Patents by Inventor Chirag Rajyaguru

Chirag Rajyaguru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8513629
    Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.
    Type: Grant
    Filed: May 13, 2011
    Date of Patent: August 20, 2013
    Assignee: Cymer, LLC
    Inventors: Chirag Rajyaguru, Peter Baumgart, Georgiy O. Vaschenko
  • Publication number: 20130153792
    Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.
    Type: Application
    Filed: December 16, 2011
    Publication date: June 20, 2013
    Applicant: CYMER, INC
    Inventors: Peter M. Baumgart, J. Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
  • Publication number: 20120286176
    Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.
    Type: Application
    Filed: May 13, 2011
    Publication date: November 15, 2012
    Inventors: Chirag Rajyaguru, Peter Baumgart, Georgiy O. Vaschenko