Abstract: The present invention discloses a universal replaceable back radar, wherein a head sleeve and a vehicle-reversing module thereof are separately designed and coated, an ultrasonic head is coupled to the connecting block of the vehicle-reversing module, an angle-adjust pad is also clamped to the connecting block of the vehicle-reversing module, and a big and a small hook platelets each with different heights are separately installed at both sides of one face of the angle-adjust pad and press against the internal face of a downward-tilt or an upward-tilt bumper. The universal replaceable back radar of the present invention can simplify the assemblage thereof and save the coating step thereof and its man-hour.

Abstract: Disclosed herein is a method of analyzing three-dimensional data obtained from a chromatography/spectrometry process, in particular an LC/MS process using a two-dimensional multi-variant statistical analysis. The LC portion permits separation of analytes within a sample. The information obtained from such a procedure typically depends on retention time (Rt). As the analytes progress through the system, they enter the MS region of the LC/MS system. There they are ionized and a mass detector then detects these ionized species. The information procured from this procedure is generally reported as intensity for a corresponding m/z value. Therefore, an LC/MS system provides at least three pieces of information. Principle component analysis (PCA) is a robust method of multi-variant analysis of this type of data between different samples. However, typically, PCA analysis is performed using only two-dimensional data.

Abstract: Three alternate fiber ribbon interconnections are described for optically interfacing two 4-channel optoelectronic transceiver modules, each module having separate, spaced apart transmitter and receiver diode arrays. In each instance the optical interconnection is made by either an 8 fiber or a 12 fiber ribbon and associated fiber end connectors.

Abstract: A fuel injector includes a homogenous charge nozzle outlet set and a conventional nozzle outlet set that are controlled respectively by first and second three way needle control valves. Each fuel injector includes first and second concentric needle valve members. One of the needle valve members moves to an open position for a homogenous charge injection event, while the other needle valve member moves to an open position for a conventional injection event. The fuel injector has the ability to operate in a homogenous charge mode with a homogenous charge spray pattern, a conventional mode with a conventional spray pattern or a mixed mode.

Abstract: A method for etching a wafer having a pattern of photoresist material thereon is disclosed. The method includes curing the photoresist material with a bromine containing plasma. Then a main etch of the wafer is carried out. A method for curing a pattern of photoresist material on a wafer is also disclosed. The curing method includes providing a bromine containing plasma and exposing the photoresist material to the plasma, such that a layer of the wafer below the photoresist material is not etched through. A composition of a plasma for curing a photoresist material on a wafer in a high density plasma processing device includes bromine.

Abstract: An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.

Abstract: A method and apparatus for determining the relative relevance of electronic documents based on metadata/content associated with the document as a whole and/or metadata/content associated with one or more subdivisions of the electronic document are provided. With the method and apparatus, metadata is associated with the document and various subdivision markers in the code of the document. A comparison of electronic documents may be made by comparing the metadata/content associated with the document and/or the subdivisions of the document to determine which documents contains subject matter that is relevant to the subject matter of another document or search criteria. The metadata/content associated with the document and/or subdivisions may be weighted and these weights may be modified based on a rank profile that may be established by a relative relevance search engine provider or may be customized by users to their specific needs.

Abstract: A method for selectively etching a high dielectric constant layer over a silicon substrate is provided. The silicon substrate is placed into an etch chamber. An etchant gas is provided into the etch chamber, where the etchant gas comprises BCl3, an inert diluent, and Cl2, where the flow ratio of the inert diluent to BCl3 is between 2:1 and 1:2, and where the flow ratio of BCl3 to Cl2 is between 2:1 and 20:1. A plasma is generated from the etchant gas to selectively etch the high dielectric constant layer.

Abstract: Optoelectronic transceiver modules having photoemitter and photodetector arrays spaced from each other are interfaced to a single optical fiber ribbon having evenly spaced optical fibers.

Abstract: A method for etching a bilayer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first layer of the bilayer resist into the etch chamber. Then SiCl4 gas flows into the etch chamber. Next, a plasma is struck in the etch chamber while flowing the SiCl4 gas. Then the bilayer resist is etched.

Abstract: A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.

Abstract: A coaxial cable may include an inner conductor, an outer conductor coaxially disposed about the inner conductor, and a proximal end sized and shaped for insertion into a connector. The proximal end may have an outer conductor contact coupled electrically to the outer conductor, and an extended section of the inner conductor that extends axially beyond the outer conductor contact. The extended section may include an inner conductor contact having an electrically conductive material disposed at least partially around the inner conductor, and an insulated area positioned to isolate electrically the outer conductive contact from the inner conductive contact, and having an electrically insulating material disposed at least partially around the inner conductor.

Abstract: A method for etching a polysilicon gate structure in a plasma etch chamber is provided. The method initiates with defining a pattern protecting a polysilicon film to be etched. Then, a plasma is generated. Next, substantially all of the polysilicon film that is unprotected is etched. Then, a silicon containing gas is introduced and a remainder of the polysilicon film is etched while introducing a silicon containing gas. An etch chamber configured to introduce a silicon containing gas during an etch process is also provided.

Abstract: A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.

Abstract: Connector and guidewires connectable thereto are disclosed which enable for the connection of guidewires requiring electrical connection to an external electrical source. These guidewires may be used for MRI imaging and the external source could be an MRI scanner. An embodiment of a guidewire is provided with enables for easier connection through improved dimensions and mechanical strength at the proximal end. An embodiment of a connector is provided which can attach to any guidewire or coaxial cable. These connectors provide for desirable mechanical and electrical properties while still enabling catheters and other tools to be used in conjunction with guidewires and other cables.

Abstract: A method of soldering a circuit board comprises moving a circuit board through various stations including a preheater station and a solder station.

Abstract: Methods and apparatus to facilitate prevention of the installation of incompatible firmware components into a firmware-supported device. Methods include performing an automatic firmware dependency compatibility check in conjunction with an attempted installation of firmware components into the firmware-supported device. Apparatus include a firmware bundle having one or more firmware components and which also has a firmware compatibility identifier that is configured to facilitate the performance of the automatic firmware dependency compatibility check. Other apparatus include a firmware-supported device that comprises a firmware component dependency compatibility algorithm that is configured to prevent the installation of incompatible firmware components into the firmware-supported device.

Abstract: The present invention provides a distinctive method and apparatus (20) for forming an article which includes one or more selectively configured strands of material. In particular aspects, the invention can provide a method and apparatus for wrapping a strand of material with a selected filament, and desirably, the filament can be an adhesive filament. The technique of the invention can include a moving of a strand of material (22) at a selected speed along an appointed machine-direction (34). A substantially continuous filament (24) can be directed onto the strand of material (22) along an oscillating filament path (26) to form a plurality of filament threads (28) extending from opposed lateral side regions (30) of the strand of material (22). An air stream (32) is directed to operatively wrap the filament threads (28) around the strand of material (22).

Abstract: An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.

Abstract: A thin walled intracorporeal catheter such as a guiding catheter employed for intravascular procedures which generally has an elongated catheter shaft with a polymeric wall with a stranded reinforcing structure having at least one strand and preferably most, if not all of the strands, formed of a metallic matereial containing at least 50%, preferably at least 65% by weight of a refractory metal such as molybdenum, tungsten rhenium, tantalum and niobium. The refractory metal containing strands of the reinforcing structure, which may have a circular or rectangular transverse cross-sectional shape, provide high levels of radiopacity with a high level of mechanical properties.