Patents by Inventor Chirag Rajyaguru
Chirag Rajyaguru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11690159Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.Type: GrantFiled: October 25, 2019Date of Patent: June 27, 2023Assignee: ASML Netherlands B.V.Inventors: Bob Rollinger, Georgiy Olegovich Vaschenko, Chirag Rajyaguru, Alexander Igorevich Ershov, Joshua Mark Lukens, Mathew Cheeran Abraham
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Patent number: 11317501Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.Type: GrantFiled: September 16, 2019Date of Patent: April 26, 2022Assignee: ASML Netherlands B.V.Inventors: Georgiy Vaschenko, Peter Baumgart, Chirag Rajyaguru, Benjamin Sams, Armin Ridinger, Janine Kardokus
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Publication number: 20210392733Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.Type: ApplicationFiled: October 25, 2019Publication date: December 16, 2021Inventors: Bob Rollinger, Georgiy Olegovich Vaschenko, Chirag Rajyaguru, Alexander Igorevich Ershov, Joshua Mark Lukens, Mathew Cheeran Abraham
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Patent number: 10632505Abstract: A system and method for cleaning a sintered filter includes a cleaning fluid source and a cleaning nozzle. The cleaning nozzle includes an inlet end coupled to the cleaning fluid source and at least one outlet port for outputting the cleaning fluid injected through the cleaning nozzle. The outlet port is disposed proximate to an outlet end of the cleaning nozzle. The cleaning nozzle has an external width less than an internal width of the sintered filter to be cleaned. The cleaning nozzle has a nozzle length greater than a full depth of the sintered filter to be cleaned. The outlet port can be disposed in a side of the cleaning nozzle proximate to the outlet end of the cleaning nozzle. The outlet port can include more than one outlet ports.Type: GrantFiled: April 6, 2016Date of Patent: April 28, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Armin Bernhard Ridinger, Georgiy O. Vaschenko, Chirag Rajyaguru, Peter Michael Baumgart, Timothy Richard Palmer
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Publication number: 20200015343Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.Type: ApplicationFiled: September 16, 2019Publication date: January 9, 2020Inventors: Georgiy VASCHENKO, Peter BAUMGART, Chirag RAJYAGURU, Benjamin SAMS, Armin RIDINGER, Janine KARDOKUS
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Patent number: 10455680Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.Type: GrantFiled: February 29, 2016Date of Patent: October 22, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Georgiy Vaschenko, Peter Baumgart, Chirag Rajyaguru, Benjamin Sams, Armin Ridinger, Janine Kardokus
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Patent number: 10426020Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.Type: GrantFiled: February 2, 2016Date of Patent: September 24, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Peter M. Baumgart, John Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
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Publication number: 20170291196Abstract: A system and method for cleaning a sintered filter includes a cleaning fluid source and a cleaning nozzle. The cleaning nozzle includes an inlet end coupled to the cleaning fluid source and at least one outlet port for outputting the cleaning fluid injected through the cleaning nozzle. The outlet port is disposed proximate to an outlet end of the cleaning nozzle. The cleaning nozzle has an external width less than an internal width of the sintered filter to be cleaned. The cleaning nozzle has a nozzle length greater than a full depth of the sintered filter to be cleaned. The outlet port can be disposed in a side of the cleaning nozzle proximate to the outlet end of the cleaning nozzle. The outlet port can include more than one outlet ports.Type: ApplicationFiled: April 6, 2016Publication date: October 12, 2017Inventors: Armin Bernhard Ridinger, Georgiy O. Vaschenko, Chirag Rajyaguru, Peter Michael Baumgart, Timothy Richard Palmer
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Publication number: 20170247778Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.Type: ApplicationFiled: February 29, 2016Publication date: August 31, 2017Inventors: Georgiy Vaschenko, Peter Baumgart, Chirag Rajyaguru, Benjamin Sams, Armin Ridinger, Janine Kardokus
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Patent number: 9699876Abstract: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.Type: GrantFiled: January 9, 2014Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS, B.V.Inventors: Georgiy Vaschenko, Peter Baumgart, Jeffrey Gacutan, Martin Algots, Theodosios Syrpis, Chirag Rajyaguru, Sanjeev Seshagiri
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Patent number: 9544983Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.Type: GrantFiled: November 5, 2014Date of Patent: January 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Chirag Rajyaguru, John M. Algots, Tetsuya Ishikawa, Peter Baumgart
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Publication number: 20160150626Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.Type: ApplicationFiled: February 2, 2016Publication date: May 26, 2016Inventors: Peter M. BAUMGART, J. Martin ALGOTS, Abhiram GOVINDARAJU, Chirag RAJYAGURU
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Publication number: 20160128170Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.Type: ApplicationFiled: November 5, 2014Publication date: May 5, 2016Applicant: ASML Netherlands B.V.Inventors: Chirag RAJYAGURU, John M. Algots, Tetsuya Ishikawa, Peter Baumgart
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Patent number: 9279445Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.Type: GrantFiled: December 16, 2011Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Peter M. Baumgart, J. Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
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Publication number: 20150113123Abstract: Disclosed is a method and server for discovering virtual private networks with extranet configurations. An extent of a virtual private network (VPN) is determined based on matching criteria. Confirmed layer three (L3) VPNs are determined based on an enablement of a heuristic. The confirmed L3 VPNs are re-examined to determine extranet linkages. Also disclosed is a method and user interface device for discovering VPNs with extranet configurations. VPNs whose extents cannot be reliably determined by a heuristic are manually determined using a user interface device. Extranet linkages are manually located using the user interface device.Type: ApplicationFiled: October 22, 2013Publication date: April 23, 2015Applicant: TELEFONAKTIEBOLAGET L M ERICSSON (PUBL)Inventors: Shing Yeung, Kelvin Ting, Chris Stein, Chirag Rajyaguru
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Patent number: 8969840Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: GrantFiled: August 5, 2014Date of Patent: March 3, 2015Assignee: ASML Netherlands B.V.Inventors: Chirag Rajyaguru, Peter M. Baumgart, Georgiy O. Vaschenko
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Publication number: 20140346373Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: ApplicationFiled: August 5, 2014Publication date: November 27, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Chirag Rajyaguru, Peter M. Baumgart, Georgiy O. Vaschenko
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Publication number: 20140261761Abstract: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.Type: ApplicationFiled: January 9, 2014Publication date: September 18, 2014Inventors: Georgiy VASCHENKO, Peter Baumgart, Jeffrey Gacutan, martin Algots, Theodosios Syrpis, Chirag Rajyaguru, Sanjeev Seshagiri
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Patent number: 8829477Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: GrantFiled: April 30, 2013Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Chirag Rajyaguru, Peter M. Baumgart, Georgiy O. Vaschenko
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Publication number: 20130234051Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: ApplicationFiled: April 30, 2013Publication date: September 12, 2013Inventors: Chirag Rajyaguru, Peter M. Baumgart, Georgiy O. Vaschenko