Abstract: The present invention relates to an apparatus (1), a system (2), a method (200), and a computer program for synthesizing at least one targeted broadband electromagnetic signal (60).

Abstract: The present invention relates to a micro-optomechanical system (500) and to a method for the production thereof.

Abstract: The invention relates to an apparatus (10) and a method for optically characterizing or processing an object (60), and to an object transport unit (55).

Abstract: Method for detecting an electromagnetic use-signal (2401) comprising: providing an use-signal; Providing a reference signal (2201) comprising M discrete tones with M?2; splitting the use-signal into N partial use-signals (2511) with N?2; splitting the reference signal into N partial reference signals (2521); mixing each partial use-signal (2511-n) with the corresponding partial reference signal (2521-n) to generate (I) partial mixing signals (2531), wherein the nth mixing element (2530-n) generates Kn partial mixing signals (2531-n); digitizing the partial mixing signals (2531) that (I) digitized partial mixing signals (2541) are generated; reconstructing the use-signal (2551) using a transformation that relates partial mixing signals to the use-signal and that comprises at least one model parameter related to a measurement property, characterized in that: at least one partial reference signal comprises at least two spectral tones, and the (I) of the partial mixing signals comprises redundant information to d

Abstract: The invention relates to a method and to an assembly (200) for localizing an optical coupling point (11) and to a method for producing a microstructure (100) at the optical coupling point (11).

Abstract: An optical system and a method for producing it is disclosed. The optical system has at least two separate optical components and an optical connection between them. In the inventive method, first and second optical component are provided, each having respective beam profiles. An arrangement of the first and second optical components and the form and target position of at least one beam-shaping element are specified. The beam-shaping element is produced using a three-dimensional direct-writing lithography method in situ at the target position to thereby obtain an optical component supplemented by the beam-shaping element. The supplemented optical component is placed and fixed on common base plate to thereby obtain the optical system. The optical systems produced with the present method can be used in optical data transfer, measurement technology and sensors, life sciences and medical technology, or optical signal processing.

Abstract: The invention relates to an optical waveguide component and to a method for the production thereof.

Abstract: The invention relates to an assembly for optical coupling and for mode-selective separation or overlaying of optical fields, to the use thereof and to a method for producing a waveguide-based optical coupling element (10) which is designed for mode-selective separation or overlaying of optical fields at a further optical coupling point (410) of an optical component (400).

Abstract: The invention relates to a method and to an assembly (200) for localizing an optical coupling point (11) and to a method for producing a microstructure (100) at the optical coupling point (11).

Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.

Abstract: The present invention relates to a method for producing a molded body (10), comprising the following steps: a) providing a molding tool (40) which has at least one receptacle (12) in which at least one material (30) which comprises at least one shape-memory material (31) is introduced, wherein the shape-memory material (31) is present in a first state (111), wherein the material (30) at least partially fills the receptacle (12) of the molding tool (40) in such a manner that said material adjoins at least one surface of the receptacle (12); b) creating a molded body (10) in the receptacle (12) of the molding tool (40) from the material (30), wherein the shape-memory material (31) is present in a second state (112), wherein a form (11) is embossed into the molded body (10) during the second state (112); c) transferring the shape-memory material (31) to a third state (113), wherein the molded body (10) can be deformed during the third state (113) in such a manner that the molded body (10) is demolded from the

Abstract: A waveguide component includes a waveguide, which is at least partially transparent or translucent with respect to light and is set up in such a way that light can be conducted at least partially through the waveguide. The waveguide includes a waveguide core, a first casing region, and a second casing region. The waveguide core is formed from one or more spatially separated elements of at least one waveguide core material. The first casing region, which includes at least one electro-optical material, interacts with light guided in the waveguide. The first casing region is disposed around the one or more elements of the waveguide core. The second casing region includes at least one dielectric material. The second casing region is arranged around the first casing region and/or the waveguide core. The waveguide component further includes at least two line regions that are at least partially electrically conductive.

Abstract: The invention relates to an apparatus (10) and a method for optically characterizing or processing an object (60), and to an object transport unit (55).

Abstract: An optical system and a method for producing it is disclosed. The optical system has at least two separate optical components and an optical connection between them. In the inventive method, first and second optical component are provided, each having respective beam profiles. An arrangement of the first and second optical components and the form and target position of at least one beam-shaping element are specified. The beam-shaping element is produced using a three-dimensional direct-writing lithography method in situ at the target position to thereby obtain an optical component supplemented by the beam-shaping element. The supplemented optical component is placed and fixed on common base plate to thereby obtain the optical system. The optical systems produced with the present method can be used in optical data transfer, measurement technology and sensors, life sciences and medical technology, or optical signal processing.

Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.

Abstract: An optical system and a method for producing it is disclosed. The optical system has at least two separate optical components and an optical connection between them. In the inventive method, first and second optical component are provided, each having respective beam profiles. An arrangement of the first and second optical components and the form and target position of at least one beam-shaping element are specified. The beam-shaping element is produced using a three-dimensional direct-writing lithography method in situ at the target position to thereby obtain an optical component supplemented by the beam-shaping element. The supplemented optical component is placed and fixed on common base plate to thereby obtain the optical system. The optical systems produced with the present method can be used in optical data transfer, measurement technology and sensors, life sciences and medical technology, or optical signal processing.

Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.

Abstract: A waveguide component includes a waveguide, which is at least partially transparent or translucent with respect to light and is set up in such a way that light can be conducted at least partially through the waveguide. The waveguide includes a waveguide core, a first casing region, and a second casing region. The waveguide core is formed from one or more spatially separated elements of at least one waveguide core material. The first casing region, which includes at least one electro-optical material, interacts with light guided in the waveguide. The first casing region is disposed around the one or more elements of the waveguide core. The second casing region includes at least one dielectric material. The second casing region is arranged around the first casing region and/or the waveguide core. The waveguide component further includes at least two line regions that are at least partially electrically conductive.

Abstract: The present invention relates to a method for producing a molded body (10), comprising the following steps: a) providing a molding tool (40) which has at least one receptacle (12) in which at least one material (30) which comprises at least one shape-memory material (31) is introduced, wherein the shape-memory material (31) is present in a first state (111), wherein the material (30) at least partially fills the receptacle (12) of the molding tool (40) in such a manner that said material adjoins at least one surface of the receptacle (12); b) creating a molded body (10) in the receptacle (12) of the molding tool (40) from the material (30), wherein the shape-memory material (31) is present in a second state (112), wherein a form (11) is embossed into the molded body (10) during the second state (112); c) transferring the shape-memory material (31) to a third state (113), wherein the molded body (10) can be deformed during the third state (113) in such a manner that the molded body (10) is demolded from the

Abstract: The present invention relates to a micro-optomechanical system (500) and to a method for the production thereof.