaque and transmissive areas arranged to reflect a patterned feature of the line end, at least one of an opaque edge or a transmissive edge located at each end of the main feature, wherein the opaque edge has a set of transmissive assist features arranged therein such that the set of transmissive assist features align alternately with the transmissive areas of the main feature, and the transmissive edge has a set of opaque assist features arranged therein such that the set of opaque assist features align alternately with the opaque areas of the main feature.

Abstract: The present invention relates to a retractable correction tape-dispensing device (100). The device (100) generally comprises a housing; a supply spool (10), rotatably mounted on a supply spool spindle, for reeling the transfer tape (20) adhered with the film; a take-up spool (30), rotatably mounted on a take-up spool spindle for reeling the transfer tape (20) which has been blank-backed of the applied film; an application tip (40) displaceable between an application position and a retracted position, and the transfer tape (20) is spanned over the application tip (40); an actuating member (50), connected to the application tip (40), and manually operable to displace the application tip (40) back and forth between the application position and the retracted position; and means to propel the applicator tip into the retracted position.

Abstract: A method of cleaning wafer cleaning includes: first a wafer stage for holding and rotating a wafer is provided. The wafer has a surface to be washed. A nozzle is positioned on the wafer for spraying a cleaning solution. The nozzle moves in non-uniform motion from a first given point to a second given point so as to make the time which the first given point is exposed to the cleaning solution equal to the time which the second given point is exposed to the cleaning solution. Furthermore, the nozzle moves faster when passing the center of the wafer and moves slower when passing the edge of the wafer.

Abstract: An overlay mark is used in pattern registration on a semiconductor wafer with an oxide layer. Four sets of two trenches each are formed in the oxide layer. Each trench in a set is parallel to the other trench of the same set. The trenches are configured such that each set forms one side of a box shape.

Abstract: In a liquid crystal display (LCD) device, a plurality of pixels is driven to display a first frame and a second frame in sequence. A gray-scale difference between the first frame and the second frame is detected to determine a driving mode variation between the first frame and the second frame. The number of pixels driven by a dynamic mode and a static mode in the second frame is adjusted according to the driving mode variation. Gray-scale data corresponding to the pixels in the second frame is output.

Abstract: A method of manufacturing a memory device is disclosed. The method includes providing a substrate, forming a number of memory sectors on the substrate, wherein each of the memory sectors is coupled to an adjacent one via a first diffused region in the substrate and is coupled to another adjacent one via at least one second diffused region in the substrate, forming a first dielectric layer on the memory sectors, forming a first conductive structure through the first dielectric layer to the first diffused region, and at least one second conductive structure through the first dielectric layer to the at least one second diffused region, forming a patterned first mask layer on the first dielectric layer, the first conductive structure and the at least one second conductive structure, the patterned first mask layer exposing the first conductive structure, and etching back the first conductive structure.

Abstract: The present invention provides a semiconductor device with a metal-to-contact overlay structure. The semiconductor device includes a substrate, a dielectric layer on the substrate, a contact coupled to the substrate in the dielectric layer, a first conductive region on the contact in the dielectric layer, a dielectric sidewall on the contact in the dielectric layer, the dielectric sidewall surrounding the first conductive region, and a second conductive region on the first conductive region on the dielectric layer.

Abstract: A touch-sensing display device, specifically to a borderless touch-sensing display device, is disclosed. The touch-sensing display device includes a display module and a touch-sensing module. The touch-sensing module includes a first sensing sheet and a second sensing sheet, wherein a space exists between the first sensing sheet and the second sensing sheet. The first sensing sheet includes a lens layer, a plurality of first conductive portions, and a conductive film, wherein the conductive film is disposed on the lens layer while the first conductive portions are distributed on two opposite sides of the lens layer. The second sensing sheet includes a substrate, a plurality of second conductive portions, and a plurality of conductive strips, wherein the second conductive portions are selectively distributed on one of two sides of the substrate while the conductive strips are respectively connected to the second conductive portions and have different voltages.