Abstract: A method of performing a chemical mechanical planarization (CMP) process includes holding a wafer by a retainer ring attached to a carrier, pressing the wafer against a first surface of a polishing pad, the polishing pad rotating at a first speed, dispensing a slurry on the first surface of the polishing pad, and generating vibrations at the polishing pad.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: A method of performing a chemical mechanical planarization (CMP) process includes holding a wafer by a retainer ring attached to a carrier, pressing the wafer against a first surface of a polishing pad, the polishing pad rotating at a first speed, dispensing a slurry on the first surface of the polishing pad, and generating vibrations at the polishing pad.

Abstract: A planarization method includes: providing a substrate, wherein the substrate includes a first region and a second region having different degrees of hydrophobicity or hydrophilicity, the second region covering an upper surface of the first region; polishing the substrate with a polishing slurry until the upper surface of the first region is exposed; and continuing polishing and performing a surface treatment by the polishing slurry to adjust the degree of hydrophobicity or hydrophilicity of at least one of the first region and the second region. The polishing slurry and the upper surface of the second region have a first contact angle, and the polishing slurry and the upper surface of the first region have a second contact angle. The surface treatment keeps a contact angle difference between the first contact angle and the second contact angle being equal to or less than 30 degrees during the polishing.

Abstract: A method of performing a chemical mechanical planarization (CMP) process includes holding a wafer by a retainer ring attached to a carrier, pressing the wafer against a first surface of a polishing pad, the polishing pad rotating at a first speed, dispensing a slurry on the first surface of the polishing pad, and generating vibrations at the polishing pad.

Abstract: An electronic device, a method, and a computer-readable recording medium are provided for deactivating a chat room of a messenger application. The electronic device is configured for: receiving a deactivation request for one or more chat rooms, in which the deactivation request is associated with a chat room configuration, and the chat room configuration includes a deactivation condition for the one or more chat rooms; storing the chat room configuration including the deactivation condition for the one or more chat rooms based on the deactivation request; and deactivating the one or more chat rooms based on determining whether or not the deactivation condition for the one or more chat rooms is satisfied.

Abstract: A planarization method and a CMP method are provided. The planarization method includes providing a substrate with a first region and a second region having different degrees of hydrophobicity or hydrophilicity and performing a surface treatment to the first region to render the degrees of hydrophobicity or hydrophilicity in proximity to that of the second region. The CMP method includes providing a substrate with a first region and a second region; providing a polishing slurry on the substrate, wherein the polishing slurry and the surface of the first region have a first contact angle, and the polishing slurry and the surface of the first region have a second contact angle; modifying the surface of the first region to make a contact angle difference between the first contact angle and the second contact angle equal to or less than 30 degrees.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: A method of performing a chemical mechanical planarization (CMP) process includes holding a wafer by a retainer ring attached to a carrier, pressing the wafer against a first surface of a polishing pad, the polishing pad rotating at a first speed, dispensing a slurry on the first surface of the polishing pad, and generating vibrations at the polishing pad.

Abstract: A planarization method and a CMP method are provided. The planarization method includes providing a substrate with a first region and a second region having different degrees of hydrophobicity or hydrophilicity and performing a surface treatment to the first region to render the degrees of hydrophobicity or hydrophilicity in proximity to that of the second region. The CMP method includes providing a substrate with a first region and a second region; providing a polishing slurry on the substrate, wherein the polishing slurry and the surface of the first region have a first contact angle, and the polishing slurry and the surface of the first region have a second contact angle; modifying the surface of the first region to make a contact angle difference between the first contact angle and the second contact angle equal to or less than 30 degrees.

Abstract: A computer-implemented method of providing seamless online video advertisements includes rendering a video advertisement on a first web page in a first tab. The computer-implemented method also includes recording current time of play constantly during the rendering of the video advertisement and receiving a request for a second web page in the first tab from the user. Further, the computer-implemented method includes unloading the first web page and loading the second web page in the first tab. Moreover, the computer-implemented method includes retrieving current time of play stored corresponding to the unloading and resume the rendering the video advertisement on the second web page based on the current time of play retrieved.

Abstract: A planarization method and a CMP method are provided. The planarization method includes providing a substrate with a first region and a second region having different degrees of hydrophobicity or hydrophilicity and performing a surface treatment to the first region to render the degrees of hydrophobicity or hydrophilicity in proximity to that of the second region. The CMP method includes providing a substrate with a first region and a second region; providing a polishing slurry on the substrate, wherein the polishing slurry and the surface of the first region have a first contact angle, and the polishing slurry and the surface of the first region have a second contact angle; modifying the surface of the first region to make a contact angle difference between the first contact angle and the second contact angle equal to or less than 30 degrees.

Abstract: A planarization method and a CMP method are provided. The planarization method includes providing a substrate with a first region and a second region having different degrees of hydrophobicity or hydrophilicity and performing a surface treatment to the first region to render the degrees of hydrophobicity or hydrophilicity in proximity to that of the second region. The CMP method includes providing a substrate with a first region and a second region; providing a polishing slurry on the substrate, wherein the polishing slurry and the surface of the first region have a first contact angle, and the polishing slurry and the surface of the first region have a second contact angle; modifying the surface of the first region to make a contact angle difference between the first contact angle and the second contact angle equal to or less than 30 degrees.

Abstract: A mounting apparatus is used to mount a hard disk drive to a storage rack. The mounting apparatus includes a supporting frame and two grounding members. The supporting frame includes a handle, and two side brackets extending from opposite ends of the handle, and attached to opposite sides of the hard disk drive. Each grounding member is made of resilient and conductive material, and includes a mounting plate mounted to the side bracket, and two abutting plates extending out from two opposite ends of the mounting plate. A part of each abutting plate is exposed out of the corresponding side bracket. when the mounting apparatus mounting the hard disk drive in a storage rack, the abutting plates are sandwiched between the storage rack and the hard disk drive.

Abstract: A mounting apparatus is used to mount a hard disk drive to a storage rack. The mounting apparatus includes a supporting frame and two grounding members. The supporting frame includes a handle, and two side brackets extending from opposite ends of the handle, and attached to opposite sides of the hard disk drive. Each grounding member is made of resilient and conductive material, and includes a mounting plate mounted to the side bracket, and two abutting plates extending out from two opposite ends of the mounting plate. A part of each abutting plate is exposed out of the corresponding side bracket. when the mounting apparatus mounting the hard disk drive in a storage rack, the abutting plates are sandwiched between the storage rack and the hard disk drive.

Abstract: A supporting frame is used to mount a hard disk drive to a storage rack. The storage rack forms two protrusions protruding inwards from opposite sides of the storage rack. The supporting frame includes a handle and two side brackets resiliently connected to the handle. The side brackets are fixedly attached to opposite sides of the hard disk drive. The handle defines two locking holes. The protrusions of the storage rack are respectively engaged in the locking holes. When the handle is moved away from the hard disk drive, the handle is deformed to disengage the protrusions of the storage rack from the locking holes of the handle.

Abstract: A supporting frame is used to mount a hard disk drive to a storage rack. The storage rack forms two protrusions protruding inwards from opposite sides of the storage rack. The supporting frame includes a handle and two side brackets resiliently connected to the handle. The side brackets are fixedly attached to opposite sides of the hard disk drive. The handle defines two locking holes. The protrusions of the storage rack are respectively engaged in the locking holes. When the handle is moved away from the hard disk drive, the handle is deformed to disengage the protrusions of the storage rack from the locking holes of the handle.