Abstract: The invention relates to preparations, in particular plant-protective preparations which contain a mixture of at least two different active plant-protective substances, wherein a) at least one active substance is selected from a conazole group (active substance 1) and b) another active-plant protective substance (active substance 2) whose water solubility at a temperature of 20° C. is less than 20 g/l., c) at least one type of copolymer CP consisting of M monomers comprising ?) at least one type of monoethylenically unsaturated monomer M1 comprising at least one sulphonic acid group and ?) at least one type of neutral monoethylenically unsaturated monomer M2, wherein the quantitative ratio between the active substance 1 and the other active plant-protective substance 2 ranges from 1:10 to 10:1.

Abstract: Binder for granular and/or fibrous substrates.

Abstract: The invention relates to a bone plate (1), comprising a bottom side (4) intended for lying against the bone, a top side (3) facing away from the bone, a plurality of holes that penetrate the plate, of which holes at least one hole is used to accommodate a bone screw that has or does not have a threaded screw head, wherein furthermore at least one of the holes has a spherical oblong-hole shape having a threaded section.

Abstract: This invention relates to an aqueous binder composition containing a) at least one polymer P and b) at least one saccharide compound S, such that an amount of the saccharide compound S is ?10 and ?400 parts by weight per 100 parts by weight of polymer P, wherein an amount of an additional formaldehyde-containing binder is ?50 parts by weight per 100 parts by weight of the summed overall amounts of the polymer P and the saccharide compound S. This invention also relates to a process for producing a shaped articles from granular and/or fibrous substrates where an aqueous binder composition of the present invention is applied to the granular and/or fibrous substrate, the granular and/or fibrous substrate thus treated is optionally shaped and then the granular and/or fibrous substrate thus obtained is thermally treated. This invention also relates to shaped articles obtained by a process of the present invention.

Abstract: Binder for granular and/or fibrous substrates.

Abstract: An orthodontic appliance includes a body (16) and at least one clip (36) connected to the body for retaining an archwire in an archwire slot (18). The body and each clip have matching, generally oval-shaped external profiles that present a compact, low-profile configuration. Each clip includes at least one prong (46) that engages a tab for helping to retain the clip in connected relationship to the body. Each tab is connected to the body by a protrusion that has a top surface coplanar with a bottom wall of the archwire slot.

Abstract: The present invention relates to a solid herbicidal composition comprising: i. mesotrione; ii. at least one arene sulfonate condensed with formaldehyde (e.g sodium alkylnaphthalene sulfonate condensed with formaldehyde); and iii. an acidifying agent. The present invention further provides a method of controlling weeds at a locus comprising diluting the solid herbicidal composition of the present invention and applying to the locus a weed controlling amount of the diluted herbicidal composition.

Abstract: Aqueous binder composition for granular and/or fibrous substrates

Abstract: In one example, a method disclosed herein includes reducing a temperature of at least an implant surface of a semiconducting substrate to a temperature less than ?50° C. and after reducing the temperature of the implant surface, performing at least one ion implantation process to implant ions into the substrate with the implant surface at a temperature less than ?50° C.

Abstract: Binder for granular and/or fibrous substrates

Abstract: Binder for granular and/or fibrous substrates

Abstract: Swellable nonwovens with reduced washoff loss are produced.

Abstract: In sophisticated semiconductor devices, the defect rate that may typically be associated with the provision of a silicon/germanium material in the active region of P-channel transistors may be significantly decreased by incorporating a carbon species prior to or during the selective epitaxial growth of the silicon/germanium material. In some embodiments, the carbon species may be incorporated during the selective growth process, while in other cases an ion implantation process may be used. In this case, superior strain conditions may also be obtained in N-channel transistors.

Abstract: The present invention relates to UV-curable polyurethane dispersions, to a process for preparing them, and to their use.

Abstract: Aqueous binders for granular and/or fibrous substrates comprising as active constituents a) at least one polymer which is obtainable by free-radical addition polymerization and comprises in copolymerized form ?5.5% and ?20% by weight of an ?,?-ethylenically unsaturated monocarboxylic or dicarboxylic acid [polymer A], b) at least one polymer which is obtainable by free-radical addition polymerization and comprises in copolymerized form ?40% by weight of an ?,?-ethylenically unsaturated monocarboxylic or dicarboxylic acid [polymer B], and c) at least one polyol compound having at least two hydroxyl groups [polyol C].

Abstract: The invention relates to preparations, in particular plant-protective preparations which contain a mixture of at least two different active plant-protective substances, wherein a) at least one active substance is selected from a conazole group (active substance 1) and b) another active-plant protective substance (active substance 2) whose water solubility at a temperature of 20° C. is less than 20 g/l., c) at least one type of copolymer CP consisting of M monomers comprising ?) at least one type of monoethylenically unsaturated monomer M1 comprising at least one sulphonic acid group and ?) at least one type of neutral monoethylenically unsaturated monomer M2, wherein the quantitative ratio between the active substance 1 and the other active plant-protective substance 2 ranges from 1:10 to 10:1.

Abstract: The invention relates to preparations, in particular plant-protective preparations which contain a mixture of at least two different active plant-protective substances, wherein a) at least one active substance is selected from a conazole group (active substance 1) and b) another active-plant protective substance (active substance 2) whose water solubility at a temperature of 20° C. is less than 20 g/l., c) at least one type of copolymer CP consisting of M monomers comprising ?) at least one type of monoethylenically unsaturated monomer M1 comprising at least one sulphonic acid group and ?) at least one type of neutral monoethylenically unsaturated monomer M2, wherein the quantitative ratio between the active substance 1 and the other active plant-protective substance 2 ranges from 1:10 to 10:1.

Abstract: The present invention relates to amphiphilic polymer compositions, to a process for their preparation and to their use for preparing aqueous active compound compositions of water-insoluble active compounds, in particular active compounds for crop protection. The amphiphilic polymer compositions can be obtained by reacting a) at least one hydrophobic polymer P1 which carries functional groups R1 which are reactive toward isocyanate groups and which is constructed of ethylenically unsaturated monomers M1, comprising: a1) at least 10% by weight, based on the total amount of monomers M1, of monomers M1a of the formula I ?in which X is oxygen or a group N—R4; R1, R2, R3 and R4 are as defined in the claims and the description; a2) up to 90% by weight, based on the total amount of monomers M1, of neutral monoethylenically unsaturated monomers M1b whose solubility in water at 25° C.

Abstract: Resist masks exposed to high-dose implantation processes may be efficiently removed on the basis of a combination of a plasma-based etch process and a wet chemical etch recipe, wherein both etch steps may include a highly selective etch chemistry in order to minimize substrate material loss and thus dopant loss in sophisticated semiconductor devices. The first plasma-based etch step may provide under-etched areas of the resist mask, which may then be efficiently removed on the basis of the wet chemical etch process.

Abstract: By operating an implantation tool with a source gas having a halogen fraction of 66 atomic percent or less relative to the total composition of the source gas, an in situ cleaning effect may be achieved while performing an implantation process.