Patents by Inventor Christian Hager
Christian Hager has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7922813Abstract: Epitaxially coated silicon wafers, are produced by epitaxially coating a multiplicity of wafers polished at least on their front sides, successively and individually in an epitaxy reactor, by placing a silicon wafer on a susceptor, pretreating under a hydrogen atmosphere followed by addition of an etching medium to the hydrogen atmosphere, coating epitaxially on the polished front side and removing the water from the epitaxy reactor. The susceptor is then heated, in each case, to a temperature of at least 1000° C. under a hydrogen atmosphere, and furthermore an etching treatment of the susceptor and a momentary coating of the susceptor with silicon are effected after a specific number of epitaxial coatings. Silicon wafers characterized by a parameter R30-1 mm of ?10 nm to +10 nm, determined at a distance of 1 mm from the edge of the silicon wafer are produced.Type: GrantFiled: September 15, 2006Date of Patent: April 12, 2011Assignee: Siltronic AGInventors: Reinhard Schauer, Christian Hager
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Publication number: 20100176491Abstract: Silicon wafers polished on their front sides are individually placed on a susceptor in an epitaxy reactor and firstly pretreated under a hydrogen atmosphere, and secondly with addition of an etching medium with a flow rate of 1.5-5 slm to the hydrogen atmosphere, the hydrogen flow rate being 1-100 slm in both steps, and subsequently epitaxially coated on the polished front side, and then removed from the reactor. In a second method, gas flows introduced into the reactor by injectors are distributed into outer and inner zones of the chamber, such that the inner zone gas flow acts on a wafer central region and the outer zone gas flow acts on a wafer edge region, the inner/outer distribution of the etching medium I/O=0-0.75. Silicon wafers having an epitaxial layer having global flatness value GBIR of 0.02-0.06 ?m, relative to an edge exclusion of 2 mm are produced.Type: ApplicationFiled: January 5, 2010Publication date: July 15, 2010Applicant: SILTRONIC AGInventors: Joerg Haberecht, Christian Hager, Georg Brenninger
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Patent number: 7644980Abstract: The invention relates to a vehicle roof with a movable roof section which can be deployed into a ventilation position by means of a deploy and/or displacement mechanism and/or then displaced above or below the vehicle roof or an at least temporarily stationary roof section for at least partially releasing a roof opening in the vehicle roof. The deploy and/or displacement mechanism comprises at least one vertical gate (9) which has at least one guide web (10), disposed perpendicular to the gate (9) and having slide tracks (15, 16) that are at least partially encircled by a slide element of a slide (8) that can be displaced along a guide rail. The gate (9) is produced from metal and the guide web (10) at least partially from plastic. In order to provide a simple and stable gate (9) having good sliding properties, the gate (9) comprises a plurality of spaced-apart openings (11) for anchoring the plastic (14) of the guide webs (10).Type: GrantFiled: July 7, 2006Date of Patent: January 12, 2010Assignee: Webasto AGInventors: Christian Hager, Robert Bertsch
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Publication number: 20090277376Abstract: Epitaxially coated semiconductor wafers are prepared by a process in which a semiconductor wafer polished at least on its front side is placed on a susceptor in a single-wafer epitaxy reactor and epitaxially coated on its polished front side at temperatures of 1000-1200° C., wherein, after coating, the semiconductor wafer is cooled in the temperature range from 1200° C. to 900° C. at a rate of less than 5° C. per second. In a second method for producing an epitaxially coated wafer, the wafer is placed on a susceptor in the epitaxy reactor and epitaxially coated on its polished front side at a deposition temperature of 1000-1200° C., and after coating, and while still at the deposition temperature, the wafer is raised for 1-60 seconds to break connections between susceptor and wafer produced by deposited semiconductor material before the wafer is cooled.Type: ApplicationFiled: April 15, 2009Publication date: November 12, 2009Applicant: Siltronic AGInventors: Reinhard Schauer, Christian Hager
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Publication number: 20090134671Abstract: The invention relates to a vehicle roof with a movable roof section which can be deployed into a ventilation position by means of a deploy and/or displacement mechanism and/or then displaced above or below the vehicle roof or an at least temporarily stationary roof section for at least partially releasing a roof opening in the vehicle roof. The deploy and/or displacement mechanism comprises at least one vertical gate (9) which has at least one guide web (10), disposed perpendicular to the gate (9) and having slide tracks (15, 16) that are at least partially encircled by a slide element of a slide (8) that can be displaced along a guide rail. The gate (9) is produced from metal and the guide web (10) at least partially from plastic. In order to provide a simple and stable gate (9) having good sliding properties, the gate (9) comprises a plurality of spaced-apart openings (11) for anchoring the plastic (14) of the guide webs (10).Type: ApplicationFiled: July 7, 2006Publication date: May 28, 2009Inventors: Christian Hager, Robert Bertsch
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Publication number: 20070062438Abstract: Epitaxially coated silicon wafers, are produced by epitaxially coating a multiplicity of wafers polished at least on their front sides, successively and individually in an epitaxy reactor, by placing a silicon wafer on a susceptor, pretreating under a hydrogen atmosphere followed by addition of an etching medium to the hydrogen atmosphere, coating epitaxially on the polished front side and removing the water from the epitaxy reactor. The susceptor is then heated, in each case, to a temperature of at least 1000° C. under a hydrogen atmosphere, and furthermore an etching treatment of the susceptor and a momentary coating of the susceptor with silicon are effected after a specific number of epitaxial coatings. Silicon wafers characterized by a parameter R30-1 mm of ?10 nm to +10 nm, determined at a distance of 1 mm from the edge of the silicon wafer are produced.Type: ApplicationFiled: September 15, 2006Publication date: March 22, 2007Applicant: Siltronic AGInventors: Reinhard Schauer, Christian Hager
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Patent number: 6663885Abstract: An aqueous liposome system comprises at least one phospholipid, a non-phospholipidic substance which is a bile acid or derivative thereof, and, optionally, a non-toxic organic solvent. The mass ratio of phospholipid to the non-phospholidic substance is in the range between 1:0.001 and 1:0.1. The diameter of the liposomes formed in this liposome system is in the range between 35 and 90 nm. The liposome system is stable over large periods of time, e.g., several months or years, and is highly transparent. The liposomes may be loaded with a pharmaceutically active ingredient.Type: GrantFiled: March 7, 1996Date of Patent: December 16, 2003Assignee: A. Natterman & Cie GmbHInventors: Jörg-Christian Hager, Josef-Peter Löhr, Manfred Dürr
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Patent number: 6579461Abstract: The invention relates to a process for the reprocessing respectively purification of aqueous solutions of a tertiary amine oxide, particularly of process waters, e.g. used precipitation baths, which occur during the production of cellulosic moulded bodies, comprising the separation of turbidifying agents and solid impurities from the solution. The process in accordance with the invention is characterised in that the turbidifying agents and impurities are at least partly separated by means of a flotation process.Type: GrantFiled: March 13, 2001Date of Patent: June 17, 2003Assignee: Lenzing AktiengesellschaftInventors: Johann Männer, Rudolf Emeder, Christian Hager, Franz Nussbaumer, Thomas Endl, Johannes Kneissl
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Publication number: 20010045394Abstract: The invention relates to a process for the reprocessing respectively purification of aqueous solutions of a tertiary amine oxide, particularly of process waters, e.g. used precipitation baths, which occur during the production of cellulosic moulded bodies, comprising the separation of turbidifying agents and solid impurities from the solution. The process in accordance with the invention is characterised in that the turbidifying agents and impurities are at least partly separated by means of a flotation process.Type: ApplicationFiled: March 13, 2001Publication date: November 29, 2001Applicant: Lenzing AktiengesellschaftInventors: Johann Manner, Rudolf Emeder, Christian Hager, Franz Nussbaumer, Endl Thomas, Jpjammes Kneissl
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Patent number: 6103274Abstract: A pharmaceutical, orally applicable composition is disclosed, whereby the composition contains at least one antacid active substance as well as more than 45% by weight of a sugar and/or sugar alcohol and between 12% and 35% by weight of water. The composition has a liquid or a semisolid consistency and is substantially free of preservatives.Type: GrantFiled: September 29, 1998Date of Patent: August 15, 2000Assignee: Rhone-Poulenc Rorer GmbHInventors: Winfred Jettka, Jorg-Christian Hager, Manfred Durr
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Patent number: 6090070Abstract: A sale unit for the parenteral application of liquid pharmaceutical products by the user is described, whereby the unit comprises at least one cannula, a device to emit a given liquid amount of the pharmaceutical product in single doses, as well as at least one vessel filled with the pharmaceutical product, the vessel being arranged within the device and emptied in single doses by means of the device, and whereby each single dose corresponds to the given liquid amount of the pharmaceutical product.Type: GrantFiled: February 10, 1997Date of Patent: July 18, 2000Assignee: Rhone-Poulenc Rorer GmbHInventors: Jorg-Christian Hager, Kurt Gebhart, Helmut Lowenich, Ulrich Pastewka
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Patent number: 6063507Abstract: The invention relates to a double-layered sheet metal with a first layer (5) of sheet metal comprising indented knobs (4.sub.I -4.sub.IV ; 4.sub.V -4.sub.VII ; 4.sub.VIII -4.sub.XIII), with several of these knobs forming the corner points of a geometrical segment (8.sub.I, 8.sub.II, 8.sub.III) of the first layer (5) of sheet metal, with a second layer (6) of sheet metal which is connected to the first layer (5) of sheet metal in the area of the tips (4a) of the knobs (4.sub.I -4.sub.IV ; 4.sub.V -4.sub.VII ; 4.sub.VIII -4.sub.XIII), and with a filling (7) made of filling material arranged in the void remaining between the layers (5, 6) of sheet metal. With such a double-layered sheet metal the danger of "total failure" in the case of a load exceeding elastically endured deformation is reduced in that the geometrical segment (8.sub.I, 8.sub.II, 8.sub.Type: GrantFiled: August 14, 1998Date of Patent: May 16, 2000Assignee: Thyssen Stahl AGInventors: Klaus Blumel, Friedrich Behr, Klaus Gohler, Christian Hager, Uwe Kneiphoff
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Patent number: 5858413Abstract: A pharmaceutical, oral composition of a liquid to semisolid consistency is disclosed, wherein the composition, substantially free of preservatives, contains at least one antacid active substance as well as more than 45% by weight, a sugar and/or sugar alcohol, relative to the ready-to-use composition, and up to 40% by weight, a pharmaceutically harmless solvent, relative to the ready-to-use composition.Type: GrantFiled: July 23, 1996Date of Patent: January 12, 1999Assignee: Rhone-Poulenc Rorer GmbHInventors: Winfred Jettka, Jorg-Christian Hager, Manfred Durr
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Patent number: 5766530Abstract: The invention is concerned with a process for the production of cellulose moulded bodies wherein a suspension of cellulose in an aqueous solution of a tertiary amine-oxide is transformed into a mouldable solution, said solution being extruded by means of a forming tool and conducted into a precipitation bath. The process is characterized in that at least part of the materials in devices and pipes for the transportation and processing of the solution, which material is in contact with the mouldable solution contains at a minimum of 90% up to a depth of at least 0,5 .mu.m, preferably more than 1 .mu.m, at least one element of the group consisting of titanium, zirconium, chromium and nickel in elementary form and/or in the form of compounds provided that the remaining of the material does not contain any of the elements of the group consisting of copper, molybdenum, tungsten or cobalt.Type: GrantFiled: June 6, 1995Date of Patent: June 16, 1998Assignee: Lenzing AktiengesellschaftInventors: Wolfram Kalt, Johann Manner, Arnold Nigsch, Heinrich Firgo, Christian Hager, Wolfgang Helmut Schkorwaga
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Patent number: 5670536Abstract: This invention relates to a pharmaceutical composition comprising as active principle, docetaxel or a taxoid derived from docetaxel, one or more unsaturated phospholipids and a small amount of one or more negative phospholipids, allow the active principle to be formulated in high concentration and are suitable for administration by injection.Type: GrantFiled: April 25, 1995Date of Patent: September 23, 1997Assignee: Rhone-Poulenc Rorer S.A.Inventors: Manfred Durr, Jorg-Christian Hager, Armin Wendel