Patents by Inventor Chiun Wang

Chiun Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for pressure compensation in a mass flow controller
    Publication number: 20040074311
    Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.
    Type: Application
    Filed: July 17, 2003
    Publication date: April 22, 2004
    Applicant: Celerity Group, Inc.
    Inventors: John Michael Lull, Chiun Wang, Joseph A. Saggio
  • System and method for a mass flow controller
    Publication number: 20020198668
    Abstract: A system and method for controlling a mass flow controller to have a constant control loop gain under a variety of different types of fluids and operating conditions, and for configuring the mass flow controller for operation with a fluid and/or operating conditions different from that used during a production of the mass flow controller. Further, the system and method includes providing control by reducing the effects of hysteresis in solenoid actuated devices by providing a non-operational signal to the solenoid actuated device.
    Type: Application
    Filed: April 24, 2002
    Publication date: December 26, 2002
    Inventors: John M. Lull, Chiun Wang, William S. Valentine, Joseph A. Saggio
  • Pressure insensitive gas control system
    Patent number: 6425281
    Abstract: A pressure insensitive gas process device that includes a gas sensor and restrictions upstream and downstream of the gas sensor. The restrictions result in pressure drops upstream and downstream of the gas sensor which shield the gas sensor from upstream and downstream pressure changes, respectively, rendering the gas sensor and the entire gas process device insensitive to pressure changes. Gas process devices in which pressure insensitivity may be achieved include mass flow controllers as well as other types of devices.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: July 30, 2002
    Assignee: Unit Instruments, Inc.
    Inventors: David P. Sheriff, Chiun Wang