Patents by Inventor Ching-Hwa Chang

Ching-Hwa Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110089398
    Abstract: A method for improving internal quantum efficiency of a group-III nitride-based light emitting device is disclosed. The method includes the steps of: providing a group-III nitride-based substrate having a single crystalline structure; forming on the group-III nitride-based substrate an oxide layer, having a plurality of particles, without absorption of visible light, size, shape, and density of the particles are controlled by reaction concentration ratio of nitrogen/hydrogen, reaction time and reaction temperature; and growing a group-III nitride-based layer over the oxide layer; wherein the oxide layer prevents threading dislocation of the group-III nitride-based substrate from propagating into the group-III nitride-based layer, thereby improving internal quantum efficiency of the group-III nitride-based light emitting device.
    Type: Application
    Filed: October 20, 2009
    Publication date: April 21, 2011
    Applicant: WALSIN LIHWA CORPORATION
    Inventors: Chang-Chi Pan, Ching-Hwa Chang Jean, Jang-Ho Chen
  • Publication number: 20100308323
    Abstract: A method for improving light extraction efficiency of a group-III nitride-based light emitting device is disclosed. The method includes the steps of: providing a group-III nitride-based light emitting device having a top surface; disposing a seed layer on the top surface for increasing adhesion of the group-III nitride-based light emitting device; and forming a patterned oxide layer, having a plurality of nanostructure particles, without absorption of visible light on the seed layer. The size and shape of the nanostructure particles are controlled by reaction concentration, time and temperature during the patterned oxide layer formation, thereby improving light extraction efficiency of the group-III nitride-based light emitting device without damaging the group-III nitride-based light emitting device.
    Type: Application
    Filed: June 8, 2009
    Publication date: December 9, 2010
    Applicant: WALSIN LIHWA CORPORATION
    Inventors: Ching-hwa CHANG JEAN, Jangho CHEN
  • Patent number: 7781242
    Abstract: A method of forming a vertical structure light emitting diode with a heat exhaustion structure, comprising the steps of: providing a sapphire substrate; producing a number of recesses on the sapphire substrate, each of which has a depth of p; forming a buffer layer having a number of protrusions, each of which has a height of q smaller than p so that when the protrusions of the buffer layer are accommodated within the recesses of the sapphire substrate, a number of gaps are formed therebetween for heat exhaustion; growing a number of luminescent layers on the buffer layer, having a medium layer formed between the luminescent layers and the buffer layer; etching through the luminescent layers and the buffer layer to form a duct for heat exhaustion; removing the sapphire substrate by excimer laser lift-off (LLO); roughening the medium layer; and depositing electrodes on the roughened medium layer.
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: August 24, 2010
    Assignee: Walsin Lihwa Corporation
    Inventors: Shiue-Lung Chen, Jeng-Kuo Feng, Ching-Hwa Chang Jean, Jang-Ho Chen
  • Patent number: 6685820
    Abstract: The present invention relates to a method for treating spent tin or tin/lead stripping solution used in the electronic industry, particularly in the manufacture of printed circuit boards or a lead frames. Said method comprises (i) electrolytically reducing copper ions in the solution to copper at a low temperature; (ii) electrolytically oxidizing Sn2+ and Pb2+ in the solution at a high temperature to form solid tin and lead oxides and hydroxides; (iii) separating solid tin and lead oxides and hydroxides from the solution; (iv) dissolving tin and lead oxides and hydroxides obtained in step (iii) in a strong alkali or acidic solution; and (v) electrolytically reducing the alkali or acidic solution obtained in step (iv) at a high temperature to recover metallic tin and lead. Also, the filtrate obtained in step (iii) above is useful for preparing fresh tin or tin/lead stripping solution.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: February 3, 2004
    Assignees: Amia Co., Ltd., Persee Chemical Co., Ltd.
    Inventors: Kuo-Chin Chen, Ching-Hwa Chang, Yu-Feng Lin, Tai-Sheng Yuan, Hung-Ming Wang, Jenn-Fang Wu, Huei-Yin Cheng
  • Publication number: 20030200838
    Abstract: The present invention relates to a method for treating spent tin or tin/lead stripping solution used in the electronic industry, particularly in the manufacture of printed circuit boards or a lead frames. Said method comprises (i) electrolytically reducing copper ions in the solution to copper at a low temperature; (ii) electrolytically oxidizing Sn2+ and Pb2+ in the solution at a high temperature to form solid tin and lead oxides and hydroxides; (iii) separating solid tin and lead oxides and hydroxides from the solution; (iv) dissolving tin and lead oxides and hydroxides obtained in step (iii) in a strong alkali or acidic solution; and (v) electrolytically reducing the alkali or acidic solution obtained in step (iv) at a high temperature to recover metallic tin and lead. Also, the filtrate obtained in step (iii) above is useful for preparing fresh tin or tin/lead stripping solution.
    Type: Application
    Filed: April 26, 2002
    Publication date: October 30, 2003
    Inventors: Kuo-Chin Chen, Ching-Hwa Chang, Yu-Feng Lin, Tai-Sheng Yuan, Hung-Ming Wang, Jenn-Fang Wu, Huei-Yin Cheng